Match Document Document Title
US20080106719 Compensating Masks, Multi-Optical Systems Using the Masks, and Methods of Compensating for 3-D Mask Effect Using the Same  
Provided are a compensating mask, a multi-optical system using the compensating mask, and a method of compensating for a 3-dimensional (3-D) mask effect using the compensating mask. Methods of...
US20130122413 AZO COMPOUND, PIGMENT DISPERSANT CONTAINING THE AZO COMPOUND, PIGMENT COMPOSITION, PIGMENT DISPERSION, AND TONER  
A novel compound that can improve the dispersibility of an azo pigment in a non-water-soluble solvent is provided, which is represented by the following formula (1):
US20110159444 METHOD FOR MANUFACTURING PROBE SHEET  
An embodiment of the invention provides a method for manufacturing a probe sheet in which a probe tip can be arranged at a predetermined accurate position without the need for troublesome...
US20090202932 Medium for laser printing including optical special effect flakes  
A laser toner includes optical effect taggent flakes or other structures in a binder suitable for binding particles to a substrate. Preferably the optical effect taggent structures have a...
US20130316272 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY  
To provide an EUV mask blank with which the etching selectivity under etching conditions for absorber layer is sufficiently high, line edge roughness after pattern formation will not be large, and...
US20150010864 Meta-Photoresist for Lithography  
Provided are a meta-photoresist capable of transferring mask patterns on which fine patterns having a diffraction limit or less are formed, on a substrate, and a lithography method using the same,...
US20050244720 Recto/verso copy-protected security document  
The invention concerns a security document comprising, as security element against recto/verso copying, indicia present on both sides and capable of being viewed under reflected lighting and...
US20140322648 COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY  
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially...
US20110255069 COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY  
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially...
US20130065160 REMOVABLE TRANSPARENT MEMBRANE FOR A PELLICLE  
According to one embodiment, a pellicle includes first and second frame members that are selectively removable from one another. The second frame member has an annular shape similar to and is...
US20110195363 LAYERED RADIATION-SENSITIVE MATERIALS WITH VARYING SENSITIVITY  
A method for fabricating a radiation-cured structure is provided. The method includes the steps of providing a first radiation-sensitive material and a second radiation-sensitive material adjacent...
US20120171624 PRINTED CIRCUIT BOARD FOR OPTICAL WAVEGUIDE AND METHOD OF MANUFACTURING THE SAME  
Disclosed herein is a printed circuit board for an optical waveguide, including a base board, and an optical waveguide formed on the base board. The optical waveguide includes a lower clad layer...
US20070275311 FLAT PANEL DISPLAY MANUFACTURING  
A method includes exposing a photo-resist layer using a first exposure machine that has a first resolution to cause the photo-resist layer to have an exposed portion and an un-exposed portion. The...
US20150111149 MAKING A LIQUID ELECTROPHOTOGRAPHIC (LEP) PASTE  
A method of making a liquid electrophotographic (LEP) paste is disclosed herein. A base paste is made by forming a dispersion of a pigment and a non-polar carrier, adding a transparent resin...
US20130244160 LOW STRUCTURE CARBON BLACK AND METHOD OF MAKING SAME  
A carbon black having an I2 number from 30 mg/g to 200 mg/g and a DBP from 20 cc/100 g to 40 cc/100 g.
US20080130074 Anti-Counterfeit Security and Methods for Its Production and Verification  
The security object comprises a substrate, a surface structure and a hologram layer. A volume hologram is arranged in the hologram layer. The hologram layer is deformed in homogeneously by the...
US20110189606 TREATED FLUOROPOLYMER PARTICLES, METHODS OF MAKING TREATED FLUOROPOLYMER PARTICLES, TONER COMPOSITIONS, AND METHODS OF MAKING TONER COMPOSITIONS  
Toner compositions, treated fluoropolymer particles, methods of making treated fluoropolymer particles, and the like, are disclosed.
US20150109659 ELECTROPHORETIC PARTICLES, PRODUCTION METHODS OF ELECTROPHORETIC PARTICLES, AND ELECTROPHORETIC DISPLAY DEVICES  
The present invention relates to an electrophoretic particle that includes: a core part including an inorganic particle; a shell layer formed on the core part; and a protective layer formed on the...
US20130302730 TONER  
To provide a toner that can keep its melt-sticking to sleeve from occurring and, even in double-sided printing, can keep high-temperature offset from occurring and obtain high-quality images on...
US20100143829 Use of soft adhesive to attach pellicle to reticle  
A pellicle is attached to a reticle by a soft adhesive. The distortion of the reticle is less than if a hard adhesive were used.
US20090226823 RETICLES INCLUDING ASSISTANT STRUCTURES, METHODS OF FORMING SUCH RETICLES, AND METHODS OF UTILIZING SUCH RETICLES  
Reticles comprising assistant structures in contact with at least sidewalls of a phase shift and transmission control material are disclosed. The assistant structures are formed from an absorptive...
US20140245948 METHOD TO PROVIDE A PATTERNED ORIENTATION TEMPLATE FOR A SELF-ASSEMBLABLE POLYMER  
A graphoepitaxy template to align a self-assembled block polymer adapted to self-assemble into a 2-D array having parallel rows of discontinuous first domains extending parallel to a first axis,...
US20070178391 Mask having balance pattern and method of patterning photoresist using the same  
A method and mask having balance patterns for reducing and/or preventing chemical flare from occurring in a photoresist between a first mask region and a second mask region. Balance patterns...
US20090162766 PHOTOCONDUCTORS CONTAINING KETAL OVERCOATS  
A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and at least one charge transport layer comprised of at least one charge transport component, and an...
US20110250544 BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS  
Antireflective coating compositions are discussed.
US20130164658 PROCESS AND SYSTEM FOR DESIGNING A PHOTOLITHOGRAPHY MASK AND A LIGHT SOURCE  
A method for designing a photolithography mask and a light source may include designing an initial photolithography mask and an initial light source using an initial target pattern corresponding...
US20140106264 PHOTOLITHOGRAPHY MASK, PHOTOLITHOGRAPHY MASK ARRANGEMENT, AND METHOD FOR EXPOSING A WAFER  
A photolithography mask according to an embodiment may include: a mask substrate, the mask substrate having a three-dimensional pattern located and dimensioned to at least partially receive an...
US20150111176 COMPOSITE RESIN COMPOSITION AND USE THEREOF, METHOD FOR PRODUCING DENTAL COMPONENTS BY MEANS OF STEREO-LITHOGRAPHY  
The invention relates to the use of a composite resin composition comprising (a) at least one polyreactive binder,(b) a first photopolymerization initiator having an absorption maximum at a...
US20090130572 RETICLE FOR FORMING MICROSCOPIC PATTERN  
A reticle for forming a microscopic pattern is formed that prevents a ghost image generated in a photolithography process for patterning microscopic-sized holes. The reticle may include a quartz...
US20110165506 Photomasks and Methods Of Forming Photomasks  
Some embodiments include methods in which a mathematical representation of a photomask construction is defined, with such representation comprising a plurality of pillars that individually contain...
US20090220866 PRE-ALIGNMENT MARKING AND INSPECTION TO IMPROVE MASK SUBSTRATE DEFECT TOLERANCE  
A method includes determining defect types and defect locations on a mask blank and storing the defect types and the defect locations on the mask blank. The method further includes generating at...
US20150037712 Extreme Ultraviolet (EUV) Mask, Method Of Fabricating The EUV Mask And Method Of Inspecting The EUV Mask  
An out-of-band (OoB) suppression layer is applied on a reflective multiplayer (ML) coating, so as to avoid the OoB reflection and to enhance the optical contrast at 13.5 nm A material having a low...
US20090263729 TEMPLATES FOR IMPRINT LITHOGRAPHY AND METHODS OF FABRICATING AND USING SUCH TEMPLATES  
A template for use in imprint lithography is disclosed. The template includes at least two ultraviolet transparent materials bonded together by an ultraviolet transparent epoxy. The ultraviolet...
US20110151379 BLACK MATRIX COMPOSITION WITH HIGH LIGHT-SHIELDING AND IMPROVED ADHESION PROPERTIES  
The present invention relates to a black matrix photosensitive resin composition having high light-shielding and improved adhesion properties and a black matrix for a liquid crystal display...
US20050147932 Method for processing color motion picture print film  
A method for processing imagewise exposed silver halide light sensitive motion picture photographic print film elements, the method comprising: i) classifying imagewise exposed print film elements...
US20130004893 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST  
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more parabanic acid moieties. Preferred...
US20110033932 SUBSTRATE FOR CELL ADHESION OR CULTURE AND METHOD FOR PRODUCING THE SAME  
A substrate for cell adhesion or culture of the invention comprises: a base material; a cell adhesion layer arranged to cover a predetermined region on this base material; and a non-cell adhesion...
US20100028810 ETCHING METHOD FOR USE IN DEEP-ULTRAVIOLET LITHOGRAPHY  
In a lithography process using an ultraviolet process, the applied ultraviolet resist can be removed by intentionally condensing the ultraviolet resist before removing the ultraviolet resist.
US20120034562 COATING COMPOSITION FOR USE WITH AN OVERCOATED PHOTORESIST  
In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating...
US20060019172 Volume hologram resin composition, surface relief hologram resin composition, and hologram layer, hologram transfer foil and brittle hologram label using the same  
The major object of the invention is to provide a volume-type hologram resin composition and a surface relief-type hologram resin composition having a high effect of preventing forgery and...
US20140178813 METHOD FOR MANUFACTURING FATTY ACID METAL SALT PARTICLE, AND FATTY ACID METAL SALT PARTICLE  
A method for manufacturing a fatty acid metal salt particle includes forming a coating layer including a fatty acid metal salt on a surface of a core material particle in supercritical carbon dioxide.
US20140186750 Lithography Mask Repairing Process  
A method includes performing a beam scan on a photolithography mask to repair the photolithography mask. After the beam scan, a radiation treatment is performed on the photolithography mask. The...
US20100297556 Coating compositions suitable for use with an overcoated photoresist  
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the...
US20150220012 Hyperpigmented Magenta Toner  
Hyperpigmented magenta toner, that is indistinguishable from standard and conventional magenta toner, contains PR122 and PR260 in a 56:44 weight ratio and can be used with reduced TMA as compared...
US20140315093 USE AND FABRICATION OF MICROSCAFFOLDS AND NANOSCAFFOLDS  
A scaffold includes struts that intersect at nodes. In some instances, a cross section of the cores has at least one dimension less than 100 microns. The core can be a solid, liquid or a gas. In...
US20090284721 RETICLE SYSTEM FOR MANUFACTURING INTEGRATED CIRCUIT SYSTEMS  
A reticle system that includes: providing a reticle system; and assigning two or more of an image pattern onto the reticle system to form one or more layers of an integrated circuit system by...
US20060055911 High resolution printer and a method for high resolution printing  
The invention provides a method and printer for printing an image that comprises at least one group of highly dense shapes, the method includes: (i) determining multiple intermediate schemes such...
US20070035715 Exposure apparatus for manufacturing semiconductors and method for inspecting pellicles  
Example embodiments of the present invention relate to an apparatus for manufacturing semiconductors and a method of inspecting a pellicle. Other example embodiments of the present invention...
US20080206685 Exposure method, method for manufacturing flat panel display substrate, and exposure apparatus  
An exposure method and exposure apparatus optimal for the formation of a fine pattern of an electronic device, such as a flat panel display. The exposure method and apparatus provides a high...
US20130236832 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS  
There is disclosed an acid generator generating a sulfonic acid represented by the following general formula (1) in response to high-energy beam or heat: As a result, there is provided a novel...