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8181597 Plasma generating apparatus having antenna with impedance controller  
Provided is a plasma generating apparatus. The apparatus includes a vacuum chamber, an ElectroStatic Chuck (ESC), an antenna holder. The vacuum chamber has a hollow interior and is sealed at its...
8179050 Helicon plasma source with permanent magnets  
A helicon plasma source has a discharge tube, a radio frequency antenna disposed proximate the discharge tube, and a permanent magnet positioned with respect to the discharge tube so that the...
8173928 Processing device  
In a processing apparatus for performing a specified process on a target object at a predetermined process pressure, the apparatus includes an evacuable processing chamber having a gas exhaust port...
8153926 Etching method and system  
An etching method and an etching system are adapted to produce a high etch selectivity for a mask, an excellent anisotropic profile and a large etching depth. An etching system according to the...
8138444 Plasma processing apparatus  
Provided is a plasma processing apparatus including a chamber, a lower electrode, an upper electrode, and a substrate sensor. The chamber is configured to provide a reaction space. The lower...
8133349 Rapid and uniform gas switching for a plasma etch process  
An inductively coupled plasma processing apparatus includes a processing chamber in which a semiconductor substrate is processed, a substrate support, a dielectric window forming a wall of the...
8123903 Plasma reactor having multiple antenna structure  
A plasma reactor includes a chamber in which a wafer is treated by a plasma reaction, the chamber being provided at an upper portion with a cylindrical dielectric window, a multiple antenna...
8114246 Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same  
A vacuum plasma processor includes a roof structure including a dielectric window carrying (1) a semiconductor plate having a high electric conductivity so it functions as an electrode, (2) a...
8114245 Plasma etching device  
A plasma etching device which has an auxiliary electrode enabling realization of a uniform plasma density of generated plasma on the surface of a base and which enables uniform etching with respect...
8110991 Phase and frequency control of a radio frequency generator from an external source  
Controlling a phase and/or a frequency of a RF generator. The RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to...
8097082 Nonplanar faceplate for a plasma processing chamber  
A method and apparatus for adjust local plasma density during a plasma process. One embodiment provides an electrode assembly comprising a conductive faceplate having a nonplanar surface. The...
8092600 Plasma apparatus and plasma processing method  
The plasma apparatus includes a conveying unit for conveying a substrate in a conveying direction while being situated at a processing position, an elongated electric field forming unit for forming...
8087379 Localized plasma processing  
A method of localized plasma processing improves processing speed and reduces work piece damage compared to charged particle beam deposition and etching. In one embodiment, a plasma jet exits a...
8062473 Plasma processing apparatus and method  
A plasma processing apparatus includes in a processing chamber, a sample stage, a bell jar, a coil antenna, a Faraday shield, and a gas ring member located below a skirt portion of the bell jar and...
8062470 Method and apparatus for application of thin coatings from plasma onto inner surfaces of hollow containers  
A method and an apparatus are proposed for simultaneously coating the inner walls of a plurality of hollow containers, such as bottles, with fluid-impermeable barrier layers applied by a PECVD...
8062472 Method of correcting baseline skew by a novel motorized source coil assembly  
The present invention generally provides apparatus and method for adjusting plasma density distribution in an inductively coupled plasma chamber. One embodiment of the present invention provides an...
8058586 Plasma treatment apparatus and plasma treatment method  
A plasma treatment apparatus that can perform an excellent plasma treatment on a portion of a work which is to be used for producing products or parts, while preventing undesirable occurrence of...
8053700 Applicators and cooling systems for a plasma device  
An improved plasma vessel (i.e., plasma applicator) that provides effective cooling includes a plurality of generally linear tubes having a dielectric interior fluidly connected together by...
8043471 Plasma processing apparatus  
A plasma processing apparatus includes a processing chamber; a plasma generating unit for generating a plasma of a gas supplied into the processing chamber; a substrate mounting table, disposed in...
8038836 Plasma processing apparatus  
A plasma processing apparatus includes a barrier wall member disposed between a plasma generation chamber and a processing chamber to separate the plasma generation chamber from the processing...
8034418 Method for forming thin film and apparatus therefor  
A plurality of antenna elements, each of which has first and second linear conductors whose first ends are electrically interconnected are formed. The antenna elements are arranged in plane in such...
8035056 Plasma generation apparatus  
A plasma generation apparatus includes: a chamber having a chamber lid and defining an airtight reaction region; a susceptor in the chamber; a gas supply means supplying a process gas to the...
8028655 Plasma processing system with locally-efficient inductive plasma coupling  
An inductively coupled plasma source is provided with a peripheral ionization source for producing a high-density plasma in a vacuum chamber for semiconductor wafer coating or etching. The source...
8020513 Cooled device for plasma depositing a barrier layer onto a container  
A device for plasma depositing a thin film of a barrier material on an internal wall of a container includes: an electromagnetic wave generator; a cavity connected to the generator and made of a...
8021515 Inductively coupled plasma processing apparatus  
An inductively coupled plasma processing apparatus (100) comprises a plasma chamber (12) with a dielectric window (400) forming a self-supporting wall element of the plasma chamber (12). The...
8008596 Plasma processing apparatus and electrode used therein  
A plasma processing apparatus performs a specific plasma processing on a target substrate by disposing a first and a second electrode to face each other in a processing chamber, and supplying...
7988835 Silicon dot forming method and silicon dot forming apparatus  
There are provided a method and an apparatus which form silicon dots having substantially uniform particle diameters and exhibiting a substantially uniform density distribution directly on a...
7988815 Plasma reactor with reduced electrical skew using electrical bypass elements  
RF ground return current flow is diverted away from asymmetrical features of the reactor chamber by providing bypass current flow paths. One bypass current flow path avoids the pumping port in the...
7989736 System for heat treatment of semiconductor device  
Disclosed is a heat treatment system for semiconductor devices. The heat treatment system is used in a heat treatment process for semiconductor devices, such as a crystallization process for an...
7977255 Method and system for depositing a thin-film transistor  
A method for forming a thin-film transistor gate insulating layer over a substrate disposed in a processing chamber is provided. The method includes: introducing a processing gas for producing a...
7976671 Mask etch plasma reactor with variable process gas distribution  
A plasma reactor for processing a workpiece such as a mask or wafer includes a vacuum chamber having a cylindrical side wall, a ceiling overlying the side wall and a ring supported on a top edge of...
7976674 Embedded multi-inductive large area plasma source  
Plasma generating devices, systems and processes are provided in which hybrid capacitively coupled plasma (CCP) and inductively coupled plasma (ICP) sources use a plurality of primary plasma...
7972471 Inductively coupled dual zone processing chamber with single planar antenna  
A dual zone plasma processing chamber is provided. The plasma processing chamber includes a first substrate support having a first support surface adapted to support a first substrate within the...
7967945 RF antenna assembly for treatment of inner surfaces of tubes with inductively coupled plasma  
An antenna assembly for forming a barrier coating on the inner surface of a tube by means of a sealed annular chemical-plasma-reaction chamber defined by the inner wall of the tube, two spaced...
7955986 Capacitively coupled plasma reactor with magnetic plasma control  
A plasma reactor includes a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within the chamber and facing the ceiling for supporting a planar...
7952048 Plasma source with discharge inducing bridge and plasma processing system using the same  
A plasma source with discharge inducing bridges and a plasma processing system using the same. The plasma source may be constructed with a number of discharge inducing bridges, each discharge...
7942112 Method and apparatus for preventing the formation of a plasma-inhibiting substance  
A system and method for preventing formation of a plasma-inhibiting substance within a plasma chamber is provided. In one embodiment, an apparatus that includes a barrier component configured to be...
7939778 Plasma processing chamber with guard ring for upper electrode assembly  
A plasma processing chamber, which includes an upper electrode assembly, a lower electrode assembly, and a plasma confinement assembly. The upper electrode assembly includes an upper electrode, a...
7909961 Method and apparatus for photomask plasma etching  
A method and apparatus for etching photomasks are provided herein. The apparatus includes a process chamber with a shield above a substrate support. The shield comprises a plate with apertures, and...
7910865 Method and arrangement for supplying power to several induction coils in an induction apparatus  
An arrangement for controlling induction coils of an induction cooking hob so as to minimize noise production resulting from intermodulation of certain frequencies of operation. The induction coils...
7910853 Direct real-time monitoring and feedback control of RF plasma output for wafer processing  
A method and apparatus for controlling power output of a capacitatively-coupled plasma are provided. A detector is disposed on the power delivery conduit carrying power to one electrode to detect...
7905982 Antenna for plasma processor apparatus  
An antenna includes excitation terminals responsive to an RF source to supply an RF electromagnetic field to a plasma that processes a workpiece in a vacuum chamber. The coil includes a transformer...
7883601 Apparatus and method for controlling relative particle speeds in a plasma  
An apparatus for controlling a plasma etching process includes plasma control structure that can vary a size of a plasma flow passage, vary a speed of plasma flowing through the plasma flow...
7879187 Plasma etching apparatus  
The present invention relates to a plasma etching apparatus, which comprises a chamber, a substrate support disposed inside the chamber to support a substrate, a shield disposed with a gap on the...
7871490 Inductively coupled plasma generation system with a parallel antenna array having evenly distributed power input and ground nodes and improved field distribution  
An antenna adapted to apply uniform electromagnetic fields to a volume of gas and including radiating elements connected in parallel with evenly distributed input terminals for receiving...
7867355 Adjustable height PIF probe  
A plasma probe assembly for use in a plasma processing chamber is provided. A semiconductor probe element with a probe surface at a first end of the semiconductor probe element is provided. An...
7858898 Bevel etcher with gap control  
A device for cleaning a bevel edge of a semiconductor substrate. The device includes a lower electrode assembly that has a top surface and is adapted to support the substrate and an upper electrode...
7854213 Modulated gap segmented antenna for inductively-coupled plasma processing system  
An inductively coupled plasma source is provided with a peripheral ionization source for producing a high-density plasma in a vacuum chamber for semiconductor wafer coating or etching. The source...
7849814 Plasma generating device  
A plasma generating device provided with a plasma generating chamber (10) and a high-frequency antenna (1) arranged in the chamber (10) for generating inductively coupled plasma by applying a...
7845310 Wide area radio frequency plasma apparatus for processing multiple substrates  
An antenna array for a radio frequency plasma process chamber including, an array of electrodes, an array of dielectric tubes concentrically disposed about each electrode tube to define a chamber...
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