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6806211 |
Device and method for processing substrate
A substrate processing apparatus consists of: a processing container; a first processing gas supply unit and a second processing gas supply unit, countering each other, prepared on both sides of a...
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6806199 |
Method for manufacturing silicon mirror wafer, silicon mirror wafer, and heat treatment furnace
There are provided a manufacturing process for a mirror finished silicon wafer capable of manufacturing a mirror finished silicon wafer, having an excellent quality in which grown-in crystal...
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6802906 |
Emissivity-change-free pumping plate kit in a single wafer chamber
An apparatus that includes a pumping plate having a skirt, where the skirt contains a number of holes and a wafer access slot, and where the number of holes are sized and positioned to provide...
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6803325 |
Apparatus for improving barrier layer adhesion to HDP-FSG thin films
A method of formation of a damascene FSG film with good adhesion to silicon nitride in an HDP-CVD system. Silane (SiH 4 ), silicon tetrafluoride (SiF 4 ), oxygen (O 2 ) and argon (Ar) are used as...
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6800833 |
Electromagnetically levitated substrate support
An apparatus for supporting a substrate and a method for positioning a substrate include a substrate support, a stator circumscribing the substrate support, and an actuator. The actuator is coupled...
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6799603 |
Gas flow controller system
A gas flow controller system includes a support structure and a gas manifold and gas manifold inlet valve located at the support structure. The gas manifold is coupled to one or more injector ports...
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6800139 |
Film deposition apparatus and method
A film deposition apparatus ( 2 ) forms a PZT film at a high deposition rate under a low temperature by using a single showerhead ( 50 ) throughout the deposition process. Process gases including a...
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6797108 |
Apparatus and method for evenly flowing processing gas onto a semiconductor wafer
A semiconductor processing apparatus with a chamber, a wafer holder and a processing gas inlet pipe is provided with an impeller fixed within the inlet pipe. As gas flows through slots in the...
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6797639 |
Dielectric etch chamber with expanded process window
A capacitively coupled reactor for plasma etch processing of substrates at subatmospheric pressures includes a chamber body defining a processing volume, a lid provided upon the chamber body, the...
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6793734 |
Heating furnace and semiconductor wafer-holding jig assembly and process of manufacturing semiconductor devices
An assembly of heating furnace and semiconductor wafer-holding jig. This assembly includes a furnace body made of refractory or heat insulting material; a heater disposed around the inner side...
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6794291 |
Reactor for processing a semiconductor wafer
An apparatus for processing a semiconductor wafer or similar article includes a reactor having a processing chamber formed by upper and lower rotors. The wafer is supported between the rotors. The...
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6794308 |
Method for reducing by-product deposition in wafer processing equipment
A method of reducing by-product deposition inside wafer processing equipment includes providing a chamber having a peripheral inner wall and placing a semiconductor wafer within the chamber. The...
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6789498 |
Elements having erosion resistance
A component of a plasma reactor chamber for processing a semiconductor workpiece, the component being a monolithic ceramic piece formed from a mixture of yttrium aluminum perovskite (YAP) and...
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6786998 |
Wafer temperature control apparatus and method
An assembly for holding a substrate is provided. The substrate has a first surface, a second surface, opposite the first surface and an outer peripheral portion. The assembly includes a holding...
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6786973 |
Method for depositing in particular crystalline layers, gas-admission element and device for carrying out the method
The invention relates to a method and to a device for carrying out the method for depositing, in particular, crystalline layers on substrates that are also, in particular, crystalline. According to...
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6787010 |
Non-thermionic sputter material transport device, methods of use, and materials produced thereby
A sputter transport device comprises a sealed chamber, a negatively-biased target cathode holder disposed in the chamber, and a substrate holder disposed in the chamber and spaced at a distance...
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6786936 |
Methods, complexes, and systems for forming metal-containing films on semiconductor structures
A method of forming a film on a substrate using Group IVB, VB, or VIB metal complexes. The methods are particularly suitable for the preparation of semiconductor structures using chemical vapor...
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6786997 |
Plasma processing apparatus
A chemical vapor reaction processing apparatus including a reaction chamber; a power source; a source of a reactive film forming gas; a device for inputting the reactive film forming gas into the...
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6782907 |
Gas recirculation flow control method and apparatus for use in vacuum system
A gas recirculation flow control method and apparatus for use in an evacuation system having a vacuum chamber into which a gas is introduced, a first vacuum pump for exhausting the gas from the...
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6776875 |
Semiconductor substrate support assembly having lobed o-rings therein
A semiconductor wafer processing substrate support assembly, comprises a substrate support platform having a centrally disposed recess, coupled to a base disposed above the centrally disposed...
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6776850 |
Preventative maintenance aided tool for CVD chamber
A preventive maintenance tool which may be installed on a metal chemical vapor deposition (CVD) chamber to prevent escape of contaminating and toxic gases from the chamber interior during...
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6777352 |
Variable flow deposition apparatus and method in semiconductor substrate processing
In one embodiment of the present inventions, an exhaust outlet in a vacuum processing chamber includes a nonsealing flow restrictor which can facilitate rapid opening and closing of the flow...
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6770143 |
Method for annealing a semiconductor
A method for manufacturing a semiconductor device including preparing a multi-chamber system having at least first and second chambers, the first chamber for forming a film and the second chamber...
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6769629 |
Gas injector adapted for ALD process
A gas injector includes a body, a motor and a chopper. The body is mounted on a reaction chamber in a vertically extending cylinder shape and has a plurality of gas injection tubes and a central...
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6770145 |
Low-pressure CVD apparatus and method of manufacturing a thin film
An LPCVD apparatus comprising: a container for accommodating an organometallic compound which serves as a raw material; a heating means for heating the container and vaporizing the organometallic...
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6766818 |
Chemical concentration control device
A system and method for ensuring constant concentration ratios in multi-fluid mixtures used in wafer processing steps. In one aspect the invention is a method for supplying a multi-fluid mixture to...
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6767407 |
Auto-centering device for mechanical clamp
A substrate holding mechanism which is particularly adaptable to automatically centering a semiconductor wafer on a platen spider as the wafer is lowered from a wafer loading and unloading position...
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6767429 |
Vacuum processing apparatus
In a plasma CVD apparatus for applying a film deposition process to a semiconductor wafer (W), a wafer placement stage ( 3 ) is provided at a center of a vacuum chamber ( 2 ). The placement stage (...
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6761770 |
Atmospheric pressure wafer processing reactor having an internal pressure control system and method
An atmospheric pressure wafer processing system for delivering at least one gas is provided, having an exhaust control feedback system that utilizes sensors to measure the pressure within the...
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6758911 |
Apparatus and process of improving atomic layer deposition chamber performance
An apparatus and process for atomic layer deposition that minimizes mixing of the chemicals and reactive gases is disclosed. The first precursor and second precursor are only mixed with other...
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6758910 |
Apparatus and method for sulfonating an article and articles made therefrom
Apparatuses, methods and articles made therefrom include the use of an on-site and on-demand gas generator for preparation of sulfonating gas to be mixed with dry air to treat surfaces of polymeric...
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6758909 |
Gas port sealing for CVD/CVI furnace hearth plates
A method and apparatus for sealing gas ports in CVD/CVI furnaces and processes is disclosed. A fluid direction nozzle ( 160 ) is positioned between a top lip ( 101 ) of a gas inlet port ( 100 )...
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6753268 |
Reduced particulate etching
A platen for use in a dry etching process for substrate production, the platen having a surface susceptible to chipping and/or particle generation from the dry etching process and a coating applied...
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6752874 |
Apparatus for perpendicular-type ultra vacuum chemical vapor deposition
The apparatus for a perpendicular type ultra vacuum chemical vapor deposition, which is for growing an epitaxy crystal as a semiconductor thin film based on a high quality, includes a growth...
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6746539 |
Scanning deposition head for depositing particles on a wafer
A deposition chamber is formed in a housing that has a substrate carrier on the interior. The substrate carrier is rotatable about a central axis, and a particle deposition head is mounted in the...
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6743736 |
Reactive gaseous deposition precursor feed apparatus
The invention includes reactive gaseous deposition precursor feed apparatus and chemical vapor deposition methods. In one implementation, a reactive gaseous deposition precursor feed apparatus...
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6740167 |
Device for mounting a substrate and method for producing an insert for a susceptor
A device for mounting a substrate includes a susceptor as a support for the substrate to be coated. The susceptor includes an insert whose surface is at least partly formed by a metal carbide layer...
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6740195 |
Detection of nontransient processing anomalies in vacuum manufacturing process
A sensor, such as a mass spectrometer, capable of detecting the presence of materials in a sampled gas is interconnected with a processing chamber of a vacuum manufacturing tool. The sensor...
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6740166 |
Thin film deposition apparatus for semiconductor
A semiconductor thin film deposition apparatus having at least one reactor in which a wafer is received, a gas supply portion for supplying a reaction gas or inert gas to the reactor, and an...
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6740586 |
Vapor delivery system for solid precursors and method of using same
A vaporizer delivery system including a sublimatable solid precursor material applied to a wire substrate for vaporizing and achieving a continuous uninterrupted delivery of a vaporized precursor...
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6739360 |
Liner for use in processing chamber
A container for use in a processing chamber to lessen the amount of contaminant particles found within the chamber after processing. The container fits closely within the chamber and includes ports...
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6733591 |
Method and apparatus for producing group-III nitrides
The subject invention pertains to a method and device for producing large area single crystalline III-V nitride compound semiconductor substrates with a composition Al x In y Ga 1-x-y N (where...
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6734037 |
Method and device for producing solar cells
The present invention concerns a process for fabricating a solar cell, wherein material is deposited on a multicrystalline silicon substrate and passivation is performed by means of hydrogen...
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6733621 |
Venting apparatus and method for vacuum system
A method and apparatus comprising a purge conduit and vent conduit attached to a turbo pump of a plasma etch chamber. The purge conduit may communicate with atmospheric air or with a nitrogen...
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6733620 |
Process apparatus
The present invention provides a process apparatus including an airtight process vessel, an exhaust system for exhausting gas from the process vessel, and a baffle plate for partitioning the...
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6733592 |
High-temperature and high-pressure treatment device
The present invention has an object to obtain a small-size, high-temperature and high-pressure treatment device adapted to treat semiconductor wafers. The high-temperature and high-pressure device...
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6730174 |
Unitary removable shield assembly
An apparatus for replacing consumables of a vacuum chamber. A unitary removable shield assembly is provided to quickly replace consumables such as a shield. The shield assembly can include an upper...
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6726767 |
Layer processing
Layer processing to grow a layer structure upon a substrate surface comprises supplying a vapor mixture stream to the substrate ( 28 ) to deposit constituents, monitoring growth with an...
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6726800 |
Ashing apparatus, ashing methods, and methods for manufacturing semiconductor devices
A method for manufacturing a semiconductor device in accordance with an embodiment of the present invention includes a step of forming a TiN film 2 on an underlying film 1 ; a step of coating a...
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6723201 |
Microchip fabrication chamber wafer detection
A microchip fabrication chamber has a pedestal adapted to retain a wafer during processing steps conducted within the chamber. A lift mechanism including a plurality of lift mechanism pins engages...
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