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7413611 |
Gas reaction system and semiconductor processing apparatus
A gas reaction system is disclosed which comprises a vaporizer ( 230 ) for generating a reaction gas by vaporizing a liquid material and a reaction chamber ( 221 A) wherein the reaction gas is...
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7404862 |
Device and method for organic vapor jet deposition
A device and a method for facilitating the deposition and patterning of organic materials onto substrates utilizing the vapor transport mechanisms of organic vapor phase deposition is provided. The...
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7402779 |
Effusion cell and method for use in molecular beam deposition
An MBE effusion cell is configured to produce an inverted temperature gradient; that is, the top surface of the melt is not cooler than the bottom surface of the melt. In one embodiment, the MBE...
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7393416 |
Vapor deposition process and apparatus therefor
An apparatus for depositing a ceramic coating on a component. The apparatus includes an evaporation source containing multiple different oxide compounds, at least one of the oxide compounds having...
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7384666 |
Method and apparatus for fabricating quantum dot functional structure, quantum dot functional structure, and optically functioning device
Fabrication of a quantum dot functional structure having ultra-fine particles homogeneously distributed in a transparent medium includes depositing such particles having a single particle diameter...
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7378133 |
Fabrication system, light-emitting device and fabricating method of organic compound-containing layer
The present invention provides a vapor deposition system for a film forming systems that promote an efficiency of utilizing an EL material and is excellent in uniformity or throughput of forming an...
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7371285 |
Motorized chamber lid
A semiconductor processing chamber having a motorized lid is provided. In one embodiment, the semiconductor processing chamber generally includes a chamber body having sidewalls and a bottom...
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7370848 |
Bubbler for substrate processing
A vaporization chamber for a substrate processing system includes a main body, a cover member and a transition member. The main body is made of aluminum and defines a first inner surface, which...
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7369758 |
Molecular beam source for use in accumulation of organic thin-films
A molecular beam source for use in accumulation of organic thin-films which enables the forming of a uniform thin-film on film-forming surfaces of a large-sized substrate, but without producing...
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7359630 |
Evaporation source for evaporating an organic electroluminescent layer
The present invention relates to an evaporation source for evaporating an organic electroluminescent layer. In particular, the present invention relates to the evaporation source preventing an...
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7339139 |
Multi-layered radiant thermal evaporator and method of use
The present invention provides a system and method for uniform coating of a substrate at high deposition rates by evaporating a coating material in a vacuum chamber. The system includes an...
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7335584 |
Method of using SACVD deposition and corresponding deposition reactor
A method is provided for using SACVD deposition to deposit at least one layer of dielectric material inside a deposition reactor during the fabrication of at least one semiconductor integrated...
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7332040 |
Semiconductor manufacturing system having a vaporizer which efficiently vaporizes a liquid material
A vaporizer can efficiently vaporize a liquid material under a depressurized atmosphere. The liquid material is temporarily stored in a liquid storing chamber, and is supplied to a vaporizing...
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7331512 |
Monitoring and controlling of laser operation
A laser monitoring and controlling apparatus is disclosed that includes a laser, a data server and a laser Graphical User Interface (GUI). In an embodiment, the apparatus further includes, an...
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7329595 |
Deposition of carbon-containing layers using vitreous carbon source
An effusion source comprises a vitreous C filament and a heater to increase the temperature of the filament to produce a C vapor. Also described is a deposition method comprising (a) depositing a...
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7326303 |
Single-pass growth of multilayer patterned electronic and photonic devices using a scanning localized evaporation methodology (SLEM)
This invention describes an apparatus, Scanning Localized Evaporation Methodology (SLEM) for the close proximity deposition of thin films with high feature definition, high deposition rates, and...
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7320734 |
Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage
A system for processing a workpiece includes a plasma immersion ion implantation reactor with an enclosure having a side wall and a ceiling and defining a chamber, and a workpiece support pedestal...
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7311939 |
Vacuum coating unit and a method for the differentiated coating of spectacle lenses
Substrates, such as spectacle lenses for example, may be provided with a coating which is not uniform by way of screens. The screens are aperture rings, arranged concentric to a symmetry axis of...
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7311797 |
Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor
Components of semiconductor processing apparatus comprise thermal sprayed yttria-containing coatings that provide erosion, corrosion and/or corrosion-erosion resistance in plasma atmospheres. The...
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7311783 |
Multiple axis tumbler coating apparatus
The present invention relates to an apparatus for coating one or more workpieces such as components to be used in jet engines or industrial turbines. The apparatus comprises a device for...
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7300537 |
Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor
Components of semiconductor processing apparatus comprise thermal sprayed yttria-containing coatings that provide erosion, corrosion and/or corrosion-erosion resistance in plasma atmospheres. The...
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7300038 |
Method and apparatus to help promote contact of gas with vaporized material
Structure helps support material in a container with an increased exposed surface area to help promote contact of a gas with vaporized material. For at least one disclosed embodiment, the structure...
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7294208 |
Apparatus for providing gas to a processing chamber
A method and apparatus for generating gas for a processing system is provided. In one embodiment, an apparatus for generating gas for a processing system includes a unitary, isolatable,...
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7291224 |
Covering assembly for crucible used for evaporation of raw materials
The present invention provides an assembly comprising two plates or covers, one of which being an outermost plate or cover, and both, at least in part having a perforation pattern over a surface...
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7279047 |
Reactor for extended duration growth of gallium containing single crystals
An apparatus for growing bulk GaN and AlGaN single crystal boules, preferably using a modified HVPE process, is provided. The single crystal boules typically have a volume in excess of 4 cubic...
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7276121 |
Forming improved metal nitrides
Method and apparatus are provided for forming metal nitride (MN), wherein M is contacted with iodine vapor or hydrogen iodide (HI) vapor to form metal iodide (MI) and then contacting MI with...
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7270714 |
Surface treating apparatus
A surface treating process according to the present invention, a vapor deposited film is formed from an easily oxidizable vapor-depositing material on the surface of a work by evaporating the...
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7253084 |
Deposition from liquid sources
A liquid injector is used to vaporize and inject a silicon precursor into a process chamber to form silicon-containing layers during a semiconductor fabrication process. The injector is connected...
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7246796 |
Carburetor, various types of devices using the carburetor, and method of vaporization
A vaporizer which can be used for extended time without blockage, and possible to stably supply raw materials to a reaction part. A gas passage 2 is formed inside of main body of a dispersion...
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7238238 |
Gasification monitor, method for detecting mist, film forming method and film forming apparatus
A deposition apparatus supplies a reactive gas obtained by vaporizing a liquid material at a vaporizer 30 into a chamber 10 via a processing-gas pipe 40 and forms a thin film on a...
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7213347 |
Metering material to promote rapid vaporization
Apparatus for vaporization of powdered or granular material, includes a container for holding powdered or granular material having at least one component; a vaporization structure; and a positive...
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7201942 |
Coating method
A method for the production of coated substrates, such as OLEDs is disclosed, whereby at least one layer is deposited on the at least one substrate, by means of a condensation method and a solid...
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7192486 |
Clog-resistant gas delivery system
Processing gases reactive with each other are provided in parallel to a processing chamber through separate delivery lines including mass flow controllers devoted to each line. The parallel...
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7182976 |
Process for forming a thin film and apparatus therefor
A process for forming a thin film is described that enables automatic formation of thin films having constant optical properties reliably and in large quantities with excellent reproducibility...
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7169232 |
Producing repetitive coatings on a flexible substrate
Apparatus for use in making a device by forming repetitive sequences of coatings on a flexible substrate including defining a path for the flexible substrate; the flexible substrate being disposed...
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7166169 |
Vaporization source with baffle
A vapor deposition source for depositing organic material includes a boat having a cavity for holding organic material and an aperture plate, having a plurality of spaced apertures, for enclosing...
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7163197 |
Liquid substance supply device for vaporizing system, vaporizer, and vaporization performance appraisal method
In a liquid substance supply device, a three port two valve directional control valve is provided in a transfer line, and a substance container and the transfer line are connected together by a...
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7156960 |
Method and device for continuous cold plasma deposition of metal coatings
A method for the deposition of a metal layer on a substrate ( 1 ) uses a cold plasma inside an enclosure ( 7 ) heated to avoid the formation of a metal deposit at its surface. The enclosure has an...
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7156380 |
Safe liquid source containers
Containers for providing vapor phase reactant from liquid sources include bubbler designs and designs in which carrier gas flows over the liquid surface. Among the bubbler arrangements, a bypass...
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7155115 |
Method and device for vacuum sputtering
The invention concerns a device and a process for applying a lubricant by means of vapour deposition to a target object, especially a magnetic data carrier. The device in accordance with the...
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7152549 |
Vapor deposition system
An arrangement for controlling the deflection of an electron beam in a vapor deposition system includes a control unit to which are assigned deflection modules ( 23, 27 ) which can be driven in...
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7150792 |
Film deposition system and film deposition method using the same
The present invention provides a film deposition system capable of effectively cooling a work having a large volume, and a film deposition method using this system. The film deposition system has,...
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7132128 |
Method and system for depositing material on a substrate using a solid precursor
A system and method is disclosed for vaporizing a solid precursor and transporting the precursor vapor to a process chamber. The film precursor vaporization system is coupled to the process chamber...
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7125581 |
Evaporation method and apparatus thereof
An evaporation method and an apparatus thereof are disclosed. The evaporation apparatus comprises a rotator, a heater and a source supplying device. The rotator, which is disposed above the central...
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7122085 |
Sublimation bed employing carrier gas guidance structures
Preferred embodiments of the present invention provides a sublimation system employing guidance structures including certain preferred embodiments having a high surface area support medium onto...
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7118783 |
Methods and apparatus for vapor processing of micro-device workpieces
CVD, ALD, and other vapor processes used in processing semiconductor workpieces often require volatilizing a liquid or solid precursor. Certain embodiments of the invention provide improved and/or...
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7118630 |
Apparatus for depositing a low work function material
Short-wavelength photons are used to ablate material from a low work function target onto a suitable substrate. The short-wavelength photons are at or below visible wavelength. The elemental...
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7115186 |
Liquid material evaporation apparatus for semiconductor manufacturing
A liquid material evaporation apparatus including a mixing chamber, a flow control unit, a first flow passage for introducing a liquid material, a second flow passage for introducing a carrier gas...
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7115168 |
Patterned thin-film deposition using collimating heated masked assembly
Scanning localized evaporation and deposition of an evaporant on a substrate utilizes a mask assembly comprised of a series of mask elements with openings thereon and spaced apart in a stack. The...
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7109113 |
Solid source precursor delivery system
A solid source precursor material is delivered to a deposition chamber in vaporized form by utilizing a solid source precursor delivery system having either single or multiple stations(s) having a...
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