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9039838 Method of manufacturing semiconductor device and substrate processing apparatus  
Provided is a substrate processing apparatus. The apparatus includes: a process vessel, a heater, a source gas supply system, an oxygen-containing gas supply system, a hydrogen-containing gas...
9031391 Woven mesh form liquid control apparatus  
A liquid control apparatus that controls a spread of a liquid has a main body that has a supply subject surface onto which the liquid is supplied. The apparatus also has a mesh form body that is...
9028614 Substrate processing apparatus  
When processing such as SiC epitaxial growth is performed at an ultrahigh temperature of 1500° C. to 1700° C., a film-forming gas can be decreased to heat-resistant temperature of a manifold and...
9023429 Method of manufacturing semiconductor device and substrate processing apparatus  
A method of manufacturing a semiconductor device including: mounting a substrate on a substrate mounting member that is disposed in a reaction container; heating the substrate at a predetermined...
8998606 Apparatus and method utilizing forced convection for uniform thermal treatment of thin film devices  
An apparatus for uniform reactive thermal treatment of thin-film materials includes a chamber enclosing a tube shaped space filled with a work gas and heaters disposed outside the chamber. The...
8999063 Susceptor, semiconductor manufacturing apparatus, and semiconductor manufacturing method  
A susceptor includes a first step portion on which a wafer is placed; and a convex portion placed on a bottom surface of the first step portion, wherein a void is formed between a top surface of...
8986451 Linear batch chemical vapor deposition system  
Described is a linear batch CVD system that includes a deposition chamber, one or more substrate carriers, gas injectors and a heating system. Each substrate carrier is disposed in the deposition...
8986453 Device for coating substrates disposed on a susceptor  
The invention relates to a device for coating substrates having a process chamber (1) disposed in a reactor housing and a two-part, substantially cup-shaped susceptor (2, 3) disposed therein,...
8986454 Window assembly for use in substrate processing systems  
Embodiments of a window assembly are provided herein. In some embodiments, a window assembly for use in a substrate processing system comprising a first window at least partially transparent to...
8980044 Plasma reactor with a multiple zone thermal control feed forward control apparatus  
A plasma reactor having a reactor chamber and an electrostatic chuck having a surface for holding a workpiece inside the chamber includes inner and outer zone backside gas pressure sources coupled...
8980001 Method for manufacturing epitaxial wafer and wafer holder used in the method  
A susceptor having a recessed portion and a ring-like step portion is arranged in a reaction chamber, and a plurality of through bores are formed in a bottom wall in the recessed portion excluding...
8981263 Electrostatic chuck apparatus  
Disclosed is an electrostatic chuck apparatus which is configured of: an electrostatic chuck section; an annular focus ring section provided to surround the electrostatic chuck section; and a...
8973526 Plasma deposition apparatus and method  
A plasma deposition apparatus includes a cathode assembly including a cathode disk and a water-coolable cathode holder supporting the cathode disk, an anode assembly including a water-coolable...
8961689 Systems and methods for distributing gas in a chemical vapor deposition reactor  
Systems and methods for the production of polysilicon or another material via chemical vapor deposition in a reactor are provided in which gas is distributed using a silicon standpipe. The silicon...
8963051 Heat treatment apparatus and method of manufacturing substrates  
A heat treatment apparatus wherein a nozzle is accurately provided on an adaptor to prevent the nozzle from interfering with other part items and a possibility of breakage due to heat expansion of...
8961691 Film deposition apparatus, film deposition method, computer readable storage medium for storing a program causing the apparatus to perform the method  
A disclosed film deposition apparatus includes a susceptor having in one surface a substrate receiving portion provided rotatably in a chamber; a heating unit including plural independently...
8956459 Joined assembly, wafer holding assembly, attaching structure thereof and method for processing wafer  
The object of the present invention is to provide an assembly, wafer holding assembly and attaching structure thereof, wherein sufficient air-tightness is assured during prolonged cycles of...
8951353 Manufacturing method and apparatus for semiconductor device  
A manufacturing method for semiconductor device includes: loading a wafer to a reaction chamber and placing the wafer on a support member; supplying process gas including source gas to a surface...
8951348 Single-chamber sequential curing of semiconductor wafers  
The present invention relates to curing of semiconductor wafers. More particularly, the invention relates to cure chambers containing multiple cure stations, each featuring one or more UV light...
8932405 Apparatus for low-temperature epitaxy on a plurality semiconductor substrates  
A reactor arrangement for layer deposition on a plurality of substrates (hereafter substrates) comprising a first reactor chamber for simultaneous cleaning the substrates, at least one second...
8927440 Film deposition apparatus and method of depositing film  
A film deposition apparatus that laminates layers of reaction product by repeating cycles of sequentially supplying process gases that mutually reacts in a vacuum atmosphere includes a turntable...
8920565 Metalorganic chemical vapor deposition reactor  
Affords MOCVD reactors with which, while deposited films are uniformized in thickness, film deposition efficiency can be improved. An MOCVD reactor (1) is furnished with a susceptor (5) and a duct...
8920562 Film formation apparatus, film formation method, manufacturing apparatus, and method for manufacturing light-emitting device  
An object is to improve use efficiency of an evaporation material, to reduce manufacturing cost of a light-emitting device, and to reduce manufacturing time needed for a light-emitting device...
8916804 Heat treatment method, recording medium having recorded program for executing heat treatment method, and heat treatment apparatus  
Provided is a thermal processing method including a first process comprising changing a set temperature of the heating plate from a first temperature to a second temperature; initiating a thermal...
8907254 Heating control system, deposition device provided therewith, and temperature control method  
A heating control system which allows a plurality of heaters to heat an object without depending on a variation in characteristics among a plurality of heater power sources includes: a...
8906162 Metal organic chemical vapor deposition equipment  
Metal organic chemical vapor deposition equipment is metal organic chemical vapor deposition equipment for forming a film on a substrate by using a reactant gas, and includes a susceptor heating...
8906161 Semiconductor producing device and semiconductor device producing method  
A tubular electrode (215) and a tubular magnet (216) are installed on an external section of a processing furnace (202) for an MMT device. A susceptor (217) for holding a wafer (200) is installed...
8895414 Method and apparatus for forming amorphous silicon film  
A method of forming an amorphous silicon film includes: forming a seed layer on a surface of a base by heating the base and supplying an amino silane-based gas to the heated base, forming the...
8888917 Restricted radiated heating assembly for high temperature processing  
A vapor deposition reactor and associated method are disclosed that increase the lifetime and productivity of a filament-based resistive-heated vapor deposition system. The reactor and method...
8882923 Substrate processing apparatus and method of manufacturing semiconductor device  
A substrate processing apparatus includes: a process chamber having an object to be heated therein and configured to process a plurality of substrates; a substrate holder configured to hold the...
8877553 Floating slit valve for transfer chamber interface  
The present invention generally comprises a floating slit valve for interfacing with a chamber. A floating slit valve moves or “floats” relative to another object such as a chamber. The slit valve...
8876976 Chemical vapor deposition apparatus for equalizing heating temperature  
Disclosed is a chemical vapor deposition apparatus for equalizing a heating temperature, which maintains the heating temperature of a heater provided therein uniform not only on the lower surface...
8864934 Plasma processing apparatus, plasma processing method, and storage medium  
Provided is a parallel flat-panel type plasma processing apparatus which includes a recipe storing unit storing a processing recipe for performing a plasma processing, a compensation setting unit...
8859042 Methods for heating with lamps  
Embodiments of the invention generally relate to methods for chemical vapor deposition (CVD) processes. In one embodiment, a method for heating a substrate or a substrate susceptor within a vapor...
8858753 Focus ring heating method, plasma etching apparatus, and plasma etching method  
There are provided a method of heating a focus ring and a plasma etching apparatus, capable of simplifying a structure of a heating mechanism without a dummy substrate. The plasma etching...
8852348 Heat exchange pedestal with coating of diamond-like material  
A substrate heat exchange pedestal comprises: (i) a support structure having a contact surface comprising a coating of a diamond-like material, and (ii) a heat exchanger in the support structure,...
8852347 Apparatus for chemical vapor deposition control  
A gas heating device and a processing system for use therein are described for depositing a thin film on a substrate using a vapor deposition process. The gas heating device includes a heating...
8845809 Scalable, high-throughput, multi-chamber epitaxial reactor for silicon deposition  
One embodiment provides an apparatus for material deposition. The apparatus includes a reaction chamber, and a pair of susceptors. Each susceptor has a front side mounting substrates and a back...
8846442 Method for producing semiconductor layers and coated substrates treated with elemental selenium and/or sulphur, in particular flat substrates  
The invention relates to a method for producing semiconductor layers and coated substrates treated with elemental selenium and/or sulphur, in particular flat substrates, containing at least one...
8840728 Imprint system for performing a treatment on a template  
The present invention is a template treatment apparatus forming a film of a release agent on a template having a transfer pattern formed on a front surface thereof, the template treatment...
8835813 Heat treatment apparatus and method for heating substrate by light-irradiation  
A light-emission output of a flash lamp for performing a light-irradiation heat treatment on a substrate in which impurities are implanted is increased up to a target value L1 over a period of...
8829397 Corrosion-resistant multilayer ceramic member  
The present invention relates to a corrosion-resistant multilayer ceramic member consisting at least of: a ceramic support substrate; an electrode layer formed on the ceramic support substrate; a...
8828185 Dry non-plasma treatment system and method of using  
A dry non-plasma treatment system and method for removing oxide material is described. The treatment system is configured to provide chemical treatment of one or more substrates, wherein each...
8821639 Apparatus for spatial and temporal control of temperature on a substrate  
An apparatus for control of a temperature of a substrate has a temperature-controlled base, a heater, a metal plate, a layer of dielectric material. The heater is thermally coupled to an underside...
8809727 Heat treatment apparatus  
The present invention relates to a heat treatment apparatus that performs activation annealing or defect repair annealing and surface oxidization which succeed impurity doping intended to control...
8808455 Substrate processing apparatus and method of manufacturing semiconductor device  
Provided are a substrate processing apparatus and a method of manufacturing a semiconductor device which are able to form a conductive film, which is dense, includes a low concentration of...
8809747 Current peak spreading schemes for multiplexed heated array  
A method of operating a heating plate for a substrate support assembly used to support a semiconductor substrate in a semiconductor processing apparatus, wherein the heating plate comprises power...
8802547 Method and apparatus for forming amorphous silicon film  
A method of forming an amorphous silicon film includes: forming a seed layer on a surface of a base by heating the base and supplying an amino silane-based gas to the heated base, forming the...
8801893 Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor  
A method of transferring heat from or to a workpiece support in an RF coupled plasma reactor includes placing coolant in an internal flow channel that is located inside the workpiece support and...
8795435 Susceptor, coating apparatus and coating method using the susceptor  
In accordance with the embodiment of the present invention, there is provided a susceptor which includes an annular first susceptor portion for supporting the peripheral portion of a silicon wafer...