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7622378 |
Multi-step system and method for curing a dielectric film
A multi-step system and method for curing a dielectric film in which the system includes a drying system configured to reduce the amount of contaminants, such as moisture, in the dielectric film....
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7618494 |
Substrate holding structure and substrate processing device
The object of the present invention is to prevent damage due to thermal stress induced into a substrate holding table in a substrate holding structure for holding a substrate to be processed. In...
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7618687 |
Method for coating substrates
Disclosed are methods for coating a substrate. These methods include: (a) vertically orienting the substrate between a vertically oriented backstop and a spray gun; (b) at least partially coating...
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7616872 |
Temperature measurement and heat-treating methods and systems
Temperature measurement and heat-treating methods and systems. One method includes identifying a temperature of a first surface of a workpiece, and controlling energy of an irradiance flash...
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7611586 |
Reactor for extended duration growth of gallium containing single crystals
An apparatus for growing bulk GaN and AlGaN single crystal boules, preferably using a modified HVPE process, is provided. The single crystal boules typically have a volume in excess of 4 cubic...
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7608802 |
Heating device for heating semiconductor wafers in thermal processing chambers
An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly of light energy sources for emitting light energy onto a wafer....
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7601935 |
Two-wire hot runner nozzle heater system
A hot runner nozzle heater system is provided with a layered heater in communication with a two-wire controller, wherein a resistive layer of the layered heater is both a heater element and a...
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7601933 |
Heat processing apparatus and heat processing method
A heat processing device that bakes a substrate having a resist coating film containing a volatile substance, includes a hot plate 2 , a hot plate temperature control unit 3 , a box member 1 a ,...
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7601934 |
Integrated thermal unit having a shuttle with a temperature controlled surface
An integrated thermal unit comprising a bake plate configured to heat a substrate supported on a surface of the bake plate; a chill plate configured to cool a substrate supported on a surface of...
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7601224 |
Method of supporting a substrate in a gas cushion susceptor system
An apparatus and method to position a wafer onto a wafer holder and to maintain a uniform wafer temperature is disclosed. The wafer holder or susceptor comprises a recess or pocket whose surface...
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7585386 |
Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method
A plasma processing apparatus for performing a plasma process on a target substrate includes a process container configured to accommodate the target substrate and to reduce pressure therein. A...
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7582166 |
Holder for supporting wafers during semiconductor manufacture
An improved wafer holder design is described which has manufacturing and performance advantages over present state-of-the-art holders used in various wafer processing applications. The new wafer...
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7576303 |
Wafer holder, and wafer prober provided therewith
A wafer holder is provided having high rigidity and an enhanced heat-insulating effect that allow positional accuracy and heating uniformity to be improved, a chip to be rapidly heated and cooled,...
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7570876 |
Method and system for loading substrate supports into a substrate holder
Wafer supports are provided that have a diameter smaller than the diameter of the wafer that they are to support in a wafer boat. The perimeter of the wafer support is preferably continuous,...
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7564008 |
Alumina member and manufacturing method thereof
An electrostatic chuck includes a base of a sintered body containing alumina, an electrode as a power-supplied member embedded in the base and supplied with electric power, a bonding member...
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7554059 |
Heater unit and semiconductor manufacturing apparatus including the same
A ceramic heater attaining more uniform temperature distribution from the start to the end of cooling is provided. Further, in a cooling module used for cooling the heater, liquid leakage during...
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7544916 |
Heating device
A heating device is provided, including a ceramic base in which a resistance heating body is embedded, gas flow passages formed in an inside portion of the base, and adjustment members which vary...
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7544251 |
Method and apparatus for controlling temperature of a substrate
A pedestal assembly and method for controlling temperature of a substrate during processing is provided. In one embodiment, the pedestal assembly includes a support member that is coupled to a base...
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7528349 |
Temperature stabilization for substrate processing
A temperature stabilization system, method, composition of matter and substrate processing system are disclosed. A heat absorbing material is disposed in thermal contact with a substrate. The heat...
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7528347 |
Cooling device and heat treating device using the same
A heat treating device ( 50 ) has a cooling sleeve that covers a treating vessel ( 56 ) and a heater ( 100 ). The cooling sleeve has a cylindrical base member ( 110 ) and a cooling pipe ( 112 )...
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7527755 |
Method for increasing bulk conductivity of a ferroelectric material such as lithium tantalate
In one embodiment, a ferroelectric material is processed by placing the material in an environment including metal vapor and heating the material to a temperature below the Curie temperature of the...
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7524481 |
Reactors for producing inorganic fullerene-like tungsten disulfide hollow nanoparticles and nanotubes
The present invention is related to an apparatus for the production of inorganic fullerene-like (IF) nanoparticles and nanotubes. The apparatus comprises a chemical reactor, and is further...
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7525068 |
Heating system of batch type reaction chamber and method thereof
A heating system of a batch type reaction chamber for semiconductor device and a method thereof are disclosed. Each heat unit of heating groups has different height and caloric value at right...
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7525071 |
Power-supplying member and heating apparatus using the same
A power-supplying member comprises: a first rod-shaped member connected to power-supplied object; a second rod-shaped member connected to power supply; and a thermal-expansion absorbing member,...
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7509035 |
Lamp array for thermal processing exhibiting improved radial uniformity
A thermal processing chamber includes a substrate support rotating about a center axis and a lamphead of plural lamps in an array having a predetermined difference in radiance pattern between them....
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7503980 |
Substrate supporting apparatus
A substrate supporting apparatus includes a plate member of an aluminum alloy having a flat upper surface, bottomed pits formed in the plate member, and spacer members held in the pits,...
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7497912 |
Substrate processing apparatus
A cell controller controls the operation of a transport robot to keep a substrate belonging to a succeeding lot carried into a heating part in the fourth transport cycle from being transported out...
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7491913 |
Bake apparatus for use in spin-coating equipment
Bake apparatus for use in baking a substrate, such as a semiconductor wafer, includes a chamber, a hot plate installed within the chamber, and first and second buffer plates for uniformly...
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7488922 |
Susceptor system
The present invention relates to a susceptor system for an apparatus for the treatment of substrates and/or wafers, provided with a treatment chamber ( 1 ) delimited by at least two walls and with...
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7481312 |
Direct cooling pallet assembly for temperature stability for deep ion mill etch process
Embodiments of the present invention are directed to a frame component of a pallet assembly. In one embodiment, the frame comprises a plurality of arms for retaining at least one carrier component....
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7466907 |
Annealing process and device of semiconductor wafer
A device for use in a thermal annealing process for a wafer (T) of material chosen among the semiconductor materials for the purpose of detaching a layer from the wafer at an weakened zone. During...
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7465475 |
Method for controlling the deposition of vaporized organic material
A method for controlling the deposition of vaporized organic material onto a substrate surface, includes providing a heating device to produce vaporized organic material; providing a manifold...
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7462245 |
Single-wafer-processing type CVD apparatus
A single-wafer-processing type CVD apparatus for forming a thin film on an object to be processed includes a reaction chamber, a susceptor for placing the object thereon, a shower plate for...
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7461794 |
Substrate temperature regulating support pins
A method and apparatus for regulating the temperature of substrates positioned within a chamber are provided. In one embodiment, a substrate support pin is provided that includes a body having a...
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7453051 |
System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy
An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear...
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7446284 |
Etch resistant wafer processing apparatus and method for producing the same
A wafer processing apparatus is fabricated by depositing a film electrode onto the surface of a base substrate, the structure is then overcoated with a protective coating film layer comprising at...
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7442275 |
Lateral temperature equalizing system for large area surfaces during processing
In many processes used in fabricating semiconductors the wafer is seated on the top surface of a pedestal and heated in a high energy process step, such as plasma etching. The pedestal, chuck or...
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7442900 |
Chamber for uniform heating of large area substrates
Embodiments of the present invention generally provide an apparatus for providing a uniform thermal profile to a plurality of large area substrates during thermal processing. In one embodiment, an...
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7442413 |
Methods and apparatus for treating a work piece with a vaporous element
Methods and apparatus for controlling and delivering a vaporous element or compound, for example, selenium or sulfur, from a solid source to a work piece are provided. The methods and apparatus may...
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7438872 |
Steam oxidation apparatus
A steam oxidation apparatus is provided which is capable of ensuring a desirable controllability and reproducibility of the steam oxidation of an object-to-be-oxidized housed in the reactor, by...
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7432475 |
Vertical heat treatment device and method controlling the same
A vertical heat processing apparatus includes a process chamber ( 5 ) defining a process field (A 1 ) configured to accommodate a plurality of target substrates (W) supported at intervals in a...
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7429717 |
Multizone heater for furnace
The present invention relates to an apparatus and method for heating a semiconductor processing chamber. One embodiment of the present invention provides a furnace for heating a semiconductor...
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7427329 |
Temperature control for single substrate semiconductor processing reactor
A reactor for heat treatment of a substrate having a process chamber within a substrate enclosing structure, and a support structure configured to position a substrate at a predetermined spacing...
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7422655 |
Apparatus for performing semiconductor processing on target substrate
An apparatus for performing a semiconductor process on a target substrate (W) includes a lifting mechanism ( 48 ) disposed in a worktable ( 38 ) to assist transfer of the target substrate. The...
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7422635 |
Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces
The present disclosure suggests several systems and methods for batch processing of microfeature workpieces, e.g., semiconductor wafers or the like. One exemplary implementation provides a method...
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7419550 |
Oxidizing method and oxidizing unit of object for object to be processed
An oxidizing method for includes: an arranging step of arranging a plurality of objects to be processed in a processing container whose inside can be vacuumed, a supplying unit of an oxidative gas...
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7419566 |
Plasma reactor
The plasma reactor comprises at least one cooling device ( 15, 16 ) consisting of two cooling elements ( 15 a, 15 b; 16 a, 16 b ) adapted to be separately switched on and off. The heat produced...
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7416633 |
Plasma processing apparatus
Described is a vacuum processing apparatus that includes a vacuum container which has a processing chamber inside thereof, wherein a plasma used for processing a sample is formed inside the...
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7413610 |
Method and apparatus for coating or heat treatment of blisks for aircraft gas turbines
A method for hard-material coating or heat treatment of the blade airfoils of blisks for gas turbines provides for partial heat-insulation and cooling of the other blisk parts during the respective...
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7411161 |
Susceptor for deposition process equipment and method of fabricating a heater therein
A susceptor for deposition process equipment is provided. The susceptor includes a heater that heats the susceptor. The heater includes a sheath. The sheath surrounds a heating wire and is filled...
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