Matches 1 - 50 out of 408 1 2 3 4 5 6 7 8 9 >
Match Document Document Title
7615118 Substrate processing apparatus and substrate processing method  
In a substrate processing apparatus of the present invention, when substrates are loaded into a chamber, a frame part formed integral with a substrate holding part is interposed between the chamber...
7611322 Processing thin wafers  
There is described a wafer processing system for thinned wafers that are easily broken during handling. The system protects against breakage during handling and provides for temperature controls...
7604701 Method and apparatus for removing external components from a process chamber without compromising process vacuum  
An access assembly for a process chamber, including a wall segment constructed and arranged to access the process chamber, a mounting assembly constructed and arranged to couple the wall segment to...
7585370 Gas-purged vacuum valve  
A vacuum valve assembly for use in a vacuum processing chamber includes a seat defining an opening in the vacuum valve, with the seat having a sealing face adjacent the opening and normal to the...
7582167 Apparatus for reducing entrapment of foreign matter along a moveable shaft of a substrate support  
In one embodiment, the invention is a guard ring for reducing particle entrapment along a moveable shaft of a substrate support. In one embodiment, the guard ring comprises a substantially annular...
7491913 Bake apparatus for use in spin-coating equipment  
Bake apparatus for use in baking a substrate, such as a semiconductor wafer, includes a chamber, a hot plate installed within the chamber, and first and second buffer plates for uniformly...
7462372 Light emitting device, method of manufacturing the same, and thin film forming apparatus  
A method of manufacturing a light emitting device of upward emission type and a thin film forming apparatus used in the method are provided. A plurality of film forming chambers are connected to a...
7431813 Multi-chambered substrate processing equipment having sealing structure between chambers thereof, and method of assembling such equipment  
Sealing structure provided between a transfer chamber and a chamber, such as a process chamber, connected to the transfer chamber includes an insert member, a docking member, and annular seals. The...
7422653 Single-sided inflatable vertical slit valve  
A vacuum chamber having a gate valve including a chamber housing defining an internal vacuum region and first and second openings through the chamber housing and a gate valve secured to the chamber...
7416633 Plasma processing apparatus  
Described is a vacuum processing apparatus that includes a vacuum container which has a processing chamber inside thereof, wherein a plasma used for processing a sample is formed inside the...
7410542 Variable environment, scale-able, roll to roll system and method for manufacturing thin film electronics on flexible substrates  
A roll to roll, film forming system overcoming the shortcomings of current roll to roll processing is presented; The roll to roll enabled cartridge is loaded with a bolt of fresh flexible...
7374620 Substrate processing apparatus  
A substrate processing apparatus ( 10 A) using a microwave plasma is disclosed wherein an inner partition wall ( 15 ) is provided within a process chamber ( 11 ) so that the inside of the process...
7371285 Motorized chamber lid  
A semiconductor processing chamber having a motorized lid is provided. In one embodiment, the semiconductor processing chamber generally includes a chamber body having sidewalls and a bottom...
7282111 System and method for monitoring particles contamination in semiconductor manufacturing facilities  
Provided is a particle monitoring system capable of detecting a level of polymer particle contamination on inner walls of a process chamber. Also disclosed is a method of monitoring the level of...
7282097 Slit valve door seal  
Embodiments of the invention generally provide a slit valve door seal. In one embodiment, a slit valve door seal includes a ring-shaped base having a center axis and at least one finger extending...
7279067 Port structure in semiconductor processing system  
In a port structure 16 A in a semiconductor processing system 2 , a door 20 A is disposed in a port 12 A defined by upright wall 52 and 54 . A table 48 opposed to the port is disposed...
7279049 Apparatus for reducing entrapment of foreign matter along a moveable shaft of a substrate support  
In one embodiment, the invention is a guard ring for reducing particle entrapment along a moveable shaft of a substrate support. In one embodiment, the guard ring comprises a substantially annular...
7276123 Semiconductor-processing apparatus provided with susceptor and placing block  
A semiconductor-processing apparatus comprises a susceptor and removable placing blocks detachably placed at a periphery of the susceptor for transferring a substrate. Retractable supporting...
7270715 Chemical vapor deposition apparatus  
A chemical vapor deposition apparatus includes a subatmospheric substrate transfer chamber. A subatmospheric deposition chamber is defined at least in part by a chamber sidewall. A passageway in...
7267725 Thin-film deposition apparatus  
A thin-film deposition apparatus includes a reaction chamber, a substrate transfer chamber, a susceptor having a radially-extending step portion, a ring-shaped separation wall for separating the...
7241346 Apparatus for vapor deposition  
A stage has a plate, a first seal surface, a stem, a second seal surface, a cover, a conductor and a flow path. A heater is embedded in the plate. A terminal for supplying power to the heater is...
7232286 Seal device and method for operating the same and substrate processing apparatus comprising a vacuum chamber  
The present invention provides a seal device comprising a sealing passage which allows communication between a first space and a second space, and evacuation lines individually connected to the...
7225820 High-pressure processing chamber for a semiconductor wafer  
A processing chamber having an improved sealing means is disclosed. The processing chamber comprises a lower element, an upper element, and a seal energizer. The seal energizer is configured to...
7214274 Method and apparatus for thermally insulating adjacent temperature controlled processing chambers  
A dual chamber apparatus including a first chamber and a second chamber which is configured to be coupled to the first chamber at an interface. Each of the first chamber and the second chamber has...
7208065 Structure for measuring the etching speed  
The specification discloses a structure and method for measuring the etching speed. A test layer is connected with several resistors. Etching the metal layer disconnects in order the resistors from...
7198678 Apparatus for performing at least one process on a substrate  
Apparatus for performing at least one processing operation on a substrate, the apparatus being provided with at least one process chamber and a vacuum lock for the purposes of placing the substrate...
7189290 Method and device for cleaning raw material gas introduction tube used in CVD film forming apparatus  
A method and apparatus for cleaning a source gas introduction pipe, which can prevent strong adhesion of contaminant mainly containing carbon powder on an outer surface of the source gas...
7166170 Cylinder-based plasma processing system  
A method and system for reducing the cost of a vacuum processing system by utilizing separately fabricated parts for the walls and the tops and bottoms of chambers. Walls are formed from cylinders...
7160393 Vacuum chamber assembly  
A vacuum chamber assembly comprises a floor plate, an upper plate, plural props standing on the floor plate to support the upper plate, and side plates closing side opening portions between the...
7153542 Assembly line processing method  
An apparatus for sequential processing of a workpiece comprises an assembly line processing system. The apparatus comprises multiple workpieces moving in an assembly line fashion under multiple...
7153388 Chamber for high-pressure wafer processing and method for making the same  
Broadly speaking, a wafer processing chamber for performing a high pressure wafer process is provided. More specifically, the wafer processing chamber incorporates a wafer processing volume and an...
7153362 System and method for real time deposition process control based on resulting product detection  
A system and method for real time deposition process control based on resulting product detection, where the system and method detect an amount of at least one reaction product in real time, while...
7125587 Ion beam for enhancing optical properties of materials  
A system and method to expose a material to an ion beam during a continuous material production process may include a vacuum fixture to form the ion beam and a slit in the fixture to allow at least...
7105061 Method and apparatus for sealing substrate load port in a high pressure reactor  
Methods and an apparatus for providing an intrinsically safe chamber door for a processing chamber capable of operating at high pressures are provided. One exemplary apparatus includes a processing...
7101442 Reaction apparatus  
A reaction apparatus including: a main body having a reaction chamber with an upper opening thereof, a lid hinge, and a lid combined to the lid hinge, rotationally opening and closing the upper...
7098045 Processing method utilizing an apparatus to be sealed against workpiece  
A processing method is performed for processing a workpiece such as a semiconductor wafer. The processing method utilizes an apparatus comprising a cover for covering a portion of a surface, to be...
7025833 Apparatus and method for web cooling in a vacuum coating chamber  
A chill drum ( 14 ) is modified to improve heat transfert between the drum and a flexible web substrate ( 20 ) disposed around the drum. The drum surface ( 22 ) contains a series of passages ( 44 )...
7001468 Pressure energized pressure vessel opening and closing device and method of providing therefor  
A closure assembly coupled to a vessel including a chamber and an access port in communication with the chamber, the closure assembly comprising: a door assembly coupled to the vessel and...
6972055 Continuous flow deposition system  
An atomic layer deposition system is described that includes a deposition chamber. A first and second reaction chamber are positioned in the deposition chamber and contain a first and a second...
6958097 Device for holding and vacuum-sealing a container having an opening  
A device for holding and vacuum-sealing a container as used in particular in the internal and/or external coating of containers. The device holds and vacuum-seals at least one container and has a...
6932873 Managing work-piece deflection  
A work-piece deflection management system including: (a) a first and a second vacuum chambers, each said vacuum chamber having an air-bearing seal circumscribing one of its sides, and (b) a...
6911093 Lid liner for chemical vapor deposition chamber  
A lid liner for a chemical vapor deposition chamber includes an annular portion having an inner surface for surrounding a reaction volume within the chemical deposition chamber; a mounting tab...
6911092 ALD apparatus and method  
An apparatus and method for atomic layer deposition with improved efficiency of both chemical dose and purge is presented. The apparatus includes an integrated equipment and procedure for chamber...
6899764 Chemical vapor deposition reactor and process chamber for said reactor  
A chemical vapor deposition reactor having a process chamber accommodating a substrate holder for wafers, a first gas flow of reactive gases to process the wafers and a crown-shaped gas-collector...
6889627 Symmetrical semiconductor reactor  
A symmetrical semiconductor reactor for semiconductor processing, comprising a liner, a process chamber, a valve chamber, a slot valve plate, a liner aperture plate, a rod, and an actuator. The...
6881446 Method and device for production of endless plastic hollow profiles  
A method for production of endless plastic hollow profiles, in particular tubes, comprises several production stages for the plastic tube and a coating stage for a metal coating. A reduced pressure...
6878207 Gas gate for isolating regions of differing gaseous pressure  
Disclosed herein is an improved gas gate for interconnecting regions of differing gaseous composition and/or pressure, more particularly between atmosphere and a vacuum. The gas gate includes a...
6866746 Clamshell and small volume chamber with fixed substrate support  
Embodiments of the present invention generally relate to a clamshell and small volume chamber with a fixed substrate support. One embodiment of a processing chamber includes a fixed substrate...
6863736 Shaft cooling mechanisms  
The present invention provides a rotating shaft that can extend between two regions having different ambient pressures. The rotating shaft can include a rotatable hollow outer shell that is coupled...
6858088 Method and apparatus for treating substrates  
To achieve a uniform coating of a substrate, with an apparatus and a method for coating substrates, according to which the substrate is supported on a substrate holder in such a way that a...
Matches 1 - 50 out of 408 1 2 3 4 5 6 7 8 9 >