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6051276 Internally heated pyrolysis zone  
A method and apparatus for more efficiently depositing a gas onto a surface. In one embodiment, a deposition apparatus is provided. The deposition apparatus comprises a deposition chamber, a tube...
6048402 Device for fabricating a metalized film capacitor  
A metallized film capacitor formed by laminating or winding a metallized film 1 with metal evaporated electrode on one or both sides thereof so that a pair of metal evaporated electrodes 2 are...
6039808 CVD apparatus for Cu formation  
In a CVD apparatus for Cu formation using as a raw material, a mixture of a solvent and a liquid raw material including Cu(HFA) and adducted molecules or a solid raw material including Cu(HFA) and...
6037241 Apparatus and method for depositing a semiconductor material  
Apparatus (12, 12a) and a method for depositing a semiconductor material on a glass sheet substrate (G) utilizes a distributor (22) including a heated permeable member (24) through which a carrier...
6036783 Liquid material vaporizer apparatus and gas ejection device  
A vaporizer apparatus enables efficient vaporization of a liquid material for the production of high dielectric thin film devices by allowing a sufficient dwell time for complete vaporization of...
6033479 Process gas delivery system for CVD having a cleaning subsystem  
A process gas delivery system incorporating a cleaning solution delivery subsystem for chemical vapor deposition. The system includes a slanted cleaning solution feed pipe for introducing a...
6030460 Method and apparatus for forming dielectric films  
Disclosed is a method and apparatus for facilitating the decomposition of organometallic compounds such as TEOS in chemical vapor deposition reactors in order to form deposition films. The method...
6030458 Phosphorus effusion source  
This invention is a sublimating and cracking apparatus for producing a beam of molecules to be deposited on a substrate, and an apparatus which is particularly useful with phosphorus as the source...
6024851 Apparatus for magnetic field pulsed laser deposition of thin films  
The present invention relies upon a free space magnetic field in a pulsed laser deposition (PLD) chamber for forming high quality thin films made from diverted ions from a plume evaporated from an...
6022416 Point-of-use vaporization system and method  
A point-of-use vaporization system for use in Chemical Vapor Deposition having a first delivery member for delivering a liquid precursor to a vaporization point, a second delivery member for...
6013135 Method and apparatus for six-sided vacuum painting of parts  
A method for six-sided painting of parts, such as boards, the parts having a top, bottom, sides, and ends, in a vacuum painting system having a feed conveyor, a vacuum painting chamber, and a...
6012413 Electron beam source for use with varying sizes of crucibles  
An electron beam source provides beam focusing by placing magnets under the crucible. The location of the magnets, operating in conjunction with the remaining magnetic and electromagnetic...
6011904 Molecular beam epitaxy effusion cell  
A molecular beam epitaxy effusion cell for growing epitaxial layers upon a semiconductor substrate by control of a collimated beam of molecules generated from a source material in a high vacuum...
6006701 Vaporizer in a liquid material vaporizing and feeding apparatus  
It is intended to provide a vaporizer in a liquid material vaporizing and feeding apparatus for allowing a liquid to absorb heat efficiently and vaporizing it thereby without pulsation of the...
5993622 Apparatus for coating a web on a rotating drum by plasma assisted vapor deposition  
A crucible (4) in a vacuum chamber (3) holds material to be evaporated, such as a metal or metal oxide or a mixture of a metal and a metal oxide, and a coating roll (6) guides a film web (8) a...
5989305 Feeder of a solid organometallic compound  
A feeder of a solid organometallic compound is obtained by filling a container up to 50-80 vol % of the total capacity of the container with stainless steel support whose pore ratio is adjusted to...
5976263 Sources used in molecular beam epitaxy  
A source for Molecular Beam Epitaxy (MBE) including an open-ended crucible and a removable orificed covered plate for covering the open end of the crucible, the cover plate having an encapsulated...
5972117 Method and apparatus for monitoring generation of liquid chemical vapor  
In a method and apparatus for producing a vapor containing a liquid chemical by bubbling a carrier gas through a mass of the liquid chemical, vapor production is monitored by: determining...
5968588 In-situ liquid flow rate estimation and verification by sonic flow method  
An apparatus for in-situ control of the flow of a liquid precursor into a deposition chamber comprises a liquid injection system having a liquid injection outlet connected to a chamber inlet line...
5958510 Method and apparatus for forming a thin polymer layer on an integrated circuit structure  
A method and apparatus are disclosed for forming thin polymer layers on semiconductor substrates. In one embodiment, the method and apparatus include the sublimation of stable dimer parylene...
5951769 Method and apparatus for making high refractive index (HRI) film  
This invention includes an apparatus for heating a deposition material to form a vapor that may be deposited on a polymer film and thereby create a holographic film or similar material. A system...
5952063 Crucible of pyrolytic boron nitride for molecular beam epitaxy  
Disclosed is a crucible of pyrolytic boron nitride (PBN) for molecular beam epitaxy for melting of the source material, with which the troubles due to adhering of the molten source material in the...
5951767 Molecular beam epitaxy isolation tube system  
A molecular beam epitaxy (MBE) growth chamber which provides separate longitudinally oriented isolation chambers for each effusion cell thereof. Wall structures bounding each isolation chamber are...
5944903 Effusion cell crucible with thermocouple  
A crucible with a thermocouple temperature sensor for use in a vapor effusion cell is disclosed. The upper portion of the crucible consists of a cup which contains a small quantity of the source...
5945163 Apparatus and method for depositing a material on a substrate  
Apparatus (12, 12a) and a method for depositing a material on a substrate (G) utilizes a distributor (22) including a heated permeable member (24) through which a carrier gas and a material are...
5943471 Solid precursor injector apparatus and method  
An apparatus and method are provided for effectively and controllably vaporizing solid material, in general, and specifically, solid precursor material for chemical phase deposition processes. The...
5942040 Multi-target manipulator for pulsed laser deposition apparatus  
Disclosed is a multi-target manipulator for a pulsed laser deposition apparatus. The multi-target manipulator for a pulsed laser deposition apparatus grows a thin film having both a high quality...
5939151 Method and apparatus for reactive plasma atomization  
A method and apparatus for producing AlN powder employing a vacuum chamber with a nozzle thereon having a hollow center crucible of graphite with a small feed hole in the bottom thereof. A device...
5938853 Vertical vaporizer for halide-free, silcon-containing compounds  
A vaporizer for halide-free, silicon-containing liquid reactants used in producing preforms is provided. The vaporizer includes a heated, vertically-oriented expansion chamber (20) and a vertical...
5932294 MBE deposition method employing effusion cell having a unibody crucible  
A unibody, monolithic, one-piece negative draft crucible for a MBE effusion cell. The crucible maximizes capacity, uniformity and long term flux stability, and minimizes oval defects, depletion...
5910219 Can coating system  
A coating apparatus is provided which comprises a can defining an internal chamber. A hollow sleeve which itself defines an internal space is located within the chamber. The hollow sleeve defines...
5906857 Apparatus, system and method for controlling emission parameters attending vaporized in a HV environment  
An apparatus, system and method for controlling parameters attending the emission of a vaporized material from a source in a HV environment utilizes at least one shutter which is rotatably mounted...
5904781 Processing and apparatus for manufacturing auto-collimating phosphors  
There is described a process and apparatus for the physical vapor deposition of an anisotropic phosphor composition with an auto-collimating, optical waveguide structure.
5904958 Adjustable nozzle for evaporation or organic monomers  
An apparatus for depositing a coating material, such as an organic monomer, in vapor form onto a substrate including a heated evaporation chamber having an inlet for introduction of the coating...
5891253 Corrosion resistant apparatus  
An apparatus used for processing substrates in a corrosive process gas is rendered substantially resistant to corrosion, by coating processing components exposed to the corrosive process gas with a...
5885357 Process and device for coating a substrate surface with vaporized inorganic material  
In a process for coating a substrate surface with a layer of inorganic material, the inorganic material is vaporised in a vacuum chamber evacuated to at least 10 -3 mbar by bombarding with an...
5882416 Liquid delivery system, heater apparatus for liquid delivery system, and vaporizer  
A liquid delivery system for delivery of an initially liquid reagent in vaporized form to a chemical vapor deposition reactor arranged in vapor-receiving relationship to the liquid delivery system....
5882807 Jig for heat treatment and process for fabricating the jig  
A jig used for heat treatment made from an SiC-coated silicon carbide material, wherein the SiC film is coated by the CVD method on a silicon carbide matrix in which silicon has been impregnated...
5876503 Multiple vaporizer reagent supply system for chemical vapor deposition utilizing dissimilar precursor compositions  
A system for the deposition of a multicomponent material layer on a substrate from respective liquid precursors for components of the multicomponent material layer, comprising: a vapor deposition...
5863336 Apparatus for fabrication of superconductor  
An apparatus for thallium-containing superconductor with grains having c-axis alignment perpendicular to the plane of the substrate is fabricated by controlling the thallium oxide vapor partial...
5861599 Rod-fed electron beam evaporation system  
A rod-fed electron beam evaporation system having a rod-fed electron beam evaporation source for evaporating an ingot. The ingot is of rod-like configuration and has a peg-like element to...
5855683 Thin film deposition apparatus  
An improved thin film deposition apparatus which is capable of easily increasing the temperature of a crucible using low electric power, for thus reducing the maintenance cost of the system, and...
5851297 Method and apparatus for preparing crystalline thin-films for solid-state lasers  
The present invention has been achieved by perceiving the fact to the effect that a semiconductor production process-like manner such as CVD method or the like by which materials and film thickness...
5849089 Evaporator for liquid raw material and evaporation method therefor  
Inside a first cylinder for structuring an evaporator, a second cylinder is provided. The second cylinder has an undulated surface and a plurality of fine holes are provided on this surface. A...
5849371 Laser and laser-assisted free electron beam deposition apparatus and method  
A laser and laser-assisted multi-beam deposition apparatus for evaporating and/or sublimating a material to deposit on a substrate comprises using a laser and an electron beam, or two lasers,...
5840124 Wafer carrier with flexible wafer flat holder  
Apparatus for mounting wafers in an epitaxial reactor is disclosed. The apparatus includes a wafer carrier for holding the wafer during the epitaxial deposition, including a depressed region for...
5837316 Ultra fine particle gas deposition apparatus  
In a gas deposition apparatus includes: an ultra fine particle evaporation chamber; an evaporation source arranged in the ultra fine particle evaporation chamber; a deposition chamber; a substrate...
5835678 Liquid vaporizer system and method  
A liquid vaporizer apparatus and method for chemical vapor deposition of liquid solutions into a controlled atmosphere of a CVD reaction chamber. The apparatus comprises an atomizer, gas curtain,...
5827371 Unibody crucible and effusion source employing such a crucible  
A unibody, monolithic, one-piece negative draft crucible for an MBE effusion source. The crucible maximizes capacity, uniformity and long term flux stability, and minimizes oval defects, depletion...
5820681 Unibody crucible and effusion cell employing such a crucible  
A unibody, monolithic, one-piece negative draft crucible for a MBE effusion cell. The crucible maximizes capacity, uniformity and long term flux stability, and minimizes oval defects, depletion...