|
Match
|
Document |
Document Title |
|
|
6562705 |
Method and apparatus for manufacturing semiconductor element
A laser heating apparatus for forming an electrode on one surface of an Si chip provided on an Si wafer, thereby producing a semiconductor element, comprises a high vacuum chamber having a light...
|
|
|
6561220 |
Apparatus and method for increasing throughput in fluid processing
A method and an apparatus, the apparatus including appropriate valves and conduits, for increasing throughput in pressurized fluid processing including storing in a storage chamber of the apparatus...
|
|
|
6554906 |
Wafer holder for semiconductor manufacturing apparatus and semiconductor manufacturing apparatus using the same
A wafer holder is configured of a pair of ceramic base members and conductive layers each posed between the ceramic base members. The conductive layer has a body facing a wafer and an extension...
|
|
|
6554954 |
Conductive collar surrounding semiconductor workpiece in plasma chamber
A plasma chamber apparatus and method having a process kit capable of reducing or eliminating electrical arcing from exposed metal at the perimeter of a workpiece. The plasma chamber includes a...
|
|
|
6551404 |
Apparatus for treating a wafer
An apparatus for treating a wafer manufactured from semiconducting material, the apparatus comprising a first and a second housing part arranged for movement away front and towards each other, the...
|
|
|
6549825 |
Alignment apparatus
An alignment apparatus which obtains an amount of correction for centering a semiconductor wafer from four points of a wafer edge detected by noncontact proprioceptors in a wafer delivery position...
|
|
|
6547885 |
Multipurpose draft shield apparatus
A draft shield apparatus having a longitudinal axis including: an open upper end section defining a substrate entry end, an open lower end section defining a substrate exit end, and a central...
|
|
|
6544339 |
Rectilinear wedge geometry for optimal process control in chemical vapor deposition and rapid thermal processing
A processing reactor for processing semiconductor substrates includes a reactor housing, which defines a processing chamber, and a platform which is rotatably supported in the reactor housing for...
|
|
|
6544341 |
System for fabricating a device on a substrate with a process gas
A method and system for fabricating a device on a substrate with a process gas, such as with chemical vapor deposition. A reaction chamber and support chuck cooperate to form a low conductance...
|
|
|
6544340 |
Heater with detachable ceramic top plate
A substrate support assembly for supporting a substrate during processing is provided. In one embodiment, a support assembly includes a support plate supported by a second plate. The support plate...
|
|
|
6539890 |
Multiple source deposition plasma apparatus
An apparatus for forming a film on a substrate includes a gas inlet and an insert attached to the gas inlet, the insert including a deposition source material such as lithium. To form the film on...
|
|
|
6540839 |
Apparatus and method to passivate magnets and magnetic materials
An apparatus and method is provided for uniformly coating a magnet having a plurality of surfaces and includes a reaction chamber having a port for introducing the magnet into the reaction chamber....
|
|
|
6540838 |
Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition
A new method and apparatus for avoiding contamination of films deposited in layered depositions, such as Atomic Layer Deposition (ALD) and other sequential chemical vapor deposition (CVD)...
|
|
|
6539891 |
Chemical deposition reactor and method of forming a thin film using the same
A chemical deposition reactor capable of switching rapidly from one process gas to another and method of forming a thin film using the same. The reactor of the present invention comprises: a...
|
|
|
6540837 |
Quartz wafer processing chamber
Described herein is a process chamber with a substantially all-quartz interior surface. The preferred embodiments have upper and lower walls being curved in both the x-z and y-z planes. In one...
|
|
|
6537924 |
Method of chemically growing a thin film in a gas phase on a silicon semiconductor substrate
A method of chemically growing a thin film in a gas phase using a rotary gaseous phase thin film growth apparatus which feeds a material gas by flowing down the gas from above to a surface of a...
|
|
|
6537418 |
Spatially uniform gas supply and pump configuration for large wafer diameters
A gas distribution plate ( 60 ) for a semiconductor processing chamber ( 86 ) includes a gas distribution plate for distributing gases across a surface of a semiconductor wafer ( 84 ) to be...
|
|
|
6533868 |
Deposition apparatus
This invention relates to an apparatus for depositing a layer of material on to a workpiece. The apparatus includes chamber 11, a sputter target 12, a wafer support 13, wafer transport...
|
|
|
6533867 |
Surface sealing showerhead for vapor deposition reactor having integrated flow diverters
The present invention relates to an improved structure of the “showerhead used to introduce gaseous source material into a vapor deposition reactor such as a metal-organic chemical vapor...
|
|
|
6530992 |
Method of forming a film in a chamber and positioning a substitute in a chamber
Methods and apparatuses of forming a film on a substrate including introducing a pretreatment material into a processing chamber sufficient to form a film as a portion of an inner surface of the...
|
|
|
6528435 |
Plasma processing
An apparatus and method for depositing a thin film on a semiconductor substrate. The apparatus includes a chamber or housing suited for holding a plurality of wafer platforms. The wafer platforms...
|
|
|
6527865 |
Temperature controlled gas feedthrough
The invention relates to an apparatus and process for the vaporization of liquid precursors and deposition of a film on a suitable substrate. In one aspect, an apparatus and process for the control...
|
|
|
6528395 |
Method of fabricating compound semiconductor device and apparatus for fabricating compound semiconductor device
A method of fabricating a compound semiconductor device having an ohmic electrode of a low contact potential includes a first cleaning step of heating a compound semiconductor substrate containing...
|
|
|
6521042 |
Semiconductor growth method
Molecular beam epitaxy ( 202 ) with growing layer thickness control ( 206 ) by feedback of mass spectrometer ( 204 ) signals based on a process model. Examples include III-V compound structures...
|
|
|
6521046 |
Chamber material made of Al alloy and heater block
A chamber material made of Al alloy excellent in thermal cracking resistance and chemical and/or physical corrosion resistance and capable of reducing contamination excellently and further having...
|
|
|
6517634 |
Chemical vapor deposition chamber lid assembly
A semiconductor substrate processing chamber is disclosed generally comprising a chamber body that has a semiconductor substrate support assembly disposed in the chamber body. A lid assembly is...
|
|
|
6514348 |
Substrate processing apparatus
A substrate processing apparatus processes a substrate introduced into a chamber under a low pressure. The substrate processing apparatus comprises a vacuum pump for evacuating a chamber and a gas...
|
|
|
6513452 |
Adjusting DC bias voltage in plasma chamber
A method of adjusting the cathode DC bias in a plasma chamber for fabricating semiconductor devices. A dielectric shield is positioned between the plasma and a selected portion of the electrically...
|
|
|
6508913 |
Gas distribution apparatus for semiconductor processing
A gas distribution system for processing a semiconductor substrate includes a plurality of gas supplies, a mixing manifold wherein gas from the plurality of gas supplies is mixed together, a...
|
|
|
6508197 |
Apparatus for dispensing gas for fabricating substrates
A method and system for fabricating a device on a substrate with a process gas, such as with chemical vapor deposition. A reaction chamber and support chuck cooperate to form a low conductance...
|
|
|
6506312 |
Vapor deposition chamber components and methods of making the same
The present invention provides a method of reducing or delaying the exfoliation of deposited films within a vapor deposition system. The method of preventing the delamination of thin films...
|
|
|
6506255 |
Apparatus for supplying gas used in semiconductor processing
A method and apparatus for uniformly supplying a gas into a chamber through a dispersion head. The gas is introduced through an inlet of the dispersion head, and flows in a flow direction toward a...
|
|
|
6506253 |
Photo-excited gas processing apparatus for semiconductor process
A CVD apparatus includes a process chamber connected to a process chamber through a connection path. A window made of a light transmission material is disposed in a wall that defines the excitation...
|
|
|
6503362 |
Atomizing nozzle an filter and spray generating device
A nozzle assembly for use in atomizing and generating sprays from a fluid. The nozzle assembly includes two members, each with generally planar surfaces, that are joined together. A first set of...
|
|
|
6503562 |
Semiconductor fabrication apparatus and fabrication method thereof
An epitaxial growth system is provided with a susceptor driving mechanism for rotationally driving a susceptor in a process chamber and this susceptor driving mechanism has a support shaft coupled...
|
|
|
6500266 |
Heater temperature uniformity qualification tool
An apparatus of a reactor or processing chamber comprising a chamber having a resistive heater disposed within a volume of the chamber, including a stage having a surface area to support a...
|
|
|
6500263 |
Semiconductor substrate processing chamber having interchangeable lids actuating plural gas interlock levels
Multiple levels of interlocks are provided relative to gas flow for a chemical vapor deposition chamber. When a chamber lid used for normal processing is in place, no interlock is in effect. When a...
|
|
|
6499973 |
Turbo molecular pump
A turbo molecular pump comprises a pump body having a vacuum chamber, a gas inlet port and a gas outlet port. A rotor shaft is mounted in the pump body for undergoing rotation. A rotor vane section...
|
|
|
6499426 |
System and method for coating non-planar surfaces of objects with diamond film
A system and method for depositing a CVD diamond coating on a non-planar surface of an object is provided. The system includes a deflector having a deflecting surface which resists diamond coating...
|
|
|
6498104 |
Method of in-situ cleaning for LPCVD TEOS pump
In one embodiment, the present invention relates to a method of cleaning a low pressure chemical vapor deposition apparatus having TEOS material build-up therein involving contacting the low...
|
|
|
6494955 |
Ceramic substrate support
A substrate support assembly for supporting a substrate during processing is provided. In one embodiment, a support assembly includes a top ceramic plate having a first side, a bottom ceramic plate...
|
|
|
6495233 |
Apparatus for distributing gases in a chemical vapor deposition system
A lid assembly for a semiconductor processing apparatus having at least two chambers comprises a lid plate having a first side and a second side and a plasma generation source mounted to the first...
|
|
|
6491758 |
CVD apparatus equipped with moisture monitoring
A CVD apparatus is able to efficiently perform purging treatment after maintenance by using for the purge gas a mixed gas of a high thermal conductivity and an inert gas. Purging treatment before...
|
|
|
6488775 |
Semiconductor-manufacturing device
A batch-processing type semiconductor-manufacturing device includes a cylindrical reaction chamber with its upper end closed and its bottom end open, a substrate-supporting boat loading multiple...
|
|
|
6488776 |
Method and apparatus for forming insitu boron doped polycrystalline and amorphous silicon films
A method and apparatus for depositing a boron insitu doped amorphous or polycrystalline silicon film on a substrate. According to the present invention, a substrate is placed into deposition...
|
|
|
6488774 |
Trap apparatus
A trap apparatus is optimum for trapping a material gas discharged from a vapor deposition apparatus for depositing in a vapor phase thin films of high-dielectric or ferroelectric such as...
|
|
|
6485565 |
Process and apparatus for making oriented crystal layers
Thin films of single crystal-like materials are made by using flow-through ion beam deposition during specific substrate rotation around an axis in a clocking action. The substrate is quickly...
|
|
|
6482266 |
Metal organic chemical vapor deposition method and apparatus
In a metal organic chemical vapor deposition method, a parameter convertible into the number of moles of gas of an organometallic source supplied from at least one source vessel is detected. A...
|
|
|
6481368 |
Device and a method for heat treatment of an object in a susceptor
A device for heat treatment of an object comprises a susceptor ( 9 ) having walls ( 10 ) surrounding an inner room ( 11 ) adapted to receive the object and Rf-field radiating means ( 12, 15 )...
|
|
|
6478875 |
Method and apparatus for determining process-induced stresses and elastic modulus of coatings by in-situ measurement
An apparatus for performing in-situ curvature measurement of a substrate during a deposition process is provided which includes a clamp for retaining the substrate near one end while leaving the...
|