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US20120028191 Azide Functionalized Poly(3-Hexylthiophene) and Method of Forming Same  
The invention relates azide functionalized poly(3-hexylthiophene)s. Various azide functionalized poly(3-hexylthiophene)s and intermediates are disclosed and described, as well as method for making...
US20070054197 Mask and pattern forming method by using the same  
The present invention provides a mask comprising a substrate, a plurality of strip patterns and at least an assist pattern. The strip patterns are disposed on the substrate and arranged in...
US20070222100 Method and system using NIR spectroscopy for in-line monitoring and controlling content in continuous production of engineered wood products  
Method and system using near infrared (NIR) spectroscopy for dynamically monitoring and controlling the proportion of resin solids or other additive solids in combination with other ingredients...
US20120193762 REVERSAL LITHOGRAPHY APPROACH BY SELECTIVE DEPOSITION OF NANOPARTICLES  
A novel reversal lithography process without etch back is described. The reversal material comprises nanoparticles that are selectively deposited into the gaps between features without overcoating...
US20080254268 COLOR TONER FOR ELECTRO PRINTING, AND PROCESS FOR PRODUCING GLASS PLATE PROVIDED WITH CERAMIC COLOR PRINT, EMPLOYING IT  
A color toner for electro printing, whereby a ceramic color print excellent in adhesion can be printed on a glass plate surface by a simple process without using a screen plate. The color toner...
US20140193752 STABILIZED ACID AMPLIFIERS  
There are disclosed sulfonic acid precursor compositions, as are methods of using these compositions in, for example, photolithography. Other embodiments are also disclosed.
US20140127619 Red Toners  
Red toners that approximate PANTONEĀ® Red 032 and PANTONEĀ® Warm Red are described. The colorant includes an orange colorant and a red colorant, where the orange colorant absorbs light having a...
US20140255826 Endpoint Detection for Photolithography Mask Repair  
A method includes scanning a lithography mask with a repair process, and measuring back-scattered electron signals of back-scattered electrons generated from the scanning. An endpoint is...
US20110236803 PHOTOPOLYMER FORMULATION FOR PRODUCING VISIBLE HOLOGRAMS  
The present invention relates to a photopolymer formulation containing chemically crosslinked matrix polymers, writing monomers and a photoinitiator system, wherein the photoinitiator system...
US20120273899 SYSTEM AND METHODS FOR CONVERTING PLANAR DESIGN TO FINFET DESIGN  
A method for generating a layout for a device having FinFETs from a first layout for a device having planar transistors is disclosed. The planar layout is analyzed and corresponding FinFET...
US20120231377 PHOTOPOLYMER FORMULATION HAVING DIFFERENT WRITING COMONOMERS  
The invention relates to a photopolymer formulation comprising matrix polymers, writing monomers, and photo initiators, comprising a combination of at least two different writing monomers. The...
US20130323649 High Heat Load Optics with Vibration Isolated Hoses in an Extreme Ultraviolet Lithography System  
Methods and apparatus for reducing vibrations in an extreme ultraviolet (EUV) lithography system associated with the cooling of minors are described. According to one aspect of the present...
US20110045389 Method to Recover the Exposure Sensitivity of Chemically Amplified Resins from Post Coat Delay Effect  
Methods of fabricating a photomask, methods of treating a chemically amplified resist-coated photomask blank, a photomask blank resulting from the methods, and systems for fabricating a photomask...
US20150109672 Reflective Diffraction Grating and Method for the Production Thereof  
A reflective diffraction grating includes a substrate and a reflection-enhancing interference layer system. The reflection-enhancing interference layer system has alternating low refractive index...
US20130040235 POSITIVELY CHARGEABLE TONER  
In a positively chargeable toner, calcium carbonate fine particles having a certain average primary particle diameter are attached to the surface of toner base particles. The toner base particles...
US20050130077 Method for positioning and transferring at least two different patterns from a supply strip  
A method wherein a supply strip (bm) is entrained at a constant speed, which speed is the same as that of the substrate in strip form (c), during transfer between strips of each pattern and...
US20120064462 BY-PRODUCT MITIGATION IN THROUGH-SILICON-VIA PLATING  
Methods, systems, and apparatus for plating a metal onto a work piece with a plating solution having a low oxygen concentration are described. In one aspect, a method includes reducing an oxygen...
US20150004538 AZO COMPOUND, PIGMENT DISPERSANT CONTAINING THE AZO COMPOUND, PIGMENT COMPOSITION, PIGMENT DISPERSION AND TONER  
An object of the present invention is to provide an azo compound capable of improving the dispersibility of an azo pigment in a non-water-soluble solvent. The object of the present invention is...
US20150024321 NOVEL COMPOUND HAVING AZO SKELETON AND PIGMENT DISPERSANT, PIGMENT COMPOSITION, PIGMENT DISPERSION, AND TONER CONTAINING THE COMPOUND  
To provide an azo compound which improves the dispersibility of an azo pigment in a non-water soluble solvent. The purpose is achieved by an azo compound having a specific structure in which a...
US20150138524 Extreme Ultraviolet Lithography Process and Mask  
A system of an extreme ultraviolet lithography (EUVL) is disclosed. The system includes a mask having reflective phase-shift-grating-blocks (PhSGBs). The system also includes an illumination to...
US20080224251 Optimal Rasterization for Maskless Lithography  
A lithographic system is provided in which an extent of overlap between pattern sections is adjusted in order to match a size of a pattern section to a size of a repeating portion of the pattern...
US20110236805 MEMS lithography mask with improved tungsten deposition topography and method for the same  
The present invention discloses a MEMS lithography mask with improved tungsten deposition topography and a method for making the same. The MEMS lithography mask includes: a pattern including at...
US20130216949 WATER MARK DEFECT PREVENTION FOR IMMERSION LITHOGRAPHY  
A photoresist material having a polymer that turns soluble to a base solution in response to reaction with acid. The material includes a photo-acid generator (PAG) that decomposes to form acid in...
US20110183273 Water Mark Defect Prevention for Immersion Lithography  
A photoresist material having a polymer that turns soluble to a base solution in response to reaction with acid. The material includes a photo-acid generator (PAG) that decomposes to form acid in...
US20130089752 Forming a Bridging Feature Using Chromeless Phase-Shift Lithography  
An elongated, chromeless, bridging feature is formed on a photolithography mask with an etching depth that causes a nominal phase difference of more than 180 degrees to energy passing through the...
US20120282543 Easily Dispersible Pigment Preparation Based on C.I. Pigment Yellow 155  
Easily dispersible pigment preparation based on C.I. Pigment Yellow 155 The invention relates to a solid pigment preparation containing A) 5% to 99% by weight of PY 155 andB) 1% to 95% by weight...
US20100086860 PHOTOPOLYMER COMPOSITIONS FOR OPTICAL ELEMENTS AND VISUAL DISPLAYS  
The invention relates to novel photopolymers based on specific urethane acrylates as writing monomers, which are suitable for producing holographic media, in particular for visual display of images.
US20150072290 COATING COMPOSITIONS  
In one aspect, coating compositions are provided that comprise a component a component that comprises one or more silicon, antimony, aluminum, yttrium, cerium, lanthanum, tin, titanium, zirconium,...
US20070148561 Exposure equipment having auxiliary photo mask and exposure method using the same  
Example embodiments of the present invention may provide exposure equipment having an auxiliary photo mask. The exposure equipment may include a light source, and a first photo mask spaced apart...
US20150241775 PRETREATMENT METHOD FOR PARTIAL PLATING, PARTIAL PLATING METHOD FOR ALUMINUM MATERIALS, AND RESIST FOR PLATING ALUMINUM MATERIALS  
A self-assembled monolayer is formed, as a resist, from a mixture of nonafluorohexyltrimethoxysilane and trifluoropropyltrimethoxysilane on a substrate constituted by an aluminum material. A...
US20140199518 Facile Large Area Periodic Sub-Micron Photolithography  
Disclosed herein are articles and methods useful for the lithographic applications. The articles comprise a wrinkling structure and a photosensitive material. The articles and methods provide low...
US20150185647 Toner Compositions Including Silica Blends and Method to Make the Same  
The toner composition of the present invention and method to make the same includes toner particles mixed with a specific set of extra particulate additives including large colloidal silica sized...
US20150185646 Toner Compositions Including Silica Blends and Method to Make the Same  
The toner composition of the present invention and method to make the same includes toner particles mixed with a specific set of extra particulate additives including large colloidal silica sized...
US20060093937 Printing semiconducting components  
A toner particle for use in electrostatic printing of a semiconducting electronic device, the particle comprising: a resin; and non-organic semiconductor particles dispersed in the resin.
US20100009139 ADVANCED ORIENTED ASSIST FEATURES FOR INTEGRATED CIRCUIT HOLE PATTERNS  
An oriented assist feature is described that permits transferring of a lithographic pattern corresponding to an integrated circuit from a mask onto a semiconductor substrate. The oriented assist...
US20050221238 Use of a reticle absorber material in reducing aberrations  
A lithographic apparatus comprising a patterning reticle which has an aluminium absorber layer which improves imaging by eliminating or at least minimising the formation of aberrations in a...
US20050008942 [PHOTOMASK WITH INTERNAL ASSISTANT PATTERN FORENHANCING RESOLUTION OF MULTI-DIMENSION PATTERN]  
A photomask with an internal assistant pattern, comprising a first pattern having a plurality of parallel lines along a first direction; a second pattern having a plurality of parallel lines along...
US20060141209 Pellicle for photolithography and pellicle frame  
There is disclosed a pellicle 1 for photolithography comprising, a pellicle frame 2 for constituting a pellicle for photolithography, wherein the frame is made of an aluminum alloy whose surface...
US20100297557 Coating compositions suitable for use with an overcoated photoresist  
Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development...
US20090233189 DEVICE AND METHOD FOR OBTAINING EXPOSURE CORRECTION INFORMATION, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE  
A method of obtaining exposure correction information includes adjusting intensity of light incident on a photomask so that intensity of light output from the photomask has a desired distribution,...
US20120077123 Organic pigments for colour filters  
Use of pigments of the formula (I) containing melamine as guest compound and having a dispersion harshness of more than 250 as pigments for colour filters for liquid-crystal displays.
US20110143268 Scattering Bar OPC Application Method for Sub-Half Wavelength Lithography Patterning  
A method of forming a mask having optical proximity correction features, which includes the steps of obtaining a target pattern of features to be imaged, expanding- the width of the features to be...
US20150053457 PRINTED CIRCUIT BOARD AND METHOD OF MANUFACTURING THE SAME  
Disclosed herein are a printed circuit board and a method of manufacturing the same. According to the preferred embodiment of the present invention, the printed circuit board includes: a glass...
US20090233239 Reticle for Use in a Semiconductor Lithographic System and Method for Modifying the Same  
A reticle for use in a semiconductor lithographic system includes at least two separated reticle parts. Each part includes a pattern to be transferred lithographically to a substrate. At least one...
US20150255272 SYSTEM, METHOD AND RETICLE FOR IMPROVED PATTERN QUALITY IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY AND METHOD FOR FORMING THE RETICLE  
A reticle for use in an extreme ultraviolet (euv) lithography tool includes a trench formed in the opaque border formed around the image field of the reticle. The trench is coated with an absorber...
US20150017579 IMAGING MEMBERS HAVING A CROSS-LINKED ANTICURL BACK COATING  
The disclosure provides a flexible electrophotographic imaging member having an optically clear, cross-linked anticurl back coating of melamine formaldehyde to effect complete and absolute imaging...
US20070231712 Alternating phase shift masking  
An alternating phase shift mask may be formed using a dry undercut etch. The dry undercut etch reduces problems associated with wet etching of quartz or glass masks. In addition, the use of the...
US20130004892 METHOD OF PRODUCTING ELECTRONIC CIRCUIT BOARDS USING ELECTROPHOTOGRAPHY  
The present invention provides a method producing printed electronic circuits using electrophotography.
US20150205194 Lithography Mask  
The present disclosure provides a lithography mask comprising a substrate, a reflective multiplayer (ML) on the substrate, a barrier layer on the reflective ML, and an absorber layer over the...
US20080145765 Metal Identification Platelet and Method of Producing Thereof  
A metal identification platelet equipped with an identification code, while the identification code comprises a hologram. A method of producing the identification platelet with the identification...