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Document Title |
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7520957 |
Lid assembly for front end of line fabrication
A lid assembly for semiconductor processing is provided. In at least one embodiment, the lid assembly includes a first electrode comprising an expanding section that has a gradually increasing...
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7446479 |
High-density plasma source
The present invention relates to a plasma source. The plasma source includes a cathode assembly having an inner cathode section and an outer cathode section. An anode is positioned adjacent to the...
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7332039 |
Plasma processing apparatus and method thereof
A nozzle head NH of a plasma processing apparatus comprises an annular inner holder 3 , an annular inner electrode 11 surrounding this holder 3 , an annular outer electrode 21 surrounding...
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7327089 |
Beam plasma source
A plasma source which includes a discharge cavity having a first width, where that discharge cavity includes a top portion, a wall portion, and a nozzle disposed on the top portion and extending...
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7165506 |
Method and device for plasma-treating the surface of substrates by ion bombardment
In an ion etching method for reducing a substrate thickness, an electric arc is generated in a vacuum chamber such that the electric arc is locally separated from the substrate and circulates about...
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6948448 |
Apparatus and method for depositing large area coatings on planar surfaces
A method and apparatus for depositing a uniform coating on a large area, planar surface using an array of multiple plasma sources and a common reactant gas injector. The apparatus includes at least...
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6918352 |
Method for producing coated workpieces, uses and installation for the method
A system and a method produce workpieces coated by PECVD with a quality sufficient for epitaxy. Included are a vacuum recipient, a plasma discharge source operationally connected to the vacuum...
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6806652 |
High-density plasma source using excited atoms
The plasma source includes a cathode assembly. An anode is positioned adjacent to the cathode assembly. An excited atom source generates an initial plasma and excited atoms from a volume of feed...
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6745717 |
Method and apparatus for preparing nitride semiconductor surfaces
Semiconductor nitride layers are produced using a corona discharge supersonic free-jet source producing an activated nitrogen molecule beam impacting a semiconductor substrate in the presence of a...
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6632323 |
Method and apparatus having pin electrode for surface treatment using capillary discharge plasma
A method and an apparatus for treating a workpiece using a plasma are disclosed in the present invention. In treating a workpiece using a plasma, the apparatus includes at least one pin electrode...
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6539890 |
Multiple source deposition plasma apparatus
An apparatus for forming a film on a substrate includes a gas inlet and an insert attached to the gas inlet, the insert including a deposition source material such as lithium. To form the film on...
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6525481 |
Method of making a physically and chemically active environment by means of a plasma jet and the related plasma jet
The method consists in the fact that from at least one external source ( 3 ) electromagnetic energy is conducted to at least one hollow electrode ( 1 ) with elements ( 14 ) locally increasing the...
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6394025 |
Vacuum film growth apparatus
A correction mechanism including a magnetic body ( 51 ) is placed at a position between a vacuum chamber ( 21 ) and a steering coil ( 23 ) and where line of magnetic force generated from the...
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6388381 |
Constricted glow discharge plasma source
A miniaturized construction and slit end orifice configurations of a constricted glow discharge chamber and method are disclosed. The polarity and geometry of the constricted glow discharge plasma...
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6365013 |
Coating method and device
The invention relates to a coating process, particularly for coating a gas turbine blade ( 1 ) having cooling passageways ( 4 ) opening out onto the surface ( 2 ). During the coating operation, a...
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6325857 |
CVD apparatus
A CVD apparatus is provided, which is capable of cleaning the inside of a reaction chamber without affecting a catalyzer member after a CVD process is completed. This apparatus is comprised of a...
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6213049 |
Nozzle-injector for arc plasma deposition apparatus
A nozzle-injector was designed and fabricated for plasma deposition of thin-film coatings using a wall-stabilized arc torch as the plasma generator. The design of the nozzle-injector controls the...
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5891312 |
Enhanced vacuum arc vapor deposition electrode
A process for forming a thin metal coating on a substrate wherein a gas stream heated by an electrical current impinges on a metallic target in a vacuum chamber to form a molten pool of the metal...
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5846330 |
Gas injection disc assembly for CVD applications
A gas injection disc is provided which includes an outer ring and a tubular modular insert which slips into the outer ring. The outer ring is provided with an inner bore, a ring-shaped plenum...
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5679167 |
Plasma gun apparatus for forming dense, uniform coatings on large substrates
A plasma system forms a dense, uniform coating of metallic oxide or other material on a relatively large substrate of metal foil or other composition located a substantial distance from the plasma...
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5679159 |
Spinning substrate holder for cutting tool inserts for improved arc-jet diamond deposition
A mandrel for use in an arc-jet spinning diamond deposition process for coating cutting tool inserts is disclosed. The mandrel has a plurality of cutouts or wells for receiving cutting tool...
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5580386 |
Coating a substrate surface with a permeation barrier
A substrate surface is coated with a permeation barrier of inorganic material, which is vaporised from a crucible in a vacuum chamber evacuated to at least 10 -3 mbar and precipitated on the...
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5565249 |
Method for producing diamond by a DC plasma jet
A process for gas phase synthesis of diamond using a DC plasma jet where a plasma jet generated by DC arc discharge using a DC plasma torch is made to strike a substrate and grow diamond on the...
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5560779 |
Apparatus for synthesizing diamond films utilizing an arc plasma
There is provided a system for the manufacture of a diamond film. A plasma generator generates a hydrogen atom containing plasma stream into which a hydrocarbon containing gas is fed. The plasma...
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5529633 |
Apparatus for depositing a substance on a rotating surface
An apparatus for depositing a substance includes a rotating mandrel assembly with a mandrel having a deposition surface exposed to the vapor so that the substance is deposited on the deposition...
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5468295 |
Apparatus and method for thermal spray coating interior surfaces
A method of thermal spray coating a surface with a metal coating material includes the provision of a nozzle about a thermal spray coating apparatus, such as a two wire electric-arc apparatus. The...
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5435849 |
Apparatus for plasma deposition
The substrate in a plasma jet deposition system is provided with structural attributes, such as apertures and/or grooves, that facilitate efficient deposition. Groups of substrates are arranged...
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5403399 |
Method and apparatus for vapor deposition of diamond
An apparatus for a vapor deposition of diamond by: effecting an arc discharge while feeding a discharge gas between an anode and a cathode of a thermal plasma chemical vapor deposition device; ...
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5382293 |
Plasma jet CVD apparatus for forming diamond films
An apparatus for depositing a diamond film on a substrate includes a first electrode formed as an enclosed body having a nozzle for jetting thermal plasma opening therefrom and a second electrode...
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RE34806 |
Magnetoplasmadynamic processor, applications thereof and methods
Embodiments of magnetoplasmadynamic processors are disclosed which utilize specially designed cathode-buffer, anodeionizer and vacuum-insulator/isolator structures to transform a working fluid into...
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5328516 |
Modular plasma gun assembly for coating the inner surfaces of hollow spaces and cavities
The plasma gun assembly of the invention is particularly suitable for coating the inner surfaces of narrow cavities, bores, channels or the like. It essentially comprises a plasma gun head member,...
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5314540 |
Apparatus for forming diamond film
Apparatus and process for synthesizing a diamond film of high purity at a high rate. Mixture gas of hydrocarbon gas and hydrogen gas is introduced into an arc discharge to produce a gas plasma....
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5099788 |
Method and apparatus for forming a diamond film
A method and apparatus for forming a diamond film, has a casing in which vacuum is maintained at a predetermined value. A substrate is disposed within the casing so that the diamond film is formed...
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4957062 |
Apparatus for plasma surface treating and preparation of membrane layers
An apparatus suitable for plasma surface treating (e.g., forming a membrane layer on a substrate surface) comprises a plasma generation section which is operable at least at substantially...
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4830702 |
Hollow cathode plasma assisted apparatus and method of diamond synthesis
The present invention includes an apparatus and method for depositing diamond on a substrate. A hydrocarbon/hydrogen gas mixture is passed through a refractory metal hollow cathode which is self...
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4487162 |
Magnetoplasmadynamic apparatus for the separation and deposition of materials
A plasma arc discharge method for deposition of metallic and semiconductor layers on a substrate for the purpose of producing semiconductor grade materials such as silicon at a reduced cost....
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3324027 |
Apparatus for performing chemical and other processes under the action of gas ions
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