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7553375 |
Fabrication of functional device mounting board making use of inkjet technique
An apparatus for fabricating a functional device mounting board comprises a holder for holding a substrate on which functional devices are to be formed, a jet head for ejecting a droplet containing...
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7534298 |
Apparatus and method of detecting the electroless deposition endpoint
An apparatus and a method of controlling an electroless deposition process by directing electromagnetic radiation towards the surface of a substrate and detecting the change in intensity of the...
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7410541 |
Roll coater assembly system
A roll coater assembly system for application of a fluid material having a transport system with a part loading system, an application system, and a curing system for curing the material applied....
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7399364 |
Hermetic cap layers formed on low-κ films by plasma enhanced chemical vapor deposition
A method of forming a cap layer over a dielecrtic layer on a substrate including forming a plasma from a process gas including oxygen and tetraethoxysilane, and depositing the cap layer on the...
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7396414 |
Apparatus for simultaneously coating and measuring parts
A method and apparatus for simultaneously coating and measuring a part. The apparatus includes a part support, a sprayer and a part measurer positioned adjacent to the part support and a display...
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7347900 |
Chemical vapor deposition apparatus and method
A chemical vapor deposition (CVD) apparatus includes a process chamber where a deposition process is performed on a wafer. A gas supply assembly is mounted in the process chamber for supplying a...
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7335266 |
Method of forming a controlled and uniform lightly phosphorous doped silicon film
Method of forming a lightly phosphorous doped silicon film. A substrate is provided. A process gas comprising a phosphorous source gas and a disilane gas is used to form a lightly phosphorous doped...
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7309395 |
System for forming composite polymer dielectric film
A system for depositing a composite polymer dielectric film on a substrate is disclosed, wherein the composite polymer dielectric film includes a low dielectric constant polymer layer disposed...
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7294205 |
Method for reducing the intrinsic stress of high density plasma films
A layer of reduced stress is formed on a substrate using an HDP-CVD system by delaying or interrupting the application of capacitively coupled RF energy. The layer is formed by introducing a...
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7294204 |
Apparatus for painting traffic marks on road surface
An apparatus for painting traffic marks on a road surface without requiring any professional painting skills. The apparatus having: a first support and second support being parallel to each other...
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7258894 |
Apparatus and method for dispensing liquid crystal material
A liquid crystal material dispensing apparatus includes a spacer height measuring unit for measuring a height of a spacer on a substrate, and a liquid crystal material dispensing system for...
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7252715 |
System for dispensing liquids
The present invention provides a system to dispense a liquid, contained in a cartridge, onto a substrate employing a dispensing system under control of a processor in data communication with a memory.
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7205240 |
HDP-CVD multistep gapfill process
A gapfill process is provided using cycling of HDP-CVD deposition, etching, and deposition step. The fluent gas during the first deposition step includes an inert gas such as He, but includes H 2 ...
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7192486 |
Clog-resistant gas delivery system
Processing gases reactive with each other are provided in parallel to a processing chamber through separate delivery lines including mass flow controllers devoted to each line. The parallel...
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7139641 |
Wafer protection system
A system for protecting wafers from damage caused by an inaccurately-positioned wafer transfer robot blade during the transfer of wafers typically from a wafer cassette to a processing tool. The...
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7113253 |
Method, apparatus and computer product for substrate processing
A method, apparatus and computer product for processing of substrates in at least a part of a substrate processing system is provided. In an embodiment, the method includes obtaining, using a...
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7108751 |
Method and apparatus for determining consumable lifetime
A plasma processing device comprising a gas injection system is described, wherein the gas injection system comprises a gas injection assembly body, a consumable gas inject plate coupled to the gas...
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7052552 |
Gas chemistry cycling to achieve high aspect ratio gapfill with HDP-CVD
A method and apparatus are disclosed for depositing a dielectric film in a gap having an aspect ratio at least as large as 6:1. By cycling the gas chemistry of a high-density-plasma...
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7014715 |
Photoresist supply apparatus and method of controlling the operation thereof
A photoresist supply apparatus of semiconductor coating equipment fills a supply pipe with new photoresist when a used photoresist bottle is replaced. The photoresist supply apparatus includes...
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6977013 |
Powder coating system central controller
A central controller for a powder coating system has a single processor connected to a memory, a gun controller input/output device and gun control logic for controlling a characteristic of a spray...
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6960264 |
Process for fabricating films of uniform properties on semiconductor devices
A process for forming a thin layer exhibiting a substantially uniform property on an active surface of a semiconductor substrate. The process includes varying the temperature within a reaction...
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6949142 |
Device for controlling a surface treatment installation in automotive industry
A system comprising at least a multiaxial machine, each axis being equipped with motor means, provided with a sprayer and corresponding sensor and actuator, is provided. Said system comprises a...
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6942736 |
Automatically controlled flow applicator
A system allows for accurate manual application of a fluid material in a linear pattern to a surface from a container holding the fluid. The system may comprise a container holding a fluid, the...
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6916380 |
System for depositing a layered film
The present invention relates to an electrically conductive film stack for semiconductors and methods and apparatus for providing same. A film stack comprising a first layer of a platinum-rhodium...
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6899763 |
Lid cooling mechanism and method for optimized deposition of low-K dielectric using TR methylsilane-ozone based processes
An apparatus and method for depositing thin films. The apparatus generally comprises a process chamber having one or more walls and a lid and two heat exchangers. A first heat exchanger is coupled...
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6868869 |
Sub-atmospheric pressure delivery of liquids, solids and low vapor pressure gases
A delivery system and method for vaporizing and delivery of vaporized solid and liquid precursor materials at sub-atmospheric pressures between a heatable vaporization vessel and a processing tool....
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6837938 |
Apparatus associatable with a deposition chamber to enhance uniformity of properties of material layers formed on semiconductor substrates therein
An apparatus for use with a deposition chamber includes a temperature control system that communicates with a heating element of the deposition chamber so as to not cause the formation of a thin...
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6830774 |
Coating method
A processing solution is supplied from processing-solution suppliers onto the surfaces of targets to be processed while a flow rate of the processing solution is being adjusted. The processing...
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6830643 |
Method of manufacturing an item and apparatus for manufacturing an item
A method of manufacturing an item comprises the steps of: controlling a printer means to print a layer of retaining material in a predetermined pattern onto a substrate; applying a manufacturing...
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6827779 |
Selective mass transfer hoist
A mass transfer system offers the simultaneous transfer and time-saving efficiencies transfer techniques, while also offering the flexibility of prior-art free techniques. A mass transfer mechanism...
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6803325 |
Apparatus for improving barrier layer adhesion to HDP-FSG thin films
A method of formation of a damascene FSG film with good adhesion to silicon nitride in an HDP-CVD system. Silane (SiH 4 ), silicon tetrafluoride (SiF 4 ), oxygen (O 2 ) and argon (Ar) are used as...
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6799910 |
Processing method and processing apparatus
After the first workpieces have been processed in the first process portion while the second workpieces are being processed in the second process portion, the first process portion in which the...
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6790283 |
Coating apparatus
A processing solution is supplied from processing-solution suppliers onto the surfaces of targets to be processed while a flow rate of the processing solution is being adjusted. The processing...
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6758908 |
Solvent prewet and method and apparatus to dispense the solvent prewet
A method and apparatus is provided for more efficient application of photoresist to a wafer surface. One aspect of the method comprises applying solvent to the wafer and spinning it to coat the...
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6753272 |
High-performance energy transfer method for thermal processing applications
An apparatus and method supports thermal processing of a microelectronic device such as a semiconductor chip in a substrate by heating the substrate with secondary radiation from an energy transfer...
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6749689 |
Controlled reciprocating machine and method
A reciprocating coating system for coating objects. The reciprocating coating system includes a computer controller for controlling the motion of a coating device, and to allow configuration of...
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6706118 |
Apparatus and method of using motion control to improve coatweight uniformity in intermittent coaters in an inkjet printer
A coating apparatus for applying a coating liquid to a printing substrate. The apparatus includes a rotatable first roll, and a rotatable second roll positioned adjacent to the first roll and...
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6692573 |
Automated pitch button dispensing station and method
The present invention provides a work station and method for applying a blocking material such as pitch or the like to a selected location on a workpiece or workpieces, wherein the work station...
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6682601 |
Electronic fluid dispenser
A programmable electronic fluid dispenser with computer controlled direct drives of a motor, connecting rod, and attached piston in a yringe is used to dispense accurate quantities of liquids with...
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6610151 |
Seed layers for interconnects and methods and apparatus for their fabrication
An apparatus for depositing seed layers from a group of Cu, Ag or an alloy thereof on a substrate having narrow openings surrounded by a filed; the apparatus comprising a controller, said...
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6562139 |
Computer controlled apparatus for fairing and painting of marine vessel surfaces
An apparatus for finishing marine vessel surfaces including track-mounted robots, movable relative to the vessel being finished. The robots are controlled by a computer, with each robot having a...
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6530992 |
Method of forming a film in a chamber and positioning a substitute in a chamber
Methods and apparatuses of forming a film on a substrate including introducing a pretreatment material into a processing chamber sufficient to form a film as a portion of an inner surface of the...
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6514345 |
Processing apparatus and managing method of operational condition parameter thereof
A semiconductor manufacturing apparatus is improved so that apparatus operating condition parameters can be restored to setting values of various levels such as standard, apparatus delivery time or...
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6511544 |
Control system for use when growing thin-films on semiconductor-based materials
A process and system for use during the growth of a thin film upon the surface of a substrate by exposing the substrate surface ti vaporized material in a high vacuum (HV) facility involves the...
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6500266 |
Heater temperature uniformity qualification tool
An apparatus of a reactor or processing chamber comprising a chamber having a resistive heater disposed within a volume of the chamber, including a stage having a surface area to support a...
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6478875 |
Method and apparatus for determining process-induced stresses and elastic modulus of coatings by in-situ measurement
An apparatus for performing in-situ curvature measurement of a substrate during a deposition process is provided which includes a clamp for retaining the substrate near one end while leaving the...
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6440218 |
Coating solution applying method and apparatus
An apparatus for applying a coating solution to a surface of a substrate to form a coating film of desired thickness thereon. The apparatus includes a rotary supporting device for supporting and...
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6375744 |
Sequential in-situ heating and deposition of halogen-doped silicon oxide
A low dielectric constant insulating film on a substrate is formed by introducing a process gas comprising a silicon source, a fluorine source, and oxygen into a chamber. The process gas is formed...
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6375743 |
Method for improved chamber bake-out and cool-down
A method and apparatus for baking-out and for cooling a vacuum chamber are provided. In a first aspect, an inert gas which conducts heat from the vacuum chamber's bake-out lamps to the shield and...
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6374770 |
Apparatus for improving film stability of halogen-doped silicon oxide films
A chemical vapor deposition system that includes a housing configured to form a processing chamber, a substrate holder configured to hold a substrate within the processing chamber, a gas...
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