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US20070248898 TARGETS FOR ALIGNMENT OF SEMICONDUCTOR MASKS  
Alignment of mask layers in semiconductor manufacturing is carried out by using alignment lines having at least one row of diffractively reflecting or scattering features on the lines. The...
US20050175907 Photo mask including scattering bars and method of manufacturing the same  
A photo mask includes a transparent substrate, a main pattern, and scattering bars. The image of the main pattern is that which is transferred to photosensitive material by rays of exposure light...
US20050271949 Reticle manipulations  
Slits and holes within a reticle for a local interconnect layer (LIL) are sized according to factors such as relative isolation and whether they are large or small. This helps overcome side-lobing...
US20060292472 Electrophotographic toner using metal containing compound  
An electrophotographic toner is disclosed, comprising at least a metal containing compound represented by the following formula: wherein M is a divalent metal ion, and R1, R2 and R3 are each a...
US20090042107 PELLICLE FOR HIGH NUMERICAL APERTURE EXPOSURE DEVICE  
A pellicle that is used in a semiconductor lithography process and that can be used in an exposure device with an optical system having a numerical aperture of 1.0 or above, is provided. The...
US20070258637 Overlay Mark Arrangement for Reducing Overlay Shift  
An overlay mark arrangement for reducing the asymmetric profile and an overlay shift during an integrated circuit manufacturing process is disclosed. In one embodiment, the overlay mark...
US20120321997 URETHANES USED AS ADDITIVES IN A PHOTOPOLYMER FORMULATION  
The invention relates to a photopolymer formulation comprising matrix polymers, writing monomers and photo initiators, to a method for producing said photopolymer formulation, a photopolymer...
US20080206691 Phosphor screen in rare gas discharge device  
The present invention provides a phosphor screen in a Xe gas discharge device such as a plasma display device or a mercury-free flat fluorescent lamp, which phosphor having a clean surface that...
US20150030977 LATEX COMPRISING COLORANT AND METHODS OF MAKING THE SAME  
A process includes forming an emulsion comprising a monomer and a colorant, the colorant further including an anionic functional group and a lipophilic counter ion, and polymerizing the monomer to...
US20130045439 TITANIA-DOPED QUARTZ GLASS AND MAKING METHOD  
Titania-doped quartz glass is manufactured by mixing a silicon-providing reactant gas and a titanium-providing reactant gas, preheating the reactant gas mixture at 200-400° C., and subjecting the...
US20140141374 NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS  
A negative-working lithographic printing plate precursor is used for making lithographic printing plates from infrared radiation imaging. The precursor comprises free radical chemistry and a...
US20130323643 NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS  
Negative-working lithographic printing plate precursor a negative-working imagable layer and an outermost water-soluble overcoat layer that is disposed directly on the negative-working imagable...
US20150056097 IMAGING DEVICES FOR MOLECULE DETECTION  
An imager may include an array of pixels formed on a substrate. A chemisorption layer such as a planar chemisorption layer may be deposited over the array of pixels. The chemisorption layer may...
US20130202995 PLASTICIZED ANTI-CURL BACK COATING FOR FLEXIBLE IMAGING MEMBER  
The presently disclosed embodiments relate generally to a flexible imaging member having an anti-curl back coating comprising a liquid plasticizer, and the imaging member is substantially flat.
US20120229885 ELECTROPHORETIC DISPLAY MEDIUM AND PREPARING METHOD THEREOF  
An electrophoretic display medium and preparing method thereof. The electrophoretic display medium comprises: negatively or positively-charged pigment particles; neutral pigment particles with...
US20080044775 Method for Aligning or Assembling Nano-Structure on Solid Surface  
The present invention relates to a method for selectively assembling and aligning nano-structures on a solid surface; and, more particularly, to a method for directly adsorbing the nano-structures...
US20130171561 ADDITIVE FOR RESIST AND RESIST COMPOSITION COMPRISING SAME  
A resist additive represented by Formula 1 below and a resist composition including the additive are disclosed. The resist additive improves hydrophobicity of the surface of the resist film to...
US20150241779 REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES  
A reagent that enhances acid generation of a photoacid generator and composition containing such reagent is described.
US20120034558 PHOTOLITHOGRAPHY MATERIAL FOR IMMERSION LITHOGRAPHY PROCESSES  
A photolithography material is provided. The photolithography material is a surface modifying material. The photolithography material includes a polymer (e.g., fluorine polymer) that includes less...
US20080199783 Double-Decker Pellicle-Mask Assembly  
A pellicle-mask assembly includes a mask substrate having an absorber pattern, and a hard pellicle held against movement with respect to the mask substrate by gas pressure.
US20150147687 Extreme Ultraviolet Lithography Process and Mask with Reduced Shadow Effect and Enhanced Intensity  
The present disclosure provides one embodiment of an extreme ultraviolet (EUV) mask. The EUV mask includes a first state and a second state different from each other; a first main polygon and a...
US20100247790 INTERACTIVE ENAMELLED VISUAL COMMUNICATION PANEL  
Interactive visual communication panel (1), such as among others a board that can be written on with felt-tip pens or a chalkboard that can be written on with chalk, characterised in that it is...
US20070098963 Toner receiving compositions for electrophotographic toner receiving systems  
A toner receiving composition for electrophotographic toner receiving systems includes a binder of polymeric material and a plurality of organic hollow polymeric particles adhered to the polymeric...
US20060263706 Overlay vernier and method for manufacturing semiconductor device using the same  
An overlay vernier comprises overlay vernier patterns having a layout identical to that of patterns disposed within a real cell. A lower overlay vernier pattern is formed within a scribe line...
US20120321998 PHOTOPOLYMER FORMULATION HAVING TRIAZINE-BASED WRITING MONOMERS  
The invention relates to a photopolymer formulation comprising polyurethane matrix polymers, writing monomers, and photoinitiators, wherein the writing monomers comprise compounds of formula (I),...
US20150017571 PHOTOLITHOGRPAHY SCATTERING BAR STRUCTURE AND METHOD  
Provided is an integrated circuit (IC) photo mask. The IC photo mask includes a main feature of the IC, the main feature having a plurality of sides, and a plurality of assist features, the assist...
US20090075184 MASK BLANK FOR EUV EXPOSURE AND MASK FOR EUV EXPOSURE  
Provided are a mask for EUV exposure and a mask blank for EUV exposure for manufacturing the same, so as to improve the contrast of ultraviolet inspection light and improve the inspection...
US20100086861 SPECIAL POLYETHER-BASED POLYURETHANE FORMULATIONS FOR THE PRODUCTION OF HOLOGRAPHIC MEDIA  
The present invention relates to novel polyurethane compositions which are advantageous for the production of holographic media, inter alia for data storage, but also for optical applications of...
US20050271961 Substrate and near infrared absorbing toner  
A paper having toner fixed on its surface, with the toner including a near infrared absorbing dye. The toner-paper absorbance difference is about 0.2 or less at 450 nm, 550 nm, and 650 nm, and...
US20140045116 EMULSION AGGREGATION TONER PROCESS COMPRISING DIRECT ADDITION OF SURFACE-TREATED PIGMENT  
A method of making a toner that includes adding pigments into an emulsion aggregation toner without first preparing a pigment dispersion. The method eliminates the pigment dispersion step in the...
US20060147826 Undercoat layer and method of forming the same and photoconductor comprising undercoat layer  
An undercoat layer for photoconductor. The undercoat layer includes a resin and a plurality of powders dispersed therein. The powders include a first powder and at least one of a second and a...
US20110059407 DOUBLE PATTERNING STRATEGY FOR FORMING FINE PATTERNS IN PHOTOLITHOGRAPHY  
A method of lithography patterning includes forming a first resist pattern over a substrate, baking the first resist features, hardening the first resist features, forming a second resist layer...
US20140329184 STABILIZED CHOLINE SOLUTIONS AND METHODS FOR PREPARING THE SAME  
A method for the stabilization of an aqueous choline hydroxide solution includes, optionally adding a first stabilizer of a dithionite salt and/or a dialkylhydroxylamine to an aqueous solution...
US20080151207 Magneto-optical photoresist  
A method for a magneto-optical photoresist. The method includes applying a magneto-optical photoresist to a surface, and patterning the magneto-optical photoresist by using a magnetic alignment....
US20080113491 EUV pellicle with increased EUV light transmittance  
According to one exemplary embodiment, an extreme ultraviolet (EUV) pellicle for protecting a lithographic mask includes an aerogel film. The pellicle further includes a frame for mounting the...
US20060008725 Microtoner formulation with enhanced classification properties and method of producing same  
A method (10) for forming a microtoner (C) for use in the development of electrophotographic images includes blending at least one polymer (P1, P2, P3, . . . PN) with at least one thermoplastic...
US20100316939 Photolithography Monitoring Mark, Photolithography Mask Comprising An Exposure Monitoring Mark, And Phase Shift Mask Comprising An Exposure Monitoring Mark  
A photolithography monitoring mark on a substrate includes a plurality of sets of lines. Individual of the sets include a plurality of substantially parallel lines comprising different widths...
US20090130610 Integrated color mask  
The invention relates to a process for forming a structure comprising providing a support, coating one side of said support with a colored mask, coating a layer photopatternable by visible light,...
US20130260313 PHOTOACID GENERATING POLYMERS CONTAINING A URETHANE LINKAGE FOR LITHOGRAPHY  
A photoacid generating polymer (PAG polymer) comprises i) a first repeat unit of capable of reacting with a photogenerated acid to form a carboxylic acid containing repeat unit, ii) a second...
US20120231388 AZO COMPOUND, AND PIGMENT DISPERSANT, PIGMENT COMPOSITION, PIGMENT DISPERSION AND TONER INCLUDING THE AZO COMPOUND  
There is provided an azo compound for improvement in the dispersibility of an azo pigment into a water-insoluble solvent. The azo compound is represented by the following general formula (1):
US20130161936 Photographic Paper  
A photographic paper comprising an outer-most layer comprising a hydrophilic colloid binder and colloidal silica, wherein: (i) the weight ratio of colloidal silica to hydrophilic colloid binder in...
US20110135959 PMR WRITER AND METHOD OF FABRICATION  
Embodiments of the invention provide a magnetic recording head including a write pole having increasing magnetic moment from a leading edge of the write pole to a trailing edge of the write pole,...
US20100316945 METHODS FOR MAKING CUSTOMIZED BLACK TONERS  
According to embodiments illustrated herein, there is provided a black toner having a resin, an optional additive, and at least two or more colored pigments, and the at least two or more colored...
US20140347718 ELECTRO-OPTIC DISPLAYS  
The invention provides an electrophoretic medium comprising at least two types of particles having substantially the same electrophoretic mobility but differing colors. The invention also provides...
US20100020373 HOLOGRAPHIC STORAGE MEDIUM AND METHOD FOR GATED DIFFUSION OF PHOTOACTIVE MONOMER  
An optical medium is provided. The optical medium comprises: a diffusion-controlling matrix framework; at least one photoactive monomer attached to the diffusion-controlling matrix framework in a...
US20130236833 COATING COMPOSITIONS  
Developable bottom antireflective coating compositions are provided.
US20150037735 MOLECULAR GLASS PHOTORESISTS CONTAINING BISPHENOL A FRAMEWORK AND METHOD FOR PREPARING THE SAME AND USE THEREOF  
The present invention provides a class of molecular glass photoresist (I and II) comprising bisphenol A as a main structure and their preparation. The molecular glass photoresist is formulated...
US20060234152 Method for thermal development of a photosensitive element using an oriented development medium  
The invention relates to a method for forming a relief pattern from a photosensitive element containing a composition layer capable of being partially liquefied by heating. Liquefied portions of...
US20110249307 HOLOGRAM AND ASSOCIATED METHODS OF FABRICATION THEREOF AND USE IN SECURITY/AUTHENTICATION APPLICATIONS  
A hologram (and related hologram element) contains and exhibits a holographic image when illuminated and viewed on angle and with the holographic image gradually fading when viewed increasingly...
US20070218378 THERMALLY PRINTABLE ELECTRICALLY CONDUCTIVE RIBBON AND METHOD  
A thermally transferable electrically conductive ribbon includes a carrier web having first and second sides and an electrically conductive layer disposed on the first side of the carrier web. A...