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7611552 |
Semiconductor polishing composition
A semiconductor polishing composition is disclosed. The composition includes fumed silica. The semiconductor polishing composition is an aqueous dispersion solution of fumed silica. Further, the...
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7597729 |
Polishing composition and polishing method using the same
A polishing composition contains an abrasive such as colloidal silica, at least one kind of compound selected from imidazole and an imidazole derivative, and water. The polishing composition...
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7582127 |
Polishing composition for a tungsten-containing substrate
The invention provides a method of chemically-mechanically polishing a substrate comprising tungsten through use of a composition comprising a tungsten etchant, an inhibitor of tungsten etching,...
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7578862 |
Abrasive compound for glass hard disk platter
The present invention provides an abrasive compound suitable for polishing the surface of a glass substrate for an optical disk platter or a magnetic disk platter. More specifically, the present...
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7575615 |
Process for preparing a polishing composition
The present invention relates to a process for preparing a polishing composition comprising a colloidal silica prepared from a silicate. The first step involves adjusting the pH of a silica...
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7569205 |
Nanodiamond fractional and the products thereof
In certain embodiments, a method of processing detonation nanodiamonds to fractionate the detonation nanodiamonds involves, in order forming a combination of detonation nanodiamonds and a solvent,...
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7553345 |
Polishing composition
A microwaviness reducing agent for polishing a substrate for a precision part, containing either a surfactant having two or more ionic hydrophilic groups, or a polycarboxylic acid compound having 2...
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7550020 |
Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method
A chemical mechanical polishing aqueous dispersion comprises abrasives in a concentration of not more than 1.5% by mass, wherein the abrasives comprise ceria and have an average dispersed particle...
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7547335 |
Metal polishing composition and method of polishing using the same
A metal polishing composition comprising at least one of the compound represented by formula (1) defined herein and the compound represented by formula (2) defined herein, and an oxidizing agent,...
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7534277 |
Slurry composition for secondary polishing of silicon wafer
Disclosed is a slurry composition for secondary polishing of silicon wafers comprising: 2˜10 weight % of colloidal silica having an average particle size of 30˜80 nm; 0.5˜1.5 % by weight of...
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7524347 |
CMP composition comprising surfactant
The invention provides a polishing composition comprising fumed alumina, alpha alumina, silica, a nonionic surfactant, a metal chelating organic acid, and a liquid carrier. The invention further...
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7524346 |
Compositions of chemical mechanical planarization slurries contacting noble-metal-featured substrates
A composition for chemical-mechanical planarization comprises periodic acid and an abrasive present in a combined amount sufficient to planarize a substrate surface having a feature thereon...
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7513920 |
Free radical-forming activator attached to solid and used to enhance CMP formulations
A CMP composition having: a fluid comprising water and at least one oxidizing compound that produces free radicals when contacted with an activator; and a plurality of particles having a surface...
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7503964 |
Paste wax composition
A solvent based paste wax polish composition for metallic, plastic, and painted surfaces containing a blend of synthetic and natural waxes, a blend of silicone fluids, blend of solvents, zinc oxide...
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7503963 |
Cleaning and polishing wax composition
A water in oil emulsion wax composition composed of natural and synthetic waxes, surfactants, suspending agents, and aluminum oxide particles of high purity of 0.20 micrometer or less containing no...
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7491252 |
Tantalum barrier removal solution
A chemical mechanical planarization solution is useful for removing tantalum barrier materials. The solution includes by weight percent 0 to 25 oxidizer, 0 to 15 inhibitor for a nonferrous metal...
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7470295 |
Polishing slurry, method of producing same, and method of polishing substrate
Disclosed herein is a polishing slurry for chemical mechanical polishing. The polishing slurry comprises polishing particles, which have a particle size distribution including separated fine and...
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7459419 |
CD cleaner and restorer composition and method
A single step rub-on, rub-off combination cleaning and waxing CD and DVD restoration method and composition particularly suited for repairing damaged and dirty reflective coatings.
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7431867 |
Nanosized semiconductor particles
Nanosized semiconductor particles of a core/shell structure is disclosed, wherein the particles each comprise a core and a shell and exhibit an average particle size of not more than 100 nm and a...
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7431758 |
Cerium oxide particles and production method therefor
The production method for cerium oxide particles of the present invention is a method of producing a cerium oxide particle by heating a cerium compound from a normal temperature to a temperature...
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7429367 |
Method for producing improved cerium oxide abrasive particles and compositions including such particles
Provided are methods for manufacturing improved cerium oxide abrasives suitable for forming slurry compositions suitable for CMP processes. The cerium oxide abrasives are produced by the heat...
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7427587 |
Polishing compound
A cleaning and polishing composition contains mineral spirits, a first abrasive component of particles having a median size in a range of 1-4 microns, a second abrasive component of particles...
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7427305 |
Free radical-forming activator attached to solid and used to enhance CMP formulations
This invention relates to a method of making selected oxidizers or other free radical-producing compounds become more effective chemical etchants and/or oxidizers for CMP activities by promoting...
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7404831 |
Abrasive composite, method for making the same, and polishing apparatus using the same
An abrasive composite, a method for making the abrasive composite, and a polishing apparatus using the abrasive composite are disclosed. The abrasive composite includes a matrix and a plurality of...
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7399738 |
Sprayable dry wash and wax composition comprising a silicone blend and acrylic-based polymer
A composition for simultaneously cleaning and waxing non-porous surfaces without the need for additional rinsing of the treated surface with water, has a pH of from about 6 to about 7 and contains...
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7399348 |
Low surface tension surfactants based on amino alcohol and their use
The invention provides low surface tension surfactants based on amino alcohol and also provides for their use in aqueous coating formulations, said surfactants being preparable by reacting at least...
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7393401 |
Spray wax composition
A water based spray wax composition containing a microemulsion of a cationic wax nanoparticles, a quaternary silicone compound and zinc oxide nanoparticles providing long lasting protection of...
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7381250 |
Interior protectant/cleaner composition
The present invention provides a liquid protectant composition composed of a cationic microemulsion of a natural wax (carnauba wax) nanometer sized particles and zinc oxide nanometer sized...
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7381249 |
Wax composition for application to wet surfaces
A wax composition for application to a wet surfaces utilizing a polymeric emulsion with a cross-linked copolymer of acrylic acid and C10-30 alkyl acrylate whereby upon application to the surface to...
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7381231 |
Finishing compositions with reduced volatile organic compounds
Finishing composition substantially free of non-volatile silicone materials and comprises a mixture of abrasive particles and an emulsion, which comprises water, a volatile siloxane, and a lubricant.
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7378381 |
Floor coating composition and floor coating composition additive
To provide a floor coating composition and floor coating composition additive. It is possible to improve the leveling performance, mopping performance, and other properties of a floor coating...
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7374592 |
Cleaning and polishing composition for metallic surfaces
A polish composition for metallic surfaces containing a polish and abrasive alumina nanoparticles in a water in oil emulsion composition composed of surfactants, suspending agents, and aluminum...
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7365101 |
Dispersion of pyrogenically produced cerium oxide
A dispersion of pyrogenically produced cerium oxide, which does not contain any particles larger than 1 μm, is produced by dispersing a pyrogenically produced cerium oxide in water by means of a...
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7364667 |
Slurry for CMP and CMP method
A CMP slurry comprising polishing abrasives containing mixture abrasives of silica and alumina is used. In CMP using the slurry comprising mixture abrasives of silica and alumina as polishing...
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7364600 |
Slurry for CMP and method of polishing substrate using same
Disclosed herein is a polishing slurry and a method of producing the same. The polishing slurry has high selectivity in terms of a polishing speed of an oxide layer to that of a nitride layer used...
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7316993 |
Combination cleaning and waxing composition and method
A single step rub-on, rub-off combination cleaning and waxing composition particularly suited for automobiles, glass, plastics, fiberglass, tile, and floor coverings.
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7306638 |
Chemical mechanical polishing process for 2.45T CoFeNi structures of thin film magnetic heads
The present invention is directed to methods for polishing and cleaning a wafer having CoFeNi structures within alumina fill to achieve corrosion-free, smooth, and planar surface. A preferred...
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7306637 |
Anionic abrasive particles treated with positively charged polyelectrolytes for CMP
The invention provides chemical-mechanical polishing systems, and methods of polishing a substrate using the polishing systems, comprising (a) an abrasive, (b) a liquid carrier, and (c) a...
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7303993 |
Chemical mechanical polishing compositions and methods relating thereto
The present invention provides an aqueous composition useful for CMP of a semiconductor wafer containing a metal comprising oxidizer, inhibitor for a nonferrous metal, complexing agent for the...
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7303601 |
Polishing composition
A polishing composition for memory hard disk containing water and silica particles, wherein the silica particles have a particle size distribution in which the relationship of a particle size (R)...
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7300480 |
High-rate barrier polishing composition
The solution is useful for removing a barrier material from a semiconductor substrate. The solution comprises, by weight percent, 0.01 to 25 oxidizer, 0 to 15 inhibitor for a nonferrous metal, 0 to...
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7300478 |
Slurry composition and method of use
The present invention provides an aqueous slurry composition that comprises cerium oxide and/or cerium oxide-containing mixed rare earth oxide abrasive particles, a polyacrylate, and an agent that...
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7288509 |
Compatibilization of esters with latices
There is provided a composition comprising
(a) at least one aqueous polymer dispersion, (b) at least one ester in the amount of 0.005 to 50 parts by weight of said ester, based on 100 weight parts...
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7267702 |
Polishing composition
A polishing composition is provided containing an abrasive having an average particle size of from 1 to 30 nm and water, wherein the abrasive has a packing ratio of from 79 to 90% by weight; a...
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7264787 |
Cerium oxide powder
Polycrystalline cerium oxide powder in the form of aggregates of primary particles with a specific surface of between 70 and 150 m 2 /g, an average primary particle diameter of between 5 and 20 nm...
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7255843 |
Low viscosity-increment fumed-silica and its slurry
A fumed-silica, which can make a slurry having sufficient wettability to a polar liquid, excellent dispersibility, and low viscosity even in the high concentration, and a slurry thereof. A...
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7247179 |
Composition and associated methods for chemical mechanical planarization having high selectivity for metal removal
A composition and associated methods for chemical mechanical planarization (or other polishing) are described. The composition may comprise an abrasive and a dispersed hybrid organic/inorganic...
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7241325 |
Polishing compound
An abrasive composition is provided based on the following:
an abrasive, preferably feldspar 7-59% a clay, preferably smectite clay 3-7% water 37-64% an organic solvent, such as...
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7229486 |
Shoe and leather care product
The invention provides a water-based low VOC shoe and leather care product having good product properties and characteristics, which can be formulated by making an appropriate and careful selection...
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7229484 |
Pre-coated particles for chemical mechanical polishing
The present invention relates to the manufacture and use of novel pre-coated abrasive particles and particle slurries for the chemical mechanical polishing (CMP) of semiconductor wafers, thin...
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