|
Match
|
Document |
Document Title |
|
|
7618599 |
Reaction chamber for manufacturing a carbon nanotube, apparatus for manufacturing the carbon nanotube and system for manufacturing the carbon nanotube
Disclosed are a reaction chamber for manufacturing a carbon nanotube, an apparatus for manufacturing a carbon nanotube and a system for manufacturing a carbon nanotube. The reaction chamber...
|
|
|
7618493 |
Device and method for manufacturing thin films
The present invention herein provide a thin film-manufacturing device and a thin film-manufacturing method which are excellent in the mass-production ability and productivity, which permit the...
|
|
|
7611587 |
Thin-film deposition evaporator
A material source evaporator for use with an evacuable interior deposition chamber in which evaporated materials are deposited on substrates comprising a container with an associated heater that...
|
|
|
7608151 |
Method and system for coating sections of internal surfaces
A method and system for coating the internal surfaces of a localized area or section of a workpiece is presented. Conductive structures are inserted into one or more openings of a workpiece to...
|
|
|
7605095 |
Heat processing method and apparatus for semiconductor process
A heat processing method for a semiconductor process includes placing a plurality of target substrates stacked at intervals in a vertical direction within a process field of a process container....
|
|
|
7604708 |
Cleaning of native oxide with hydrogen-containing radicals
A substrate cleaning apparatus has a remote source to remotely energize a hydrogen-containing gas to form an energized gas having a first ratio of ionic hydrogen-containing species to radical...
|
|
|
7601242 |
Plasma processing system and baffle assembly for use in plasma processing system
The present invention presents a baffle assembly located in a plasma processing system, comprising a baffle carrier attached to the plasma processing system, and at least two baffle inserts having...
|
|
|
7601223 |
Showerhead assembly and ALD methods
An apparatus for depositing thin films onto a substrate is provided. The apparatus includes a gas exchange plate that is positioned within a reaction chamber having a platform. The gas exchange...
|
|
|
7597758 |
Chemical precursor ampoule for vapor deposition processes
Embodiments of the invention provide chemical precursor ampoules that may be used during vapor deposition processes. In one embodiment, an apparatus for generating a chemical precursor gas used in...
|
|
|
7594479 |
Plasma CVD device and discharge electrode
In a film formation chamber, a gas flow to be introduced is rectified in a direction away from the film formation surface of the substrate on which the film is to be formed, so as to exhaust the...
|
|
|
7592275 |
Method and apparatus for manufacturing active matrix device including top gate type TFT
A method and an apparatus are provided for manufacturing an active matrix device including a top gate type TFT. A manufacturing process of the top gate type TFT includes the steps of forming an...
|
|
|
7591907 |
Apparatus for hybrid chemical processing
In one embodiment, an apparatus for performing an atomic layer deposition (ALD) process is provided which includes a chamber body containing a substrate support, a lid assembly attached to the...
|
|
|
7589000 |
Fabrication method and fabrication apparatus of group III nitride crystal substance
A fabrication method of a group III nitride crystal substance includes the steps of cleaning the interior of a reaction chamber by introducing HCl gas into the reaction chamber, and vapor...
|
|
|
7588736 |
Apparatus and method for generating a chemical precursor
Embodiments of an apparatus for generating a chemical precursor used in a vapor deposition processing system are provide which include a canister having a sidewall, a top, and a bottom forming an...
|
|
|
7585384 |
Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor
An apparatus configured to confine a plasma within a processing region in a plasma processing chamber. In one embodiment, the apparatus includes a ring that has a baffle having a plurality of slots...
|
|
|
7585370 |
Gas-purged vacuum valve
A vacuum valve assembly for use in a vacuum processing chamber includes a seat defining an opening in the vacuum valve, with the seat having a sealing face adjacent the opening and normal to the...
|
|
|
7582846 |
Hybrid plasma-cold spray method and apparatus
The present invention provides a method and apparatus of producing a dense coating with desirable stress conditions similar to coatings produced by a cold spray processes, but with higher process...
|
|
|
7582181 |
Method and system for controlling a velocity field of a supercritical fluid in a processing system
A method and system for controlling a velocity field in a processing system is described. In an exemplary embodiment described, the system includes a multi-outlet exhaust manifold having three or...
|
|
|
7578883 |
Arrangement and method for abating effluent from a process
An arrangement and associated method for abating effluent from an etching process is disclosed.
|
|
|
7575638 |
Apparatus for defining regions of process exclusion and process performance in a process chamber
Positional relationships are established in a process chamber. An upper electrode is configured with a first surface to support a wafer, and an electrode has a second surface. A linear drive is...
|
|
|
7572337 |
Blocker plate bypass to distribute gases in a chemical vapor deposition system
Apparatus and methods for distributing gases into a processing chamber are disclosed. In one embodiment, the apparatus includes a gas distribution plate having a plurality of apertures disposed...
|
|
|
7566422 |
Exposure apparatus with tanks storing helium gas and method of manufacturing device using exposure apparatus
A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at...
|
|
|
7566368 |
Method and apparatus for an improved upper electrode plate in a plasma processing system
The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate coupled to an upper assembly advantageously...
|
|
|
7563328 |
Method and apparatus for gas injection system with minimum particulate contamination
A gas injection system ( 10 ) is provided for a processing reactor and a method is provided for reducing transport of particulate material onto a substrate ( 12 ) during process gas start-up. The...
|
|
|
7560038 |
Thin film forming method and system
A thin-film forming method, which includes the steps of: (1) holding at least one object in a chamber; (2) depositing a film-forming material on the object; (3) etching the forming material while...
|
|
|
7559992 |
Semiconductor processing apparatus and method
A semiconductor processing apparatus includes a process chamber to accommodate a target substrate, a gas supply system to supply a process gas into the process chamber, an exhaust unit to exhaust...
|
|
|
7553516 |
System and method of reducing particle contamination of semiconductor substrates
Particle contamination of semiconductor substrates due to particles coming off of wafer boat rods is reduced. A gas flow is established with the boat rods downstream of the substrates, to blow...
|
|
|
7552521 |
Method and apparatus for improved baffle plate
An apparatus related to plasma chambers used for processing semiconductor substrates and specifically to improvements in pumping baffle plates used in plasma sources. An apparatus and method for...
|
|
|
7550046 |
Vapor deposition system using benzotriazole (BTA) and isopropyl alcohol for protecting copper interconnects
A method of protecting an interconnect is provided. The method includes forming an integrated circuit structure having an interconnect, and depositing vaporized benzotriazole on the interconnect.
|
|
|
7547363 |
Solid organometallic compound-filled container and filling method thereof
A solid organometallic compound novel filled container stably supplies an apparatus for vapor phase epitaxial growth such as an MOCVD apparatus with a solid organometallic compound over a long...
|
|
|
7544615 |
Systems and methods of forming refractory metal nitride layers using organic amines
A method of forming (and apparatus for forming) refractory metal nitride layers (including silicon nitride layers), such as a tantalum nitride barrier layer, on a substrate by using an atomic layer...
|
|
|
7541069 |
Method and system for coating internal surfaces using reverse-flow cycling
A method and system for coating the internal surfaces of a workpiece is presented. A bias voltage is connected to a workpiece, which functions as a cathode. A gas source and a vacuum source are...
|
|
|
7537673 |
Plasma processing apparatus
Disclosed herein is a plasma processing apparatus, which generates plasma within a vacuum chamber to process semiconductor substrates using the plasma. The apparatus comprises a substrate mounting...
|
|
|
7537662 |
Method and apparatus for depositing thin films on a surface
A method and apparatus for depositing thin films onto a substrate is provided. The apparatus includes a gas injection structure that is positioned within a reaction chamber that has a platform. The...
|
|
|
7534854 |
Apparatus and method for oxidation and stabilization of polymeric materials
An apparatus for treating polymeric materials comprises a treatment chamber adapted to maintain a selected atmosphere; a means for supporting the polymeric material within the chamber; and, a...
|
|
|
7531061 |
Gas temperature control for a plasma process
A method and system for controlling the temperatures of at least one gas in a plasma processing environment prior to the at least one gas entering a process chamber. This temperature control may...
|
|
|
7527658 |
Method of manufacturing displays and apparatus for manufacturing displays
A method of manufacturing displays, includes at least forming a metal pattern on a surface of an insulating substrate, forming an insulating film on the metal pattern, forming a pattern of a...
|
|
|
7524532 |
Process for depositing thin layers on a substrate in a process chamber of adjustable height
A process for depositing thin layers on a substrate in a process chamber arranged in a reactor housing, the bottom of the process chamber consisting of a temperable substrate holder which can be...
|
|
|
7524374 |
Method and apparatus for generating a precursor for a semiconductor processing system
Embodiments of the present invention are directed to an apparatus for generating a precursor for a semiconductor processing system ( 320 ). The apparatus includes a canister ( 300 ) having a...
|
|
|
7522974 |
Interface for operating and monitoring abatement systems
Method and systems are provided for monitoring and controlling one or more abatement systems. One or more abatement systems may be represented on a display alone with one or more effluent flows...
|
|
|
7520937 |
Thin film forming apparatus and method of cleaning the same
The present invention relates to a technique for cleaning a thin film forming apparatus. In a typical embodiment, deposits originating from process gases for forming a thin film and deposited on...
|
|
|
7517558 |
Methods for positioning carbon nanotubes
The present invention is generally directed to a system for controlling placement of nanoparticles, and methods of using same. In one illustrative embodiment, the device includes a substrate and a...
|
|
|
7517141 |
Simultaneous control of deposition time and temperature of multi-zone furnaces
The present invention facilitates multi-zone furnace ( 102 ) based deposition processes by iteratively adjusting deposition time and zonal setpoint temperatures to mitigate deviations from desired...
|
|
|
7513953 |
Continuous system for depositing films onto plastic bottles and method
A bottle processing apparatus includes a rotary bottle vacuum transfer system and a bottle coating system. The rotary bottle vacuum transfer system takes bottles from atmospheric pressure and...
|
|
|
7513949 |
Method and apparatus for producing semiconductor device
An amorphous silicon film is formed on a flat glass substrate, and then crystallized by heating to obtain a crystalline silicon film. The glass substrate is placed on a stage having a convex...
|
|
|
7510624 |
Self-cooling gas delivery apparatus under high vacuum for high density plasma applications
A gas distributor for use in a semiconductor processing chamber is provided. The gas distributor comprises a gas inlet, a gas outlet, and a stem section having a spiral thread. The gas distributor...
|
|
|
7504078 |
Continuous production of aligned carbon nanotubes
An apparatus for continuous production of aligned carbon nanotubes is disclosed. The apparatus includes a reactor, an injector for delivering a feed solution into the reactor, and a conveyor for...
|
|
|
7500822 |
Combined vacuum pump load-lock assembly
A load-lock and dry vacuum pump assembly includes a load-lock having a load-lock housing, the load-lock housing includes a mating system having a flange-like cylinder and a cylinder concentrically...
|
|
|
7494560 |
Non-plasma reaction apparatus and method
An apparatus and method for forming a self-limiting etchable layer on a workpiece. The apparatus comprises: a chamber adapted for holding a workpiece; a distribution plate within the chamber,...
|
|
|
7491913 |
Bake apparatus for use in spin-coating equipment
Bake apparatus for use in baking a substrate, such as a semiconductor wafer, includes a chamber, a hot plate installed within the chamber, and first and second buffer plates for uniformly...
|