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6423946 |
Apparatus for and method of developing fingerprints
An apparatus for and method of developing fingerprints on an object by cyanoacrylate fuming. The apparatus includes a container having a chamber, an opening to the chamber and a mechanism for...
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6419752 |
Structuring device for processing a substrate
A structuring device (SD) for processing a surface of a substrate (SB), comprising a substrate chamber (VC) for mounting the substrate (SB) and a reaction chamber (GC) enabling a gas reaction at a...
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6416577 |
Method for coating inner surfaces of equipment
This invention concerns a method for coating the inner surfaces of equipment with a layer of material. According to the invention, of the inner space of the equipment limited by the surfaces to be...
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6416584 |
Apparatus for forming a film on a substrate
An apparatus for forming a film on a substrate includes a reaction chamber and gas supply lines. The gas supply lines supply gases for depositing and annealing the film. Depositing a dielectric...
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6416889 |
Anti-corrosion ceramic member
An anti-corrosion ceramic member having a substrate made of a ceramic material, a surface layer made of a fluoride and formed on the substrate, and an intermediate layer formed between the...
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6416579 |
Apparatus for treating silicon wafers
An apparatus for the chemical treatment of disc-shaped semiconduct or substrates comprises a fluid-tight treatment chamber, a carrier for holding a disc-shaped substrate in the chamber, and an...
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6417626 |
Immersed inductively—coupled plasma source
A plasma processing system having a plasma source that efficiently couple radiofrequency energy to a plasma within a vacuum processing space of a vacuum chamber. The plasma source comprises a...
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6410434 |
Method and apparatus for formation of in-situ doped amorphous semiconductor film
A LPCVD (Low Pressure Chemical Vapor Deposition) process is used for formation of a doped amorphous semiconductor film with in-situ doping of the semiconductor film on a plurality of semiconductor...
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6409838 |
Coating film formation apparatus and aging process apparatus
An apparatus for forming a coating film, comprises a coating unit for coating a sol containing dielectric particles and a first solvent on a substrate, an aging unit for changing a sol-state...
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6410089 |
Chemical vapor deposition of copper using profiled distribution of showerhead apertures
A showerhead used for dispensing gas over a wafer in chemical vapor deposition (CVD), especially for CVD of copper in a thermal process using a precursor such as HFAC-Cu-TMVS. The patterns of holes...
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6406543 |
Infra-red transparent thermal reactor cover member
A cover member for a semiconductor processing thermal reactor. The cover member has a central quartz window portion and an outer flange portion. The central window portion has either an inward bow...
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6407010 |
Single-substrate-heat-processing apparatus and method for semiconductor process
A single-substrate-heat-processing method performs a reformation process for a tantalum oxide film on a wafer and a crystallization process for this film in this order. In the reformation process...
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6406539 |
Process for producing silicon carbide single crystal and production apparatus therefor
A process for producing a silicon carbide single crystal and a production apparatus therefor which enable, under stable conditions, continuous production of a silicon carbide single crystal which...
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6402844 |
Substrate processing method and substrate processing unit
Process gas supply/stop operations are intermittently performed. As the hydrophobic process progresses, the temperature of a gas contract portion of a wafer lowers. While the hydrophobic process...
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6402848 |
Single-substrate-treating apparatus for semiconductor processing system
In an annealing apparatus for processing semiconductor wafers one by one, a hermetic process chamber has a work table having an upper surface on which a wafer is placed. A shower head is disposed...
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6402849 |
Process tube having slit type process gas injection portion and hole type waste gas exhaust portion, and apparatus for fabricating semiconductor device
A semiconductor device fabrication apparatus is provided for increasing the deposition rate of a film. The apparatus includes a process tube. Process gas injection portions in a slit configuration...
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6402847 |
Dry processing apparatus and dry processing method
A dry processing apparatus includes a lower electrode for holding a substrate to be processed in a chamber, a shower head, provided to face a surface of the lower electrode, on which the substrate...
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6395092 |
Apparatus for depositing high deposition rate halogen-doped silicon oxide layer
A silicon oxide film is deposited on a substrate by first introducing a process gas into a chamber. The process gas includes a gaseous source of silicon (such as silane), a gaseous source of...
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6395640 |
Apparatus and method for selectivity restricting process fluid flow in semiconductor processing
A semiconductor processing apparatus ( 10 ) is disclosed which includes a process chamber ( 12 ) and at least one substrate support ( 18 ) disposed within the process chamber ( 12 ) operable to...
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6391146 |
Erosion resistant gas energizer
An apparatus and method for reducing hazardous gases exhausted from a process chamber 25 includes an effluent gas treatment system 200 with a gas energizing reactor 210 with an erosion...
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6391116 |
Semiconductor device manufacturing apparatus and semiconductor device manufacturing method
In a semiconductor device manufacturing apparatus and a semiconductor device manufacturing method, a furnace tube port gas introducing pipe ( 9 ) for supplying gas to only one end portion of a...
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6382249 |
Vacuum exhaust system
A vacuum exhaust system comprising a vacuum chamber; means for introducing a gas into the vacuum chamber; a main pump for exhausting the vacuum chamber and reducing a pressure of the vacuum chamber...
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6383298 |
Method and apparatus for pressure measurement in a CVI/CVD furnace
An apparatus to determine the pressure within the furnace during thermal gradient forced flow processes as well as other CVI/CVD processes is disclosed. Further, a method to measure the pressure is...
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6379492 |
Corrosion resistant coating
A corrosion resistant part comprising a protective coating formed upon a component part. The protective coating comprises magnesium fluoride, which is substantially pure and substantially dense....
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6379466 |
Temperature controlled gas distribution plate
The temperature controlled gas distribution plate of the present invention includes a liquid cooling passage, with inlet and outlet ports, that is formed within the gas distribution plate. In the...
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6380081 |
Method of vaporizing liquid sources and apparatus therefor
A method and apparatus for vaporizing liquid source materials, where such vaporized source materials are supplied to a deposition tool such as Chemical Vapor Deposition (CVD) apparatus, and more...
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6375739 |
Apparatus and process for crystal growth
Apparatus for bulk vapor phase crystal growth comprising: at least one source zone and at least one sink zone each associated with means for independent temperature control within the zone; and at...
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6375748 |
Method and apparatus for preventing edge deposition
A substrate support having a removable edge ring, which is made of a material having a lower coefficient of thermal expansion (CTE), than that of the substrate support is provided. The edge ring...
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6375743 |
Method for improved chamber bake-out and cool-down
A method and apparatus for baking-out and for cooling a vacuum chamber are provided. In a first aspect, an inert gas which conducts heat from the vacuum chamber's bake-out lamps to the shield and...
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6375744 |
Sequential in-situ heating and deposition of halogen-doped silicon oxide
A low dielectric constant insulating film on a substrate is formed by introducing a process gas comprising a silicon source, a fluorine source, and oxygen into a chamber. The process gas is formed...
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6373159 |
Substrate rotating apparatus
A rotor is placed in a space communicating with a processing chamber. Stator-side constituent members of magnetic bearings and a stator-side constituent member of a motor are placed in a space...
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6371737 |
Conveying pumped gases in a vacuum pump or in pipes
A vacuum-generating device including at least one vacuum pump associated with a suction pipe and with a delivery pipe, at least a portion of the vacuum-generating device is separated from the...
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6368411 |
Molecular contamination control system
The system and method for molecular contamination control permits purging a SMIF pod to desired levels of relative humidity, oxygen, or particulates. The SMIF pod includes an inlet port including a...
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6368880 |
Barrier applications for aluminum planarization
The present invention provides an effective barrier layer for improved via fill in high aspect ratio sub-micron apertures at low temperature, particularly at the contact level on a substrate. In...
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6367410 |
Closed-loop dome thermal control apparatus for a semiconductor wafer processing system
A closed-loop, dome thermal control apparatus containing a high-volume fan, a heat exchange chamber, and an enclosure that encloses the fan and the heat exchange chamber. The fan blows air over a...
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6368451 |
High voltage feedthrough for non-thermal plasma reactor
High voltage feedthrough connectors provide a means for isolating high voltage through a reactor housing while providing thermal expansion tolerance along with ease of assembly. The connectors...
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6364954 |
High temperature chemical vapor deposition chamber
An apparatus for wafer processing, which comprises a chamber body and a heated liner which are thermally isolated from each other by isolating pins. During wafer processing, e.g., deposition of...
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6365013 |
Coating method and device
The invention relates to a coating process, particularly for coating a gas turbine blade ( 1 ) having cooling passageways ( 4 ) opening out onto the surface ( 2 ). During the coating operation, a...
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6365229 |
Surface treatment material deposition and recapture
A method and system for applying a surface treatment to an object. The system comprises: a source chamber ( 106 ) for holding a source of surface treatment material ( 102 ); a deposition chamber (...
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6364949 |
300 mm CVD chamber design for metal-organic thin film deposition
The present invention relates to plasma-enhanced chemical vapor deposition (PECVD) and related chamber hardware. Embodiments of the present invention include a PECVD system for depositing a film of...
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6361607 |
Apparatus for controlling polymerized teos build-up in vacuum pump lines
A TEOS trap for controlling TEOS polymerization from reaction furnace effluent in a vacuum pump line a SiO 2 CVD process includes a molecular species-selective flow impeding medium that adsorbs...
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6358323 |
Method and apparatus for improved control of process and purge material in a substrate processing system
A deposition system for performing chemical vapor deposition comprising deposition chamber having a lid and a vaporizer attached to the lid is provided. Additionally, one or more valves disposed...
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6354109 |
Process and apparatus for providing a film with a gradient
The subject of the invention is a glazing panel comprising a transparent substrate ( 1 ) especially one made of glass, provided with at least one functional, conductive and/or low-emissivity,...
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6355106 |
Deposition of copper with increased adhesion
A method and apparatus for improving the adhesion of a copper layer to an underlying layer on a wafer. The layer of copper is formed over a layer of material on a wafer and the copper layer...
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6354241 |
Heated electrostatic particle trap for in-situ vacuum line cleaning of a substrated processing
An apparatus and method for preventing particulate matter and residue build-up within a vacuum exhaust line of a semiconductor-processing device. The apparatus includes a vessel chamber having an...
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6352591 |
Methods and apparatus for shallow trench isolation
The present invention provides systems, methods and apparatus for high temperature (at least about 500-800° C.) processing of semiconductor wafers. The systems, methods and apparatus of the...
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6352592 |
Free floating shield and semiconductor processing system
A protective shield and a semiconductor processing system including a protective shield is provided. The shield includes a frame assembly including a pair of spaced end walls and a pair of side...
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6350320 |
Heater for processing chamber
A gas delivery apparatus and method for directing a flow of gas to the edge of a substrate at an angle to the radial direction of the substrate is provided. The apparatus directs the gas from a gas...
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6350319 |
Micro-environment reactor for processing a workpiece
An apparatus for processing a workpiece in a micro-environment is set forth. The apparatus includes a rotor motor and a workpiece housing. The workpiece housing is connected to be rotated by the...
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6347749 |
Semiconductor processing reactor controllable gas jet assembly
A gas jet assembly includes a gas injector having a longitudinal axis, a first motor coupled to the gas injector and a second motor coupled to the gas injector. The first motor controls a position...
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