|
Match
|
Document |
Document Title |
|
|
7628862 |
Treating solution supply nozzle, a substrate treating apparatus having this nozzle, and a method of manufacturing a treating solution supply nozzle
A resin block has a treating solution channel extending between and opening at front and back surfaces thereof. Heat conductive members are face-bonded to the front and back surfaces of the resin...
|
|
|
7628861 |
Pulsed mass flow delivery system and method
A system for delivering pulses of a desired mass of gas, including a chamber, a first valve controlling flow into the chamber, a second valve controlling flow out of the chamber. A controller is...
|
|
|
7628860 |
Pulsed mass flow delivery system and method
A system for delivering a desired mass of gas, including a chamber, a first valve controlling flow into the chamber, a second valve controlling flow out of the chamber, a pressure transducer...
|
|
|
7622017 |
Processing apparatus and gas discharge suppressing member
A processing apparatus for performing a process on a surface of an object to be processed by applying a high frequency power to an electrode installed in an airtight processing chamber to convert a...
|
|
|
7615120 |
Pulsed mass flow delivery system and method
A system for delivering a desired mass of gas, including a chamber, a first valve controlling flow into the chamber, a second valve controlling flow out of the chamber, a pressure transducer...
|
|
|
7575639 |
Apparatus and method for processing sheet materials
An apparatus and method for processing elongated sheet material through a plurality of processing stations including a cooling station for lowering the temperature of the sheet material. The...
|
|
|
7566368 |
Method and apparatus for an improved upper electrode plate in a plasma processing system
The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate coupled to an upper assembly advantageously...
|
|
|
7565879 |
Plasma processing apparatus
A plasma processing apparatus having a plasma generating unit, a process chamber including an outer cylinder for withstanding a reduced pressure, and an inner cylinder made of non-magnetic material...
|
|
|
7540923 |
Shower head structure for processing semiconductor
A shower head structure disposed in a device 2 for processing a semiconductor while supplying processing gas to a processing space S for storing a heated processed substrate W, comprising a...
|
|
|
7540922 |
Thin film forming apparatus
When a solution sprayed by a spray nozzle portion reaches one surface portion of a substrate, a thin film forming material contained the solution decomposes thermally because the substrate is...
|
|
|
7531061 |
Gas temperature control for a plasma process
A method and system for controlling the temperatures of at least one gas in a plasma processing environment prior to the at least one gas entering a process chamber. This temperature control may...
|
|
|
7527827 |
Substrate processing apparatus and substrate processing method
A method for performing a predetermined process on a substrate having coating film formed thereon includes preparing a data base denoting a relationship between each of parameters and a processing...
|
|
|
7520936 |
Hardening processing apparatus, hardening processing method, and coating film forming apparatus
The present invention is a hardening processing apparatus for heating a substrate coated with a coating solution to harden the coating film on the substrate, which includes a first processing...
|
|
|
7465358 |
Measurement techniques for controlling aspects of a electroless deposition process
Embodiments of the invention generally provide a fluid processing chamber, sensors and a controller and method for using the same. The fluid processing chamber includes an inlet region, a...
|
|
|
7332036 |
Thermal projection device
The invention relates to a device and a method for control of the operation of a thermal projection torch ( 12 ), characterized in that the characteristics of the jet ( 16 ) and the temperature of...
|
|
|
7323061 |
Thermal spraying instrument
The invention relates to a device and method for controlling the operation of a thermal spray torch ( 12 ). The inventive device and method are characterised in that an on-board camera ( 54 ) and...
|
|
|
7318867 |
Producing cover layers in optical discs
Techniques for a cover layer with uniform thickness are disclosed. The cover layer is formed with a type of material, such as glue, in hardened form. In one embodiment, a certain amount of the...
|
|
|
7267723 |
Treating solution supply nozzle, a substrate treating apparatus having this nozzle, and a method of manufacturing a treating solution supply nozzle
A resin block has a treating solution channel extending between and opening at front and back surfaces thereof. Heat conductive members are face-bonded to the front and back surfaces of the resin...
|
|
|
7258892 |
Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition
The present disclosure provides methods and systems for controlling temperature. The method has particular utility in connection with controlling temperature in a deposition process, e.g., in...
|
|
|
7255747 |
Coat/develop module with independent stations
An apparatus for dispensing fluid during semiconductor substrate processing operations. The apparatus includes a first processing chamber, a second processing chamber, and a dispense arm assembly....
|
|
|
7204885 |
Deposition system to provide preheating of chemical vapor deposition precursors
Chemical vapor deposition systems include elements to preheat reactant gases prior to reacting the gases to form layers of a material on a substrate, which provides devices and systems with...
|
|
|
7203565 |
Temperature abnormality detection method and semiconductor manufacturing apparatus
A semiconductor manufacturing apparatus includes: a hot plate that heats an article to be processed; a temperature control section that controls temperature of the hot plate; a main body control...
|
|
|
7192486 |
Clog-resistant gas delivery system
Processing gases reactive with each other are provided in parallel to a processing chamber through separate delivery lines including mass flow controllers devoted to each line. The parallel...
|
|
|
7179663 |
CDA controller and method for stabilizing dome temperature
A domed plasma reactor chamber uses an antenna driven by RF energy which is inductively coupled inside the reactor dome. The antenna generates a high density, low energy plasma inside the chamber...
|
|
|
7166168 |
Substrate-coating system and an associated substrate-heating method
A substrate-coating system and an associated substrate-heating method, wherein the substrate-coating system is equipped with a substrate holder ( 1, 2 ) for holding at least one substrate at a...
|
|
|
7141274 |
Substrate processing apparatus and method
A substrate processing apparatus and method which employs the so-called batch processing method of processing a plurality of substrates simultaneously, thereby increasing the throughput, and which...
|
|
|
7090727 |
Heated gas line body feedthrough for vapor and gas delivery systems and methods for employing same
A feedthrough device for use in deposition chambers such as chemical vapor deposition chambers and atomic layer deposition chambers and methods using the same in association with such chambers as...
|
|
|
7087119 |
Atomic layer deposition with point of use generated reactive gas species
An apparatus for atomic layer deposition preventing mixing of a precursor gas and an input gas. From the apparatus a flow of the input gas is provided over a surface of the workpiece wherein a beam...
|
|
|
6967177 |
Temperature control system
An apparatus for controlling the substrate temperature of a substrate during processing of the substrate at a process energy. A chuck temperature input receives temperature measurements from...
|
|
|
6960264 |
Process for fabricating films of uniform properties on semiconductor devices
A process for forming a thin layer exhibiting a substantially uniform property on an active surface of a semiconductor substrate. The process includes varying the temperature within a reaction...
|
|
|
6911089 |
System and method for coating a work piece
A method and apparatus for coating a work piece. The system comprising an applicator adapted to travel over a portion of the work piece. The system being operable to heat the work piece and/or...
|
|
|
6902622 |
Systems and methods for epitaxially depositing films on a semiconductor substrate
Systems and methods for epitaxial deposition. The reactor includes a hot wall process cavity enclosed by a heater system, a thermal insulation system, and chamber walls. The walls of the process...
|
|
|
6886618 |
System for catalyzation of thermoset resin adhesives for wood composites using computerized in-line metering and mixing equipment
The present invention provides a process and system for the manufacture of wood-based composites that implement feedback adjusted in-line addition of a curing accelerator/catalyst to a...
|
|
|
6878232 |
Method and apparatus for improving a temperature controlled solution delivery process
A method and apparatus for improving an operating efficiency for a process including temperature dependent fluid delivery including determining a projected time period to start a process during a...
|
|
|
6858084 |
Plating apparatus and method
The present invention relates to an electroless plating apparatus which can reduce an amount of a plating liquid to be used, maintain a stable plating process, be downsized, reduce an apparatus...
|
|
|
6843069 |
Etching apparatus
An etching apparatus of the present invention has a processing device having a reaction chamber in which an electrode provided with a built-in refrigerant-circulating path is installed, a...
|
|
|
6838127 |
Method and apparatus for forming an HSG-Si layer on a wafer
An HSG-Si layer is formed on a wafer under a uniform temperature condition. An apparatus for forming the HSG-Si layer includes a housing forming a process chamber, a first heater on which the wafer...
|
|
|
6837938 |
Apparatus associatable with a deposition chamber to enhance uniformity of properties of material layers formed on semiconductor substrates therein
An apparatus for use with a deposition chamber includes a temperature control system that communicates with a heating element of the deposition chamber so as to not cause the formation of a thin...
|
|
|
6814809 |
Coating and developing apparatus and pattern forming method
A coating and developing apparatus has an interface section equipped with a temperature adjuster (a cooling unit). A temperature-raised substrate due to exposure on periphery of the substrate...
|
|
|
6790783 |
Semiconductor fabrication apparatus
Methods and apparatus for fabricating and cleaning in-process semi-conductor wafers are provided. An in-process wafer is placed within a closed chamber. A reactant gas is incorporated in a liquid...
|
|
|
6756074 |
Methods for the deposition and curing of coating compositions
Systems and methods for creating a combinatorial coating library including a coating system operatively coupled to at least one of a plurality of materials suitable for forming at least one coating...
|
|
|
6736901 |
Vertical chemical vapor deposition system
A susceptor is arranged in a reaction chamber, and an induction heating coil is arranged at a lower side of the susceptor. A ceiling of a bell jar is provided with an observation port, and an...
|
|
|
6730173 |
Method and apparatus of manufacturing electronic circuit module, and method and apparatus of manufacturing semiconductor module
A method of manufacturing an electronic circuit module includes flow soldering including preheating an interconnect substrate on which an electronic part is placed, and supplying molten solder to a...
|
|
|
6673155 |
Apparatus for forming coating film and apparatus for curing the coating film
An apparatus for forming a coating film comprising, a coating unit for forming a coating film by applying a coating solution onto a substrate, and a curing unit for curing the coating film by...
|
|
|
6660090 |
Film or coating deposition on a substrate
A method of depositing a material onto a substrate, comprising the steps of: feeding a material solution to an outlet to provide a stream of droplets of the material solution; applying a potential...
|
|
|
6649019 |
Apparatus for conditioning the atmosphere in a vacuum chamber
In the invention, the atmosphere in a vacuum chamber ( 1 ) is conditioned using a primary pump ( 3 ), a secondary pump ( 2 ), speed control means ( 6, 7 ) for controlling the speed of the primary...
|
|
|
6624083 |
METHOD FOR REMOVING CONTAMINANT COMPOUNDS RESPECTIVELY HAVING BENZENE RING THEREIN FROM SURFACE OF SI LAYER AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE INCLUDING STEP FOR REMOVING CONTAMINANT COMPOUNDS
A method for removing contaminant compounds respectively having a benzene ring therein from the surface of an Si layer, the method containing enter a step for causing the Si layer to contact with...
|
|
|
6620245 |
Liquid coating apparatus with temperature controlling manifold
An apparatus for processing a substrate of the present invention comprises a holder holding a substrate, a supply pipe being supplied with a processing solution from a first end and supplying the...
|
|
|
6599366 |
Substrate processing unit and processing method
The present invention includes a current plate which is arranged above a substrate in a chamber. A pressure inside the chamber is reduced by exhaust means and drying processing is performed on, for...
|
|
|
6569249 |
Process for forming layers on substrates
The present invention is generally directed to various processes and systems for forming layers and coatings on substrates, such as semiconductor wafers and solar cells. In one embodiment, the...
|