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7618516 |
Method and apparatus to confine plasma and to enhance flow conductance
The embodiments of the present invention generally relate to annular ring used in a plasma processing chamber. In one embodiment, the annular ring includes an inner wall, an upper outer wall, a...
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7597762 |
Methods and apparatus for manufacturing components
A method for manufacturing components is provided. The method includes coupling a drive assembly to a positioning assembly, coupling a plurality of components to be manufactured to a plurality of...
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7588640 |
Workpiece carrier device
A workpiece carrier ( 2 ) comprises a rotary frame ( 3 ) and a driving part ( 20 ), both of which are rotatable about a driving axle ( 4 ). The rotary frame ( 3 ) can be driven by a motor ( 6 ),...
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7582186 |
Method and apparatus for an improved focus ring in a plasma processing system
A focus ring configured to be coupled to a substrate holder comprises a first surface exposed to a process; a second surface, opposite the first surface, for coupling to an upper surface of the...
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7582167 |
Apparatus for reducing entrapment of foreign matter along a moveable shaft of a substrate support
In one embodiment, the invention is a guard ring for reducing particle entrapment along a moveable shaft of a substrate support. In one embodiment, the guard ring comprises a substantially annular...
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7567421 |
Bipolar electrostatic chuck
A bipolar electrostatic including a chuck main body having a mounting surface; an annular electrode member formed in an annular configuration wit a center opening and fixed onto the mounting...
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7556695 |
Apparatus to make nanolaminate thermal barrier coatings
Methods and apparatus to make multilayer thermal barrier coatings for superalloy substrates such as turbine blades or vanes are disclosed. The methods produce non-homogeneous, nanometer-size,...
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7554059 |
Heater unit and semiconductor manufacturing apparatus including the same
A ceramic heater attaining more uniform temperature distribution from the start to the end of cooling is provided. Further, in a cooling module used for cooling the heater, liquid leakage during...
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7527694 |
Substrate gripping apparatus
In one embodiment, a substrate centering apparatus for centering a substrate on a substrate support is provided. In one embodiment, the invention comprises an apparatus that is mounted to an...
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7513954 |
Plasma processing apparatus and substrate mounting table employed therein
A plasma processing apparatus includes a processing container for receiving a substrate to be processed and processing the substrate by a plasma of a processing gas, a substrate mounting table,...
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7513953 |
Continuous system for depositing films onto plastic bottles and method
A bottle processing apparatus includes a rotary bottle vacuum transfer system and a bottle coating system. The rotary bottle vacuum transfer system takes bottles from atmospheric pressure and...
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7494562 |
Vapor phase growth apparatus
A vapor phase growth apparatus has a plurality of rotation susceptors to hold the semiconductor wafer, and a disk-like revolution susceptor on which the plurality of rotation susceptors are...
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7479210 |
Temperature control of pallet in sputtering system
A multi-chamber processing system is described for depositing materials on multiple workpieces (wafers, display panels, or any other workpieces) at a time in a vacuum chamber. The system includes a...
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7466907 |
Annealing process and device of semiconductor wafer
A device for use in a thermal annealing process for a wafer (T) of material chosen among the semiconductor materials for the purpose of detaching a layer from the wafer at an weakened zone. During...
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7459187 |
Surface-treatment method and equipment
An object of the present invention is to make it possible to uniformly supply of a gas onto a base material in a way simpler and lower in cost, and thus, to realize a high-quality surface...
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7449071 |
Wafer holder with peripheral lift ring
A wafer holder for supporting a wafer within a CVD processing chamber includes a vertically moveable lift ring configured to support the bottom peripheral surface of the wafer, and an inner plug...
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7446284 |
Etch resistant wafer processing apparatus and method for producing the same
A wafer processing apparatus is fabricated by depositing a film electrode onto the surface of a base substrate, the structure is then overcoated with a protective coating film layer comprising at...
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7444955 |
Apparatus for directing plasma flow to coat internal passageways
An apparatus for coating surfaces of a workpiece is configured to establish a pressure gradient within internal passageways through the workpiece, so that the coating within the internal...
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7422637 |
Processing chamber configured for uniform gas flow
An apparatus and method for performing uniform gas flow in a processing chamber is provided. In one embodiment, an apparatus is an edge ring that includes an annular body having an annular seal...
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7419551 |
Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one another
A plasma reactor for processing a workpiece includes a process chamber comprising an enclosure including a ceiling and having a vertical axis of symmetry generally perpendicular to said ceiling, a...
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7393433 |
Plasma processing apparatus, semiconductor manufacturing apparatus and electrostatic chucking unit used thereof
A wiring member which becomes substantially symmetrical on the plane of an electrostatic chuck unit is connected to the tip end of an RF introduction rod between the RF introduction rod and the...
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7393418 |
Susceptor
A susceptor at least a surface thereof being coated with SiC, includes a recess where an wafer is mounted, the recess having an round portion disposed on a lower portion of an outer circumferential...
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7393417 |
Semiconductor-manufacturing apparatus
On a wafer holding area 50 on the upper surface of a susceptor 22, a wafer W is supported by a wafer support 54 such that a gap with a predetermined distance is formed between the wafer W and...
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7387687 |
Support system for a treatment apparatus
A system for an apparatus of the type adapted to treat substrates and/or wafers is described and comprises a stationary base element and a movable support for at least one substrate or at least one...
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7368018 |
Chemical vapor deposition apparatus
A chemical vapor deposition apparatus is provided. The chemical vapor deposition apparatus includes a susceptor support base and a susceptor, and configured to rotate the susceptor with a rotary...
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7351986 |
Method and apparatus for reducing cross contamination of species during ion implantation
A wafer support for an ion implanter includes a wafer holder and a support arm for the holder in the implant chamber. A portion of the support arm adjacent the wafer holder is at least...
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7351936 |
Method and apparatus for preventing baking chamber exhaust line clog
A method and apparatus involve providing a supply of nitrogen gas, heating the supply of nitrogen gas to a temperature, and ejecting the heated nitrogen gas through the exhaust line of the baking...
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7351293 |
Method and device for rotating a wafer
Method and device for rotating a wafer which is arranged floating in a reactor. The wafer is treated in a reactor of this nature, and it is important for this treatment to be carried out as...
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7331512 |
Monitoring and controlling of laser operation
A laser monitoring and controlling apparatus is disclosed that includes a laser, a data server and a laser Graphical User Interface (GUI). In an embodiment, the apparatus further includes, an...
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7331307 |
Thermally sprayed member, electrode and plasma processing apparatus using the electrode
A thermally sprayed member or an electrode includes a basic material, a thermally sprayed film formed on the surface of the basic material, the thermally sprayed film being made of an insulating...
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7314526 |
Reaction chamber for an epitaxial reactor
Reaction chamer ( 10 ) for an epitaxial reactor comprising a belljar ( 14 ) made of insulating, transparent and chemically resistant material, a susceptor ( 24 ) provided with disk-shaped cavities...
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7311939 |
Vacuum coating unit and a method for the differentiated coating of spectacle lenses
Substrates, such as spectacle lenses for example, may be provided with a coating which is not uniform by way of screens. The screens are aperture rings, arranged concentric to a symmetry axis of...
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7311783 |
Multiple axis tumbler coating apparatus
The present invention relates to an apparatus for coating one or more workpieces such as components to be used in jet engines or industrial turbines. The apparatus comprises a device for...
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7284760 |
Holding device for disk-shaped objects
Semiconductor technology requires the use of object holders, which are capable of holding wafers securely, also during rotation. In order to save time and expense, such holders should be suitable...
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7279049 |
Apparatus for reducing entrapment of foreign matter along a moveable shaft of a substrate support
In one embodiment, the invention is a guard ring for reducing particle entrapment along a moveable shaft of a substrate support. In one embodiment, the guard ring comprises a substantially annular...
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7276125 |
Barrel type susceptor
The barrel type susceptor for use in the semiconductor epitaxial growth is characterized in that a face plate 5 of a susceptor main body 2 having the shape of a truncated cone is partitioned...
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7276123 |
Semiconductor-processing apparatus provided with susceptor and placing block
A semiconductor-processing apparatus comprises a susceptor and removable placing blocks detachably placed at a periphery of the susceptor for transferring a substrate. Retractable supporting...
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7264699 |
Workpiece holder for processing apparatus, and processing apparatus using the same
An inexpensive workpiece holder having high reliability and a processing apparatus equipped with the workpiece holder are provided, in which damage caused by oxygen in the air is prevented. The...
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7252737 |
Pedestal with integral shield
Generally, a substrate support member for supporting a substrate is provided. In one embodiment, a substrate support member for supporting a substrate includes a body coupled to a lower shield. The...
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7226055 |
Substrate holding and spinning assembly and methods for making the same
A substrate holding apparatus is provided. The substrate holding apparatus includes a chuck yoke, a plurality of arm assemblies, and a plurality of gripper assemblies. A first end of each of the...
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7223308 |
Apparatus to improve wafer temperature uniformity for face-up wet processing
A method and apparatus for controlling a substrate temperature during an electroless deposition process. The apparatus includes a deposition cell configured to support a substrate at a position...
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7204888 |
Lift pin assembly for substrate processing
Embodiments of the present invention provide an apparatus for constraining and supporting the lift pins to prevent or minimize lateral movement of the lift pins that causes substrate hand-off...
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7198276 |
Adaptive electrostatic pin chuck
Disclosed is an electrostatic chuck and system for maintaining a device flat within the electrostatic chuck. The electrostatic chuck has a plate, height adjustment mechanisms connected to the...
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7192624 |
Method for obtaining thermal diffusion coating
Continuously operating furnace and method for obtaining thermal diffusion coating on the outside surface of metallic articles. The furnace is configured as a tunnel through which in succession are...
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7186298 |
Wafer support system
A wafer support system comprising a segmented susceptor having top and bottom sections and gas flow passages therethrough. A plurality of spacers projecting from a recess formed in the top section...
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7182814 |
Sample holder for physical vapor deposition equipment
A sample holder for physical vapor deposition equipment, which is disposed in a vacuum chamber for holding samples, includes a transmission mechanism and a fastening mechanism. The transmission...
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7179397 |
Plasma processing methods and apparatus
To move an article in and out of plasma during plasma processing, the article is rotated by a first drive around a first axis, and the first drive is itself rotated by a second drive. As a result,...
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7169234 |
Apparatus and methods for preventing rotational slippage between a vertical shaft and a support structure for a semiconductor wafer holder
A substrate support assembly positively secures a substrate holder support to a rotation shaft with respect to rotationally applied forces. A substrate holder support is configured to have an...
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7166168 |
Substrate-coating system and an associated substrate-heating method
A substrate-coating system and an associated substrate-heating method, wherein the substrate-coating system is equipped with a substrate holder ( 1, 2 ) for holding at least one substrate at a...
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7153542 |
Assembly line processing method
An apparatus for sequential processing of a workpiece comprises an assembly line processing system. The apparatus comprises multiple workpieces moving in an assembly line fashion under multiple...
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