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5582647 |
Material supplying apparatus
A material supplying apparatus includes a container for storing a solution; an inlet pipe for introducing a carrier gas and an outlet pipe; electrodes disposed in the container over the depth...
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5580386 |
Coating a substrate surface with a permeation barrier
A substrate surface is coated with a permeation barrier of inorganic material, which is vaporised from a crucible in a vacuum chamber evacuated to at least 10 -3 mbar and precipitated on the...
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5575854 |
Semiconductor treatment apparatus
A CVD apparatus in which a process gas containing a carrier gas and a raw material gas is supplied to a process chamber through a supply line. A first part of the carrier gas is supplied from a...
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5558720 |
Rapid response vapor source
The apparatus is a rapid response evaporator for material deposition in vapor. The structure is a vessel which is heated to a temperature just above the melting temperature of the liquid which it...
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5556473 |
Parylene deposition apparatus including dry vacuum pump system and downstream cold trap
Chemical vapor deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The apparatus includes an...
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5556472 |
Film deposition apparatus
A MBE film deposition apparatus comprises a vacuum chamber provided with a partition wall for dividing the vacuum chamber into a first sub-chamber and a second sub-chamber, which are independently...
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5553395 |
Bubbler for solid metal organic source material and method of producing saturated carrying gas
A cone-shaped bubbler for use with solid metal organic source material used in metal organic chemical vapor phase deposition systems, and a method of producing carrying gas saturated with source...
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5542979 |
Apparatus for producing thin film
A thin sulfide film can be formed by simultaneously generating under different conditions a plurality of deposition materials to be deposited on a substrate, using the fact that sulfur has a higher...
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5541407 |
Arsenic atom source
The present invention provides a source of Group V and VI atoms, and in particular arsenic atoms, usable in MBE as a growth source or a doping source. The arsenic atoms are produced in two steps....
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5540782 |
Heat treating apparatus having heat transmission-preventing plates
A heat-treating apparatus for heat treating a plurality of objects-to-be-treated (semiconductor wafers) by loading the objects-to-be-treated into a heat treatment vessel having the lower end...
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5536323 |
Apparatus for flash vaporization delivery of reagents
A process and apparatus for delivering an involatile reagent in gaseous form, wherein an involatile reagent source liquid is flash vaporized on a vaporization matrix structure at elevated...
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5536322 |
Parylene deposition apparatus including a heated and cooled support platen and an electrostatic clamping device
Chemical vapor deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The apparatus includes a heated...
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5537507 |
Coated flash evaporator heater
A flash evaporator heater including a substrate formed of an intermetallic compound or of graphite and having an outer coating composed of pyrolytic boron nitride or pyrolytic graphite. The...
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5536321 |
Parylene deposition apparatus including a post-pyrolysis filtering chamber and a deposition chamber inlet filter
Chemical vapor deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The apparatus includes a...
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5536317 |
Parylene deposition apparatus including a quartz crystal thickness/rate controller
A parylene deposition apparatus includes a quartz crystal thickness/rate controller for controlling the deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The...
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5536319 |
Parylene deposition apparatus including an atmospheric shroud and inert gas source
Chemical vapor deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The apparatus includes an...
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5534314 |
Directed vapor deposition of electron beam evaporant
A process for vapor depositing an evaporant onto a substrate is provided which involves: presenting the substrate to a deposition chamber, wherein the deposition chamber has an operating pressure...
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5534068 |
Parylene deposition apparatus including a tapered deposition chamber and dual vacuum outlet pumping arrangement
A parylene deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The apparatus includes a...
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5534071 |
Integrated laser ablation deposition system
A laser ablation deposition system includes a movable platform for supporting ferroelectric target material and a support structure for supporting a thermally sensitive semiconductor substrate...
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5529634 |
Apparatus and method of manufacturing semiconductor device
An evaporation chamber for forming fine metal particles is separated from a film formation chamber in which the substrate having a metal film such as a metal column thereon is placed during metal...
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5518548 |
Deposition barrier
Deposition sources deposit material onto mirrors used in ring laser gyros. The mirrors are placed in a rotating apparatus called a planet which rotates above the deposition sources which emit the...
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5514414 |
Solvent-less vapor deposition apparatus and process for application of soldering fluxes
Apparatus and method for condensing a solderless flux vapor onto a work surface to be soldered, such as an electronic circuit board. The flux vapor is created by heating flux in a liquid state to a...
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5505781 |
Hydrophobic processing apparatus including a liquid delivery system
An apparatus for hydrophobic treatment of a semiconductor wafer comprises a tank in which HMDS liquid is stored, a process chamber in which the wafer is treated, and a unit for supplying HMDS...
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5494499 |
Crucible and method for its use
A crucible particularly intended for use when vaporizing aluminum and comprised of an ultralow cement compound. Subsequent to moulding and drying the crucible, the crucible is baked at a high...
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5495550 |
Graphite flash evaporator having at least one intermediate layer and a pyrolytic boron nitride coating
A flash evaporator vaporization vessel for flash evaporating metal under conditions of repeated thermal cycling having a graphite body, an outer layer of pyrolytic boron nitride and an intermediate...
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5494521 |
Apparatus and method for vapor growth
Herein disclosed is a vapor growth system, in which the number of dummy lines is reduced to decrease the number of lines led into a valve system, thereby enabling thin film growth having a good...
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5493630 |
Pyrolytic boron nitride coated flash evaporator
A resistance heated evaporator includes a body of graphite having a generally rectangular geometry with opposite ends each of which has four sides. A coating of pyrolytic boron nitride covers...
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5492724 |
Method for the controlled delivery of vaporized chemical precursor to an LPCVD reactor
Method and apparatus for the controlled delivery of vaporized chemical precursor to a low pressure chemical vapor deposition (LPCVD) reactor. A flow of liquid precursor containing dissolved inert...
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5490912 |
Apparatus for laser assisted thin film deposition
A pulsed laser deposition apparatus uses fiber optics to deliver visible output beams. One or more optical fibers are coupled to one or more laser sources, and delivers visible output beams to a...
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5480488 |
Apparatus for supplying CVD coating devices
An apparatus supplies CVD coating devices with coating gas and includes an intermediate reservoir for accommodation of the gaseous coating material arranged between a storage tank and a coating...
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5478398 |
Device for forming a compound oxide superconductor thin film
There is disclosed a device for forming a thin film on a substrate by irradiating a target of a compound oxide superconducting material with a laser beam and evaporating on the substrate a thin...
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5473627 |
UHV rotating fluid delivery system
A rotating all metal sealed fluid delivery system for supplying fluid to an apparatus, such as an electron beam source assembly, in an UHV environment includes a housing with fluid inlet and outlet...
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5472506 |
Method and apparatus for producing magnetic recording medium
A magnetic recording medium having good high density recording characteristics is produced by forming a magnetic layer on a substrate which is traveling around a peripheral surface of a cylindrical...
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5472510 |
Superconducting films on alkaline earth fluoride substrates with multiple buffer layers
A high frequency superconducting device structure is disclosed which comprises an alkaline earth fluoride substrate with a magnesium oxide lower buffer layer on the alkaline earth substrate and an...
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5470388 |
Device for the vacuum coating of mass produced products
Device for the vacuum coating of mass produced products. By means of the ice small parts, such as screws and bolts, as mass produced products are highly productively coated by vacuum deposition or...
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5462014 |
Apparatus for growing a thin metallic film
Gold or copper is grown on a substrate by a chemical vapor deposition method using a β-ketonato type metal complex of gold or copper as a starting material and introducing the starting material to...
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5462013 |
CVD apparatus and method for forming uniform coatings
A chemical vapor deposition (CVD) apparatus comprises a reactor having a coating chamber at elevated temperature, means for supporting substrates to be coated at different zones in the coating...
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5462602 |
Apparatus for continuous reactive metal deposition in vacuum with web looping over upper and lower rollers
Apparatus and method for coating a plastic web with dielectric coatings formed in-situ by the reaction of a reactive gas with deposited metal as the web passes over lower and upper arrays of...
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5460654 |
Apparatus for generating raw material gas used in apparatus for growing thin film
In an apparatus for forming a film of MOCVD, gas source MBE or the like, there is provided a gas supply pipe for supplying gas obtained by gasifying a liquid or solid organic metal raw material to...
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5458686 |
Pulsed laser passive filter deposition system
This invention directs itself to a pulsed laser passive filter deposition system (10) which provides a blocking and transparent mask mechanism (34) placed between a target (14) and a substrate (12)...
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5454873 |
Cold end glassware coating apparatus
An apparatus for forming a coating on glassware articles comprises a source of pressurized air and source of liquid coating material. The source of liquid coating material includes a reservoir and...
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5451260 |
Method and apparatus for CVD using liquid delivery system with an ultrasonic nozzle
A liquid delivery system for a chemical vapor deposition apparatus, and a method of using the same employs one or more ultrasonic atomizing nozzles to inject one or more liquid precursor solutions...
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5451258 |
Apparatus and method for improved delivery of vaporized reactant gases to a reaction chamber
Gas delivery apparatuses and methods utilize a housing containing three thermal zones through which a gas travels from a source to a reaction chamber. Reactant gases vaporized within the first...
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5447569 |
MOCVD system for forming superconducting thin films
A system for MOCVD fabrication of superconducting oxide thin films provides a feed tube having a narrow slot along its length with a uniform mixture of powdered precursor materials packed inside...
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5439525 |
Device for coating hollow workpieces by gas diffusion
A device for coating hollow workpieces made of heat-resistant alloys, such as Ni, Co or Fe base alloy via gas diffusion is provided. The outer and inner surfaces of the workpieces are linked with...
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5435850 |
Gas injection system
A gas injection system employs a crucible having a plurality of cylindrical bores within which gas is generated and a central passage leading to a dispensing nozzle. A chamber between the crucible...
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5433791 |
MBE apparatus with photo-cracker cell
Ultraviolet (UV) light from a lamp or UV laser, such as a metal can short arc xenon lamp or excimer laser, respectively, is provided for cracking Group V and Group VI species comprising clusters...
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5431736 |
Method for transforming a liquid flow into a gas flow and a device for implementing the method
Method and device which is to be used for the implementation thereof for transforming a liquid flow into a gas flow, whereby the liquid flow is led into a space in which the liquid evaporates and...
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5425811 |
Apparatus for manufacturing a nitrogen containing compound thin film
An apparatus for forming a II-VI Group compound thin film containing nitrogen as an impurity, on a substrate, comprises a container for holding a substrate, a vapor source for supplying Zn vapor on...
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5421895 |
Apparatus for vaporizing liquid raw material and apparatus for forming thin film
An apparatus for vaporizing a liquid raw material comprises a nozzle with an open tip end for ejecting a liquid raw material into a heated gas atmosphere as liquid droplets and a heated plate with...
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