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US20110287365 LITHOGRAPHIC PRINTING PLATE PRECURSORS  
A backside coating is applied to lithographic printing plate precursors and this coating provides sufficient protection so that adjacent precursors are not scratched or otherwise damaged when...
US20120135235 Lock-Release Polymerization  
Techniques are provided to independently control 3D shape and chemistry of rapidly produced colloids. A pre-polymer mixture including a monomer is made to flow into a channel with insular relief...
US20100297558 PHOTOPOLYMERIZABLE FLEXOGRAPHIC PRINTING ELEMENTS AND HARD FLEXOGRAPHIC PRINTING FORMES WHICH ARE PRODUCED THEREFROM  
The invention relates to photopolymerizable flexographic printing elements which contain ethylenically unsaturated, alicyclic monomers and hard flexographic printing plates, in particular...
US20130244144 GATE CD CONTROL USING LOCAL DESIGN ON BOTH SIDES OF NEIGHBORING DUMMY GATE LEVEL FEATURES  
A method of forming an IC including MOS transistors includes using a gate mask to form a first active gate feature having a line width W1 over an active area and a neighboring dummy feature having...
US20120107729 GATE CD CONTROL USING LOCAL DESIGN ON BOTH SIDES OF NEIGHBORING DUMMY GATE LEVEL FEATURES  
A method of forming an IC including MOS transistors includes using a gate mask to form a first active gate feature having a line width W1 over an active area and a neighboring dummy feature having...
US20140106265 PELLICLE  
A pellicle is proposed in which the frame is composed of a detachable double structure of an inner frame and an outer frame, and the pellicle membrane is adhered only to the inner frame and the...
US20110236807 Pellicle for lithography  
There is provided a pellicle for lithography which is capable of preventing or at least restricting the outgas from its mask-bonding agglutinant layer from entering the hollow of the pellicle by...
US20100330467 PELLICLE FRAME AND LITHOGRAPHIC PELLICLE  
A pellicle frame is provided that includes a pellicle frame bar having a cross-section with a shape that has a curved line-containing recess in at least one side edge of a quadrilateral having an...
US20110275012 Pellicle  
There is provided a pellicle in which the agglutinant, that is, the mask-bonding adhesive, is designed to have a light transmission of no greater than 70 percents; preferably the agglutinant is...
US20120122024 Pellicle for lithography  
There is provided a pellicle in which the mask-bonding agglutinant layer has the adhesion strength of 1 N/m through 100 N/m, preferably 4 N/m through 80 N/m, and more preferably the agglutinant...
US20110217658 PHOTOPOLYMERISABLE LAYERED COMPOSITE FOR PRODUCING FLEXO PRINTING ELEMENTS  
Laminate comprising a) a photopolymerizable relief-forming layer, at least containing an elastomeric binder, ethylenically unsaturated monomers and a photoinitiator and optionally further...
US20110200932 RAISED LETTER PRINTING USING LARGE YELLOW TONER PARTICLES  
Electrophotographic printing of one or more layers of toner to enable the printing of a wide range of toner mass laydown using electrophotography to produce prints with raised letters. This method...
US20130216973 Coating for a dental matrix band  
A matrix band for use in dentistry has a silicone-based, polymer coating applied to an etched stainless steel surface, which reduces or eliminates capillary action between a tooth and the matrix...
US20110195351 Pellicle for lithography  
There is provided a pellicle in which the mask-bonding adhesive is formed to have a corner-rounded cross section in a shape akin to a trapezoid whose upper parallel side represents the face of the...
US20110195350 Pellicle for lithography  
There is provided a pellicle in which the adhesive layer bearing the pellicle membrane is molded so flatly that the flatness of the pellicle as measured across the membrane is 10 micrometers or...
US20110294048 MOUNTING A PELLICLE TO A FRAME  
A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may...
US20130164660 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY  
To provide a reflective mask blank for EUV lithography having an absorber layer having optical constants suitable for reducing the thickness. A mask blank for EUV lithography comprising a...
US20100304283 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY  
A reflective mask blank for EUV lithography is provided which has an absorber layer wherein stress and crystal structure can be easily controlled. A reflective mask blank for EUV lithography,...
US20140178805 PELLICLE FOR LITHOGRPAHY  
There is provided a pellicle wherein the frame is cut with one or more slight-chamfers, and in particular the one cut along the inner edge of the upper annular face of the frame, to which the...
US20080268382 Glass Paste, Method for Producing Display by Using Same, and Display  
Disclosed is a glass paste containing a glass powder and an organic component, wherein a black pigment is composed of a complex oxide having a spinel structure and containing Co element and one or...
US20100328635 Pellicle  
There is provided a pellicle having a rectangular pellicle frame formed of four side bars, having a through hole made through at least one of the frame bars for adjusting a pressure of a space...
US20150093690 WHITE CURABLE COMPOSITION FOR PRINTED CIRCUIT BOARD, CURED COATING FILM USING THE SAME, AND PRINTED CIRCUIT BOARD  
An object of the present invention is to obtain a white curable composition that can yield a highly reflective cured coating film without requiring a complicated step and show good dispersion even...
US20130108957 PRODUCTION METHOD OF RESIST COMPOSITION FOR LITHOGRAPHY  
The present invention provides a production method of a resist composition for lithography, comprising, at least: a filtering step for filtering a resist composition for lithography by a filter...
US20100330466 PELLICLE FRAME AND LITHOGRAPHIC PELLICLE  
A pellicle frame is provided that comprises a pellicle frame bar having a quadrilateral cross-section, wherein an upper edge and a lower edge of a basic quadrilateral forming said cross-section...
US20130070226 MARKER STRUCTURE AND METHOD OF FORMING THE SAME  
The invention relates to a marker structure for optical alignment of a substrate and provided thereon. The marker structure has a first reflecting surface at a first level and a second reflecting...
US20110081604 Pellicle for lithography and a method for making the same  
There is provided a method for manufacturing a pellicle in which the pellicle frame is prepared by being heated at a predetermined temperature while constricting the frame to some extent of...
US20120233929 METHOD OF INHIBITING WATER ADSORPTION OF POWDER BY ADDITION OF HYDROPHOBIC NANAOPARTICLES  
Presently described are methods of inhibiting water vapor adsorption of a powder and methods of storing a powder at increased humidity level. The methods comprise providing adding discrete...
US20120276473 PELLICLE FOR LITHOGRAPHY  
A pellicle for lithography, in which an agglutinant layer is so controlled that the deformation of the pellicle frame is prevented from transferring to an exposure original plate to which the...
US20110104420 Pellicle and a method for making the same  
There is provided a pellicle in which the adhesive layer for attaching the pellicle onto a photo mask is made from a room temperature curable two-part adhesive mask so that the formation of the...
US20100328641 PELLICLE FRAME AND LITHOGRAPHIC PELLICLE  
A pellicle frame is provided that includes a pellicle frame bar having a cross-section with a shape that has at least one triangular recess in at least one side edge of a quadrilateral having an...
US20140255827 PELLICLES WITH REDUCED PARTICULATES  
Pellicles for photomasks used in photolithographic manufacturing are described. A frame of a pellicle may include a recess formed in a side member and a locking member dimensioned to secure a...
US20120308922 PELLICLE MOUNTING APPARATUS AND ASSEMBLY WITH PELLICLE MOUNTED ON MASK  
An apparatus is provided for mounting a pellicle to a photomask. A chamber has at least one port for filling the chamber with extreme clean dry air (XCDA) or an inert gas. A pellicle mounter is...
US20120129082 METHOD OF ADHERING LITHOGRAPHIC PELLICLE AND ADHERING APPARATUS THEREFOR  
A method of adhering a lithographic pellicle includes steps of pressing the pellicle frame 6 toward the exposure stencil 5 by a pressure plate 2 via a bag 3 containing a low viscosity liquid being...
US20130177840 ALIGNMENT MARKS FOR MULTI-EXPOSURE LITHOGRAPHY  
A plurality of reticles for printing structures in the same lithography level includes an alignment structure pattern within a same relative location in each reticle. Each set of process...
US20130001193 ALIGNMENT MARKS FOR MULTI-EXPOSURE LITHOGRAPHY  
A plurality of reticles for printing structures in the same lithography level includes an alignment structure pattern within a same relative location in each reticle. Each set of process...
US20090029275 Photoconductor Formulation Containing Boron Nitride  
The present disclosure relates to incorporation of boron nitride in the charge transport layer of a photoconductor. The boron nitride may have an aspect ratio of greater than 1.0, a D50 mean...
US20130108958 PRODUCTION METHOD OF RESIST COMPOSITION FOR LITHOGRAPHY  
A production method of a resist composition for lithography, including, at least: a filtering step for filtering a resist composition for lithography by a filter therethrough, wherein in the...
US20130337372 Method and System for Design of a Reticle to be Manufactured Using Variable Shaped Beam Lithography  
A surface manufactured using variable shaped beam (VSB) shots is disclosed, where either: 1) the left edge of a first VSB shot intersects the top edge of a second VSB shot, and the bottom edge of...
US20120100485 COLOR MOTION PICTURE PRINT FILMS  
A multi-color photographic silver halide element has a total gelatin level on the imaging side of the support is less than 9000 mg/m2, and bulk gelatin-to-junk weight ratio for all of the light...
US20130089814 PELLICLE HAVING BUFFER ZONE AND PHOTOMASK STRUCTURE HAVING PELLICLE  
A pellicle including a frame having a square shape; and a buffer zone in the frame, the buffer zone dividing a lower surface of the frame into a plurality of portions.
US20140315122 PELLICLE AND AN ASSEMBLY OF PHOTOMASK PLUS PELLICLE  
A pellicle was well as an assembly of photomask plus pellicle is proposed in which the conventional agglutinant layer which bonds the pellicle to photomask is replaced by male and female screws...
US20140147773 PELLICLE FOR LITHOGRAPHY, PELLICLE-MOUNTED PHOTOMASK, AND EXPOSURE TREATMENT METHOD  
To provide a pellicle for lithography having a pellicle membrane excellent in light resistance against light with a wavelength of at most 250 nm, particularly at most 200 nm, a pellicle-mounted...
US20110129767 PELLICLE FOR LITHOGRAPHY  
A pellicle 10 for lithography includes a pellicle frame 3, a pellicle membrane 1 adhered onto the upper end surface of the pellicle frame 3 and an agglutinant layer 4 formed on the lower surface...
US20150036117 MASKLESS NANOIMPRINT LITHOGRAPHY  
A method for creating a nanoimprint lithography template includes exposing (600) a mass transport layer of material adjacent to a support substrate to electromagnetic radiation in a predetermined...
US20110117482 PELLICLE FOR LITHOGRAPHY  
A pellicle for lithography is provided that includes a pellicle frame provided with one or more atmospheric pressure adjustment holes having an inner peripheral face with a shape that opens out in...
US20110200933 RAISED PRINTING USING SMALL TONER PARTICLES  
Electrophotographic printing of one or more layers of toner to enable the printing of a wide range of toner mass laydown using electrophotography to produce prints with raised letters. This method...
US20120178029 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS ESPECIALLY SUITABLE FOR ION IMPLANT APPLICATIONS  
Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable...
US20110085939 NODE POLYPEPTIDES FOR NANOSTRUCTURE ASSEMBLY  
Engineered proteins are used in the assembly of two-dimensional and three-dimensional nanostructure assemblies, based on systematic design and production of protein node structures that can be...
US20150085266 DIFFERENTIAL DOSE AND FOCUS MONITOR  
A dose and focus monitor structure includes at least one complementary set of unit dose monitors and at least one complementary set of unit focus monitors. Each complementary set of unit dose...
US20110117481 PELLICLE FOR LITHOGRAPHY  
A pellicle for lithography is provided that includes a pellicle frame provided with an atmospheric pressure adjustment hole that extends through from an outer peripheral face to an inner...