Matches 351 - 400 out of 1221 < 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 >
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6319553 Isolation of incompatible processes in a multi-station processing chamber  
A multi-station processing chamber in which incompatible processes are performed includes multiple pedestals positioned in wells with annular gaps around the pedestals. Showerheads located above...
6315879 Modular deposition system having batch processing and serial thin film deposition  
A flexible, modular thin film deposition machine comprises a number of batch process stations which define a batch process path. At least one of the batch process stations is a thin film deposition...
6316361 CVD reactor and process for producing an epitally coated semiconductor wafer  
A CVD reactor has an upper reactor chamber (2), a lower reactor chamber (3) and a dividing wall (4) that has a circular hole (5) in which a holding ring (6) for a wafer (7) is positioned. A process...
6312525 Modular architecture for semiconductor wafer fabrication equipment  
A modular vacuum system may have vacuum chamber modules, power supply modules and control system modules. The vacuum chamber modules may be defined with a clear interface between them. There may be...
6302966 Temperature control system for plasma processing apparatus  
A plasma processing system that includes a temperature management system and method that can achieve very accurate temperature control over a plasma processing apparatus is disclosed. In one...
6299683 Method and apparatus for the production of SiC by means of CVD with improved gas utilization  
A process gas stream (2) is generated, from which SiC is deposited on a substrate (4) by means of CVD. Furthermore, a second gas stream (3) of an inert gas is generated, which substantially...
6296735 Plasma treatment apparatus and method for operation same  
An apparatus for plasma treating workpieces in vacuum comprises a stack of plasma chambers (20). Handling of workpieces to and from the plasma chambers of the stack is performed in parellelism by...
6294026 Distribution plate for a reaction chamber with multiple gas inlets and separate mass flow control loops  
The present invention is an apparatus for distributing reactant gases across the substrate mounted in a reaction chamber. The apparatus is capable of being utilized in both vapor deposition and...
6287430 Apparatus and method forming thin film  
The present invention is drawn to an apparatus for forming a thin film. The apparatus includes a vacuum chamber; a vacuum apparatus connected to the vacuum chamber; a holder placed in the vacuum...
6287386 Carousel wafer transfer system  
The present invention generally provides a rotary wafer carousel and related wafer handler for moving wafers or other workpieces through a processing system, i.e., a semiconductor fabrication tool....
6286452 Sputtering apparatus  
The chamber 1 of the spattering apparatus has a gas introduction port 2 provided at one side in a direction orthogonal to the opening/closing direction of a door 11 of chamber 1, and a vacuum...
6287984 Apparatus and method for manufacturing semiconductor device  
A loading area capable of forming a sealed space in co-operation with a reaction chamber is provided. In a state in which the inner space of the reaction chamber is separated from the inner space...
6279505 Plastic containers with an external gas barrier coating  
A coated plastic container provides for low permeability to gases and vapors. A method and system for coating plastic containers includes applying a thin inorganic oxide layer to the external...
6277199 Chamber design for modular manufacturing and flexible onsite servicing  
The present invention provides a semiconductor fabrication process and cluster tool utilizing individual gas boxes for each of the processing chambers. These individual gas boxes provide an...
6273991 Apparatus for plasma ion trimming of frequency devices  
A system for simultaneous frequency trimming of a plurality frequency devices such as oscillators, crystals and surface acoustic wave filters and resonators by removing intrinsic or previously...
6273956 Synchronous multiplexed near zero overhead architecture for vacuum processes  
Workpieces, such as, semiconductor wafers, are continuously manufactured by repetitively alternately switching a common radio frequency power source between a plurality of downstream or in-chamber...
6273955 Film forming apparatus  
A film forming apparatus for forming a plurality of films on a substrate through a continuous process, comprising a plurality of vacuum chambers in communication to each other via connection, at...
6273664 Coupling system for the transfer of a confined planar object from a containment pod to an object processing unit  
A coupling system for the transfer of a flat object from a confinement box towards a processing unit for processing the flat object. The coupling system includes a first shutter, at least one...
6274196 Apparatus and method for exchanging an atmosphere of spherical object  
A spherical object transport apparatus of the invention brings a spiral stream into contact with a first atmosphere containing a spherical object, selectively sucks the first atmosphere outward so...
6270581 Wet-oxidation apparatus and wet-oxidation method  
A wet-oxidation apparatus comprises a reaction tube capable of accommodating a semiconductor wafer; a water vapor generating apparatus for generating water vapor; a gas supply passage for supplying...
6270582 Single wafer load lock chamber for pre-processing and post-processing wafers in a vacuum processing system  
A vacuum processing system has a load lock chamber for transitioning wafers between an ambient environment pressure and a transfer chamber vacuum pressure. The load lock chamber has wafer supports...
6270861 Individually controlled environments for pulsed addition and crystallization  
An apparatus for forming thin films includes a deposition chamber having a window and having an environment maintained at a temperature and pressure selected for optimized deposition conditions. A...
6267075 Apparatus for cleaning items using gas plasma  
A plasma cleaning apparatus for cleaning lead frames or other items comprised of a chamber adapted for containing a plasma, a magazine positioned in the chamber for holding the lead frames, a first...
6264748 Substrate processing apparatus  
A substrate processing apparatus comprises a processing section having a plurality of process units for applying a series of processes including a resist coating to a processing substrate, a...
6258169 Control apparatus and control method  
A control apparatus comprises a plurality of process units operating in accordance with parameters, a storing section for storing parameters relevant to processings by the process units, a touch...
6258173 Film forming apparatus for forming a crystalline silicon film  
A film forming apparatus includes a silicon film forming vacuum chamber for forming a crystalline silicon film on a substrate; a film forming device provided for the vacuum chamber for forming a...
6251191 Processing apparatus and processing system  
One of the disclosed processing apparatus includes a processing vessel having an inner processing space defined by a ceiling portion, a bottom portion, and side walls and capable of being evacuated...
6251192 Vacuum exhaust system  
A vacuum exhaust system can improve the operating efficiency of the vacuum exhaust system while reducing the system cost, to quickly attain a vacuum in the auxiliary chambers without increasing the...
6245152 Method and apparatus for producing epitaxial wafer  
A method and apparatus for forming an epitaxial layer on a semiconductor wafer supported on a suscepter in an epitaxial growth furnace. Ther wafer to be processed is placed on the suscepter outside...
6244812 Low profile automated pod door removal system  
An automated door removal and replacement system utilizes a combination of linear and rotational drive to remove a door of a wafer supporting device and store the door below the device. In one...
6245149 Inert barrier for high purity epitaxial deposition systems  
The present invention is an improved semiconductor substrate processing apparatus which includes a processing chamber having a first member, a second member and a processing region; a vacuum tight...
6241824 Apparatus for the coating of substrates in a vacuum chamber  
In an apparatus for the coating of substrates in a vacuum with rotatable substrate carriers (15,16,20) and with a loading and an unloading station (8 or 9), two vacuum chambers (3,4) are provided...
6241858 Methods and apparatus for producing enhanced interference pigments  
Methods and apparatus are provided for uniformly depositing a coating material from a vaporization source onto a powdered substrate material to form a thin coalescence film of the coating material...
6238739 Non-plasma CVD method and apparatus of forming Ti1-xA1xN coatings  
A method for forming a Ti 1 -x Al x N coating on a part without plasma enhancement, wherein a chemical vapor deposition chamber is heated to 250-500° C.; the part to be coated is heated to...
6234788 Disk furnace for thermal processing  
A furnace for thermal processing of substrates includes a substrate cassette that supports at least one substrate and a process chamber for thermal processing. A process chamber that includes a...
6235634 Modular substrate processing system  
The invention provides an apparatus and method for performing a process on a substrate. At least two types of structures may be used to provide a flow path for a substrate so that the substrate may...
6235171 Vacuum film forming/processing apparatus and method  
Disclosed is a vacuum film forming/processing apparatus and method which is hardly influenced by dusts and contamination on a substrate and moreover has a reduced exhaust volume. A substrate...
6235172 System for and method of providing a controlled deposition on wafers  
A robotic arm assembly in a transport module is expansible to have an effector at its end receive a substrate in a cassette module and is then contracted and rotated with the effector to have the...
6234107 Auxiliary vacuum chamber and vacuum processing unit using same  
An auxiliary vacuum chamber 12 according to the invention comprises a container 30 having an opening 10, 14 for taking an object to be processed W into and out of the container. A holder 33a is...
6231289 Dual plate gas assisted heater module  
A dual plate gas assisted heater module having a vertically movable poppet movable between an upper and a lower subchamber has a passive heating feature which preheats a substrate prior to...
6231732 Cylindrical carriage sputtering system  
A cylindrical carriage sputtering system for disk, wafer, and flat panel substrates (20) comprising a cylindrical shaped vacuum sealed passageway formed by two concentric inner (11) and outer...
6230719 Apparatus for removing contaminants on electronic devices  
The invention provides a unique method and apparatus for removing flash or other contaminants from an electronic package such as encapsulated semiconductor device by exposing the device to plasma...
6228439 Thin film deposition apparatus  
An apparatus for manufacturing information recording disks is disclosed. The apparatus includes a deposition chamber for providing an undercoat layer to a substrate to be treated, a deposition...
6224680 Wafer transfer system  
A wafer transfer system is described for transferring a wafer while at substantially the same time another wafer is being processed. The wafer transfer system comprises, in one embodiment, a...
6223683 Hollow plastic containers with an external very thin coating of low permeability to gases and vapors through plasma-assisted deposition of inorganic substances and method and system for making the coating  
A method, composition and system for coating an external surface of containers and in particular, plastic containers, provides for low permeability to gases and vapors. The coating applied to the...
6224679 Controlling gas in a multichamber processing system  
A wafer processing system comprises a container-housing chamber for housing the conveying container conveyed from the common area, a cleaning chamber disposed adjacent to the container-housing...
6221791 Apparatus and method for oxidizing silicon substrates  
An apparatus and a method for oxidizing silicon substrates by either a wet oxidation or a dry oxidation process in the same oxidation chamber are provided. In the apparatus, an additional conduit...
6221165 High temperature plasma-assisted diffusion  
An apparatus and method for performing thermal diffusion on the substrate of a device such as a spherical shaped semiconductor. To this end, one embodiment provides an enclosure containing a...
6217663 Substrate processing apparatus and substrate processing method  
A substrate processing apparatus comprises a hot-wall type processing chamber for processing a substrate, a heater capable of heating an interior of the processing chamber, a substrate holder...
6218212 Apparatus for growing mixed compound semiconductor and growth method using the same  
An apparatus for growing a mixed compound semiconductor layer utilizing three or more source gases. The apparatus includes a horizontal type reactor chamber. The reactor chamber includes a...
Matches 351 - 400 out of 1221 < 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 >