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5637180 |
Plasma processing method and plasma generator
A plasma-processing method used in processes for manufacturing semiconductor devices. During plasma processing, ultraviolet radiation is emitted from a region where a plasma is created. An...
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5630879 |
Method and apparatus for the partial coating of sets of structural components
Structural components (2), such as turbine blades (16) partially to be coated, for example with precious metal coatings, are inserted into a circumferential pocket on a carrier wheel (8), so that...
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5630880 |
Method and apparatus for a large volume plasma processor that can utilize any feedstock material
This invention utilizes a large volume plasma processor to completely ionize any feedstock material and deposit the ionized and unionized species of elements of the feedstock material on deposition...
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5628828 |
Processing method and equipment for processing a semiconductor device having holder/carrier with flattened surface
Process equipment and method for processing a semiconductor device comprising a buffer chamber, at least one process chamber connected to the buffer chamber through an opening portion, a...
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5626677 |
Atmospheric pressure CVD apparatus
An atmospheric pressure CVD apparatus includes an upper convey mechanism, a lower convey mechanism, a loader susceptor up mechanism, and a loader susceptor down mechanism. The upper convey...
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5624498 |
Showerhead for a gas supplying apparatus
A gas supply apparatus, for use in a semiconductor device manufacturing process, provides a showerhead for evenly supplying various kinds of gases to a reaction chamber. The gas supplying apparatus...
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5622918 |
Process and apparatus for preparing YBaCuO superconducting films
A process for preparing an YBCO oxide thin film which has a crystalline, clean and smooth surface on a substrate. The process is conducted by using an apparatus comprising a vacuum chamber in which...
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5620522 |
Microwave plasma generator
A microwave plasma generator, wherein permanent magnets 3 forms intense magnetic field exceeding an intensity of electron cyclotron resonance magnetic field at microwave exit 6a of a dielectric...
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5620578 |
Sputtering apparatus having an on board service module
A system for sputtering a substrate is disclosed. The system includes a central housing having at least one process module for forming the layer, wherein the process module is in fluid...
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5611861 |
Rotary type apparatus for processing semiconductor wafers and method of processing semiconductor wafers
The present invention provides a semiconductor wafer processing apparatus including (a) N process chambers for processing a semiconductor wafer therein wherein N is a positive integer greater than...
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5609689 |
Vacuum process apparaus
A cooling table for cooling a processed object of process in a vacuum reserve chamber is provided with support members, which support the object with predetermined gaps between the object and the...
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5603761 |
Liquid phase epitaxial growth method for carrying out the same
In an improved liquid phase epitaxial growth method and apparatus in which a plurality of substrates are placed in a deposition chamber having at least one first vent hole; a solution for liquid...
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5597609 |
Process and apparatus for the continuous or semi-continuous coating of eyeglass lenses
Lenses are brought individually or in pairs on a transport device (12) to a continuous vacuum apparatus (1) equipped with a rotating substrate carrier (3). The eyeglass lenses (13) are introduced...
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5593740 |
Method and apparatus for making carbon-encapsulated ultrafine metal particles
A method and apparatus for making carbon-encapsulated ultrafine metal particles, in which metal powder intended for encapsulation is injected at a rate up to 25 grams per minutes into a plasma arc...
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5589007 |
Photovoltaic elements and process and apparatus for their formation
A photovoltaic element comprises a first non-monocrystalline silicon-containing semiconductor layer of a first-conductivity type, a first i-type non-monocrystalline silicon-containing semiconductor...
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5588999 |
Thin film forming device
A thin film forming device comprises a vacuum chamber which is vacuous inside, a substrate holder which is provided in the vacuum chamber for holding a substrate thereon and a molecular beam source...
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5587207 |
Arc assisted CVD coating and sintering method
An improved vacuum arc coating apparatus is provided, having a tube defining reaction zone with a plasma channel defined within a series of aligned annular substrate holders, or between an outer...
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5585137 |
Apparatus and method of manufacturing fiber
An apparatus includes a first waveguide having a first surface having a first hole through which a fiber passes, and a second surface having a second hole through which an object passes and...
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5582881 |
Process for deposition of a Ti/TiN cap layer on aluminum metallization and apparatus
A single chamber of a vapor deposition system is used to deposit both Ti and TiN, subsequent to deposition of Al or Al alloy. Because such layers are deposited in the same chamber, the process...
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5578130 |
Apparatus and method for depositing a film
A plasma apparatus for forming a diamond-like carbon layer on a magnetic substance including a central columnar electrode; an outer electrode around the central electrode in a coaxial relation such...
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5578129 |
Gas supplying head and load lock chamber of semiconductor processing system
An etching system for processing a semiconductor wafer has a processing chamber and a load lock chamber. The load lock chamber includes an airtight casing having openings through which the wafer is...
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5575855 |
Apparatus for forming a deposited film
A deposited film forming method includes the steps of: continuously carrying a long substrate into or out of a vacuum chamber, flowing a first deposited film forming gas in a reverse direction...
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5571330 |
Load lock chamber for vertical type heat treatment apparatus
The present invention is a load lock chamber for a vertical type heat treatment apparatus which has no elevating device which requires the provision of lubricating oil which is a source of...
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5571331 |
Vacuum treatment apparatus
Vacuum treatment apparatus including at least two chambers that are linked by a transit opening. A valve body pivotally linked within the opening pivots around a pivot axis that is disposed...
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5571749 |
Method and apparatus for forming deposited film
A plasma CVD method adapted to a roll-to-roll process or the like wherein the change rate of the temperature of the substrate before and after an i-type semiconductor layer is deposited is made...
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5569328 |
Silicon semiconductor wafer test
The invention relates to a system for manufacturing semiconductor devices from silicon semiconductor wafers, comprising forming device operable forming a silicon semiconductor wafer, oxidizing...
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5563095 |
Method for manufacturing semiconductor devices
A method of continuous manufacture of semiconductor integrated circuits, said method and apparatus adapted to contain the semiconductor substrate, semiconductor deposition coating processes, and...
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5556473 |
Parylene deposition apparatus including dry vacuum pump system and downstream cold trap
Chemical vapor deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The apparatus includes an...
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5556472 |
Film deposition apparatus
A MBE film deposition apparatus comprises a vacuum chamber provided with a partition wall for dividing the vacuum chamber into a first sub-chamber and a second sub-chamber, which are independently...
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5554249 |
Magnetron plasma processing system
A magnetron plasma etching system has a plurality of processing chambers connected to a common transfer chamber. Each processing chamber has a pair of counter electrodes for generating an electric...
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5551984 |
Vertical heat treatment apparatus with a circulation gas passage
A circulation duct with a blow fan and a shutter is provided to form gas flows in a transfer chamber below a heat treatment furnace, and a dust removing filter unit is provided in a blowout port of...
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5547512 |
Continuous atomspheric pressure CVD coating of fibers
Barrier coatings are deposited onto fibrous materials at atmospheric pressure by a continuous CVD process. A relatively short furnace tube with an unrestricted outlet is used. Thus, the supply and...
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5542979 |
Apparatus for producing thin film
A thin sulfide film can be formed by simultaneously generating under different conditions a plurality of deposition materials to be deposited on a substrate, using the fact that sulfur has a higher...
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5536322 |
Parylene deposition apparatus including a heated and cooled support platen and an electrostatic clamping device
Chemical vapor deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The apparatus includes a heated...
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5536321 |
Parylene deposition apparatus including a post-pyrolysis filtering chamber and a deposition chamber inlet filter
Chemical vapor deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The apparatus includes a...
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5536317 |
Parylene deposition apparatus including a quartz crystal thickness/rate controller
A parylene deposition apparatus includes a quartz crystal thickness/rate controller for controlling the deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The...
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5536319 |
Parylene deposition apparatus including an atmospheric shroud and inert gas source
Chemical vapor deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The apparatus includes an...
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5536128 |
Method and apparatus for carrying a variety of products
An apparatus for carrying a variety of products for effectively processing and carrying plural kinds of works such as semiconductor wafers includes a plurality of processing stations for processing...
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5536320 |
Processing apparatus
A waiting space is provided below a processing vessel for processing objects to be processed. An objects to be processed mount which is movable up and down into the processing vessel is disposed in...
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5534068 |
Parylene deposition apparatus including a tapered deposition chamber and dual vacuum outlet pumping arrangement
A parylene deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The apparatus includes a...
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5532102 |
Apparatus and process for preparation of migration imaging members
Disclosed is an apparatus for evaporation of a vacuum evaporatable material onto a substrate, said apparatus comprising (a) a walled container for the vacuum evaporatable material having a...
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5529634 |
Apparatus and method of manufacturing semiconductor device
An evaporation chamber for forming fine metal particles is separated from a film formation chamber in which the substrate having a metal film such as a metal column thereon is placed during metal...
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5527390 |
Treatment system including a plurality of treatment apparatus
A treatment system is disclosed, which has a treatment apparatus for performing a predetermined treatment for a planar workpiece contained in a carrier, and a first air-tight carrier storage...
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5527391 |
Method and apparatus for continuously forming functional deposited films with a large area by a microwave plasma CVD method
An apparatus for continuously forming a functional deposited film with a large area according to a microwave plasma CVD process is described. The apparatus comprises the elements of a continuous...
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5520741 |
Apparatus for producing a plasma polymer protective layer on workpieces, in particular headlamp reflectors
An apparatus is proposed for producing a plasma polymer protective layer on workpieces, in particular headlamp reflectors (10), which has a coating chamber (18) into which a polymerizable monomer...
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5515986 |
Plasma treatment apparatus and method for operating same
An apparatus for plasma treating workpieces in vacuum includes a stack of plasma chambers (20). Handling of workpieces to and from the plasma chambers of the stack is performed in parallelism by...
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5514217 |
Microwave plasma CVD apparatus with a deposition chamber having a circumferential wall comprising a curved moving substrate web and a microwave applicator means having a specific dielectric member on the exterior thereof
An apparatus for continuously forming a functional deposited film on a continuously moving web member by microwave plasma CVD process, said apparatus comprises: a substantially enclosed columnar...
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5512320 |
Vacuum processing apparatus having improved throughput
A method for depositing sequential thin films on glass substrates by single substrate deposition comprising loading a batch of substrates into a load lock chamber and evacuating the chamber,...
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5510151 |
Continuous film-forming process using microwave energy in a moving substrate web functioning as a substrate and plasma generating space
A microwave plasma CVD method for continuously forming a large area and length functional deposited film, the method comprises: continuously moving a substrate web in the longitudinal direction by...
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5505778 |
Surface treating apparatus, surface treating method and semiconductor device manufacturing method
An apparatus for treating solid surface using a thermally excited molecular beam according to the present invention is capable of completely preventing flying of contaminant caused by a heating...
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