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US20140017615 APPARATUS AND METHOD FOR RESIST COATING AND DEVELOPING  
An apparatus includes a chuck, a first drain cup and second drain cup with two separately drain lines connected to each drain cup. The second drain cup is integrated with the first drain cup and...
US20090123852 Hard-material object comprising visional color-varying surface  
A hard-material object comprising a visional color-varying surface comprises a hard-material carrier and a pattern disposed on the surface of the hard-material carrier. The pattern comprises a...
US20090047606 Lithography meandering order  
An imprint lithography method is disclosed, which includes imprinting a plurality of patterns in an imprintable medium provided on a substrate, wherein the order in which the patterns are...
US20110043238 METHOD OF MANUFACTURING NEEDLE FOR PROBE CARD USING FINE PROCESSING TECHNOLOGY, NEEDLE MANUFACTURED BY THE METHOD AND PROBE CARD COMPRISING THE NEEDLE  
Disclosed are probe card needles manufactured using microfabrication technology, a method for manufacturing the probe card needles, and a probe card having the probe card needles. The probe...
US20130089813 Forming a Bridging Feature Using Chromeless Phase-Shift Lithography  
First and second anchor features are formed on a substrate via a chromeless photolithography process. An elongated bridging feature is formed between the anchor features on the substrate via the...
US20140295348 COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY  
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
US20130017487 COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY  
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
US20120264053 COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY  
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
US20120225384 COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY  
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
US20140154631 METHOD OF REMOVING NEGATIVE ACTING PHOTORESISTS  
Polymerized negative acting photoresists are removed from substrates at relatively low temperatures and fast stripping times using aqueous based alkaline solutions.
US20140038104 WATER-DISPERSIBLE ELECTRICALLY CONDUCTIVE FLUORINE-CONTAINING POLYANILINE COMPOSITIONS FOR LITHOGRAPHY  
A water dispersible composition comprises a polyaniline copolymer having a weight average molecular weight of at least 30,000 and a polymeric acid comprising sulfonic acid groups. The polyaniline...
US20110084787 PHOTOSENSITIVE RESIN COMPOSITION, METAL-BASE-CONTAINING CIRCUIT BOARD PRODUCTION METHOD EMPLOYING THE PHOTOSENSITIVE RESIN COMPOSITION, AND METAL-BASE-CONTAINING CIRCUIT BOARD  
A photosensitive resin composition which is capable of reducing stress occurring due to thermal history, such as a heat treatment, a metal-base-containing circuit board production method which...
US20110027710 SELF EMULSIFYING GRANULES AND PROCESS FOR THE PREPARATION OF EMULSIONS THEREFROM  
A process for making a self-emulsifying granule suitable for use in forming latex emulsions includes contacting a resin with a solid or highly concentrated surfactant, a solid neutralization agent...
US20080227006 Stir-in pigment preparations for coloration of energy curable systems  
A dry colorant composition is disclosed and contains (a) pigment; (b) inert carrier; and (c) rheological additive having the structure: P—(U—Y)s wherein P is the residue of an organic colorant, Y...
US20120231376 FLUOROURETHANE AS AN ADDITIVE IN A PHOTOPOLYMER FORMULATION  
The invention relates to a photopolymer formulation comprising matrix polymers, writing monomers, and photoinitiators, to the use of the photopolymer formulation for producing optical elements, in...
US20140302436 CONTINUOUS WAX DISPERSION PRODUCTION PROCESSES  
Processes for continuously producing a wax dispersion are disclosed. A multi-screw extruder is used for the processes. A wax and a surfactant are fed into the extruder and melted together. Water...
US20120258389 TITANIA-DOPED QUARTZ GLASS AND MAKING METHOD  
On an EUV light-reflecting surface of titania-doped quartz glass, an angle (θ) included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence...
US20080020316 ELECTROPHOTOGRAPHIC TONER AND ELECTROPHOTOGRAPHIC DEVELOPER BY USE THEREOF  
An electrophotographic toner is disclosed, meeting the requirement that a ratio of a storage modulus at 60° C. [G′(60)] to a storage modulus at 80° C. [G′(80)], G′(60)/G′(80) is from 1×102 to...
US20150030980 RADIATION-SENSITIVE COMPOSITION  
A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good...
US20120145668 FORMING SLOPED RESIST, VIA, AND METAL CONDUCTOR STRUCTURES USING BANDED RETICLE STRUCTURES  
A technique generating sloping resist profiles based on an exposure process uses a reticle having structures surrounded with first and second contrasting interleaved bands below the resolution...
US20120189962 METHOD FOR MANUFACTURING STAMPER FOR INJECTION MOLDING  
The present invention relates to a method for manufacturing a stamper for injection molding, and more particularly, to a method for manufacturing a stamper for injection molding which can prevent...
US20110003123 SENSITIZER/INITIATOR COMBINATION FOR NEGATIVE-WORKING THERMAL-SENSITIVE COMPOSITIONS USABLE FOR LITHOGRAPHIC PLATES  
The radiation-sensitive composition and the negative working imageable element include a cationic IR absorber with tetraarylborate counteranion and an onium initiator with tetraarylborate...
US20110250527 MASK LAYOUT  
A mask layout is disclosed. The mask layout includes a mask body, a mask pattern disposed on a surface of the mask body, and a cover disposed on the mask body. Preferably, the mask body and the...
US20090103150 Object Having a Holographic Security Feature and Method for Manufacturing Such a Feature  
An optical security feature, e.g. for a banknote or other security documents, comprises a first and a second holographic layer arranged on top of each other. Each layer comprises a comparatively...
US20090004608 Detergent For Lithography And Method Of Forming Resist Pattern With The Same  
Conventional detergents for lithography which contain a surfactant as an active ingredient should have a reduced surfactant concentration because heightened surfactant concentrations result in...
US20090187878 DATA GENERATION METHOD FOR SEMICONDUCTOR DEVICE, AND ELECTRON BEAM EXPOSURE SYSTEM  
A method includes: generating electron beam exposure data, used for electron beam exposure, from design data of a semiconductor device; extracting differential information indicating a difference...
US20110195359 SELF-CONTAINED PROXIMITY EFFECT CORRECTION INSPIRATION FOR ADVANCED LITHOGRAPHY (SPECIAL)  
A lithography method is disclosed. An exemplary lithography method includes providing an energy sensitive resist material on a substrate; providing a desired pattern; performing a lithography...
US20070099095 Applying colour elements and busbars to a display substrate  
A method of applying to a display substrate colour elements and addressing busbars in a defined alignment relative to each other includes: forming said colour elements and said busbars on a...
US20070196761 Barrier rib and black top for plasma display panel and method of fabricating the same  
A method of fabricating barrier ribs and black tops for a plasma display panel including sequentially laminating a photosensitive barrier rib material and a photosensitive black top material on a...
US20150241781 MITIGATION OF EUV SHOT NOISE REPLICATING INTO ACID SHOT NOISE IN PHOTO-SENSITIZED CHEMICALLY-AMPLIFIED RESIST (PS-CAR)  
A method for mitigating shot noise in extreme ultraviolet (EUV) lithography and patterning of photo-sensitized chemically-amplified resist (PS-CAR) is described. The method includes a first EUV...
US20110223542 PATCH PRODUCTION  
A method of producing projections on a patch including providing a mask on a substrate and etching the substrate using an etchant and a passivant to thereby control the etching process and form...
US20050042537 Color-changing material composition and color-changing membranes made by using the same  
A color-changing material composition which comprises a binder resin comprising a copolymer of a methacrylic ester and methacrylic acid having a specific structure (Component A), at least one...
US20070072090 RETICLE HAVING A PROTECTION LAYER  
A reticle includes a reticle body having a first surface, a pattern disposed on the first surface of the reticle body, and at least a protection layer disposed on the first surface of the reticle...
US20140220480 Mask Repair with Passivation  
A method for repairing masks includes performing a first repair process to a mask by etching unwanted opaque regions from the mask, applying a plasma passivation process to the mask, and...
US20110188037 CONCENTRATOR AND LOCATOR DEVICE OF A SOLUTE AND METHOD FOR CONCENTRATING AND LOCATING A SOLUTE  
Concentrator and locator device (1) of a solute comprising a substrate (2) and a plurality of prismatic lithographic micro-structures (4) orthogonally emerging from the substrate (2). The...
US20110229821 Method of Photochemical Hydrolysis-Polycondensation of Cross-Linkable Chromophores with Steric Hindrance, Catalysed by a Photogenerated Acid, and the Applications Thereof  
The invention relates to a process for the hydrolysis-polycondensation of a sterically hindered crosslinkable chromophore, characterized in that the hydrolysis-polycondensation is catalyzed with...
US20090029270 Projection exposure device and method of separate exposure  
A projection exposure device which can perform high accurate alignment and separate exposures wherein the mask marks 20 overlap with the corresponding board marks 30 in exposure, the mask marks 20...
US20110229829 LITHOGRAPHY MATERIAL AND LITHOGRAPHY PROCESS  
An immersion lithography resist material comprising a matrix polymer having a first polarity and an additive having a second polarity that is substantially greater than the first polarity. The...
US20110287361 PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME  
New photoacid generator compounds are provided that comprise a nitrogen-base functional component of the structure —C(═O)N<. Photoresist compositions also are provided that comprise one or more...
US20110014559 COLORED TONERS  
The present disclosure provides violet toners and methods for their production. In embodiments, methods of the present disclosure include systems which may be utilized to predict the color...
US20110033787 FRAME CELL FOR SHOT LAYOUT FLEXIBILITY  
A method includes receiving an integrated circuit chip size and determining a frame structure segment size based on the chip size. The frame structure segment size is less than the chip size. An...
US20140113222 Mask for Use in Lithography  
A mask, or photomask, is used in lithography systems and processes. The mask includes a first polygon of a first state and a second polygon of a second state. The mask also includes a field of the...
US20130078557 LITHOGRAPHIC CD CORRECTION BY SECOND EXPOSURE  
Correction of critical dimension variation is accomplished with a second exposure, e.g. using a second reticle. Embodiments include exposing a first wafer with a first dose using a first reticle,...
US20110189612 METHOD FOR FIXING A FLEXOGRAPHIC PLATE  
A method includes removing the previously imaged area (120) from the flexographic plate (104) to create an opening in the flexographic plate; providing a portion (108) from a flexographic plate...
US20120183889 MULTIPLE LITHOGRAPHIC SYSTEM MASK SHAPE SLEEVING  
A mask fabrication method can include receiving a mask design, sending first exposure parameters to a first exposure machine, sending second exposure parameters to a second exposure machine,...
US20110183269 Methods Of Forming Patterns, And Methods For Trimming Photoresist Features  
Some embodiments include methods of forming patterns. Photoresist features may be formed over a base, with the individual photoresist features having heights and widths. The photoresist features...
US20060040213 Tunable lithography with a refractive mask  
A method includes exposing a first photoresist layer through a refractive mask to form a first pattern of above-threshold exposure spots in the first layer and exposing a second photoresist layer...
US20150044609 COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY  
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises two or more distinct materials that can be...
US20130065178 COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY  
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises two or more distinct materials that can be...
US20070190445 TONER FOR USE IN ELECTROSTATIC IMAGE DEVELOPMENT  
An electrostatic image developing toner is disclosed, comprising a resin and a colorant, wherein the toner contains at least one iminocarboxylic acid or its salt in an amount of from 26 to 388 ppm...