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8182608 |
Deposition system for thin film formation
An apparatus for maintaining the alignment or positional relationship between at least two coating modules in an ALD system, the apparatus comprising a plurality of coating modules in a coating...
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8178444 |
Substrate processing method and substrate processing apparatus
A substrate processing method that can eliminate unevenness in the distribution of plasma. The method is for a substrate processing apparatus that has a processing chamber in which a substrate is...
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8177912 |
Evaporation source and vacuum evaporator using the same
An evaporation source having a nozzle structure that makes the distribution of film thickness uniform in the width direction of a substrate and a vacuum evaporator using the same are provided. A...
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8173477 |
Isolation chamber and method of using the isolation chamber to make solar cell material
Apparatuses and methods are provided for the continuous formation of solar cell material including an isolation chamber that reduces cross contamination between adjacent formation zones that are at...
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8172949 |
Substrate processing apparatus, program for performing operation and control method thereof, and computer readable storage medium storing the program
A computer readable storage medium storing a program for performing an operation method of a substrate processing apparatus is provided. The operation method includes the steps of introducing a...
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8147924 |
Apparatus for manufacturing magnetic recording disk, and in-line type substrate processing apparatus
An apparatus for manufacturing a magnetic recording disk includes a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate; a lubricant-layer...
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8148271 |
Substrate processing apparatus, coolant gas supply nozzle and semiconductor device manufacturing method
A substrate processing apparatus comprises a processing chamber for storing a boat supporting multiple substrates and for processing the multiple substrates, a heater unit installed around the...
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8137465 |
Single-chamber sequential curing of semiconductor wafers
The present invention relates to curing of semiconductor wafers. More particularly, the invention relates to cure chambers containing multiple cure stations, each featuring one or more UV light...
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8137464 |
Atomic layer deposition system for coating flexible substrates
Systems and methods for atomic layer deposition (ALD) on a flexible substrate involve guiding the substrate back and forth between spaced-apart first and second precursor zones, so that the...
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8136480 |
Physical vapor deposition system
A physical vapor deposition system for making microparticles generated by using a non-transfer type plasma torch not generating an outgas even in an ultra-high vacuum environment accelerate by a...
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8137466 |
Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
A thin film deposition apparatus and an organic light-emitting display device by using the same. The thin film deposition apparatus includes an electrostatic chuck, an a plurality of chambers; at...
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8128793 |
Vertical substrate transfer apparatus and film-forming apparatus
To provide a vertical substrate transfer apparatus and a film-forming apparatus capable of, regardless of a carrying position of a substrate, subjecting either surface thereof to film-formation,...
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8123861 |
Apparatus for making interconnect seed layers and products
An apparatus for depositing seed layers over a substrate, which substrate includes a patterned insulating layer with at least one opening surrounded by a field, and which opening has sidewalls,...
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8117987 |
Hot wire chemical vapor deposition (CVD) inline coating tool
Methods and apparatus for hot wire chemical vapor deposition (HWCVD) are provided herein. In some embodiments, an inline HWCVD tool may include a linear conveyor for moving a substrate through the...
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8119020 |
Method for manufacturing electronic device
A method for manufacturing an electronic device using a closed-type transport container, includes: controlling relative humidity inside the closed-type transport container to be lower than ambient...
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8101054 |
Magnetic particle trapper for a disk sputtering system
A magnetic particle trapper for use in a sputtering system includes a roller cover plate having a plurality of openings arranged and dimensioned to accommodate a plurality of rollers associated...
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8097084 |
Vacuum chamber system for semiconductor processing
A vacuum chamber system for semiconductor processing includes at least two evacuable vacuum chambers for receiving semiconductor elements to be processed, each including a vacuum chamber opening...
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8088678 |
Semiconductor manufacturing apparatus and method
A first aspect of the present invention provides a semiconductor manufacturing apparatus including: a load lock chamber; a transfer chamber; and a treatment chamber 1 and a treatment chamber 2...
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8088224 |
Roll-to-roll evaporation system and method to manufacture group IBIIAVIA photovoltaics
The present inventions provide method and apparatus that employ constituents vaporized from one or more constituent supply source or sources to form one or more films of a precursor layer formed on...
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8075730 |
Apparatus for manufacturing a semiconductor device
In a semiconductor device manufacturing method, an etching mask (75b) having a predetermined opening pattern is formed on an etching target film (74) disposed on a target object. Then, an etching...
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8070926 |
Multi-chamber workpiece processing
A multi-chamber treatment/processing apparatus includes: a means for controlling/regulating operation of the apparatus providing the following operational sequence: performing a...
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8070880 |
Substrate processing apparatus
Provided is a substrate processing apparatus. The substrate processing apparatus includes a reaction tube, a substrate holder, a gas nozzle, a heating unit, a temperature detector, and an exhaust...
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8066815 |
Multi-workpiece processing chamber
A multi-workpiece chamber includes at least two processing stations, for exposing workpieces to a treatment process. A partition cooperates with the chamber such that the partition is disengagably...
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8061297 |
Dynamic printhead alignment assembly
According to the present disclosure, a printer apparatus may include a chuck configured to support a substrate thereon, a rail spaced apart from the chuck, a printhead carriage frame coupled to the...
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8060252 |
High throughput method of in transit wafer position correction in system using multiple robots
Methods correcting wafer position error are provided. The methods involve measuring wafer position error on a robot, e.g. a dual side-by-side end effector robot, during transfer to an intermediate...
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8053324 |
Method of manufacturing a semiconductor device having improved transistor performance
In one aspect provides a method of manufacturing a semiconductor device having improved transistor performance. In one aspect, this improvement is achieved by conducting a pre-deposition spacer...
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8048259 |
Vacuum processing apparatus
A plasma processing apparatus which contributes to reducing required time for maintenance and thereby to enhancing the efficiency of processing and that of apparatus operation is to be provided. A...
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8043432 |
Atomic layer deposition systems and methods
Systems and methods for depositing thin films using Atomic Layer Deposition (ALD). The deposition system includes a process chamber with a peripheral sidewall, partitions that divide a processing...
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8038797 |
Apparatus and method for manufacturing magnetic recording medium
A method and apparatus for manufacturing a magnetic recording medium uses a small-diameter insulating substrate. The apparatus includes a carrier for a special size of 3.5 inches for receiving a...
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8039966 |
Structures of and methods and tools for forming in-situ metallic/dielectric caps for interconnects
A structure, tool and method for forming in-situ metallic/dielectric caps for interconnects. The method includes forming wire embedded in a dielectric layer on a semiconductor substrate, the wire...
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8039049 |
Treatment of low dielectric constant films using a batch processing system
A method and system for treating a dielectric film in a batch processing system includes exposing at least one surface of the dielectric film to a treating compound including a CxHy containing...
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8034723 |
Film deposition apparatus and film deposition method
A film deposition apparatus for depositing a film on a substrate by performing a cycle of alternately supplying at least two kinds of reaction gases that react with each other on the substrate to...
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8034178 |
Apparatus and method for manufacturing an organic electroluminescence display
An apparatus for manufacturing an organic electroluminescence display having an alignment chamber for aligning a mask having openings corresponding to a predetermined pattern with a substrate on...
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8034179 |
Method for insulating film formation, storage medium from which information is readable with computer, and processing system
In order to form an insulating film, which constitutes a flat interface with silicon, by CVD, a surface of silicon is oxidized to form a silicon oxide film using a plasma treatment apparatus in...
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8034300 |
Apparatus for producing trichlorosilane
This apparatus for producing trichlorosilane includes: a vessel having a gas inlet that introduces a feed gas into the vessel and a gas outlet that discharges a reaction product gas to the outside;...
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8033772 |
Transfer chamber for vacuum processing system
A transfer chamber for a substrate processing tool includes a main body having side walls adapted to couple to at least one processing chamber and at least one load lock chamber. The main body...
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8034182 |
Apparatus for forming a film and an electroluminescence device
A device having three evaporation sources and a unit for moving the respective evaporation sources in one chamber is used, whereby it becomes possible to increase efficiency of use of an...
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8030785 |
Shadow mask deposition of materials using reconfigurable shadow masks
A shadow mask deposition system includes a plurality of identical shadow masks arranged in a number of stacks to form a like number of compound shadow masks, each of which is disposed in a...
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8025730 |
Apparatus and method for coating internal surfaces of a turbine engine component
A coating apparatus for coating interior surfaces of internal passages of a workpiece, such as a turbine engine component is provided. The coating apparatus comprises a vessel defining an internal...
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8021485 |
Positioning apparatus
In the present positioning apparatus, a positioning apparatus, comprising: a box body including a process chamber exposed to a decompression environment in the interior of the box body and an...
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8021486 |
Protective self-aligned buffer layers for damascene interconnects
Capping protective self aligned buffer (PSAB) layers are layers of material that are selectively formed at the surface of metal layers in a partially fabricated semiconductor device. Encapsulating...
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8022012 |
Device and method for fabricating thin films by reactive evaporation
A device for fabricating thin films on a substrate includes a vacuum chamber, a rotatable platen configured to hold one or more substrates within the vacuum chamber, and a housing disposed within...
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8016974 |
Plasma treatment apparatus
In a plasma treatment apparatus for performing plasma treatment by accommodating a substrate in a treatment chamber, a fixed guide 12 and a movable guide 13 made of a ceramic are arrayed in an X...
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7993457 |
Deposition sub-chamber with variable flow
An apparatus and method for depositing film on a substrate includes a plurality of conduits that allow by-product and reactant gases to flow past the edge of a substrate. The apparatus and process...
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7993458 |
Vacuum processing apparatus and method
A gas exhaust unit evacuates the inside of a vacuum transfer chamber at a constant exhaust rate. An gas exhaust valve is kept normally open, and a purge gas (N2 gas) is supplied from a purge gas...
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7993456 |
Device for carrying out a surface treatment of substrates under vacuum
The present invention relates to a device for carrying out a surface treatment of substrates under vacuum, which comprises a housing (1) comprising chambers (2-5) communicate with a vacuum source,...
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7988812 |
Substrate treatment apparatus
A substrate treatment apparatus is provided. The substrate treatment apparatus includes a process room, a load port in which a container receiving wafers is disposed, and a wafer transfer module...
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7981217 |
Vertical heat treatment apparatus and method of transferring substrates to be processed
Disclosed herein is a vertical heat treatment apparatus which includes a thermal reactor having a reactor opening, a cover that hermetically closes the reactor opening, a holder that holds a large...
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7976632 |
Vacuum processing apparatus
A vacuum processing apparatus includes a transfer unit disposed at a center thereof, plural processing chambers, each processing chamber having a processing table for supporting an object to be...
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7972961 |
Purge step-controlled sequence of processing semiconductor wafers
A method of processing semiconductor substrates includes: depositing a film on a substrate in a reaction chamber; evacuating the reaction chamber without purging the reaction chamber; opening a...
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