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5957648 |
Factory automation apparatus and method for handling, moving and storing semiconductor wafer carriers
An improved apparatus and method is provided for handling, moving and storing semiconductor wafer carriers. The apparatus comprises two physically separate load ports, each coupled to a vertical...
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5951835 |
Continuous vacuum processing apparatus
More than two pressure reducing chambers 6 to 9 are located on both the upstream and the downstream of vacuum processing housings 11 and 12. Each of the pressure reducing chambers 6 to 9 includes a...
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5942038 |
Cooling element for a semiconductor fabrication chamber
A novel semiconductor fabrication chamber includes a quartz vessel and a metal vessel with a resilient sealing member disposed between the quartz and metal vessels to define a vacuum chamber, along...
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5935395 |
Substrate processing apparatus with non-evaporable getter pump
An apparatus for processing a substrate includes at least one closed chamber for containing the substrate in a controlled environment, and a non-evaporable gettering material in the chamber acting...
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5932014 |
Apparatus for producing semiconductor device
A semiconductor device producing apparatus includes a first transporter which moves a substrate to a first unit to undergo at least a first process, and a second transporter, other than the first...
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5919310 |
Continuously film-forming apparatus provided with improved gas gate means
A continuous film-forming apparatus includes a plurality of reaction chambers each capable of forming a semiconductor film with a different chemical composition. The reaction chambers are arranged...
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5913978 |
Apparatus and method for regulating pressure in two chambers
A gas is supplied to a second chamber so that the pressure in the second chamber is raised to a predetermined level. A communication passage is provided for internally connecting the first and...
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5911834 |
Gas delivery system
The present invention provides a method and apparatus for delivering one or more process gases and one or more cleaning gases into one or more processing regions. The gas distribution system...
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5909994 |
Vertical dual loadlock chamber
A vacuum loadlock is provided for housing a pair of wafers in proper alignment for concurrent processing. In one embodiment, a single chamber loadlock is provided with a gas diffuser disposed...
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5910218 |
Systems for forming films having high dielectric constants
A method form forming a dielectric film on a substrate includes the steps of placing the substrate in a process chamber wherein said substrate is isolated from an external environment, depositing...
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5910219 |
Can coating system
A coating apparatus is provided which comprises a can defining an internal chamber. A hollow sleeve which itself defines an internal space is located within the chamber. The hollow sleeve defines...
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5908506 |
Continuous vapor deposition apparatus
Continuous vapor deposition apparatus for coating objects with a coating material, e.g., parylene, are disclosed. The apparatus comprise an entrance chamber for loading the objects, a process...
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5908507 |
Chemical vapor deposition reactor and method of producing oxide superconductive conductor using the same
A chemical vapor deposition (CVD) reactor for forming a film at the surface of a base material, and a production method for an oxide superconductive conductor using this CVD reactor, are disclosed....
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5904958 |
Adjustable nozzle for evaporation or organic monomers
An apparatus for depositing a coating material, such as an organic monomer, in vapor form onto a substrate including a heated evaporation chamber having an inlet for introduction of the coating...
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5902088 |
Single loadlock chamber with wafer cooling function
A vacuum loadlock is provided for housing a pair of wafers in proper alignment for concurrent processing. In one embodiment, a single chamber loadlock is provided with a gas diffuser disposed...
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5900062 |
Lift pin for dechucking substrates
A lift pin 95 for dechucking a substrate 15 held to a chuck 50 by residual electrostatic charge, the substrate being processed in a plasma formed using RF currents, is described. The lift pin 95...
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5900065 |
Apparatus for the plasma-chemical deposition of polycrystalline diamond
In an apparatus for the deposition of polycrystalline diamond on large, flat substrates (3) by the plasma method, with a vacuum chamber (4); with locks for the inward and outward transfer of the...
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5895594 |
Method and device for heating carrier bodies
A method and device for heating silicon carrier bodies in a deposition reactor are by means of radiated heat. In this method, the carrier bodies are irradiated by means of a heat radiation device...
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5891251 |
CVD reactor having heated process chamber within isolation chamber
A CVD reactor includes separate reaction and pressure chambers, where the reaction chamber is contained within and isolates process gases from the pressure chamber. In this manner, each of the...
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5888638 |
Sealing element, particularly for shut-off and regulating valves, and process for its production
A sealing element is made up of a shut-off body with a sealing surface; a bonding layer component provided on the sealing surface of the shut-off body and containing silicon and carbon; and a...
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5885355 |
Semiconductor fabrication apparatus with a handler
A semiconductor fabrication apparatus having a process chamber and a handler which is provided for loading wafers into the process chamber or unloading wafers therefrom, comprising a plurality of...
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5885356 |
Method of reducing residue accumulation in CVD chamber using ceramic lining
The present invention provides a method and apparatus for limiting residue build-up by lining with a ceramic material the exhaust plenun and exhaust manifold of a processing chamber. In another...
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5882412 |
Vertical two chamber reaction furnace
A vertical two chamber reaction furnace. The furnace comprises a lower chamber having an independently operable first heating means for heating the lower chamber and a gas inlet means for admitting...
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5882165 |
Multiple chamber integrated process system
An integrated modular multiple chamber vacuum processing system is disclosed. The system includes a load lock, may include an external cassette elevator, and an internal load lock wafer elevator,...
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5882413 |
Substrate processing apparatus having a substrate transport with a front end extension and an internal substrate buffer
A substrate processing apparatus having a plurality of substrate processing modules connected to a substrate transport. The substrate transport has a housing and a substrate transport mechanism....
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5882415 |
Electron-beam continuous process vaporization installation for thermally high stressed substrata
The invention is an electron-beam vaporization installation for coating structural components made of extreme-heat-resistant alloys (super alloys), especially turbine blades, with so-called thermal...
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5879461 |
Metered gas control in a substrate processing apparatus
A method of introducing gas into a substrate processing chamber. The method of introducing gas into a substrate processing chamber comprises the steps of filling a gas metering area with the gas to...
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5879519 |
Geometries and configurations for magnetron sputtering apparatus
A thin film coating system incorporates separate, separately-controlled deposition and reaction zones for depositing materials such as refractory metals and forming oxides and other compounds and...
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5871587 |
Processing system for semiconductor device manufacture of otherwise
A processing system includes a processing chamber, a circulating device for purifying an inside ambience gas of the processing chamber and for circulating the purified gas back into the processing...
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5871806 |
Heat-treating process
A process for heat-treating an object in a heat-treating apparatus comprises carburizing the object under a carburizing gas atmosphere in a carburizing zone, cooling the object with a cooling gas,...
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5868847 |
Clamp ring for shielding a substrate during film layer deposition
A chamber for depositing a film layer on a substrate includes a support member on which the substrate is positioned for processing in the chamber, and a clamp ring suspended in the chamber on a...
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5865932 |
Sealing method and apparatus for vacuum treatment of support for light-sensitive material
In a method in which a thin-film support is continuously led into a vacuum chamber from the atmospheric air, subjected to surface treatment and led-out to the atmospheric air again, a pneumatical...
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5863338 |
Apparatus and method for forming thin film
A forming apparatus of a thin film, includes a processing chamber where a predetermined process is carried out on a surface of a supplied substrate, and a feeding device, which is provided in the...
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5863336 |
Apparatus for fabrication of superconductor
An apparatus for thallium-containing superconductor with grains having c-axis alignment perpendicular to the plane of the substrate is fabricated by controlling the thallium oxide vapor partial...
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5858102 |
Apparatus of chemical vapor for producing layer variation by planetary susceptor rotation
A chemical vapor deposition apparatus for depositing at least one layer of material with controlled substrate-to-substrate variation onto a plurality of substrates is disclosed, comprising a...
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5858100 |
Substrate holder and reaction apparatus
The present invention relates to a reaction apparatus for receiving a reaction gas and for heating a substrate so as to form a film such as an insulating film on the substrate or for etching, with...
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5855675 |
Multipurpose processing chamber for chemical vapor deposition processes
A processing station adaptable to standard cluster tools has a vertically-translatable pedestal having an upper wafer-support surface including a heater plate adapted to be plugged into a unique...
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5855687 |
Substrate support shield in wafer processing reactors
Apparatus for CVD processing wherein a wafer mounted on a vertically movable susceptor beneath a showerhead. The susceptor extends beyond the outer perimeter of the wafer such that, when the...
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5855681 |
Ultra high throughput wafer vacuum processing system
The present invention generally provides a cassette-to-cassette vacuum processing system which concurrently processes multiple wafers and combines the advantages of single wafer process chambers...
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5855679 |
Semiconductor manufacturing apparatus
A semiconductor manufacturing apparatus which enables, inside a vacuum, the transport of and mounting at a prescribed position of a supporting component or processing component, such as a susceptor...
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5853486 |
Treatment system and treatment apparatus with multi-stage carrier storage chambers
A treatment system is disclosed, which has a treatment apparatus for performing a predetermined treatment for a planar workpiece contained in a carrier, and a first air-tight carrier storage...
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5851299 |
Passive shield for CVD wafer processing which provides frontside edge exclusion and prevents backside depositions
An improved apparatus for CVD processing is described wherein a wafer mounted on a vertically movable susceptor beneath a gas outlet or showerhead is raised into contact with a shield ring which...
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5851296 |
Vacuum processing apparatus and method
A vacuum processing apparatus includes a reaction chamber, a non-reaction chamber which is a load-lock chamber or a double load-lock chamber. A double arm is accommodated in the non-reaction...
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5851600 |
Plasma process method and apparatus
Plasma processing gas is introduced into an upper portion of a processing vessel and a film-formation gas is simultaneously introduced into the vicinity of a substrate to be processed. The plasma...
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5849087 |
Vacuum treatment system for applying thin layers to substrates such as headlights reflectors
In a vacuum treatment system for applying thin layers to substrates (2, 2', . . . ) such as headlight reflectors, with several treatment (8, 9, 10) and/or inward and outward transfer lock stations...
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5849088 |
Free floating shield
A protective shield and an atmospheric pressure chemical vapor deposition system including a protective shield. The shield includes a frame assembly including a pair of spaced end walls and a pair...
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5846328 |
In-line film deposition system
An in-line film deposition system is adapted so that film deposition processing on a substrate is completed through a number of film deposition processes, while the length of the system is not...
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5833754 |
Deposition apparatus for growing a material with reduced hazard
An apparatus for growing a material at high temperature and employing a reaction gas. A reaction vessel is formed of a metal sidewall having outer and inner surfaces, the inner surface surrounding...
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5817366 |
Method for manufacturing organic electroluminescent element and apparatus therefor
The present invention provides a process and apparatus for manufacturing organic electroluminescence cell, wherein the steps after formation of a transparent electrode on a substrate plate up to...
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5814153 |
Semiconductor device manufacturing apparatus
To provide a semiconductor device manufacturing method and a semiconductor device manufacturing apparatus in which both a dependency on base material and a film characteristic are satisfied in film...
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