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US20150098069 Extreme Ultraviolet Lithography Process and Mask  
A system of an extreme ultraviolet lithography (EUVL) is disclosed. The system includes an extreme ultraviolet (EUV) mask with three states. A reflection coefficient is r1, r2 and r3, respectively,...
US20150056538 Device for protecting crops using hologram of natural enemy eyes and method for fabricating the same  
Disclosed are a device for protecting crops from wildlife, comprising an optical base film on both sides of which fluorescent holograms of natural enemies with both eyes and optionally claws or...
US20150050746 METHODS FOR FABRICATING HIGH ASPECT RATIO PROBES AND DEFORMING HIGH ASPECT RATIO NANOPILLARS AND MICROPILLARS  
Methods for fabricating of high aspect ratio probes and deforming micropillars and nanopillars are described. Use of polymers in deforming nanopillars and micropillars is also described.
US20140141536 Method and System for Providing a Target Design Displaying High Sensitivity to Scanner Focus Change  
A segmented mask includes a set of cell structures, wherein each cell structure includes a set of features having an unresolvable segmentation pitch along a first direction, wherein the...
US20080291561 LIGHT COLORING SYSTEM  
A rainbow wheel that colors light that is passed therethrough. The wheel can be formed using a photolithographic process. Another supermagenta wheel can be used to increase the number of colors...
US20130148181 PHOTOREFRACTIVE COMPOSITE, SPATIAL LIGHT MODULATOR, AND HOLOGRAM DISPLAY DEVICE USING THE SAME  
A photorefractive composite, a spatial light modulator and a hologram display device using the same include at least one carborane compound expressed as the following Chemical Formulae 1A through...
US20130148180 PHOTOREFRACTIVE COMPOSITE, SPATIAL LIGHT MODULATOR, AND HOLOGRAM DISPLAY DEVICE USING THE SAME  
A photorefractive composite, a spatial light modulator and a hologram display device using the same include at least one carborane compound expressed as the following Chemical Formulae 1A through...
US20110065039 TONER BINDER AND TONER  
A toner excellent in low temperature fixability and blocking resistance, and a toner binder are provided. The present invention is a toner binder containing a crystalline resin (A) having a maximum...
US20150024307 Method for Manufacturing EUV Masks Minimizing the Impact of Substrate Defects  
In the production of extreme ultraviolet photolithography masks, to produce a set of masks: mask blanks possibly containing defects are provided; an individual map of positions of defects in each...
US20080261126 SECURE PHOTOMASK WITH BLOCKING APERTURE  
A secure photomask including a substrate having one or more pattern layers formed thereon and a blocking aperture disposed below the one or more pattern layers that prevents at least one of...
US20080199791 ELECTROPHOTOGRAPHIC PRINTING TONER, ELECTROPHOTOGRAPHIC PRINTING METHOD AND LIQUID DEVELOPER FOR ELECTROPHOTOGRAPHIC PRINTING  
An electrophotographic printing toner including a colorant and a resin, wherein the colorant includes a dye having at least one reactive group selected from the group consisting of SO2CnH2nOSO3H,...
US20140242522 DOUBLE-MASK PHOTOLITHOGRAPHY METHOD MINIMIZING THE IMPACT OF SUBSTRATE DEFECTS  
In the field of photolithography and, notably, photolithography in the extreme ultraviolet, a photolithography method is provided in which a first mask blank is produced that can have defects, an...
US20120320348 REFLECTIVE MASK FOR EUV LITHOGRAPHY  
To improve the mask of an EUV lithography apparatus in view of its high reflectivity, a reflective mask is suggested for EUV lithography having a reflective multilayer system on a substrate...
US20120107742 METHOD AND PHOTORESIST WITH ZIPPER MECHANISM  
The present disclosure provides a resist utilized in a photolithography patterning process. The resist includes a polymeric material having a plurality of zipper molecules, each including a first...
US20110171585 Photolithography Method  
A photolithography method is provided which includes: arranging a layout topography in a first mask and a second mask in such a way that at least a layout pattern of the layout topography is...
US20140376081 ELECTROPHORETIC PARTICLES, ELECTROPHORETIC DISPERSION LIQUID, DISPLAY SHEET, DISPLAY DEVICE, AND ELECTRONIC EQUIPMENT  
Electrophoretic particle include a core particle; a siloxane-based compound that is bonded to a surface of the core particle and contains a connection structure in which a plurality of siloxane...
US20090068358 PLASTIC CODE WHEEL/STRIP FABRICATION METHOD  
A method of making a plastic code wheel/code strip by: depositing a chrome-aluminum film on a plastic substrate having a transmittance greater than 90%, a transmittance greater than 90%, a heat...
US20090142675 RETICLE FOR OPTICAL PROXIMITY CORRECTION TEST PATTERN AND METHOD OF MANUFACTURING THE SAME  
A reticle for an Optical Proximity Correction (OPC) test pattern and a method of manufacturing the same. In one example embodiment of the present invention, a reticle for an OPC test pattern...
US20080020326 Pattern Decomposition Method For Double Exposure  
A pattern decomposition method capable of achieving patterns with a complicated layout by double exposure. The pattern decomposition method for decomposing a target pattern which includes first...
US20150053469 PRINTED CIRCUIT BOARD AND METHOD OF MANUFACTURING THE SAME  
Disclosed herein are a printed circuit board and a method of manufacturing the same. The printed circuit board includes a light-blocking glass substrate; a negative photosensitive insulating layer...
US20130260288 EXTREME ULTRAVIOLET LITHOGRAPHY PROCESS AND MASK  
A process of an extreme ultraviolet lithography (EUVL) is disclosed. The process includes receiving an extreme ultraviolet (EUV) mask with multiple states. Different states of the EUV mask are...
US20100045024 SECURITY ELEMENT FOR A SECURITY DOCUMENT AND PROCESS FOR THE PRODUCTION THEREOF  
The invention concerns a security element for a security document comprising a structure layer and diffractive first and second relief structures, wherein the relief structures viewed parallel to...
US20080266534 PHOTOMASK HAZE REDUCTION VIA VENTILATION  
Where a framed pellicle is mounted on a photomask, the framed pellicle comprises a pellicle frame and a pellicle membrane coupled to the pellicle frame, the pellicle frame has first and second...
US20120129108 BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME  
This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that...
US20130078574 SELF-ASSEMBLABLE POLYMER AND METHOD FOR USE IN LITHOGRAPHY  
A self-assemblable polymer is disclosed, having first and second molecular configurations with the first molecular configuration has a higher Flory Huggins parameter for the self-assemblable...
US20150132685 Lithography Mask and Method of Forming a Lithography Mask  
A first embodiment is a lithography mask comprising a transparent substrate and a first molybdenum silicon nitride (MoxSiyNz) layer. The first MoxSiyNz layer is over the transparent substrate. A...
US20130095414 Lithography Mask and Method of Forming a Lithography Mask  
A first embodiment is a lithography mask comprising a transparent substrate and a first molybdenum silicon nitride (MoxSiyNz) layer. The first MoxSiyNz layer is over the transparent substrate. A...
US20090095512 METHOD FOR PRODUCING A GLASS PLATE WITH A CONDUCTIVE PRINTED WIRE AND GLASS PLATE WITH A CONDUCTIVE PRINTED WIRE  
Provided is a process for producing a glass plate with a conductive printed wire, which does not require a screen plate for each model, facilitates adjustments for desired heat generation...
US20140348200 MIDDLE-INFRARED VOLUMETRIC BRAGG GRATING BASED ON ALKALI HALIDE COLOR CENTER CRYSTALS  
Volumetric Bragg grating devices that operate in middle-infrared region of the spectrum and methods for producing such devices are described. Such a Volumetric Bragg grating device can be produced...
US20120171600 Time Differential Reticle Inspection  
Disclosed are systems and methods for time differential reticle inspection. Contamination is detected by, for example, determining a difference between a first signature of at least a portion of a...
US20140333989 REGISTERED REFLECTIVE ELEMENT FOR A BRIGHTNESS ENHANCED TIR DISPLAY  
The brightness of a TIR-based display is enhanced with a registered reflective element by recycling and reflecting light that passes through the dark pupil region of each hemi-spherical protrusion...
US20140242524 TWO MASK PROCESS FOR ELECTROPLATING METAL EMPLOYING A NEGATIVE ELECTROPHORETIC PHOTORESIST  
A negative electrophoretic photoresist is applied over a plurality of protruding disposable template portions on a substrate. A silo structure is placed on planar portions of the negative...
US20100081077 Method For Reducing Wear On An Electro-Photographic Printer Drum  
A method for reducing wear upon an electro-photographic printer drum includes the steps of determining a non-image region of a page to be printed, applying a halftone pattern of toner to a portion...
US20090029268 PELLICLE STRESS RELIEF  
The present disclosure provides a mask-pellicle system for lithography patterning. The mask-pellicle system includes a mask substrate; a predefined pattern formed on the transparent pattern; a...
US20080166657 Resist composition for bulkhead formation, bulkhead of EL display device and EL display device  
Provided are a resist composition for separator formation which can be applied for forming separators in the form including a forward taper shape and a reverse taper shape and can be widely used...
US20110177443 COLORED TONERS  
The present disclosure provides blue toners and methods for their production. In embodiments, methods of the present disclosure include systems which may be utilized to predict the color properties...
US20150093688 MANUFACTURING METHOD FOR PHOTOMASK  
A manufacturing method for a photomask for wafer processing includes a step of forming a groove on the front side of a light shielding plate in an area where light is to be passed. The groove has a...
US20070287094 Planographic Printing Plate, Planographic Printing Plate Material, Support for Planographic Printing Plate Material, and Planographic Printing Method  
An objective is to provide a planographic printing plate material exhibiting excellent properties such as printing durability, resistance to chemicals and anti-stain at the beginning of printing...
US20090092934 GRAY-TONE LITHOGRAPHY USING OPTICAL DIFFUSERS  
A method of: directing an exposing light through an optical diffuser; directing the diffused light though a photomask having transparent areas corresponding to a gray-tone pattern; directing the...
US20130137017 Photomask Constructions Having Liners of Specified Compositions Along Sidewalls of Multi-Layered Structures  
Some embodiments include methods in which a mathematical representation of a photomask construction is defined, with such representation comprising a plurality of pillars that individually contain...
US20140030653 COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY  
Underlying coating compositions are provided that comprise one or more resins comprising one or more modified imide groups. These coating compositions are particularly useful as antireflective...
US20120058419 TITANIA-DOPED QUARTZ GLASS AND MAKING METHOD  
A titania-doped quartz glass suited as an EUV lithographic member is prepared by feeding a silicon-providing reactant gas and a titanium-providing reactant gas through a burner along with hydrogen...
US20110172110 TRACERS AND ASSEMBLY FOR LABELING CHEMICAL OR BIOLOGICAL MOLECULES METHODS AND KITS USING THE SAME  
An improved process to create an arbitrarily large number of distinguishable particles allows more flexibility in experimental design and related efficiencies of scale. Novel enhanced tracers, for...
US20120028191 Azide Functionalized Poly(3-Hexylthiophene) and Method of Forming Same  
The invention relates azide functionalized poly(3-hexylthiophene)s. Various azide functionalized poly(3-hexylthiophene)s and intermediates are disclosed and described, as well as method for making...
US20070054197 Mask and pattern forming method by using the same  
The present invention provides a mask comprising a substrate, a plurality of strip patterns and at least an assist pattern. The strip patterns are disposed on the substrate and arranged in parallel...
US20070222100 Method and system using NIR spectroscopy for in-line monitoring and controlling content in continuous production of engineered wood products  
Method and system using near infrared (NIR) spectroscopy for dynamically monitoring and controlling the proportion of resin solids or other additive solids in combination with other ingredients...
US20120193762 REVERSAL LITHOGRAPHY APPROACH BY SELECTIVE DEPOSITION OF NANOPARTICLES  
A novel reversal lithography process without etch back is described. The reversal material comprises nanoparticles that are selectively deposited into the gaps between features without overcoating...
US20080254268 COLOR TONER FOR ELECTRO PRINTING, AND PROCESS FOR PRODUCING GLASS PLATE PROVIDED WITH CERAMIC COLOR PRINT, EMPLOYING IT  
A color toner for electro printing, whereby a ceramic color print excellent in adhesion can be printed on a glass plate surface by a simple process without using a screen plate. The color toner for...
US20140193752 STABILIZED ACID AMPLIFIERS  
There are disclosed sulfonic acid precursor compositions, as are methods of using these compositions in, for example, photolithography. Other embodiments are also disclosed.
US20140127619 Red Toners  
Red toners that approximate PANTONEĀ® Red 032 and PANTONEĀ® Warm Red are described. The colorant includes an orange colorant and a red colorant, where the orange colorant absorbs light having a w...