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7618686 |
Method and apparatus for sequential plasma treatment
An apparatus for plasma treatment of a non-conductive hollow substrate, including a plurality of ionization energy sources disposed adjacent to each other all along the part of the substrate to be...
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7531816 |
Vacuum conveying apparatus and charged particle beam equipment with the same
A charged particle beam examination equipment for examining and measuring a semiconductor wafer, comprising a wafer exchange portion for exchanging an unexamined wafer and an examiner wafer with...
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7444955 |
Apparatus for directing plasma flow to coat internal passageways
An apparatus for coating surfaces of a workpiece is configured to establish a pressure gradient within internal passageways through the workpiece, so that the coating within the internal...
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7430984 |
Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements
A plasma reactor for processing a workpiece, the plasma reactor comprising an enclosure, a workpiece support within the enclosure facing an overlying portion of the enclosure, the workpiece support...
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7374941 |
Active reactant vapor pulse monitoring in a chemical reactor
A method and apparatus for determining changes in a supply system, designed to supply repeated pulses of a vapor phase reactant to a reaction chamber is disclosed. One embodiment involves providing...
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7296532 |
Bypass gas feed system and method to improve reactant gas flow and film deposition
A method and reactant gas bypass system for carrying out a plasma enhanced chemical vapor deposition (PECVD) process with improved gas flow stability to avoid unionized reactant precursors and...
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7285196 |
Methods and apparatus for making integrated-circuit wiring from copper, silver, gold, and other metals
In recent years, copper wiring has emerged as a promising substitute for the aluminum wiring in integrated circuits, because copper offers lower electrical resistance and better reliability at...
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7282454 |
Switched uniformity control
A component delivery mechanism for distributing a component inside a process chamber is disclosed. The component is used to process a work piece within the process chamber. The component delivery...
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7205034 |
Method and device for generating uniform high-frequency plasma over large surface area used for plasma chemical vapor deposition apparatus
A plasma generation device for generating plasma uniformly over a large surface area by very high frequency (VHF), which is installed in a plasma chemical vapor deposition apparatus. A first and a...
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7186314 |
Plasma processor and plasma processing method
A plasma processor includes a table on which a target object is to be placed, a vessel which accommodates the table and in which a plasma is to be generated by a high-frequency electromagnetic...
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7183715 |
Method for operating a semiconductor processing apparatus
A method for operating a semiconductor processing apparatus that plasma-processes a semiconductor wafer mounted on a stage placed in a container using a plasma generated therein. The method...
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7182842 |
Device for amplifying the current of an abnormal electrical discharge and system for using an abnormal electrical discharge comprising one such device
A device ( 1 ) for amplifying the current of an abnormal electrical discharge, characterized in that it comprises an electrode which is positively polarized ( 2 ) and associated with a magnetic...
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7166167 |
Laser CVD device and laser CVD method
A laser CVD device capable of tightening adhesion of a film formed by laser CVD to a film formation face of a substrate and preventing cracks from occurring in the film itself is to be provided....
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7094316 |
Externally excited torroidal plasma source
A plasma reactor for processing a workpiece, including an enclosure defining a vacuum chamber, a workpiece support within the enclosure facing an overlying portion of the enclosure, the enclosure...
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7063981 |
Active pulse monitoring in a chemical reactor
A method and apparatus for determining changes in a supply system, designed to supply repeated pulses of a vapor phase reactant to a reaction chamber is disclosed. One embodiment involves providing...
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7025863 |
Vacuum system with separable work piece support
A vacuum system for the treatment of work pieces has an evacuatable treatment chamber having a centrally disposed low voltage arc discharge arrangement and laterally disposed loading opening. A...
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6998785 |
Liquid-jet/liquid droplet initiated plasma discharge for generating useful plasma radiation
Plasma discharge sources for generating emissions in the VUV, EUV and X-ray spectral regions. Embodiments can include running a current through liquid jet streams within space to initiate plasma...
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6988463 |
Ion beam source with gas introduced directly into deposition/vacuum chamber
An ion source is provided wherein depositing gas and/or maintenance gas is/are introduced into the ion source via the vacuum/depositing chamber, thereby reducing the amount(s) of undesirable...
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6969953 |
System and method for inductive coupling of an expanding thermal plasma
A method is provided for generating plasma using a plasma generator system. The method includes the steps of introducing energy and a reactant to a plasma generation apparatus of the plasma...
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6917165 |
Low power plasma generator
A low power plasma generator is provided which can be fabricated in micro-miniature size and which is capable of efficient portable operation. The plasma generator comprises a microwave stripline...
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6907841 |
Apparatus and method for synthesizing spherical diamond powder by using chemical vapor deposition method
Disclosed are an apparatus and a method to synthesize powders typed diamond with the size between several tens nm to several μm in diameter using conventional CVD processes for deposition of...
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6905582 |
Configurable vacuum system and method
An exemplary configurable vacuum system is provided for use in coating or plating that provides the capability and versatility to handle substrates of significantly different shapes and sizes. The...
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6858120 |
Method and apparatus for the fabrication of ferroelectric films
The present invention is related to methods and apparatus for processing weak ferroelectric films on semiconductor substrates, including relatively large substrates, e.g., with 300 millimeter...
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6827870 |
Method and apparatus for etching and deposition using micro-plasmas
Plasma etching or deposition is performed over substrates using spatially localized micro-plasmas operating in parallel with each other. A plasma generating electrode is positioned closely adjacent...
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6818852 |
Microwave plasma processing device, plasma processing method, and microwave radiating member
A placement stage ( 24 ) on which a semiconductor wafer (W) is place is provided within a processing container ( 22 ). A microwave is generated by a microwave generator ( 76 ), and the microwave is...
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6793978 |
Method and device for coating at least one wiper-blade element
The invention is based on a method for coating at least one wiper blade element ( 10 ) made of an elastomer material, in which first, the surface of the wiper blade element ( 10 ) is cleaned and...
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6787010 |
Non-thermionic sputter material transport device, methods of use, and materials produced thereby
A sputter transport device comprises a sealed chamber, a negatively-biased target cathode holder disposed in the chamber, and a substrate holder disposed in the chamber and spaced at a distance...
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6764658 |
Plasma generator
A plasma generator includes several plasma sources distributed in an array for plasma treatment of surfaces. Each plasma source includes first and second conductive electrodes. Each second...
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6734119 |
Electro-optical apparatus and method for fabricating a film, semiconductor device and memory device at near atmospheric pressure
A method to deposit insulating, semiconducting, and conducting films at pressures close to the atmospheric pressure and at temperatures less than 500° C. is provided. In this method, noble gas is...
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6726769 |
Susceptorless reactor for growing epitaxial layers on wafers by chemical vapor deposition
The invention describes a CVD reactor on solid substrates and a related method of deposition of epitaxial layers on the wafers. In the reactor of the invention, the wafer carrier is transported...
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6692649 |
Inductively coupled plasma downstream strip module
A plasma processing module for processing a substrate includes a plasma containment chamber having a feed gas inlet port capable of allowing a feed gas to enter the plasma containment chamber of...
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6673197 |
Chemical plasma cathode
A method and apparatus for generating a plasma in a gas using a thermal source and a heat source in a common reaction zone. A process gas is flowed to a reaction zone and heated with a thermal...
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6670741 |
Plasma processing apparatus with annular waveguide
A plasma processing apparatus includes a processing container 53 , a mounting table 61 for supporting a semiconductor wafer W arranged in the processing container 53 , an endless-and-annular...
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6660342 |
Pulsed electromagnetic energy method for forming a film
A method of forming a film by a plasma CVD process in which a high density plasma is generated in the presence of a magnetic field wherein the electric power for generating the plasma has a pulsed...
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6656540 |
Method for forming metallic film and apparatus for forming the same
The present invention provides methods and apparatus for the formation of a thin noble metal film which can achieve a high rate of film growth, can use inexpensive raw materials, and do not allow...
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6649545 |
Photo-assisted remote plasma apparatus and method
The present invention provides a plasma processing system comprising a remote plasma activation region for formation of active gas species, a transparent transfer tube coupled between the remote...
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6629508 |
Ionizer for gas cluster ion beam formation
A neutral beam ionizing apparatus for electron impact ionization of a substantially cylindrical neutral beam. The apparatus includes an electron source, and a circularly cylindrical ionizing region...
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6596133 |
Method and system for physically-assisted chemical-vapor deposition
An apparatus and method for the deposition of thin film material layers provides improved use of processing chamber space for enhanced processing capability in the fabrication of microelectronic...
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6593150 |
Methods and apparatus for depositing magnetic films
Methods and systems are provided for depositing a magnetic film using one or more long throw magnetrons, and in some embodiments, an ion assist source and/or ion beam source. The long throw...
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6579428 |
Arc evaporator, method for driving arc evaporator, and ion plating apparatus
An arc evaporator comprises: an anode; an evaporation source electrode as a cathode; and a current control unit for supplying an AC square wave arcing current across the anode and the evaporation...
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6533908 |
Device and method for coating substrates in a vacuum utilizing an absorber electrode
The invention relates to a device and method for coating substrates in a vacuum, wherein a plasma is to be generated from a target and ionized particles of the plasma are to be deposited on the...
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6497803 |
Unbalanced plasma generating apparatus having cylindrical symmetry
Apparatus for creating subatmospheric high plasma densities in the vicinity of a substrate in a work space for use in magnetron sputter deposition aided by ion bombardment of the substrate....
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6478931 |
Apparatus and method for intra-layer modulation of the material deposition and assist beam and the multilayer structure produced therefrom
A method of producing a multilayer structure that has reduced interfacial roughness and interlayer mixing by using a physical-vapor deposition apparatus. In general the method includes forming a...
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6465051 |
Method of operating high density plasma CVD reactor with combined inductive and capacitive coupling
The invention is embodied in a method of cleaning a plasma reactor by creating a vacuum in the chamber while introducing an etchant gas into the chamber through the gas injection ports, and...
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6432255 |
Method and apparatus for enhancing chamber cleaning
A system for processing substrates within a chamber and for cleaning accumulated material from chamber components is provided. The system includes a reactive species generator adapted to generate a...
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6432260 |
Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof
There is provided by this invention a novel inductively coupled plasma source apparatus that utilizes a transformer to induce closed path secondary plasma currents in a hollow metal housing that is...
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6397776 |
Apparatus for large area chemical vapor deposition using multiple expanding thermal plasma generators
Chemical vapor deposition is performed using a plurality of expanding thermal plasma generating means to produce a coating on a substrate, such as a thermoplastic and especially a polycarbonate...
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6383565 |
Vapor deposition coating apparatus
The invention relates to a vapor deposition coating apparatus. More particularly it relates to an apparatus in which the ion current density is carefully controlled to improve coating. This control...
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6371045 |
Physical vapor deposition device for forming a metallic layer on a semiconductor wafer
The present invention provides a physical vapor deposition device for forming a metallic layer with a predetermined thickness on a semiconductor wafer. The PVD device comprises a chamber, a wafer...
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6368678 |
Plasma processing system and method
A substrate processing system includes a processing chamber, an electrically floating substrate holder positioned in the chamber, a gas source for supplying a process gas to the chamber, at least...
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