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6905582 |
Configurable vacuum system and method
An exemplary configurable vacuum system is provided for use in coating or plating that provides the capability and versatility to handle substrates of significantly different shapes and sizes. The...
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6905578 |
Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure
An apparatus and method for depositing plural layers of materials on a substrate within a single vacuum chamber allows high-throughput deposition of structures such as these for GMR and MRAM...
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6903016 |
Combined conformal/non-conformal seed layers for metallic interconnects
One embodiment of the present invention in a method for making copper interconnects, which method includes: (a) forming a patterned insulating layer on a substrate, the patterned insulating layer...
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6902647 |
Method of processing substrates with integrated weighing steps
An apparatus for processing substrates comprises a substrate handling chamber, including a substrate handling robot for transferring substrates from cassettes into a substrate carrier. A processing...
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6903030 |
System and method for heat treating semiconductor
A supply system in a heat-treating apparatus for a semiconductor process has a combustor ( 12 ), heating unit ( 13 ), and gas distributor ( 14 ). The combustor ( 12 ) has a combustion chamber ( 59...
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6902947 |
Integrated method for release and passivation of MEMS structures
Disclosed herein is a method of improving the adhesion of a hydrophobic self-assembled monolayer (SAM) coating to a surface of a MEMS structure, for the purpose of preventing stiction. The method...
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6903013 |
Method to fill a trench and tunnel by using ALD seed layer and electroless plating
An improved method to deposit, by atomic layer deposition, ALD, a copper barrier and seed layer for electroless copper plating, filling trench and channel or tunnel openings in a damascene process,...
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6902624 |
Massively parallel atomic layer deposition/chemical vapor deposition system
A method and apparatus for the use of individual vertically stacked ALD or CVD reactors. Individual reactors are independently operable and maintainable. The gas inlet and output are vertically...
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6899765 |
Chamber elements defining a movable internal chamber
A process chamber for processing or inspecting a substrate such as a semiconductor wafer and the like includes a internal chamber employing dynamic seals at the interface of relatively moving...
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6899764 |
Chemical vapor deposition reactor and process chamber for said reactor
A chemical vapor deposition reactor having a process chamber accommodating a substrate holder for wafers, a first gas flow of reactive gases to process the wafers and a crown-shaped gas-collector...
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6896513 |
Large area substrate processing system
A system and method for processing large area substrates is provided. In one embodiment, a processing system includes a transfer chamber having at least one processing chamber and a substrate...
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6884299 |
Deposition apparatus for organic light-emitting devices
A deposition apparatus for organic light emitting devices. The deposition apparatus includes a substrate conveying system and at least a chamber. In this case, the substrate conveying system is a...
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6884298 |
Method and system for coating and developing
A coating and developing treatment system for performing coating and developing treatment. A coating treatment unit is configured to form a resist film on a substrate. A developing treatment unit...
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6878207 |
Gas gate for isolating regions of differing gaseous pressure
Disclosed herein is an improved gas gate for interconnecting regions of differing gaseous composition and/or pressure, more particularly between atmosphere and a vacuum. The gas gate includes a...
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6875279 |
Single reactor, multi-pressure chemical vapor deposition for semiconductor devices
An apparatus and method for forming at least a portion of an electronic device include a High Vacuum-Chemical Vapor Deposition (UHV-CVD) system and a Low Pressure-Chemical Vapor Deposition (LPCVD)...
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6875306 |
Vacuum processing device
A vacuum processing device includes at least one vacuum processing chamber for performing predetermined treatments to a wafer being transferred to a predetermined position within the chamber, an...
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6875280 |
Substrate processing apparatus and substrate processing method
A substrate processing apparatus includes a chamber, a gas introducing portion, a gas discharge port, a substrate transfer gate, and a substrate moving member which moves the substrate between a...
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6869508 |
Physical vapor deposition apparatus and process
A PVD process and apparatus ( 120 ) for depositing a coating ( 132 ) from multiple sources ( 110, 111 ) of different materials. The process and apparatus ( 120 ) are particulaity intended to...
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6869483 |
Coating process and apparatus
In a process and apparatus for coating the front and/or rear facets of semiconductor laser diodes with antireflection layers of minimal reflectivity, the coating material is deposited on the facets...
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6863733 |
Apparatus for fabricating thin-film semiconductor device
There is provided a method of fabricating a thin-film semiconductor device, including the steps of (a) melting and recrystallizing at least a surface of a thin semiconductor film formed on a...
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6860965 |
High throughput architecture for semiconductor processing
In one embodiment, a wafer processing system has a loading station, a process module, and a load lock directly adjacent to the process module. The load lock has a small volume and can include...
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6858085 |
Two-compartment chamber for sequential processing
An apparatus for sequential and isolated processing of a workpiece comprises a two compartment chamber and a mechanism to transfer the workpiece from one compartment to the other compartment. The...
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6855207 |
Apparatus and system for eliminating contaminants on a substrate surface
An intergrated closed apparatus and system for eliminating contaminants including metallic and/or hydrocarbon-containing contaminants on a surface of a semiconductor substrate. The apparatus and...
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6852169 |
Apparatus and methods for processing optical fibers with a plasma
Plasma processing system and methods for stripping the buffer and, optionally, removing the cladding from an optical fiber. The plasma processing system includes a holder capable of holding one or...
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6852194 |
Processing apparatus, transferring apparatus and transferring method
Processing apparatus is disclosed, that comprises substrate container holding table that can hold substrate container that contains plurality of target substrates, first transferring chamber,...
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6849134 |
Minimum volume oven for producing uniform pyrolytic oxide coatings on capacitor anodes
A pyrolysis oven provides uniform pyrolytic coatings on capacitor anodes. An oven chamber contains cross-flow blowers situated to provide uniform laminar flow of oven atmosphere over the objects to...
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6846380 |
Substrate processing apparatus and related systems and methods
An apparatus and method for processing a microelectronic substrate comprises a main chamber and a movable boundary. The main chamber comprises a main chamber wall enclosing a main chamber interior....
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6843882 |
Gas flow control in a wafer processing system having multiple chambers for performing same process
A system for processing substrates comprises a plurality of process chambers. Each process chamber includes an inlet gas distribution member connected to an inlet gas line to distribute gas from...
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6843883 |
Vacuum processing apparatus and method for producing an object to be processed
A vacuum processing apparatus 50 is provided with a bypass line 52 for causing a vacuum transfer chamber 4 and a load-lock chamber 12 to communicate with each other, and a bypass opening...
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6843892 |
Apparatus and method for selectively and controllably electrically biasing a plurality of substrates on a pallet
An in-line, multi-station apparatus including an improved pallet for transporting a plurality of workpieces/substrates through the apparatus, the pallet comprising:
(a) a sheet of...
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6841006 |
Atmospheric substrate processing apparatus for depositing multiple layers on a substrate
A substrate processing apparatus is disclosed. In one embodiment, the apparatus includes a first atmospheric deposition station and a second atmospheric deposition station. The second atmospheric...
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6841031 |
Substrate processing apparatus equipping with high-pressure processing unit
With respect to any one of processing units, a main transportation path, a developing unit, a dedicated transportation robot and a high-pressure processing unit are disposed linearly in this order...
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6841033 |
Material handling system and method for a multi-workpiece plasma treatment system
A plasma treatment system in which untreated workpieces are serially received one at a time on an infeed table but stored in parallel on the infeed table. The untreated workpieces are transferred...
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6837936 |
Semiconductor manufacturing device
The semiconductor manufacturing device according to the present invention having a mechanical drive part which is moved in a vacuum device while holding a substrate includes at least one discharge...
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6833031 |
Method and device for coating a substrate
Apparatus and methods for coating a substrate. In an exemplary embodiment, the apparatus are used to create a metallized substrate for use as an EMI/RFI shield. The apparatus typically includes a...
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6833155 |
Apparatus and method for processing a substrate
A substrate-processing method includes at least (a) a step of delivering a web substrate and an interleaf from a substrate delivery bobbin provided in a substrate delivery chamber while the web...
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6830651 |
Load port capable of coping with different types of cassette containing substrates to be processed
A load port which can selectively receive plural types of cassette having substrate which are to be processed accommodated therein is disclosed. The load port has the following constituents. That...
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6830625 |
System for fabricating a bipolar transistor
One embodiment is a method for fabricating the base of a bipolar transistor where the method comprises placing a first wafer in an undoped epi chamber. Next a first undoped base layer is grown over...
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6830624 |
Blocker plate by-pass for remote plasma clean
A flow of a remotely-generated plasma to a processing chamber by-passes a blocker plate and thereby avoids unwanted recombination of active species. By-passing the blocker plate according to...
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6829056 |
Monitoring dimensions of features at different locations in the processing of substrates
A substrate processing apparatus has a chamber having a substrate support, gas distributor, gas energizer, and gas exhaust port. A process monitor is provided to monitor features in a first region...
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6827788 |
Substrate processing device and through-chamber
A substrate 9 is carried by a carry system in sequence, via a direction-altering chamber 8 to which a plurality of vacuum chambers comprising processing chambers 21 to 24 are...
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6826442 |
Stocker, exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method
A stocker includes a first sealing member for stocking an object to be stocked, an atmosphere control device for controlling an internal atmosphere of the first sealing member to a first atmosphere...
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6824617 |
Input/output valve switching apparatus of semiconductor manufacturing system
An input/output valve switching apparatus of a semiconductor manufacturing system minimizes a vibration set up while operating an input/output valve for opening and closing a wafer-transfer passage...
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6824618 |
Substrate receiving apparatus and method thereof
A substrate receiving apparatus and a method thereof that prevents substrate damage from occurring when a substrate is loaded/unloaded on/from a cassette. The present invention includes a cassette...
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6818067 |
Processing chamber for atomic layer deposition processes
A processing station adaptable to standard cluster tools has a vertically-translatable pedestal having an upper wafer-support surface including a heater plate adapted to be plugged into a unique...
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6818068 |
Conveyor for treating hollow bodies comprising an advanced pressure distribution circuit
Aconveyer for treating hollow bodies, comprising several identical treatment stations ( 12, 13 ) that process at least one hollow body, whereby the respective treatment station for a given...
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6818108 |
Chamber for the transport of workpieces in a vacuum atmosphere, a chamber combination and a method for transporting a workpiece
A vacuum chamber for transporting at least one workpiece has two or more openings defining respective opening areas for treating or handling the at least one workpiece. A transport device is...
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6806211 |
Device and method for processing substrate
A substrate processing apparatus consists of: a processing container; a first processing gas supply unit and a second processing gas supply unit, countering each other, prepared on both sides of a...
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6805748 |
Substrate processing system with load-lock chamber
A substrate processing system includes a process chamber having a process station for processing a substrate in an ambience different from an atmosphere, a plurality of load-lock chambers each...
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6802934 |
Processing apparatus
Two load lock chambers 130 and 132 are arranged between a first transfer chamber 122 and a second transfer chamber 133 . Each of the load lock chambers is capable of accommodating a single...
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