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7620511 |
Method for determining plasma characteristics
Methods for determining characteristics of a plasma are provided. In one embodiment, a method for determining characteristics of a plasma includes obtaining metrics of current and voltage...
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7618686 |
Method and apparatus for sequential plasma treatment
An apparatus for plasma treatment of a non-conductive hollow substrate, including a plurality of ionization energy sources disposed adjacent to each other all along the part of the substrate to be...
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7615931 |
Pulsed dielectric barrier discharge
A dielectric barrier plasma discharge device consistent with certain embodiments of the present invention has a pair of electrodes spaced apart by an electrode gap. A dielectric is disposed between...
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7615132 |
Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method
A plasma processing apparatus suitable for high-speed and high-definition etching is provided. By applying to a wafer chucking electrode 9 a voltage waveform in which an absolute value of high...
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7615131 |
Plasma etching chamber and plasma etching system using same
Disclosed is a plasma etching chamber for completely dry-cleaning a film material and particles deposited at the periphery of a wafer through plasma etching while generating plasma at the top to...
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7611603 |
Plasma processing apparatus having impedance varying electrodes
There is provided a plasma processing apparatus which processes a substrate by generating plasma in a process vessel by supply of radio frequency power from a radio frequency power source to at...
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7611585 |
Plasma reaction chamber with a built-in magnetic core
A plasma reaction chamber includes a chamber housing having two inner connection passages for connecting two vacuum chambers to other vacuum chambers. Two vacuum chambers and two inner connection...
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7610874 |
Poled plasma deposition
A poled polymer structure is formed on the surface of a substrate by poling a nonlinear optical reactant during a plasma polymerizing deposition of the reactant onto the surface. The substrate is...
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7608162 |
Plasma processing apparatus and method
A plasma processing apparatus includes a high-frequency power source for applying bias power to an electrode on which a substrate is disposed, an insulating layer formed on a surface of the...
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7604716 |
Methods and apparatus for generating high-density plasma
Methods and apparatus for generating a strongly-ionized plasma are described. An apparatus for generating a strongly-ionized plasma according to the present invention includes an anode and a...
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7603963 |
Controlled zone microwave plasma system
An apparatus and method for initiating a process gas plasma. A conductive plate having a plurality of conductive fingers is positioned in a microwave applicator. An arc forms between the conductive...
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7603962 |
Rotary type CVD film forming apparatus for mass production
A rotary type CVD film forming apparatus for mass production, wherein a film forming chamber is formed by providing one columnar body having a plurality of housing spaces for housing one plastic...
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7601619 |
Method and apparatus for plasma processing
A method and an apparatus for plasma processing which can accurately monitor an ion current applied to the surface of a sample. Predetermined gas is exhausted via an exhaust port by a...
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7601241 |
Plasma processing apparatus and plasma processing method
A plasma processing apparatus having 90% or more of a side wall of an inner wall 101 of a reaction chamber 1 covered with a dielectric 102 , and equipped with an earthed conductive member 21...
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7594479 |
Plasma CVD device and discharge electrode
In a film formation chamber, a gas flow to be introduced is rectified in a direction away from the film formation surface of the substrate on which the film is to be formed, so as to exhaust the...
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7587989 |
Plasma processing method and apparatus
In a plasma processing method, on a back side of a cathode electrode is provided at least one conductor plate d.c. potentially insulated from the cathode electrode and an opposing electrode, and...
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7582185 |
Plasma-processing apparatus
A plasma-processing apparatus having a high frequency power application electrode in which plasma is generated by supplying VHF power to the high frequency power application electrode. The...
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7582184 |
Plasma processing member
A plasma processing member includes a ceramic base, a plasma generating electrode embedded in the ceramic base, and an electrode power supply member connected to the plasma generating electrode....
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7578258 |
Methods and apparatus for selective pre-coating of a plasma processing chamber
An apparatus for selectively pre-coating a plasma processing chamber, including a chamber wall is disclosed. The apparatus includes a first set of RF electrodes, the first set of RF electrodes...
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7575638 |
Apparatus for defining regions of process exclusion and process performance in a process chamber
Positional relationships are established in a process chamber. An upper electrode is configured with a first surface to support a wafer, and an electrode has a second surface. A linear drive is...
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7571698 |
Low-frequency bias power in HDP-CVD processes
A substrate processing system has a housing that defines a process chamber. A substrate holder disposed within the process chamber supports a substrate during substrate processing. A gas-delivery...
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7566379 |
Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate with a deposition shield coupled to the upper...
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7565880 |
Plasma CVD apparatus, and method for forming film and method for forming semiconductor device using the same
A plasma CVD apparatus comprises an anode electrode and a cathode electrode, and is for forming a thin film on a substrate by performing plasma discharge between the anode electrode and the cathode...
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7556695 |
Apparatus to make nanolaminate thermal barrier coatings
Methods and apparatus to make multilayer thermal barrier coatings for superalloy substrates such as turbine blades or vanes are disclosed. The methods produce non-homogeneous, nanometer-size,...
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7550180 |
Plasma treatment method
In a plasma treatment method of and apparatus for treating the surface of a treatment target substrate by utilizing glow discharge produced by supplying high-frequency power into an...
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7543547 |
Electrode assembly for plasma processing apparatus
An electrode assembly for a plasma processing apparatus includes a backing member secured to an electrode. First fastener members mounted in apertures in the backing member cooperate with second...
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7543546 |
Plasma processing apparatus, method for producing reaction vessel for plasma generation, and plasma processing method
A plasma treatment apparatus is provided, which enables to increase a treatment area and provide good treatment uniformity. This apparatus comprises a pair of electrode plates having a plurality of...
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7540257 |
Plasma processing apparatus and semiconductor device manufactured by the same apparatus
A plasma processing apparatus of this invention includes a sealable chamber to be introduced with reactive material gas, a plurality of pairs of cathode-anode bodies arranged in the chamber, for...
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7537672 |
Apparatus for plasma processing
In the plasma processing apparatus of the present invention, a first electrode ( 21 ) for connecting a high frequency electric power source ( 40 ) in a chamber is arranged to be opposed to a second...
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7534854 |
Apparatus and method for oxidation and stabilization of polymeric materials
An apparatus for treating polymeric materials comprises a treatment chamber adapted to maintain a selected atmosphere; a means for supporting the polymeric material within the chamber; and, a...
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7533629 |
Arrangement, method and electrode for generating a plasma
The present invention provides an arrangement and method for generating a uniform and stable plasma. The arrangement comprises a discharge space ( 7 ) between at least a pair of electrodes ( 1, 2...
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7527658 |
Method of manufacturing displays and apparatus for manufacturing displays
A method of manufacturing displays, includes at least forming a metal pattern on a surface of an insulating substrate, forming an insulating film on the metal pattern, forming a pattern of a...
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7527016 |
Plasma processing apparatus
An apparatus, which performs a plasma process on a target substrate by using plasma, includes first and second electrodes in a process chamber to oppose each other. An RF field, which turns a...
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7524397 |
Lower electrode design for higher uniformity
A plasma processing system for processing a substrate is disclosed. The plasma processing system includes a process chamber within which a plasma is both ignited and sustained for processing. The...
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7520957 |
Lid assembly for front end of line fabrication
A lid assembly for semiconductor processing is provided. In at least one embodiment, the lid assembly includes a first electrode comprising an expanding section that has a gradually increasing...
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7520244 |
Plasma treatment apparatus
A plasma treatment apparatus for thin-film deposition includes a reactor chamber; a pair of parallel-plate electrodes disposed inside the chamber; and a radio-frequency power supply system used for...
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7514377 |
Plasma generator, ozone generator, substrate processing apparatus and manufacturing method of semiconductor device
To provide a generator capable of generating plasma and ozone with high efficiency and easy to handle, with a simple structure. An electrode part 10 is formed of electrodes 11 and 12 without...
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7513954 |
Plasma processing apparatus and substrate mounting table employed therein
A plasma processing apparatus includes a processing container for receiving a substrate to be processed and processing the substrate by a plasma of a processing gas, a substrate mounting table,...
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7513953 |
Continuous system for depositing films onto plastic bottles and method
A bottle processing apparatus includes a rotary bottle vacuum transfer system and a bottle coating system. The rotary bottle vacuum transfer system takes bottles from atmospheric pressure and...
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7513214 |
Plasma processing method and apparatus
The interior of a vacuum chamber is maintained at a specified pressure by introducing a specified gas into the vacuum chamber having a plasma trap provided therein. Simultaneously, therewith,...
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7506610 |
Plasma processing apparatus and method
A plasma processing apparatus includes a process container configured to have a vacuum atmosphere therein. An upper electrode is disposed to face a target substrate placed within the process...
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7500445 |
Method and apparatus for cleaning a CVD chamber
The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from...
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7494561 |
Plasma processing apparatus and method, and electrode plate for plasma processing apparatus
A plasma processing apparatus includes a process container configured to have a vacuum atmosphere therein. A first upper electrode is disposed to have a ring shape and to face a target substrate...
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7487740 |
Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates
A vacuum vessel and at least two electrodes define an internal process space. At least one power supply is connectable with the electrodes. A substrate holder holds a substrate to be treated in the...
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7485205 |
Method, arrangement and electrode for generating an atmospheric pressure glow plasma (APG)
Method of generating an atmospheric pressure glow discharge plasma (APG), wherein said plasma is generated in a discharge space formed between at least one first electrode surface and at least one...
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7481903 |
Processing device and method of maintaining the device, mechanism and method for assembling processing device parts, and lock mechanism and method for locking the lock mechanism
A processing device in which maintenance can be easily carried out and a burden on a worker can be reduced, and a method of maintaining the device are provided. An upper electrode unit 106 ...
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7467598 |
System for, and method of, etching a surface on a wafer
First and second electrodes at opposite ends and magnets between the electrodes define an enclosure. Inert gas (e.g. argon) molecules pass into the enclosure through an opening near the first...
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7465357 |
Computer-readable medium that contains software for executing a method for cleaning a CVD chamber
The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from...
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7464717 |
Method for cleaning a CVD chamber
The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from...
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7458335 |
Uniform magnetically enhanced reactive ion etching using nested electromagnetic coils
A magnetic field-enhanced plasma reactor is disclosed, comprising a reaction chamber for applying a plasma to a substrate, a plurality of primary electromagnets disposed about said reaction...
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