|
Match
|
Document |
Document Title |
|
|
US20100086860 |
PHOTOPOLYMER COMPOSITIONS FOR OPTICAL ELEMENTS AND VISUAL DISPLAYS
The invention relates to novel photopolymers based on specific urethane acrylates as writing monomers, which are suitable for producing holographic media, in particular for visual display of images.
|
|
|
US20070148561 |
Exposure equipment having auxiliary photo mask and exposure method using the same
Example embodiments of the present invention may provide exposure equipment having an auxiliary photo mask. The exposure equipment may include a light source, and a first photo mask spaced apart...
|
|
|
US20060093937 |
Printing semiconducting components
A toner particle for use in electrostatic printing of a semiconducting electronic device, the particle comprising: a resin; and non-organic semiconductor particles dispersed in the resin.
|
|
|
US20100009139 |
ADVANCED ORIENTED ASSIST FEATURES FOR INTEGRATED CIRCUIT HOLE PATTERNS
An oriented assist feature is described that permits transferring of a lithographic pattern corresponding to an integrated circuit from a mask onto a semiconductor substrate. The oriented assist...
|
|
|
US20050221238 |
Use of a reticle absorber material in reducing aberrations
A lithographic apparatus comprising a patterning reticle which has an aluminium absorber layer which improves imaging by eliminating or at least minimising the formation of aberrations in a...
|
|
|
US20050008942 |
[PHOTOMASK WITH INTERNAL ASSISTANT PATTERN FORENHANCING RESOLUTION OF MULTI-DIMENSION PATTERN]
A photomask with an internal assistant pattern, comprising a first pattern having a plurality of parallel lines along a first direction; a second pattern having a plurality of parallel lines along...
|
|
|
US20060141209 |
Pellicle for photolithography and pellicle frame
There is disclosed a pellicle 1 for photolithography comprising, a pellicle frame 2 for constituting a pellicle for photolithography, wherein the frame is made of an aluminum alloy whose surface is...
|
|
|
US20100297557 |
Coating compositions suitable for use with an overcoated photoresist
Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development...
|
|
|
US20090233189 |
DEVICE AND METHOD FOR OBTAINING EXPOSURE CORRECTION INFORMATION, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
A method of obtaining exposure correction information includes adjusting intensity of light incident on a photomask so that intensity of light output from the photomask has a desired distribution,...
|
|
|
US20120077123 |
Organic pigments for colour filters
Use of pigments of the formula (I) containing melamine as guest compound and having a dispersion harshness of more than 250 as pigments for colour filters for liquid-crystal displays.
|
|
|
US20110143268 |
Scattering Bar OPC Application Method for Sub-Half Wavelength Lithography Patterning
A method of forming a mask having optical proximity correction features, which includes the steps of obtaining a target pattern of features to be imaged, expanding- the width of the features to be...
|
|
|
US20090233239 |
Reticle for Use in a Semiconductor Lithographic System and Method for Modifying the Same
A reticle for use in a semiconductor lithographic system includes at least two separated reticle parts. Each part includes a pattern to be transferred lithographically to a substrate. At least one...
|
|
|
US20070231712 |
Alternating phase shift masking
An alternating phase shift mask may be formed using a dry undercut etch. The dry undercut etch reduces problems associated with wet etching of quartz or glass masks. In addition, the use of the dry...
|
|
|
US20130004892 |
METHOD OF PRODUCTING ELECTRONIC CIRCUIT BOARDS USING ELECTROPHOTOGRAPHY
The present invention provides a method producing printed electronic circuits using electrophotography.
|
|
|
US20080145765 |
Metal Identification Platelet and Method of Producing Thereof
A metal identification platelet equipped with an identification code, while the identification code comprises a hologram. A method of producing the identification platelet with the identification...
|
|
|
US20090123852 |
Hard-material object comprising visional color-varying surface
A hard-material object comprising a visional color-varying surface comprises a hard-material carrier and a pattern disposed on the surface of the hard-material carrier. The pattern comprises a...
|
|
|
US20090047606 |
Lithography meandering order
An imprint lithography method is disclosed, which includes imprinting a plurality of patterns in an imprintable medium provided on a substrate, wherein the order in which the patterns are imprinted...
|
|
|
US20110043238 |
METHOD OF MANUFACTURING NEEDLE FOR PROBE CARD USING FINE PROCESSING TECHNOLOGY, NEEDLE MANUFACTURED BY THE METHOD AND PROBE CARD COMPRISING THE NEEDLE
Disclosed are probe card needles manufactured using microfabrication technology, a method for manufacturing the probe card needles, and a probe card having the probe card needles. The probe needles...
|
|
|
US20130089813 |
Forming a Bridging Feature Using Chromeless Phase-Shift Lithography
First and second anchor features are formed on a substrate via a chromeless photolithography process. An elongated bridging feature is formed between the anchor features on the substrate via the...
|
|
|
US20130017487 |
COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
|
|
|
US20120264053 |
COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
|
|
|
US20120225384 |
COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
|
|
|
US20110084787 |
PHOTOSENSITIVE RESIN COMPOSITION, METAL-BASE-CONTAINING CIRCUIT BOARD PRODUCTION METHOD EMPLOYING THE PHOTOSENSITIVE RESIN COMPOSITION, AND METAL-BASE-CONTAINING CIRCUIT BOARD
A photosensitive resin composition which is capable of reducing stress occurring due to thermal history, such as a heat treatment, a metal-base-containing circuit board production method which...
|
|
|
US20110027710 |
SELF EMULSIFYING GRANULES AND PROCESS FOR THE PREPARATION OF EMULSIONS THEREFROM
A process for making a self-emulsifying granule suitable for use in forming latex emulsions includes contacting a resin with a solid or highly concentrated surfactant, a solid neutralization agent...
|
|
|
US20080227006 |
Stir-in pigment preparations for coloration of energy curable systems
A dry colorant composition is disclosed and contains (a) pigment; (b) inert carrier; and (c) rheological additive having the structure: P—(U—Y)s wherein P is the residue of an organic colorant, Y i...
|
|
|
US20120231376 |
FLUOROURETHANE AS AN ADDITIVE IN A PHOTOPOLYMER FORMULATION
The invention relates to a photopolymer formulation comprising matrix polymers, writing monomers, and photoinitiators, to the use of the photopolymer formulation for producing optical elements, in...
|
|
|
US20120258389 |
TITANIA-DOPED QUARTZ GLASS AND MAKING METHOD
On an EUV light-reflecting surface of titania-doped quartz glass, an angle (θ) included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence ...
|
|
|
US20080020316 |
ELECTROPHOTOGRAPHIC TONER AND ELECTROPHOTOGRAPHIC DEVELOPER BY USE THEREOF
An electrophotographic toner is disclosed, meeting the requirement that a ratio of a storage modulus at 60° C. [G′(60)] to a storage modulus at 80° C. [G′(80)], G′(60)/G′(80) is from 1×102 to ...
|
|
|
US20120145668 |
FORMING SLOPED RESIST, VIA, AND METAL CONDUCTOR STRUCTURES USING BANDED RETICLE STRUCTURES
A technique generating sloping resist profiles based on an exposure process uses a reticle having structures surrounded with first and second contrasting interleaved bands below the resolution...
|
|
|
US20120189962 |
METHOD FOR MANUFACTURING STAMPER FOR INJECTION MOLDING
The present invention relates to a method for manufacturing a stamper for injection molding, and more particularly, to a method for manufacturing a stamper for injection molding which can prevent a...
|
|
|
US20110003123 |
SENSITIZER/INITIATOR COMBINATION FOR NEGATIVE-WORKING THERMAL-SENSITIVE COMPOSITIONS USABLE FOR LITHOGRAPHIC PLATES
The radiation-sensitive composition and the negative working imageable element include a cationic IR absorber with tetraarylborate counteranion and an onium initiator with tetraarylborate...
|
|
|
US20110250527 |
MASK LAYOUT
A mask layout is disclosed. The mask layout includes a mask body, a mask pattern disposed on a surface of the mask body, and a cover disposed on the mask body. Preferably, the mask body and the...
|
|
|
US20090103150 |
Object Having a Holographic Security Feature and Method for Manufacturing Such a Feature
An optical security feature, e.g. for a banknote or other security documents, comprises a first and a second holographic layer arranged on top of each other. Each layer comprises a comparatively...
|
|
|
US20090004608 |
Detergent For Lithography And Method Of Forming Resist Pattern With The Same
Conventional detergents for lithography which contain a surfactant as an active ingredient should have a reduced surfactant concentration because heightened surfactant concentrations result in...
|
|
|
US20090187878 |
DATA GENERATION METHOD FOR SEMICONDUCTOR DEVICE, AND ELECTRON BEAM EXPOSURE SYSTEM
A method includes: generating electron beam exposure data, used for electron beam exposure, from design data of a semiconductor device; extracting differential information indicating a difference...
|
|
|
US20110195359 |
SELF-CONTAINED PROXIMITY EFFECT CORRECTION INSPIRATION FOR ADVANCED LITHOGRAPHY (SPECIAL)
A lithography method is disclosed. An exemplary lithography method includes providing an energy sensitive resist material on a substrate; providing a desired pattern; performing a lithography...
|
|
|
US20070099095 |
Applying colour elements and busbars to a display substrate
A method of applying to a display substrate colour elements and addressing busbars in a defined alignment relative to each other includes: forming said colour elements and said busbars on a surface...
|
|
|
US20070196761 |
Barrier rib and black top for plasma display panel and method of fabricating the same
A method of fabricating barrier ribs and black tops for a plasma display panel including sequentially laminating a photosensitive barrier rib material and a photosensitive black top material on a...
|
|
|
US20110223542 |
PATCH PRODUCTION
A method of producing projections on a patch including providing a mask on a substrate and etching the substrate using an etchant and a passivant to thereby control the etching process and form the...
|
|
|
US20050042537 |
Color-changing material composition and color-changing membranes made by using the same
A color-changing material composition which comprises a binder resin comprising a copolymer of a methacrylic ester and methacrylic acid having a specific structure (Component A), at least one...
|
|
|
US20070072090 |
RETICLE HAVING A PROTECTION LAYER
A reticle includes a reticle body having a first surface, a pattern disposed on the first surface of the reticle body, and at least a protection layer disposed on the first surface of the reticle...
|
|
|
US20110188037 |
CONCENTRATOR AND LOCATOR DEVICE OF A SOLUTE AND METHOD FOR CONCENTRATING AND LOCATING A SOLUTE
Concentrator and locator device (1) of a solute comprising a substrate (2) and a plurality of prismatic lithographic micro-structures (4) orthogonally emerging from the substrate (2). The...
|
|
|
US20110229821 |
Method of Photochemical Hydrolysis-Polycondensation of Cross-Linkable Chromophores with Steric Hindrance, Catalysed by a Photogenerated Acid, and the Applications Thereof
The invention relates to a process for the hydrolysis-polycondensation of a sterically hindered crosslinkable chromophore, characterized in that the hydrolysis-polycondensation is catalyzed with an...
|
|
|
US20090029270 |
Projection exposure device and method of separate exposure
A projection exposure device which can perform high accurate alignment and separate exposures wherein the mask marks 20 overlap with the corresponding board marks 30 in exposure, the mask marks 20...
|
|
|
US20110229829 |
LITHOGRAPHY MATERIAL AND LITHOGRAPHY PROCESS
An immersion lithography resist material comprising a matrix polymer having a first polarity and an additive having a second polarity that is substantially greater than the first polarity. The...
|
|
|
US20110287361 |
PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME
New photoacid generator compounds are provided that comprise a nitrogen-base functional component of the structure —C(═O)N<. Photoresist compositions also are provided that comprise one or more PAG...
|
|
|
US20110014559 |
COLORED TONERS
The present disclosure provides violet toners and methods for their production. In embodiments, methods of the present disclosure include systems which may be utilized to predict the color...
|
|
|
US20110033787 |
FRAME CELL FOR SHOT LAYOUT FLEXIBILITY
A method includes receiving an integrated circuit chip size and determining a frame structure segment size based on the chip size. The frame structure segment size is less than the chip size. An...
|
|
|
US20130078557 |
LITHOGRAPHIC CD CORRECTION BY SECOND EXPOSURE
Correction of critical dimension variation is accomplished with a second exposure, e.g. using a second reticle. Embodiments include exposing a first wafer with a first dose using a first reticle,...
|
|
|
US20110189612 |
METHOD FOR FIXING A FLEXOGRAPHIC PLATE
A method includes removing the previously imaged area (120) from the flexographic plate (104) to create an opening in the flexographic plate; providing a portion (108) from a flexographic plate...
|