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8169162 |
Abnormal discharge suppressing device for vacuum apparatus
The present invention is directed to an apparatus for suppressing abnormal electrical discharge used for vacuum equipment which supplies power from a high-frequency power source to a plasma...
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8142568 |
Apparatus for synthesizing a single-wall carbon nanotube array
An apparatus for synthesizing a single-wall carbon nanotube array, includes a reactor, a local heating device, a gaseous carbon supplier, and a reactant gas supplier. The reactor includes a...
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8143147 |
Methods and systems for forming thin films
A method and apparatus for the deposition of thin films is described. In embodiments, systems and methods for epitaxial thin film formation are provided, including systems and methods for forming...
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8087380 |
Evaporative system for solar cell fabrication
A plurality of chamber are arranged about a transport chamber. The linear transport chamber may include a linear track supporting robot arms. The robot arms transport substrates to and from the...
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8082877 |
Heating device coating plant and method for evaporation or sublimation of coating materials
A heating device is provided wherein coating material can be transferred into the gas phase, particularly for use in a coating installation. The heating device preferably includes at least one...
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8082878 |
Thermal evaporation apparatus, use and method of depositing a material
Thermal evaporation apparatus for depositing of a material on a substrate, comprising material storage means; heating means to generate a vapor of the material in the material storage means; vapor...
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8076251 |
Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus
Provided is a method of manufacturing a semiconductor device. The method includes: loading a substrate into a process vessel; performing a process to form an oxide, nitride, or oxynitride film on...
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8062427 |
Particulate material metering and vaporization
Apparatus for metering and vaporizing a particulate material, includes a metering device for metering particulate material including: a reservoir for receiving particulate material; a housing...
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8048230 |
Metering and vaporizing particulate material
Apparatus for metering and vaporizing a particulate material, includes: a metering device for metering particulate material having: a reservoir for receiving particulate material; a housing having...
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8027746 |
Atomic layer deposition apparatus
A method and apparatus for atomic layer deposition (ALD) is described. The apparatus comprises a deposition chamber and a wafer support. The deposition chamber is divided into two or more...
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8026159 |
Method of manufacturing semiconductor device and substrate processing apparatus
A method of manufacturing a semiconductor device includes the steps of loading a substrate into a processing chamber; processing the substrate by supplying plural kinds of reaction substances into...
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8026197 |
Method and apparatus for manufacturing superconducting tape through integrated process
A method and apparatus for manufacturing superconducting tape through an integrated process, including the steps of: heat-treating a substrate wound on a drum in a reaction chamber; continuously...
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7988785 |
Printing head for nano patterning
The present invention provides a printing head for nano patterning including a manifold for accommodating a liquid printing material, a cartridge with an injection chamber communicating with the...
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7972443 |
Metering of particulate material and vaporization thereof
Apparatus for metering and vaporizing a particulate material, includes: a metering device having: a reservoir for receiving particulate material; a housing having an internal volume and having...
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7967911 |
Apparatus and methods for chemical vapor deposition
Methods and apparatus are disclosed for the formation of vaporizing liquid precursor materials. The methods or apparatus can be used as part of a chemical vapor deposition apparatus or system, for...
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7963247 |
Diffusion tube, dopant source for a diffusion process and diffusion method using the diffusion tube and the dopant source
According to an exemplary embodiment of the present invention, a diffusion tube includes a diffusion housing which includes a first cavity within a first end which receives a diffusion target, a...
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7959733 |
Film formation apparatus and method for semiconductor process
A film formation apparatus for a semiconductor process includes a source gas supply circuit to supply into a process container a source gas for depositing a thin film on target substrates, and a...
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7931787 |
Electron-assisted deposition process and apparatus
Previous limitations in utilizing energetic vapor deposition means are addressed through the introduction of a novel means of vapor deposition, namely, an Electron-Assisted Deposition (EAD) process...
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7921805 |
Deposition from liquid sources
A liquid injector is used to vaporize and inject a silicon precursor into a process chamber to form silicon-containing layers during a semiconductor fabrication process. The injector is connected...
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7908104 |
Plasma processing apparatus and method for detecting status of said apparatus
The invention provides a method for detecting and managing the status of a plasma processing apparatus with high sensitivity so as to enable long-term stable processing. In a plasma processing...
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7906411 |
Deposition technique for producing high quality compound semiconductor materials
Deposited layers are advantageously obtained by utilizing a specific hydride vapor phase epitaxy deposition procedure. In this procedure, a vertical growth cell structure with extended diffusion...
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7887635 |
Printing head for nano patterning
The present invention provides a printing head for nano patterning including a manifold for accommodating a liquid printing material, a cartridge with an injection chamber communicating with the...
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7879400 |
Substrate processing apparatus, method of manufacturing a semiconductor device, and method of forming a thin film on metal surface
There is provided a substrate processing apparatus equipped with a metallic component, with at least a part of its metallic surface exposed to an inside of a processing chamber and subjected to...
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7866278 |
Thin-film deposition system
A thin-film deposition system has a vacuum chamber and a plasma generator. The plasma generator includes a case, a cathode disposed in the case, an anode assembly disposed at an end of the case, a...
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7860597 |
Atomic layer deposition apparatus
A method and apparatus for atomic layer deposition (ALD) is described. The apparatus comprises a deposition chamber and a wafer support. The deposition chamber is divided into two or more...
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7837794 |
Vapor phase growth apparatus and vapor phase growth method
A vapor phase growth apparatus and a vapor phase growth method improve the uniformity of film formed are provided. The vapor phase growth apparatus includes a chamber, a rotatable holder having a...
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7827932 |
Vaporizer and processor
A vaporizer vaporizes a force-fed liquid source material in a depressurized atmosphere to generate a source gas and discharging the source gas together with a carrier gas. The vaporizer includes a...
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7828899 |
In-line, pass-by system and method for disc vapor lubrication
An apparatus for performing simultaneous pass-by vapor deposition of a uniform thickness thin film of a lubricant on at least one surface of each of a plurality of substrates. The apparatus...
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7811410 |
Matching circuit for a complex radio frequency (RF) waveform
A complex waveform frequency matching device is disclosed. In various embodiments, the matching device comprises a plurality of radio frequency generators coupled in parallel with one another. Each...
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7803255 |
Device for plasma-activated vapor coating of large surfaces
The invention relates to a device for the plasma activated vapor coating of large-surface moved substrates, comprising at least one vacuum recipient, one pump system, one evaporator, one device for...
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7758699 |
Apparatus for and method of continuous HTS tape buffer layer deposition using large scale ion beam assisted deposition
The present invention is a high-throughput ion beam assisted deposition (IBAD) system and method of utilizing such a system that enables continuous deposition of thin films such as the buffer...
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7737035 |
Dual seal deposition process chamber and process
An apparatus and method for sealing and unsealing a chemical deposition apparatus in a chemical deposition process chamber includes a microvolume that has dual sealing elements at its periphery....
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7727335 |
Device and method for the evaporative deposition of a coating material
According to a first aspect, the present invention relates to a device for depositing a high temperature superconductor onto a substrate in vacuum comprising a refilling device for containing a...
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7699023 |
Gas delivery apparatus for atomic layer deposition
Embodiments as described herein provide an apparatus and a method for performing an atomic layer deposition process. In one embodiment, a deposition chamber assembly contains a substrate support...
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7678225 |
Focus ring for semiconductor treatment and plasma treatment device
A focus ring for a plasma processing apparatus has an inner region, middle region, and outer region, disposed in this order from the inner side to surround a target substrate. On the side to be...
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7665416 |
Apparatus for generating excited and/or ionized particles in a plasma and a method for generating ionized particles
An apparatus is described for generating excited and/or ionized particles in a plasma with a generator for generating an electromagnetic wave and an excitation chamber with a plasma zone in which...
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7614932 |
Method and system for endpoint detection
A method and system are presented for monitoring a process sequentially applied to a stream of substantially identical articles by a processing tool, so as to terminate the operation of the...
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7611587 |
Thin-film deposition evaporator
A material source evaporator for use with an evacuable interior deposition chamber in which evaporated materials are deposited on substrates comprising a container with an associated heater that...
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7576017 |
Method and apparatus for forming a thin-film solar cell using a continuous process
The present invention relates to new methods for manufacturing photovoltaic devices and an apparatus for practicing those methods of manufacture. The present invention employs a transfer-through...
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7556720 |
Electrostatic charge-free container and method of manufacturing such a container
Container for the storage and/or transportation of liquids or powders, in particular inflammables, suitable for preventing the formation of electrostatic charge, comprising a tank supported by a...
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7553368 |
Process for manufacturing a gallium rich gallium nitride film
A process for the manufacture of a gallium rich gallium nitride film is described. The process comprises (a) preparing a reaction mixture containing a gallium species and a nitrogen species, the...
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7524481 |
Reactors for producing inorganic fullerene-like tungsten disulfide hollow nanoparticles and nanotubes
The present invention is related to an apparatus for the production of inorganic fullerene-like (IF) nanoparticles and nanotubes. The apparatus comprises a chemical reactor, and is further...
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7503996 |
Multiple frequency plasma chamber, switchable RF system, and processes using same
An RF power supplier is provided, that enables multiple-frequency RF power. The system uses N RF signal generators, combines the RF signals, amplify the combined signals, and then separates the...
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7498587 |
Bi-directional filtered arc plasma source
An apparatus for generating plasma includes a cathode having an evaporable surface configured to emit a material comprising plasma and macroparticles; oppositely directed output apertures...
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7491913 |
Bake apparatus for use in spin-coating equipment
Bake apparatus for use in baking a substrate, such as a semiconductor wafer, includes a chamber, a hot plate installed within the chamber, and first and second buffer plates for uniformly...
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7481889 |
Film forming apparatus and film forming method
To provide a film forming apparatus in which an impurity contained in an organic compound is separated to be removed and a film is formed without decreasing the purity of the purified organic...
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7462245 |
Single-wafer-processing type CVD apparatus
A single-wafer-processing type CVD apparatus for forming a thin film on an object to be processed includes a reaction chamber, a susceptor for placing the object thereon, a shower plate for...
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7296532 |
Bypass gas feed system and method to improve reactant gas flow and film deposition
A method and reactant gas bypass system for carrying out a plasma enhanced chemical vapor deposition (PECVD) process with improved gas flow stability to avoid unionized reactant precursors and...
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7276140 |
Plasma accelerating apparatus for semiconductor substrate processing and plasma processing system having the same
A plasma accelerating apparatus and a plasma processing system having the same are provided. The apparatus includes a circular channel comprising an inner wall, an outer wall, and an end wall...
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7276121 |
Forming improved metal nitrides
Method and apparatus are provided for forming metal nitride (MN), wherein M is contacted with iodine vapor or hydrogen iodide (HI) vapor to form metal iodide (MI) and then contacting MI with...
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