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7622007 |
Substrate processing apparatus and semiconductor device producing method
Disclosed is a substrate processing apparatus which comprises reaction tubes ( 3,4 ) for processing multiple substrates ( 27 ), a heater ( 5 ) for heating the substrates, and gas introducing...
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7619184 |
Multi-parameter process and control method
A method and system for generating control settings for a multi-parameter control system. The interdependencies of processing tools and the related effect on semiconductor wafers within a...
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7618494 |
Substrate holding structure and substrate processing device
The object of the present invention is to prevent damage due to thermal stress induced into a substrate holding table in a substrate holding structure for holding a substrate to be processed. In...
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7616872 |
Temperature measurement and heat-treating methods and systems
Temperature measurement and heat-treating methods and systems. One method includes identifying a temperature of a first surface of a workpiece, and controlling energy of an irradiance flash...
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7615121 |
Susceptor system
The present invention relates to a susceptor system for an apparatus of the type adapted to treat substrates and/or wafers; the susceptor system is provided with a cavity ( 1 ) which acts as a...
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7608802 |
Heating device for heating semiconductor wafers in thermal processing chambers
An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly of light energy sources for emitting light energy onto a wafer....
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7603028 |
Non-contact thermal platforms
A thermal treatment system comprising at least one apparatus for thermally treating an object, the apparatus comprising: one platform or two substantially opposite platforms, where at least one of...
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7601935 |
Two-wire hot runner nozzle heater system
A hot runner nozzle heater system is provided with a layered heater in communication with a two-wire controller, wherein a resistive layer of the layered heater is both a heater element and a...
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7601224 |
Method of supporting a substrate in a gas cushion susceptor system
An apparatus and method to position a wafer onto a wafer holder and to maintain a uniform wafer temperature is disclosed. The wafer holder or susceptor comprises a recess or pocket whose surface...
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7592569 |
Substrate processing apparatus, pressure control method for substrate processing apparatus and recording medium having program recorded therein
A processing chamber is partitioned into a processing space and an evacuation space by a partitioning plate having formed therein a plurality of communicating holes. A processing gas supply means...
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7585386 |
Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method
A plasma processing apparatus for performing a plasma process on a target substrate includes a process container configured to accommodate the target substrate and to reduce pressure therein. A...
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7585371 |
Substrate susceptors for receiving semiconductor substrates to be deposited upon
In one implementation, a substrate susceptor for receiving a semiconductor substrate for selective epitaxial silicon-comprising depositing thereon, where the depositing comprises measuring...
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7582184 |
Plasma processing member
A plasma processing member includes a ceramic base, a plasma generating electrode embedded in the ceramic base, and an electrode power supply member connected to the plasma generating electrode....
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7582166 |
Holder for supporting wafers during semiconductor manufacture
An improved wafer holder design is described which has manufacturing and performance advantages over present state-of-the-art holders used in various wafer processing applications. The new wafer...
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7575431 |
Vertical heat processing apparatus and method for using the same
A vertical heat processing apparatus for performing a heat process on a plurality of target substrates all together includes a vertical process container configured to accommodate the target...
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7570876 |
Method and system for loading substrate supports into a substrate holder
Wafer supports are provided that have a diameter smaller than the diameter of the wafer that they are to support in a wafer boat. The perimeter of the wafer support is preferably continuous,...
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7560668 |
Substrate processing device
A substrate processing device is provided, which includes a resistance heating element and a high-frequency electrode, to which a voltage is applied, a power supply member for a resistance heating...
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7557328 |
High rate method for stable temperature control of a substrate
A method for multi-step temperature control of a substrate includes selecting a first set-point temperature and a second set-point temperature for the substrate, and selecting a first PID parameter...
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7556695 |
Apparatus to make nanolaminate thermal barrier coatings
Methods and apparatus to make multilayer thermal barrier coatings for superalloy substrates such as turbine blades or vanes are disclosed. The methods produce non-homogeneous, nanometer-size,...
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7554059 |
Heater unit and semiconductor manufacturing apparatus including the same
A ceramic heater attaining more uniform temperature distribution from the start to the end of cooling is provided. Further, in a cooling module used for cooling the heater, liquid leakage during...
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7553467 |
Tubular reaction vessel and process for producing silicon therewith
There is provided a reaction vessel whereby silicon produced can be smoothly recovered dropwise without excessive thermal load on constitutional parts of the reaction vessel, a silicon deposition...
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7528349 |
Temperature stabilization for substrate processing
A temperature stabilization system, method, composition of matter and substrate processing system are disclosed. A heat absorbing material is disposed in thermal contact with a substrate. The heat...
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7528348 |
Apparatus and method for measuring the temperature of substrates
An apparatus for measuring an object temperature of an object, and including at least one heating apparatus having at least one heating element for heating an object via electromagnetic radiation....
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7528347 |
Cooling device and heat treating device using the same
A heat treating device ( 50 ) has a cooling sleeve that covers a treating vessel ( 56 ) and a heater ( 100 ). The cooling sleeve has a cylindrical base member ( 110 ) and a cooling pipe ( 112 )...
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7527827 |
Substrate processing apparatus and substrate processing method
A method for performing a predetermined process on a substrate having coating film formed thereon includes preparing a data base denoting a relationship between each of parameters and a processing...
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7527497 |
Heat treating apparatus, heat treating method, and storage medium
A heat treating apparatus includes a heating plate for heating a substrate coated with a coating liquid, a cooling plate for cooling the substrate and a heat pipe provided in the cooling plate, a...
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7525071 |
Power-supplying member and heating apparatus using the same
A power-supplying member comprises: a first rod-shaped member connected to power-supplied object; a second rod-shaped member connected to power supply; and a thermal-expansion absorbing member,...
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7525068 |
Heating system of batch type reaction chamber and method thereof
A heating system of a batch type reaction chamber for semiconductor device and a method thereof are disclosed. Each heat unit of heating groups has different height and caloric value at right...
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7524532 |
Process for depositing thin layers on a substrate in a process chamber of adjustable height
A process for depositing thin layers on a substrate in a process chamber arranged in a reactor housing, the bottom of the process chamber consisting of a temperable substrate holder which can be...
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7521653 |
Plasma arc coating system
A system for coating a substrate includes a heater that heats the substrate. The heater includes a two-dimensional array of a plurality of heat sources which supply heat to the substrate when the...
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7517217 |
Method and apparatus for heat processing of substrate
The present invention relates to a method for heat processing of a substrate having the step of baking a substrate, on which a coating film is formed, at a predetermined high temperature,...
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7509035 |
Lamp array for thermal processing exhibiting improved radial uniformity
A thermal processing chamber includes a substrate support rotating about a center axis and a lamphead of plural lamps in an array having a predetermined difference in radiance pattern between them....
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7503980 |
Substrate supporting apparatus
A substrate supporting apparatus includes a plate member of an aluminum alloy having a flat upper surface, bottomed pits formed in the plate member, and spacer members held in the pits,...
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7501605 |
Method of tuning thermal conductivity of electrostatic chuck support assembly
A method of tuning the thermal conductivity of an electrostatic chuck (ESC) support assembly comprises measuring the temperature at a plurality of sites on a support assembly surface in which each...
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7497912 |
Substrate processing apparatus
A cell controller controls the operation of a transport robot to keep a substrate belonging to a succeeding lot carried into a heating part in the fourth transport cycle from being transported out...
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7491913 |
Bake apparatus for use in spin-coating equipment
Bake apparatus for use in baking a substrate, such as a semiconductor wafer, includes a chamber, a hot plate installed within the chamber, and first and second buffer plates for uniformly...
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7488918 |
Method and apparatus for manufacturing printed light guide plate
An apparatus for manufacturing a printed light guide plate includes a working platform ( 23 ), and a heater ( 24 ) coupled to the working platform. A transparent slab ( 21 ) is disposed on the...
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7485190 |
Apparatus for heating a substrate in a variable temperature process using a fixed temperature chuck
A method is provided for heating a substrate in a process chamber using a heated chuck. In accordance with the method, the substrate is lowered onto the chuck and heated to a first temperature less...
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7481888 |
Heat treatment jig and heat treatment method for silicon wafer
In this heat treatment jig and method for silicon wafers, a silicon wafer is heat-treated while being mounted on support projections provided on three support arms, having an intervening spacing,...
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7470919 |
Substrate support assembly with thermal isolating plate
Embodiments of the invention generally provide a substrate support assembly. In one embodiment, a substrate support assembly includes a substrate support plate, a thermal regulating plate coupled...
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7466907 |
Annealing process and device of semiconductor wafer
A device for use in a thermal annealing process for a wafer (T) of material chosen among the semiconductor materials for the purpose of detaching a layer from the wafer at an weakened zone. During...
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7461794 |
Substrate temperature regulating support pins
A method and apparatus for regulating the temperature of substrates positioned within a chamber are provided. In one embodiment, a substrate support pin is provided that includes a body having a...
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7453051 |
System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy
An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear...
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7449071 |
Wafer holder with peripheral lift ring
A wafer holder for supporting a wafer within a CVD processing chamber includes a vertically moveable lift ring configured to support the bottom peripheral surface of the wafer, and an inner plug...
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7446284 |
Etch resistant wafer processing apparatus and method for producing the same
A wafer processing apparatus is fabricated by depositing a film electrode onto the surface of a base substrate, the structure is then overcoated with a protective coating film layer comprising at...
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7442900 |
Chamber for uniform heating of large area substrates
Embodiments of the present invention generally provide an apparatus for providing a uniform thermal profile to a plurality of large area substrates during thermal processing. In one embodiment, an...
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7442275 |
Lateral temperature equalizing system for large area surfaces during processing
In many processes used in fabricating semiconductors the wafer is seated on the top surface of a pedestal and heated in a high energy process step, such as plasma etching. The pedestal, chuck or...
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7432476 |
Substrate heat treatment apparatus
A substrate heat treatment apparatus for heat-treating a substrate includes a bake plate having projections on an upper surface thereof, a seal unit disposed peripherally of the upper surface of...
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7432475 |
Vertical heat treatment device and method controlling the same
A vertical heat processing apparatus includes a process chamber ( 5 ) defining a process field (A 1 ) configured to accommodate a plurality of target substrates (W) supported at intervals in a...
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7431585 |
Apparatus and method for heating substrates
An apparatus for processing substrates is disclosed. In one embodiment, the apparatus includes a housing and a plurality of stacked cell structures in the housing. An actuator is adapted to move...
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