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8172946 |
Semiconductor device manufacturing apparatus and manufacturing method of semiconductor device
Stagnation of gas used for substrate processing in an exhaust trap is prevented, and localized precipitation of components in the gas used for substrate processing is reduced. The proposed...
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8153454 |
Fabrication apparatus and fabrication method of semiconductor device produced by heating substrate
A fabrication apparatus and fabrication method of a semiconductor device are provided, allowing the temperature distribution of a substrate to be rendered uniform. The fabrication apparatus for a...
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8128753 |
Method and apparatus for depositing LED organic film
In one embodiment the disclosure relates to an apparatus for depositing an organic material on a substrate, including a source heater for heating organic particles to form suspended organic...
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8118941 |
Semiconductor processing parts having apertures with deposited coatings and methods for forming the same
Holes in semiconductor processing reactor parts are sized to facilitate deposition of protective coatings, such as by chemical vapor deposition at atmospheric pressure. In some embodiments, the...
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8093142 |
Plasma processing apparatus and plasma processing method
There is provided a plasma processing device capable of forming a film in a favorable manner irrespective of deflection generated in an anode electrode and a cathode electrode in the case where an...
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8039052 |
Multi-region processing system and heads
The various embodiments of the invention provide for relative movement of the substrate and a process head to access the entire wafer in a minimal space to conduct combinatorial processing on...
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8034177 |
Inner electrode for barrier film formation and apparatus for film formation
An inner electrode for barrier film formation is an inner electrode for barrier film formation that is inserted inside a plastic container having an opening, supplies a medium gas to the inside of...
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8007591 |
Substrate holder having a fluid gap and method of fabricating the substrate holder
A substrate holder (20) for supporting a substrate (30). A heating component (50) is positioned adjacent to a supporting surface and between the supporting surface and a cooling component (60). A...
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7993462 |
Substrate-supporting device having continuous concavity
A substrate-supporting device has a top surface for placing a substrate thereon composed of a plurality of surfaces separated from each other and defined by a continuous concavity being in gas...
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7988786 |
Carbon film coated member
The present invention provides a carbon film coated member comprising: a base material; and a coated film formed on at least part of a surface of the base material, the coated film comprising: a...
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7959734 |
Substrate mounting structure and substrate processing apparatus
A substrate mounting structure that can maintain the temperature uniformity of a substrate mounted on a mounting stage. The substrate mounting structure disposed in a pressure reduced space has a...
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7935185 |
Film forming system and film forming method
A clean gas circulates to pass through a loading area provided below a vertical heat treatment furnace. The clean gas unidirectionally flows through the loading area. After completion of wafer...
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7935188 |
Vertical thermal processing apparatus and method of using the same
The invention is a vertical thermal processing apparatus including: a processing container that contains an object to be processed; a main heater provided so as to surround the processing...
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7886688 |
Plasma processing apparatus
To provide a plasma processing apparatus capable of enhancing insulation between an electrode and a casing and adjusting the temperature of the electrode from outside. An electrode 30 is provided...
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7886689 |
Plasma processing apparatus
To prevent occurrence of arcing caused by difference of thermal expansion between the electrode and the solid dielectric in a plasma processing apparatus. The bottom part of a casing 20 of...
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7879400 |
Substrate processing apparatus, method of manufacturing a semiconductor device, and method of forming a thin film on metal surface
There is provided a substrate processing apparatus equipped with a metallic component, with at least a part of its metallic surface exposed to an inside of a processing chamber and subjected to...
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7785419 |
Epitaxial apparatus
An epitaxial apparatus, including a supporting member to support a substrate; an external wall provided to surround the supporting member from the sides; an inner lid member provided in a removable...
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7776395 |
Method of depositing catalyst assisted silicates of high-k materials
A high-k silicate atomic layer deposition method is disclosed. To produce a hafnium silicate layer, a substrate may be exposed to a pulse of a hafnium precursor, a pulse of an oxidizer, a pulse of...
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7713378 |
Ozone processing device
A substrate ozone processing device includes: a substrate-carrying/heating platform; above the platform, a gas supply head made up of a main head unit bored with platform-directed vent holes, gas...
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7674351 |
Plasma processing apparatus
A vacuum processing apparatus that includes an inner wall member disposed inside of an outer side wall member of a vacuum container, the inner wall member surrounding a side of a sample stand on...
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7670431 |
Carbon nanotube manufacturing apparatus and method, and gas decomposer for use in the manufacturing apparatus and method
A gas decomposer formed from a porous material to decompose a carbon-containing raw material carried on a gas flow and to synthesize a carbon nanotube from the decomposed carbon-containing raw...
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7651729 |
Method of fabricating metal silicate layer using atomic layer deposition technique
There are provided methods of fabricating a metal silicate layer on a semiconductor substrate using an atomic layer deposition technique. The methods include performing a metal silicate layer...
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7635501 |
Exhaust pipe having means for preventing deposition of a reaction by-product and method for preventing deposition of a reaction by-product
An exhaust pipe (10) includes an inner cylinder (11) having an exhaust gas passage (10′) formed therein, an outer cylinder provided outside the inner cylinder with a gap (15) being formed t...
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7601619 |
Method and apparatus for plasma processing
A method and an apparatus for plasma processing which can accurately monitor an ion current applied to the surface of a sample. Predetermined gas is exhausted via an exhaust port by a...
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7544957 |
Non-uniform ion implantation
A method includes receiving an input signal representative of a desired two-dimensional non-uniform dose pattern for a front surface of a workpiece, driving the workpiece relative to an ion beam to...
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7439116 |
Apparatus and method for forming polycrystalline silicon thin film
Apparatus and method for forming a polycrystalline silicon thin film by converting an amorphous silicon thin film into the polycrystalline silicon thin film using a metal are provided. The method...
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7393416 |
Vapor deposition process and apparatus therefor
An apparatus for depositing a ceramic coating on a component. The apparatus includes an evaporation source containing multiple different oxide compounds, at least one of the oxide compounds having...
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7390366 |
Apparatus for chemical vapor deposition
An apparatus for CVD is disclosed. Processing gas is injected to an upper center portion of a wafer supporting member by a gas focus ring installed at an inner side surface of a reaction chamber....
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7384666 |
Method and apparatus for fabricating quantum dot functional structure, quantum dot functional structure, and optically functioning device
Fabrication of a quantum dot functional structure having ultra-fine particles homogeneously distributed in a transparent medium includes depositing such particles having a single particle diameter...
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7374620 |
Substrate processing apparatus
A substrate processing apparatus (10A) using a microwave plasma is disclosed wherein an inner partition wall (15) is provided within a process chamber (11) so that the inside of the process chamber...
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7371286 |
Wiring repair apparatus
A wiring repair apparatus includes an XY stage on which a substrate is placed, a laser source unit disposed above the XY stage, first and second gas windows disposed between the laser source unit...
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7353771 |
Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator
According to a first aspect, a power supply and a method of providing power for igniting a plasma in a reactive gas generator is provided that includes (i) coupling a series resonant circuit that...
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7282111 |
System and method for monitoring particles contamination in semiconductor manufacturing facilities
Provided is a particle monitoring system capable of detecting a level of polymer particle contamination on inner walls of a process chamber. Also disclosed is a method of monitoring the level of...
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7270724 |
Scanning plasma reactor
A scanning plasma reactor for exciting reactant gases at a substrate surface including a beam forming module, a gas injection module, a reaction chamber with a window and a vacuum chuck, a gas...
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7235153 |
System for removal of a spacer
The present disclosure provides a system for removing a spacer, such as associated with a processing operation using a lightly doped drain (LDD) region. In one example, the system includes means...
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7220462 |
Method and electrode assembly for non-equilibrium plasma treatment
A method and electrode assembly for treating a substrate with a non-equilibrium plasma in which the electrode assembly has two or more spaced barrier electrodes and a ground electrode spaced apart...
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7166167 |
Laser CVD device and laser CVD method
A laser CVD device capable of tightening adhesion of a film formed by laser CVD to a film formation face of a substrate and preventing cracks from occurring in the film itself is to be provided....
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7097712 |
Apparatus for processing a semiconductor
A multi-chamber system for providing a process of a high degree of cleanliness in fabricating semiconductor devices such as semiconductor integrated circuits. The system comprises a plurality of...
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7090727 |
Heated gas line body feedthrough for vapor and gas delivery systems and methods for employing same
A feedthrough device for use in deposition chambers such as chemical vapor deposition chambers and atomic layer deposition chambers and methods using the same in association with such chambers as...
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7070659 |
System for filling openings in semiconductor products
Explosive forces are used to fill interconnect material into trenches, via holes and other openings in semiconductor products. The interconnect material may be formed of metal. The metal may be...
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7063748 |
Methods for coating particles and particles produced thereby
Methods of coating core materials by providing target materials and core materials; ablating the target materials to form ablated particulate target materials; and coating the core materials with...
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7019402 |
Silicon chip carrier with through-vias using laser assisted chemical vapor deposition of conductor
This disclosure teaches a method of filling deep vias or capping deep conducting paste filled vias in silicon or glass substrate using laser assisted chemical vapor deposition of metals. This...
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6967109 |
Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units
A method and apparatus for measuring a potential difference for plasma processing with a plasma processing apparatus that processes a sample by introducing a gas into a vacuum chamber and generates...
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6946033 |
Heated gas distribution plate for a processing chamber
An apparatus for distributing gas in a processing system. In one embodiment, the system includes a gas distribution assembly having a gas distribution plate. The gas distribution plate defines a...
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6926801 |
Laser machining method and apparatus
In a laser machining method for removing remaining defects on a photomask, there has been problems to be resolved that damage is formed at the portion of the substrate where the defect has been...
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6916399 |
Temperature controlled window with a fluid supply system
The present invention provides a temperature controlled energy transparent window or electrode used to advantage in a substrate processing system. The invention also provides methods associated...
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6902947 |
Integrated method for release and passivation of MEMS structures
Disclosed herein is a method of improving the adhesion of a hydrophobic self-assembled monolayer (SAM) coating to a surface of a MEMS structure, for the purpose of preventing stiction. The method...
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6890387 |
Method and device for correcting pattern film on a semiconductor substrate
In order to correct a white defect on a surface of a substrate, the substrate is held with the surface facing downward, laser light is upward irradiated at the defect on the surface in material...
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6866721 |
Apparatus and method for photo-induced process
Apparatus for a photo-induced process are provided, which implement a transparent film (instead of an optical window), to reduce light absorption loss that would result from use of an optical...
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6863733 |
Apparatus for fabricating thin-film semiconductor device
There is provided a method of fabricating a thin-film semiconductor device, including the steps of (a) melting and recrystallizing at least a surface of a thin semiconductor film formed on a...
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