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7611587 |
Thin-film deposition evaporator
A material source evaporator for use with an evacuable interior deposition chamber in which evaporated materials are deposited on substrates comprising a container with an associated heater that...
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7611586 |
Reactor for extended duration growth of gallium containing single crystals
An apparatus for growing bulk GaN and AlGaN single crystal boules, preferably using a modified HVPE process, is provided. The single crystal boules typically have a volume in excess of 4 cubic...
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7601225 |
System for controlling the sublimation of reactants
An apparatus and method improves heating of a solid precursor inside a sublimation vessel. In one embodiment, inert, thermally conductive elements are interspersed among units of solid precursor....
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7596305 |
Method and apparatus for preparing vaporized reactants for chemical vapor deposition
One or more coating precursors are selected from metal or silicon compounds at a temperature above their melting points but substantially below their standard vaporization temperature, thereby...
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7556695 |
Apparatus to make nanolaminate thermal barrier coatings
Methods and apparatus to make multilayer thermal barrier coatings for superalloy substrates such as turbine blades or vanes are disclosed. The methods produce non-homogeneous, nanometer-size,...
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7547363 |
Solid organometallic compound-filled container and filling method thereof
A solid organometallic compound novel filled container stably supplies an apparatus for vapor phase epitaxial growth such as an MOCVD apparatus with a solid organometallic compound over a long...
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7547003 |
Vaporizing apparatus and semiconductor processing system
A vaporizing apparatus for generating a process gas from a liquid material includes a vaporizing container defining a vaporizing space of the vaporizing apparatus; an injector connected to the...
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7527693 |
Apparatus for improved delivery of metastable species
The invention includes a deposition system having a reservoir for containment of a metastable specie connected to a deposition chamber. The system includes a metastable specie generating catalyst...
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7497420 |
Safe liquid source containers
Containers for providing vapor phase reactant from liquid sources include bubbler designs and designs in which carrier gas flows over the liquid surface. Among the bubbler arrangements, a bypass...
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7487739 |
Sublimation containment apparatus and method for developing latent fingerprints
An apparatus and method for developing latent fingerprints having a heat source with a removably mounted chamber and sublimation system wherein the sublimation system is in communication with a...
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7485189 |
Thin film deposition device using an FTIR gas analyzer for mixed gas supply
This invention provides a thin film deposition process making it possible to form a thin film having a desired composition with good reproducibility and high efficiency; a thin film deposition...
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7484315 |
Replaceable precursor tray for use in a multi-tray solid precursor delivery system
A replaceable precursor tray for use with a high conductance, multi-tray solid precursor evaporation system coupled with a high conductance vapor delivery system is described for increasing...
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7481889 |
Film forming apparatus and film forming method
To provide a film forming apparatus in which an impurity contained in an organic compound is separated to be removed and a film is formed without decreasing the purity of the purified organic...
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7462245 |
Single-wafer-processing type CVD apparatus
A single-wafer-processing type CVD apparatus for forming a thin film on an object to be processed includes a reaction chamber, a susceptor for placing the object thereon, a shower plate for...
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7452424 |
Vaporizer
A vaporizer for generating a process gas from a gas-liquid mixture fluid includes a container defining a process space of the vaporizer. A supply head having a plurality of spray holes to spray the...
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7435300 |
Dynamic film thickness control system/method and its utilization
A dynamic film thickness control system/method and its utilization consisting of a minimum of one mask plate arranged between a substrate and a vapor source. A film thickness control device is...
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7429300 |
Successive vapour deposition system, vapour deposition system, and vapour deposition process
A successive vapor deposition system in which a vapor deposition material is heated, vaporized in a vacuum, and deposited onto a vapor deposition area of a substrate, includes a conveyer which...
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7422198 |
Liquid substance supply device for vaporizing system, vaporizer, vaporization performance appraisal method
In a liquid substance supply device, a three port two valve directional control valve is provided in a transfer line, and a substance container and the transfer line are connected together by a...
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7419641 |
Multiple-chamber device for fractionated evaporation and separation of a solution
A device for evaporation of a solution based on solvent and compounds or solutes inside an enclosure comprises different evaporation zones separated by separating partitions into several distinct...
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7413611 |
Gas reaction system and semiconductor processing apparatus
A gas reaction system is disclosed which comprises a vaporizer ( 230 ) for generating a reaction gas by vaporizing a liquid material and a reaction chamber ( 221 A) wherein the reaction gas is...
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7404862 |
Device and method for organic vapor jet deposition
A device and a method for facilitating the deposition and patterning of organic materials onto substrates utilizing the vapor transport mechanisms of organic vapor phase deposition is provided. The...
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7402779 |
Effusion cell and method for use in molecular beam deposition
An MBE effusion cell is configured to produce an inverted temperature gradient; that is, the top surface of the melt is not cooler than the bottom surface of the melt. In one embodiment, the MBE...
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7393416 |
Vapor deposition process and apparatus therefor
An apparatus for depositing a ceramic coating on a component. The apparatus includes an evaporation source containing multiple different oxide compounds, at least one of the oxide compounds having...
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7384666 |
Method and apparatus for fabricating quantum dot functional structure, quantum dot functional structure, and optically functioning device
Fabrication of a quantum dot functional structure having ultra-fine particles homogeneously distributed in a transparent medium includes depositing such particles having a single particle diameter...
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7378133 |
Fabrication system, light-emitting device and fabricating method of organic compound-containing layer
The present invention provides a vapor deposition system for a film forming systems that promote an efficiency of utilizing an EL material and is excellent in uniformity or throughput of forming an...
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7371285 |
Motorized chamber lid
A semiconductor processing chamber having a motorized lid is provided. In one embodiment, the semiconductor processing chamber generally includes a chamber body having sidewalls and a bottom...
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7370848 |
Bubbler for substrate processing
A vaporization chamber for a substrate processing system includes a main body, a cover member and a transition member. The main body is made of aluminum and defines a first inner surface, which...
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7369758 |
Molecular beam source for use in accumulation of organic thin-films
A molecular beam source for use in accumulation of organic thin-films which enables the forming of a uniform thin-film on film-forming surfaces of a large-sized substrate, but without producing...
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7359630 |
Evaporation source for evaporating an organic electroluminescent layer
The present invention relates to an evaporation source for evaporating an organic electroluminescent layer. In particular, the present invention relates to the evaporation source preventing an...
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7339139 |
Multi-layered radiant thermal evaporator and method of use
The present invention provides a system and method for uniform coating of a substrate at high deposition rates by evaporating a coating material in a vacuum chamber. The system includes an...
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7335584 |
Method of using SACVD deposition and corresponding deposition reactor
A method is provided for using SACVD deposition to deposit at least one layer of dielectric material inside a deposition reactor during the fabrication of at least one semiconductor integrated...
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7332040 |
Semiconductor manufacturing system having a vaporizer which efficiently vaporizes a liquid material
A vaporizer can efficiently vaporize a liquid material under a depressurized atmosphere. The liquid material is temporarily stored in a liquid storing chamber, and is supplied to a vaporizing...
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7331512 |
Monitoring and controlling of laser operation
A laser monitoring and controlling apparatus is disclosed that includes a laser, a data server and a laser Graphical User Interface (GUI). In an embodiment, the apparatus further includes, an...
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7329595 |
Deposition of carbon-containing layers using vitreous carbon source
An effusion source comprises a vitreous C filament and a heater to increase the temperature of the filament to produce a C vapor. Also described is a deposition method comprising (a) depositing a...
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7326303 |
Single-pass growth of multilayer patterned electronic and photonic devices using a scanning localized evaporation methodology (SLEM)
This invention describes an apparatus, Scanning Localized Evaporation Methodology (SLEM) for the close proximity deposition of thin films with high feature definition, high deposition rates, and...
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7320734 |
Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage
A system for processing a workpiece includes a plasma immersion ion implantation reactor with an enclosure having a side wall and a ceiling and defining a chamber, and a workpiece support pedestal...
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7311939 |
Vacuum coating unit and a method for the differentiated coating of spectacle lenses
Substrates, such as spectacle lenses for example, may be provided with a coating which is not uniform by way of screens. The screens are aperture rings, arranged concentric to a symmetry axis of...
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7311797 |
Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor
Components of semiconductor processing apparatus comprise thermal sprayed yttria-containing coatings that provide erosion, corrosion and/or corrosion-erosion resistance in plasma atmospheres. The...
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7311783 |
Multiple axis tumbler coating apparatus
The present invention relates to an apparatus for coating one or more workpieces such as components to be used in jet engines or industrial turbines. The apparatus comprises a device for...
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7294208 |
Apparatus for providing gas to a processing chamber
A method and apparatus for generating gas for a processing system is provided. In one embodiment, an apparatus for generating gas for a processing system includes a unitary, isolatable,...
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7291224 |
Covering assembly for crucible used for evaporation of raw materials
The present invention provides an assembly comprising two plates or covers, one of which being an outermost plate or cover, and both, at least in part having a perforation pattern over a surface...
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7279047 |
Reactor for extended duration growth of gallium containing single crystals
An apparatus for growing bulk GaN and AlGaN single crystal boules, preferably using a modified HVPE process, is provided. The single crystal boules typically have a volume in excess of 4 cubic...
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7276121 |
Forming improved metal nitrides
Method and apparatus are provided for forming metal nitride (MN), wherein M is contacted with iodine vapor or hydrogen iodide (HI) vapor to form metal iodide (MI) and then contacting MI with...
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7270714 |
Surface treating apparatus
A surface treating process according to the present invention, a vapor deposited film is formed from an easily oxidizable vapor-depositing material on the surface of a work by evaporating the...
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7253084 |
Deposition from liquid sources
A liquid injector is used to vaporize and inject a silicon precursor into a process chamber to form silicon-containing layers during a semiconductor fabrication process. The injector is connected...
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7246796 |
Carburetor, various types of devices using the carburetor, and method of vaporization
A vaporizer which can be used for extended time without blockage, and possible to stably supply raw materials to a reaction part. A gas passage 2 is formed inside of main body of a dispersion...
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7238238 |
Gasification monitor, method for detecting mist, film forming method and film forming apparatus
A deposition apparatus supplies a reactive gas obtained by vaporizing a liquid material at a vaporizer 30 into a chamber 10 via a processing-gas pipe 40 and forms a thin film on a...
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7213347 |
Metering material to promote rapid vaporization
Apparatus for vaporization of powdered or granular material, includes a container for holding powdered or granular material having at least one component; a vaporization structure; and a positive...
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7201942 |
Coating method
A method for the production of coated substrates, such as OLEDs is disclosed, whereby at least one layer is deposited on the at least one substrate, by means of a condensation method and a solid...
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7192486 |
Clog-resistant gas delivery system
Processing gases reactive with each other are provided in parallel to a processing chamber through separate delivery lines including mass flow controllers devoted to each line. The parallel...
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