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7611586 |
Reactor for extended duration growth of gallium containing single crystals
An apparatus for growing bulk GaN and AlGaN single crystal boules, preferably using a modified HVPE process, is provided. The single crystal boules typically have a volume in excess of 4 cubic...
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7611585 |
Plasma reaction chamber with a built-in magnetic core
A plasma reaction chamber includes a chamber housing having two inner connection passages for connecting two vacuum chambers to other vacuum chambers. Two vacuum chambers and two inner connection...
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7611322 |
Processing thin wafers
There is described a wafer processing system for thinned wafers that are easily broken during handling. The system protects against breakage during handling and provides for temperature controls...
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7594970 |
Web coating apparatus with a vacuum chamber and a coating cylinder
A web coating apparatus with a vacuum chamber ( 1 ) has between a rear wall ( 18 ) and at least one removable closing plate ( 22 ), housing member ( 20 ) with a planar cover ( 10 ), and at least...
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7585383 |
Vacuum processing apparatus
The present invention provides a vacuum processing apparatus which is small-sized and requires a small installation area. The vacuum processing apparatus includes a vacuum container which has a...
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7585141 |
Load lock system for ion beam processing
A load lock system includes a first load lock defining a first chamber, a second load lock defining a second chamber, and a vacuum pumping system to vacuum pump the first and second chambers. The...
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7576017 |
Method and apparatus for forming a thin-film solar cell using a continuous process
The present invention relates to new methods for manufacturing photovoltaic devices and an apparatus for practicing those methods of manufacture. The present invention employs a transfer-through...
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7559992 |
Semiconductor processing apparatus and method
A semiconductor processing apparatus includes a process chamber to accommodate a target substrate, a gas supply system to supply a process gas into the process chamber, an exhaust unit to exhaust...
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7547644 |
Methods and apparatus for forming barrier layers in high aspect ratio vias
In a first aspect, a method is provided that includes ( 1 ) forming a first barrier layer over the sidewalls and bottom of a via using atomic layer deposition within an atomic layer deposition...
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7547465 |
Multi-station deposition apparatus and method
A multi-station deposition apparatus capable of simultaneous processing multiple substrates using a plurality of stations, where a gas curtain separates the stations. The apparatus further...
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7537673 |
Plasma processing apparatus
Disclosed herein is a plasma processing apparatus, which generates plasma within a vacuum chamber to process semiconductor substrates using the plasma. The apparatus comprises a substrate mounting...
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7534730 |
Producing method of semiconductor device and substrate processing apparatus
Disclosed is a method for manufacturing a semiconductor device which comprises a step for carrying a plurality of substrates ( 1 ) in a process chamber ( 4 ), a step for supplying an...
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7531816 |
Vacuum conveying apparatus and charged particle beam equipment with the same
A charged particle beam examination equipment for examining and measuring a semiconductor wafer, comprising a wafer exchange portion for exchanging an unexamined wafer and an examiner wafer with...
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7527693 |
Apparatus for improved delivery of metastable species
The invention includes a deposition system having a reservoir for containment of a metastable specie connected to a deposition chamber. The system includes a metastable specie generating catalyst...
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7526878 |
Method and apparatus for drying coating film and method for producing optical film
The present invention provides a method for drying a coating film comprising drying a coating film of an organic solvent-containing coating liquid applied to a running band-shaped flexible...
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7521089 |
Method and apparatus for controlling the movement of CVD reaction byproduct gases to adjacent process chambers
Method and apparatus for controlling the migration of reaction by-product gases from a chemical vapor deposition (CVD) process chamber to a transfer vacuum chamber shared by other process chambers....
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7517557 |
Oxide films, a method of producing the same and structures having the same
An object of the present invention is to produce an oxide film having good surface morphology and crystal quality, by a metal organic chemical vapor deposition using two or more raw material gases...
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7513953 |
Continuous system for depositing films onto plastic bottles and method
A bottle processing apparatus includes a rotary bottle vacuum transfer system and a bottle coating system. The rotary bottle vacuum transfer system takes bottles from atmospheric pressure and...
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7513949 |
Method and apparatus for producing semiconductor device
An amorphous silicon film is formed on a flat glass substrate, and then crystallized by heating to obtain a crystalline silicon film. The glass substrate is placed on a stage having a convex...
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7497912 |
Substrate processing apparatus
A cell controller controls the operation of a transport robot to keep a substrate belonging to a succeeding lot carried into a heating part in the fourth transport cycle from being transported out...
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7481889 |
Film forming apparatus and film forming method
To provide a film forming apparatus in which an impurity contained in an organic compound is separated to be removed and a film is formed without decreasing the purity of the purified organic...
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7462372 |
Light emitting device, method of manufacturing the same, and thin film forming apparatus
A method of manufacturing a light emitting device of upward emission type and a thin film forming apparatus used in the method are provided. A plurality of film forming chambers are connected to a...
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7455747 |
Substrate processing apparatus, control method for the apparatus, and program for implementing the method
A substrate processing apparatus, according to which inspection of various devices in the substrate processing apparatus can be carried out with improved reliability, while reducing the burden on a...
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7455735 |
Width adjustable substrate support for plasma processing
An electrode assembly for use in a plasma processing system that includes removable rails that are adjustable for reconfiguring the electrode to accommodate substrates of different widths. The...
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7452423 |
Diffusion system
Provided is a diffusion system for forming a doping layer in a wafer. The diffusion system includes a bubbler for generating a doping gas; a premixer, which premixes the doping gas with reactive...
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7442900 |
Chamber for uniform heating of large area substrates
Embodiments of the present invention generally provide an apparatus for providing a uniform thermal profile to a plurality of large area substrates during thermal processing. In one embodiment, an...
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7439208 |
Growth of in-situ thin films by reactive evaporation
A method of forming MgB 2 films in-situ on a substrate includes the steps of (a) depositing boron onto a surface of the substrate in a deposition zone; (b) moving the substrate into a reaction...
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7438175 |
Linear vacuum deposition system
Embodiments of a vacuum conveyor system are provided herein. In one embodiment a vacuum conveyor system includes a first vacuum sleeve having a plurality of rollers that support and move substrates...
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7435445 |
Method for manufacturing semiconductor device
Disclosed are PEALD (plasma-enhanced atomic layer deposition) apparatus and PEALD method for manufacturing a semiconductor device, the PEALD apparatus comprising: a housing including a reaction...
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7431795 |
Cluster tool and method for process integration in manufacture of a gate structure of a field effect transistor
A method and apparatus for process integration in manufacture of a gate structure of a field effect transistor are disclosed. The method includes assembling an integrated substrate processing...
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7431773 |
Atomic layer deposition apparatus and method
An atomic layer deposition method includes positioning a semiconductor substrate within an atomic layer deposition chamber. A first deposition precursor is fed to the chamber under first vacuum...
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7429300 |
Successive vapour deposition system, vapour deposition system, and vapour deposition process
A successive vapor deposition system in which a vapor deposition material is heated, vaporized in a vacuum, and deposited onto a vapor deposition area of a substrate, includes a conveyer which...
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7422653 |
Single-sided inflatable vertical slit valve
A vacuum chamber having a gate valve including a chamber housing defining an internal vacuum region and first and second openings through the chamber housing and a gate valve secured to the chamber...
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7422198 |
Liquid substance supply device for vaporizing system, vaporizer, vaporization performance appraisal method
In a liquid substance supply device, a three port two valve directional control valve is provided in a transfer line, and a substance container and the transfer line are connected together by a...
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7419550 |
Oxidizing method and oxidizing unit of object for object to be processed
An oxidizing method for includes: an arranging step of arranging a plurality of objects to be processed in a processing container whose inside can be vacuumed, a supplying unit of an oxidative gas...
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7413639 |
Energy and media connection for a coating installation comprising several chambers
The invention relates to an energy and media connection module for coating installations. Said module serves for supplying with cooling water, compressed air, process gases, signal, control and...
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7410542 |
Variable environment, scale-able, roll to roll system and method for manufacturing thin film electronics on flexible substrates
A roll to roll, film forming system overcoming the shortcomings of current roll to roll processing is presented; The roll to roll enabled cartridge is loaded with a bolt of fresh flexible...
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7394067 |
Systems and methods for reducing alteration of a specimen during analysis for charged particle based and other measurement systems
Systems and methods for reducing alteration of a specimen during by charged particle based and other measurements systems are provided. One system configured to reduce alteration of a specimen...
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7387686 |
Film formation apparatus
A metal atomic layer and an oxygen atomic layer are formed in this order by ALD, followed by rapid heating through RTA (Rapid Thermal Annealing). This cycle of steps is repeated to form a high...
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7381969 |
Load lock control
A control for pressurizing a load lock. The control initiates pressurization of the loadlock interior by coupling a source of gas to the loadlock interior. A representative load lock includes a...
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7378133 |
Fabrication system, light-emitting device and fabricating method of organic compound-containing layer
The present invention provides a vapor deposition system for a film forming systems that promote an efficiency of utilizing an EL material and is excellent in uniformity or throughput of forming an...
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7377977 |
High-purity crystal growth
A method of growing a crystal on a substrate disposed in a reactor, that provides a reactor chamber in which the substrate is disposed, includes flowing reactive gases inside the reactor chamber...
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7374731 |
Reaction apparatus for producing vapor-grown carbon fibers and continuous production system thereof
A reaction apparatus for producing vapor-grown carbon fibers (VGCF) and a continuous production system for producing VGCF are disclosed. The VGCF reaction apparatus is featured in installing a...
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7357846 |
Substrate processing apparatus and substrate processing method
In a resist-removing process system 1 for removing a resist film formed on a wafer W, the resist film is denatured so as to make the resist film soluble in water and, then, the resist film is...
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7351292 |
Assembly for processing substrates
An assembly for processing substrates, which processing comprises a vacuum deposition process, such as, for instance, sputtering, CVD or PECVD, which vacuum deposition process is carried out in at...
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7351291 |
Semiconductor processing system
A semiconductor processing system includes a load lock chamber and first to third process chambers connected to an airtight transfer chamber. The second process chamber is disposed below the first...
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7351285 |
Method and system for forming a variable thickness seed layer
A method and system for forming a variable thickness seed layer on a substrate for a subsequent metal electrochemical plating process, where the seed layer thickness profile improves uniformity of...
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7341633 |
Apparatus for electroless deposition
Embodiments of the invention generally provide a fluid processing platform. The platform includes a mainframe having a substrate transfer robot, at least one substrate cleaning cell on the...
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7335277 |
Vacuum processing apparatus
A vacuum processing apparatus comprising a transfer unit disposed at a center thereof, plural processing chambers, each processing chamber having a processing table for supporting an object to be...
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7335260 |
Laser annealing apparatus
A laser annealing apparatus for sequential lateral solidification (SLS) to uniformly crystallize silicon on an entire silicon substrate by minimizing the dislocation of the silicon substrate during...
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