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6093252 |
Process chamber with inner support
An improved chemical vapor deposition reaction chamber having an internal support plate to enable reduced pressure processing. The chamber has a vertical-lateral lenticular cross-section with a...
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6086676 |
Programmable electrical interlock system for a vacuum processing system
A vacuum processing system is provided with a programmable interlock circuit for combining the interlock signals generated by the system into combined interlock signals. The programmable interlock...
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6085689 |
Apparatus to increase gas residence time in a reactor
An apparatus is provided for controlling the flow of gaseous reactants in a CVD reactor through the use of a body having interior and exterior regions, in which the body defines at least one flow...
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6083566 |
Substrate handling and processing system and method
The present invention relates in a system and method for handling and processing substrates for magnetic and optical media and other types of substrates, such as wafers and lenses, requiring...
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6083321 |
Fluid delivery system and method
The present invention generally provides a gas delivery system adapted for positioning near the process chamber. More particularly, the present invention provides an apparatus for processing a...
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6080679 |
High-speed soft evacuation process and system
A process for evacuating the inside of a vacuum vessel before a processing gas is introduced into the vacuum vessel. The process includes steps of evacuating the inside of the vacuum vessel through...
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6079354 |
Thermal post-deposition treatment of halogen-doped films to improve film stability and reduce halogen migration to interconnect layers
A method of stabilizing a halogen-doped silicon oxide film to reduce halogen atoms migrating from said film during subsequent processing steps. A halogen-doped film is deposited over a substrate...
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6074486 |
Apparatus and method for manufacturing a semiconductor device having hemispherical grains
An apparatus and method for forming a HSG silicon layer on a capacitor lower electrode of a semiconductor memory device. The apparatus includes a processing chamber having a plurality of source gas...
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6071350 |
Semiconductor device manufacturing apparatus employing vacuum system
An apparatus for manufacturing a semiconductor device employs a vacuum system, in which a heating source is installed in a predetermined portion of a venting-gas inlet. A venting-speed controlling...
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6068738 |
Method and apparatus for thin film coating an article
A method, apparatus and carrier for coating a CRT screen after assembly. The method and apparatus includes isolating a surface portion of the CRT to be coated from the remaining surface to prevent...
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6066210 |
Substrate processing apparatus with a processing chamber, transfer chamber, intermediate holding chamber, and an atmospheric pressure section
A substrate processing apparatus comprises a substrate transfer chamber; a substrate processing chamber disposed on a first side wall of the substrate transfer chamber; an intermediate substrate...
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6063248 |
Process chamber isolation system in a deposition apparatus
An improvement in an apparatus having an external casing defining a processing chamber for deposition of a film on a substrate and an opening in the processing chamber through which a substrate is...
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6063201 |
Effusion cell assembly for epitaxial apparatus
An effusion cell assembly for epitaxial apparatus is disclosed. The assembly includes an effusion cell incluing a growing material, a heater for supplying heats with the effusion cell to effuse the...
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6056849 |
Apparatus for the surface treatment of workpieces by means of a plasma
In an apparatus for the processing of workpieces and the surface treatment thereof by means of a plasma, a processing chamber (11) to process workpieces and a treatment chamber (10) for the surface...
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6053980 |
Substrate processing apparatus
A substrate processing apparatus comprises a substrate transfer section, connection modules attached to the substrate transfer section, and a first substrate transfer robot in the substrate...
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6053688 |
Method and apparatus for loading and unloading wafers from a wafer carrier
A wafer handling apparatus and method includes a wafer carrier station for supporting a wafer carrier, such as an enclosed pod, that holds one or more wafers. A grounded interface panel is provided...
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6054018 |
Outside chamber sealing roller system for surface treatment gas reactors
A surface treatment gas reactor features a roller assembly for transporting a bi-dimensional material into and out of a gas reaction chamber. Either a four-roller or a three-roller assembly may be...
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6054014 |
Exhaust apparatus
An improved exhaust apparatus for a semiconductor process includes a chamber where the semiconductor process is performed. A load mechanism is used to carry wafers into the process chamber, and a...
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6051276 |
Internally heated pyrolysis zone
A method and apparatus for more efficiently depositing a gas onto a surface. In one embodiment, a deposition apparatus is provided. The deposition apparatus comprises a deposition chamber, a tube...
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6045620 |
Two-piece slit valve insert for vacuum processing system
A vacuum processing system has a transfer chamber with a slit valve at which is attached a process chamber and with a slit valve insert disposed in the slit valve for matching up with the process...
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6042652 |
Atomic layer deposition apparatus for depositing atomic layer on multiple substrates
An atomic layer deposition (ALD) apparatus capable of depositing a thin film on a plurality of substrates. The atomic layer deposition apparatus includes: a vacuum chamber, a reactor installed in...
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6039770 |
Semiconductor device manufacturing system having means for reducing a pressure difference between loadlock and processing chambers
A semiconductor manufacturing system includes a loadlock chamber, a low level vacuum pump connected to said loadlock chamber so as to create a low level vacuum in the loadlock chamber, a processing...
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6039811 |
Apparatus for fabricating polysilicon film for semiconductor device
An apparatus for fabricating a semiconductor device having cooling jackets for preventing a gas from being exuded in a reaction chamber, thereby minimizing the generation of contaminating...
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6040585 |
Method for detecting wafer orientation during transport
The orientation of a wafer carried on a blade of a semiconductor wafer transfer system is sensed in order to prevent wafer damage during transfer of the wafer from chamber-to-chamber within a...
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6039835 |
Etching apparatus and method of etching a substrate
A etcher (10) has an inner chamber (22) that is in communication with a collection chamber (17). A cover (33) is made from a substrate (11) and an outer housing (34). The cover (33) is attached to...
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6036780 |
Mechanism for detecting particulate formation and/or failures in the removal of gas from a liquid
A fluid delivery system is provided having a degas module which can be retrofitted to allow early detection of degas defects within the system. A degas chamber is modifiable to include at least one...
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6029476 |
Method and apparatus for manufacturing an optical fiber provided with a hermetic coating
A method and apparatus for manufacturing optical fibers provided with hermetic coatings, wherein the bare fiber made from a heated preform advances through a stream of reactive gaseous medium which...
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6030458 |
Phosphorus effusion source
This invention is a sublimating and cracking apparatus for producing a beam of molecules to be deposited on a substrate, and an apparatus which is particularly useful with phosphorus as the source...
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6030459 |
Low-pressure processing device
A semiconductor manufacturing system performs etching, ashing and CVD to form a thin film, using a gas plasma. An apparatus for treatment under a reduced pressure has two treatment chambers (23), a...
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6027569 |
Gas injection systems for a LPCVD furnace
Systems and methods disclosed provide a LPCVD furnace which includes a lower gas injection tube that enters a quartz tube of the LPCVD furnace at a lower portion thereof, and extends toward the...
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6024800 |
Plasma processing apparatus
According to the present invention, a plasma processing apparatus for performing surface processing of a substrate by means of plasma discharge is provided comprising: a processing chambers 10R and...
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6025266 |
Vacuum film formation method and device
A vacuum film formation device is proposed in which when forming TiN/Ti films before forming a W film, the W film is prevented from peeling, the Ti film can be formed on all the surfaces of a...
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6022415 |
Spherical article conveying atmosphere replacing device
A spherical article conveying atmosphere replacing device includes a recovering chamber which a recovering pipe penetrates; a pressure reducing device (or recovering pump) for making the inside of...
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6019850 |
Apparatus for making a semiconductor device in a continuous manner
A method of continuous manufacture of semiconductor integrated circuits, said method and apparatus adapted to contain the semiconductor substrate, semiconductor deposition coating processes, and...
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6017395 |
Gas pressure regulation in vapor deposition
A vapor deposition apparatus includes a plurality of gas sources, a first gas feed line which is in fluid communication with the gas sources and through which a gas necessary for conducting vapor...
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6017396 |
Plasma film forming apparatus that prevents substantial irradiation damage to the substrate
A film formation device for forming a film on a substrate according to the present invention includes: a plurality of vacuum chambers, each of the plurality of vacuum chambers including a gas...
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6015465 |
Temperature control system for semiconductor process chamber
A temperature control system 10 is used to control the temperature of a chamber surface 15, such as a convoluted external surface, of a process chamber 25 that is used to process a semiconductor...
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6004397 |
TEOS-O.sub.3 oxidizing film depositing system and process for supplying ozone (O.sub.3) thereto
A method and apparatus for controlling the amount of ozone concentration in the layers of a film depositing system and the multi-layered structure produced thereby, whereby the concentration of...
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5993556 |
Vacuum treatment system for depositing thin coatings
A vacuum treatment system for depositing thin coatings on substrates, with several stationary treating chambers that are held by the annular or frame-like side wall of the vacuum chamber and...
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5989346 |
Semiconductor processing apparatus
In a semiconductor processing apparatus, an external transfer mechanism transfers substrates between a cassette for storing a plurality of target substrates by vertically arranging the substrates...
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5980684 |
Processing apparatus for substrates
For shortening the time for introducing an inactive gas, such as nitrogen gas, into a load lock chamber of a processing apparatus for substrates, a buffer tank 19 having a capacity larger than that...
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5979306 |
Heating pressure processing apparatus
A heating pressure processing apparatus in which gas sealing property and safety can be ensured, and economic property can be improved in heating pressure processing of workpieces such as Si wafers...
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5976261 |
Multi-zone gas injection apparatus and method for microelectronics manufacturing equipment
A method and apparatus for multi-zone injection apparatus of multiple process gases onto a work piece during manufacture. The multi-zone injection apparatus uses a gas injection plate with multiple...
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5976260 |
Semiconductor producing apparatus, and wafer vacuum chucking device, gas cleaning method and nitride film forming method in semiconductor producing apparatus
It is an object of the present invention to obtain a vacuum chucking which can vacuum suck a wafer even if dusts attach thereon. The main body of vacuum chuck (101) has a plurality of block grooves...
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5972161 |
Dry etcher apparatus for preventing residual reaction gas from condensing on wafers after etching
A dry etcher for etching a thin film on a wafer, includes an etching chamber having the wafer loaded therein and a supply system for supplying a reaction gas to the etching chamber to etch the thin...
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5968274 |
Continuous forming method for functional deposited films and deposition apparatus
The present invention aims to provide a continuous forming method and apparatus for functional deposited films having excellent characteristics while preventing any mutual mixture of gases between...
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5961798 |
System and method for vacuum coating of articles having precise and reproducible positioning of articles
A system and method are provided for vacuum coating articles that includes a means for moving the articles in semi-continuous fashion successively through a series of vacuum chambers. A carousel is...
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5961727 |
Sealing apparatus for vacuum treatment of support for light-sensitive material
In a method in which a thin-film support is continuously led into a vacuum chamber from the atmospheric air, subjected to surface treatment and led-out to the atmospheric air again, a pneumatical...
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5958134 |
Process equipment with simultaneous or sequential deposition and etching capabilities
Method and apparatus for forming the longitudinal edges of stacks of razor blades by conveying the stacks of razor blades along a conveying path in a vacuum chamber past material deposition and...
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5958510 |
Method and apparatus for forming a thin polymer layer on an integrated circuit structure
A method and apparatus are disclosed for forming thin polymer layers on semiconductor substrates. In one embodiment, the method and apparatus include the sublimation of stable dimer parylene...
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