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7616872 |
Temperature measurement and heat-treating methods and systems
Temperature measurement and heat-treating methods and systems. One method includes identifying a temperature of a first surface of a workpiece, and controlling energy of an irradiance flash...
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7612346 |
Non-axisymmetric charged-particle beam system
The charged-particle beam system includes a non-axisymmetric diode forms a non-axisymmetric beam having an elliptic cross-section. A focusing element utilizes a magnetic field for focusing and...
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7608802 |
Heating device for heating semiconductor wafers in thermal processing chambers
An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly of light energy sources for emitting light energy onto a wafer....
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7608151 |
Method and system for coating sections of internal surfaces
A method and system for coating the internal surfaces of a localized area or section of a workpiece is presented. Conductive structures are inserted into one or more openings of a workpiece to...
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7568445 |
System and method for the holographic deposition of material
An apparatus and method for hologram induced deposition of material for use in the formation of three-dimensional structures is described. An electromagnetic energy source may be directed in the...
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7566422 |
Exposure apparatus with tanks storing helium gas and method of manufacturing device using exposure apparatus
A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at...
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7559350 |
Apparatus and method for applying a material to an object
An apparatus to apply a material to an object. An ambience of a first chamber can be kept in inert gas. An ambience of a second chamber can be replaced between inert gas and air. A connecting...
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7554103 |
Increased tool utilization/reduction in MWBC for UV curing chamber
A pump liner is used to direct a laminar flow of purge gas across a workpiece to remove contaminants or species outgassed or otherwise produced by the workpiece during processing. The pump liner...
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7554059 |
Heater unit and semiconductor manufacturing apparatus including the same
A ceramic heater attaining more uniform temperature distribution from the start to the end of cooling is provided. Further, in a cooling module used for cooling the heater, liquid leakage during...
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7540941 |
Method and apparatus in the surface sizing of a paper or board web
An applicator device ( 1 ) applies surface size to at least one side of a web (W). A pressure effect is applied to the web (W) by subjecting the web (W) to an underpressure and/or to an...
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7534467 |
Reduced-pressure drying unit and coating film forming method
The invention includes a hermetic container provided with a substrate mount; a vacuum exhauster connected to the hermetic container; a current member; and a current member raising and lowering...
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7528349 |
Temperature stabilization for substrate processing
A temperature stabilization system, method, composition of matter and substrate processing system are disclosed. A heat absorbing material is disposed in thermal contact with a substrate. The heat...
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7528348 |
Apparatus and method for measuring the temperature of substrates
An apparatus for measuring an object temperature of an object, and including at least one heating apparatus having at least one heating element for heating an object via electromagnetic radiation....
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7528347 |
Cooling device and heat treating device using the same
A heat treating device ( 50 ) has a cooling sleeve that covers a treating vessel ( 56 ) and a heater ( 100 ). The cooling sleeve has a cylindrical base member ( 110 ) and a cooling pipe ( 112 )...
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7525068 |
Heating system of batch type reaction chamber and method thereof
A heating system of a batch type reaction chamber for semiconductor device and a method thereof are disclosed. Each heat unit of heating groups has different height and caloric value at right...
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7517549 |
Method of, and apparatus for, manufacturing organic EL device; organic EL device; electronic device; and liquid droplet ejection apparatus
An organic EL function layer is formed in the following manner. Namely, relative scanning is carried out between a substrate and a function liquid droplet ejection head having introduced therein a...
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7516714 |
Immobilizing device
A solution containing a sample is provided vibration by a vibrating element, the solution is atomized in a status retaining its activities as minute particulate substances, and the solution and/or...
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7509035 |
Lamp array for thermal processing exhibiting improved radial uniformity
A thermal processing chamber includes a substrate support rotating about a center axis and a lamphead of plural lamps in an array having a predetermined difference in radiance pattern between them....
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7497633 |
Substrate processing apparatus and substrate processing method
A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a drying/development processing block, and an interface block....
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7479189 |
Coating plant with a charging lock and device therefor
The present invention relates to a coating plant, especially a vacuum coating plant, with a charging lock, especially a rectangular vacuum lock for a coating chamber, with a lock aperture ( 13 )...
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7455733 |
Fluorescent material coating apparatus and method of coating fluorescent substance using the same
There is provided a fluorescent material coating apparatus for a fluorescent lamp. The fluorescent material coating apparatus includes a cassette on which a plurality of glass tubes are detachably...
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7453051 |
System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy
An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear...
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7452568 |
Centrifugal method for filing high aspect ratio blind micro vias with powdered materials for circuit formation
The present disclosure relates generally to semiconductor, integrated circuits, and particularly, but not by way of limitation, to centrifugal methods of filling high-aspect ratio vias and trenches...
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7438763 |
Coating apparatus and method having a slide bead coater and liquid drop applicator
A coating apparatus and coating method include a device for conveying an object to be coated; a coating device which is disposed in a vicinity of a conveyed surface of the object, and which...
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7432475 |
Vertical heat treatment device and method controlling the same
A vertical heat processing apparatus includes a process chamber ( 5 ) defining a process field (A 1 ) configured to accommodate a plurality of target substrates (W) supported at intervals in a...
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7429718 |
Heating and cooling of substrate support
A substrate support assembly and method for controlling the temperature of a substrate within a process chamber are provided. A substrate support assembly includes an thermally conductive body...
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7429717 |
Multizone heater for furnace
The present invention relates to an apparatus and method for heating a semiconductor processing chamber. One embodiment of the present invention provides a furnace for heating a semiconductor...
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7410542 |
Variable environment, scale-able, roll to roll system and method for manufacturing thin film electronics on flexible substrates
A roll to roll, film forming system overcoming the shortcomings of current roll to roll processing is presented; The roll to roll enabled cartridge is loaded with a bolt of fresh flexible...
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7399708 |
Method of treating a composite spin-on glass/anti-reflective material prior to cleaning
Methods are provided for cleaning a microelectronic device, and one method includes providing a substrate having a patterned SOG/anti-reflective material; performing a process to cure the patterned...
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7393414 |
Methods and systems for processing a microelectronic topography
Methods and systems are provided which are adapted to process a microelectronic topography, particularly in association with an electroless deposition process. In general, the methods may include...
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7384662 |
Through structure of connecting line at gastight chamber, and ejection system incorporating same; method of manufacturing LCD device, organic EL device, electron emitting device, PDP device, electrophoresis display device, color filter, and organic EL; and method of forming spacer, metal wiring, lens, resist, and light diffuser
There is provided a through structure of connecting lines extending through a wall of a gastight chamber. The through structure of the connecting lines is capable of positively sealing between the...
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7384484 |
Substrate processing method, substrate processing apparatus and substrate processing system
After subjected to a developing process, a rinsing process and a replacing process in this order in a developing unit 10 A, 10 B, a substrate W wet with an anti-drying solution is wet-transported...
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7381967 |
Non-axisymmetric charged-particle beam system
The charged-particle beam system includes a non-axisymmetric diode forms a non-axisymmetric beam having an elliptic cross-section. A focusing element utilizes a magnetic field for focusing and...
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7381928 |
Thermal processing apparatus and thermal processing method
A light source including a plurality of flash lamps emits flashes thereby flash-heating a semiconductor wafer held by a thermal diffuser and a hot plate. The current distance of irradiation between...
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7378618 |
Rapid conductive cooling using a secondary process plane
A method and apparatus for thermally processing a substrate is described. The apparatus includes a substrate support configured to move linearly and/or rotationally by a magnetic drive. The...
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7371997 |
Thermal processing apparatus and thermal processing method
In a thermal processing apparatus, using a lamp for heating a substrate, an opening is formed for a camera unit, which is used to image portions of an auxiliary ring supporting the substrate, to...
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7358462 |
Apparatus and method for reducing stray light in substrate processing chambers
A method and apparatus for heating semiconductor wafers in thermal processing chambers is disclosed. The apparatus includes a non-contact temperature measurement system that utilizes radiation...
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7357842 |
Cluster tool architecture for processing a substrate
A cluster tool for processing a substrate includes a cassette and a processing module including a first processing chamber that is configured to perform a chill process on a substrate, a second...
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7341633 |
Apparatus for electroless deposition
Embodiments of the invention generally provide a fluid processing platform. The platform includes a mainframe having a substrate transfer robot, at least one substrate cleaning cell on the...
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7332691 |
Cooling plate, bake unit, and substrate treating apparatus
A bake unit includes a cooling plate for cooling a substrate and a lift pin assembly for loading a substrate on the cooling plate. When a wafer is cooled on the cooling plate, a guide groove is...
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7323054 |
Apparatus for coating a monolith support
Apparatus for coating a support such as a monolithic catalyst support ( 5 ) comprises a dispenser ( 1 ) for dispensing a predetermined quantity of coating liquid, a containment ( 2 ) for the liquid...
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7312422 |
Semiconductor batch heating assembly
A heat treatment apparatus for use in batch heating/wafer processing is provided, which comprises a process chamber for receiving a wafer boat, at least a heating element comprising a substrate...
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7308865 |
Installation for the electrostatic oiling of metal strips
An installation for the electrostatic oiling of metal strips, with an integral system for heating the fluid circuits which allows the application of products which are solid at room temperature...
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7278831 |
Apparatus and method for control, pumping and abatement for vacuum process chambers
The present invention is an apparatus and method for controlling pressure, pumping a vacuum and providing abatement for a plurality of vacuum processing chambers. The system may be used in...
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7274867 |
System and method for determining the temperature of a semiconductor wafer
A system and method for determining the temperature of a semiconductor wafer at the time of thermal contact of the semiconductor wafer with a temperature sensing element. According to the...
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7274006 |
Heater
A heater includes a heating member formed in a plate shape that includes a substrate-heating surface on which a substrate is mounted and a heating member rear surface which is on the opposite side...
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7270724 |
Scanning plasma reactor
A scanning plasma reactor for exciting reactant gases at a substrate surface including a beam forming module, a gas injection module, a reaction chamber with a window and a vacuum chuck, a gas...
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7258746 |
Coating apparatus for segments of cylindrical substrates
A coating apparatus includes a cylindrical holding chamber having open ends, an opening formed in an inner surface and an inner diameter; a specimen having a curved inner surface with a radius of...
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7256370 |
Vacuum thermal annealer
A vacuum thermal annealing device is provided having a temperature control for use with various materials, such as semiconductor substrates. A vacuum is used to remove air and outgas residual...
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7252854 |
Method and apparatus for applying a gel
A rotatable vacuum chamber receives an optical connector having an output face on which an optical gel is applied substantially without entrapped air. Opposite the output face is placed a gel...
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