Sign up


Match Document Document Title
US20080020326 Pattern Decomposition Method For Double Exposure  
A pattern decomposition method capable of achieving patterns with a complicated layout by double exposure. The pattern decomposition method for decomposing a target pattern which includes first...
US20130260288 EXTREME ULTRAVIOLET LITHOGRAPHY PROCESS AND MASK  
A process of an extreme ultraviolet lithography (EUVL) is disclosed. The process includes receiving an extreme ultraviolet (EUV) mask with multiple states. Different states of the EUV mask are...
US20100045024 SECURITY ELEMENT FOR A SECURITY DOCUMENT AND PROCESS FOR THE PRODUCTION THEREOF  
The invention concerns a security element for a security document comprising a structure layer and diffractive first and second relief structures, wherein the relief structures viewed parallel to...
US20080266534 PHOTOMASK HAZE REDUCTION VIA VENTILATION  
Where a framed pellicle is mounted on a photomask, the framed pellicle comprises a pellicle frame and a pellicle membrane coupled to the pellicle frame, the pellicle frame has first and second...
US20120129108 BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME  
This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that...
US20130078574 SELF-ASSEMBLABLE POLYMER AND METHOD FOR USE IN LITHOGRAPHY  
A self-assemblable polymer is disclosed, having first and second molecular configurations with the first molecular configuration has a higher Flory Huggins parameter for the self-assemblable...
US20130095414 Lithography Mask and Method of Forming a Lithography Mask  
A first embodiment is a lithography mask comprising a transparent substrate and a first molybdenum silicon nitride (MoxSiyNz) layer. The first MoxSiyNz layer is over the transparent substrate. A...
US20090095512 METHOD FOR PRODUCING A GLASS PLATE WITH A CONDUCTIVE PRINTED WIRE AND GLASS PLATE WITH A CONDUCTIVE PRINTED WIRE  
Provided is a process for producing a glass plate with a conductive printed wire, which does not require a screen plate for each model, facilitates adjustments for desired heat generation...
US20120171600 Time Differential Reticle Inspection  
Disclosed are systems and methods for time differential reticle inspection. Contamination is detected by, for example, determining a difference between a first signature of at least a portion of a...
US20140242524 TWO MASK PROCESS FOR ELECTROPLATING METAL EMPLOYING A NEGATIVE ELECTROPHORETIC PHOTORESIST  
A negative electrophoretic photoresist is applied over a plurality of protruding disposable template portions on a substrate. A silo structure is placed on planar portions of the negative...
US20100081077 Method For Reducing Wear On An Electro-Photographic Printer Drum  
A method for reducing wear upon an electro-photographic printer drum includes the steps of determining a non-image region of a page to be printed, applying a halftone pattern of toner to a portion...
US20090029268 PELLICLE STRESS RELIEF  
The present disclosure provides a mask-pellicle system for lithography patterning. The mask-pellicle system includes a mask substrate; a predefined pattern formed on the transparent pattern; a...
US20080166657 Resist composition for bulkhead formation, bulkhead of EL display device and EL display device  
Provided are a resist composition for separator formation which can be applied for forming separators in the form including a forward taper shape and a reverse taper shape and can be widely used...
US20110177443 COLORED TONERS  
The present disclosure provides blue toners and methods for their production. In embodiments, methods of the present disclosure include systems which may be utilized to predict the color properties...
US20070287094 Planographic Printing Plate, Planographic Printing Plate Material, Support for Planographic Printing Plate Material, and Planographic Printing Method  
An objective is to provide a planographic printing plate material exhibiting excellent properties such as printing durability, resistance to chemicals and anti-stain at the beginning of printing...
US20090092934 GRAY-TONE LITHOGRAPHY USING OPTICAL DIFFUSERS  
A method of: directing an exposing light through an optical diffuser; directing the diffused light though a photomask having transparent areas corresponding to a gray-tone pattern; directing the...
US20130137017 Photomask Constructions Having Liners of Specified Compositions Along Sidewalls of Multi-Layered Structures  
Some embodiments include methods in which a mathematical representation of a photomask construction is defined, with such representation comprising a plurality of pillars that individually contain...
US20140030653 COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY  
Underlying coating compositions are provided that comprise one or more resins comprising one or more modified imide groups. These coating compositions are particularly useful as antireflective...
US20120058419 TITANIA-DOPED QUARTZ GLASS AND MAKING METHOD  
A titania-doped quartz glass suited as an EUV lithographic member is prepared by feeding a silicon-providing reactant gas and a titanium-providing reactant gas through a burner along with hydrogen...
US20110172110 TRACERS AND ASSEMBLY FOR LABELING CHEMICAL OR BIOLOGICAL MOLECULES METHODS AND KITS USING THE SAME  
An improved process to create an arbitrarily large number of distinguishable particles allows more flexibility in experimental design and related efficiencies of scale. Novel enhanced tracers, for...
US20120028191 Azide Functionalized Poly(3-Hexylthiophene) and Method of Forming Same  
The invention relates azide functionalized poly(3-hexylthiophene)s. Various azide functionalized poly(3-hexylthiophene)s and intermediates are disclosed and described, as well as method for making...
US20070054197 Mask and pattern forming method by using the same  
The present invention provides a mask comprising a substrate, a plurality of strip patterns and at least an assist pattern. The strip patterns are disposed on the substrate and arranged in parallel...
US20070222100 Method and system using NIR spectroscopy for in-line monitoring and controlling content in continuous production of engineered wood products  
Method and system using near infrared (NIR) spectroscopy for dynamically monitoring and controlling the proportion of resin solids or other additive solids in combination with other ingredients...
US20120193762 REVERSAL LITHOGRAPHY APPROACH BY SELECTIVE DEPOSITION OF NANOPARTICLES  
A novel reversal lithography process without etch back is described. The reversal material comprises nanoparticles that are selectively deposited into the gaps between features without overcoating...
US20080254268 COLOR TONER FOR ELECTRO PRINTING, AND PROCESS FOR PRODUCING GLASS PLATE PROVIDED WITH CERAMIC COLOR PRINT, EMPLOYING IT  
A color toner for electro printing, whereby a ceramic color print excellent in adhesion can be printed on a glass plate surface by a simple process without using a screen plate. The color toner for...
US20140193752 STABILIZED ACID AMPLIFIERS  
There are disclosed sulfonic acid precursor compositions, as are methods of using these compositions in, for example, photolithography. Other embodiments are also disclosed.
US20140127619 Red Toners  
Red toners that approximate PANTONEĀ® Red 032 and PANTONEĀ® Warm Red are described. The colorant includes an orange colorant and a red colorant, where the orange colorant absorbs light having a w...
US20140255826 Endpoint Detection for Photolithography Mask Repair  
A method includes scanning a lithography mask with a repair process, and measuring back-scattered electron signals of back-scattered electrons generated from the scanning. An endpoint is determined...
US20110236803 PHOTOPOLYMER FORMULATION FOR PRODUCING VISIBLE HOLOGRAMS  
The present invention relates to a photopolymer formulation containing chemically crosslinked matrix polymers, writing monomers and a photoinitiator system, wherein the photoinitiator system...
US20120273899 SYSTEM AND METHODS FOR CONVERTING PLANAR DESIGN TO FINFET DESIGN  
A method for generating a layout for a device having FinFETs from a first layout for a device having planar transistors is disclosed. The planar layout is analyzed and corresponding FinFET...
US20120231377 PHOTOPOLYMER FORMULATION HAVING DIFFERENT WRITING COMONOMERS  
The invention relates to a photopolymer formulation comprising matrix polymers, writing monomers, and photo initiators, comprising a combination of at least two different writing monomers. The...
US20130323649 High Heat Load Optics with Vibration Isolated Hoses in an Extreme Ultraviolet Lithography System  
Methods and apparatus for reducing vibrations in an extreme ultraviolet (EUV) lithography system associated with the cooling of minors are described. According to one aspect of the present...
US20110045389 Method to Recover the Exposure Sensitivity of Chemically Amplified Resins from Post Coat Delay Effect  
Methods of fabricating a photomask, methods of treating a chemically amplified resist-coated photomask blank, a photomask blank resulting from the methods, and systems for fabricating a photomask...
US20130040235 POSITIVELY CHARGEABLE TONER  
In a positively chargeable toner, calcium carbonate fine particles having a certain average primary particle diameter are attached to the surface of toner base particles. The toner base particles...
US20050130077 Method for positioning and transferring at least two different patterns from a supply strip  
A method wherein a supply strip (bm) is entrained at a constant speed, which speed is the same as that of the substrate in strip form (c), during transfer between strips of each pattern and...
US20120064462 BY-PRODUCT MITIGATION IN THROUGH-SILICON-VIA PLATING  
Methods, systems, and apparatus for plating a metal onto a work piece with a plating solution having a low oxygen concentration are described. In one aspect, a method includes reducing an oxygen...
US20080224251 Optimal Rasterization for Maskless Lithography  
A lithographic system is provided in which an extent of overlap between pattern sections is adjusted in order to match a size of a pattern section to a size of a repeating portion of the pattern to...
US20110236805 MEMS lithography mask with improved tungsten deposition topography and method for the same  
The present invention discloses a MEMS lithography mask with improved tungsten deposition topography and a method for making the same. The MEMS lithography mask includes: a pattern including at...
US20130216949 WATER MARK DEFECT PREVENTION FOR IMMERSION LITHOGRAPHY  
A photoresist material having a polymer that turns soluble to a base solution in response to reaction with acid. The material includes a photo-acid generator (PAG) that decomposes to form acid in...
US20110183273 Water Mark Defect Prevention for Immersion Lithography  
A photoresist material having a polymer that turns soluble to a base solution in response to reaction with acid. The material includes a photo-acid generator (PAG) that decomposes to form acid in...
US20130089752 Forming a Bridging Feature Using Chromeless Phase-Shift Lithography  
An elongated, chromeless, bridging feature is formed on a photolithography mask with an etching depth that causes a nominal phase difference of more than 180 degrees to energy passing through the...
US20120282543 Easily Dispersible Pigment Preparation Based on C.I. Pigment Yellow 155  
Easily dispersible pigment preparation based on C.I. Pigment Yellow 155 The invention relates to a solid pigment preparation containing A) 5% to 99% by weight of PY 155 andB) 1% to 95% by weight of...
US20100086860 PHOTOPOLYMER COMPOSITIONS FOR OPTICAL ELEMENTS AND VISUAL DISPLAYS  
The invention relates to novel photopolymers based on specific urethane acrylates as writing monomers, which are suitable for producing holographic media, in particular for visual display of images.
US20070148561 Exposure equipment having auxiliary photo mask and exposure method using the same  
Example embodiments of the present invention may provide exposure equipment having an auxiliary photo mask. The exposure equipment may include a light source, and a first photo mask spaced apart...
US20140199518 Facile Large Area Periodic Sub-Micron Photolithography  
Disclosed herein are articles and methods useful for the lithographic applications. The articles comprise a wrinkling structure and a photosensitive material. The articles and methods provide low...
US20060093937 Printing semiconducting components  
A toner particle for use in electrostatic printing of a semiconducting electronic device, the particle comprising: a resin; and non-organic semiconductor particles dispersed in the resin.
US20100009139 ADVANCED ORIENTED ASSIST FEATURES FOR INTEGRATED CIRCUIT HOLE PATTERNS  
An oriented assist feature is described that permits transferring of a lithographic pattern corresponding to an integrated circuit from a mask onto a semiconductor substrate. The oriented assist...
US20050221238 Use of a reticle absorber material in reducing aberrations  
A lithographic apparatus comprising a patterning reticle which has an aluminium absorber layer which improves imaging by eliminating or at least minimising the formation of aberrations in a...
US20050008942 [PHOTOMASK WITH INTERNAL ASSISTANT PATTERN FORENHANCING RESOLUTION OF MULTI-DIMENSION PATTERN]  
A photomask with an internal assistant pattern, comprising a first pattern having a plurality of parallel lines along a first direction; a second pattern having a plurality of parallel lines along...
US20060141209 Pellicle for photolithography and pellicle frame  
There is disclosed a pellicle 1 for photolithography comprising, a pellicle frame 2 for constituting a pellicle for photolithography, wherein the frame is made of an aluminum alloy whose surface is...