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US20120171433 FLUORINATED COATING AND PHOTOTOOLS MADE THEREWITH  
A coating is disclosed, comprising the reaction product of: an epoxy silane; and an oligomer comprising MFMEMS wherein MF comprises a fluorinated (meth)acrylate, ME comprises an...
US20140011120 EXTREME ULTRAVIOLET LITHOGRAPHY PROCESS AND MASK  
A process of an extreme ultraviolet lithography (EUVL) is disclosed. The process includes receiving an extreme ultraviolet (EUV) mask with multiple states. Different states of the EUV mask are...
US20130101927 PELLICLE AND MASK ADHESIVE AGENT FOR USE IN SAME  
A pellicle which has a mask adhesive layer that can be plastic-deformed readily particularly at a temperature at which exposure to light is carried out, rarely provides a residue of an adhesive...
US20110033801 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST  
Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition...
US20140104672 ELECTROWETTING DISPLAY DEVICE  
An electrowetting display device comprising a first support plate, a second support plate and a picture element having a space defined by the first support plate, the second support plate and...
US20140364819 NANO-ENHANCED WOUND DRESSING  
The present disclosure relates to a dermal drug delivery platform comprising: a primary wound dressing comprising three-dimensional polymer protuberances that extend upward from the dressing...
US20130149637 TITANIA AND SULFUR CO-DOPED QUARTZ GLASS MEMBER AND MAKING METHOD  
A titania and sulfur co-doped quartz glass member is provided. Due to co-doping of titania and sulfur, the quartz glass member undergoes zero expansion at a certain temperature and low thermal...
US20110117480 TITANIA AND SULFUR CO-DOPED QUARTZ GLASS MEMBER AND MAKING METHOD  
A titania and sulfur co-doped quartz glass member is provided. Due to co-doping of titania and sulfur, the quartz glass member undergoes zero expansion at a certain temperature and low thermal...
US20140186651 PRINTED CIRCUIT BOARD HAVING COPPER PLATED LAYER WITH ROUGHNESS AND METHOD OF MANUFACTURING THE SAME  
Disclosed herein are a printed circuit board having a copper plated layer with an anchor shaped surface and roughness by forming the copper plated layer having an anisotropic crystalline...
US20100323281 Pellicle  
There is provided a pellicle which has a ventilation hole made through at least one frame bar for adjusting the pressure inside the frame to the atmospheric pressure, and a filter to cover up the...
US20150177611 MASK  
A mask is disclosed. The mask includes a light-blocking region and a slit-like light-transmitting region. The slit includes two edges that are disposed oppositely to each other, and each of the...
US20130100428 MASK FOR EUV LITHOGRAPHY, EUV LITHOGRAPHY SYSTEM AND METHOD FOR OPTIMISING THE IMAGING OF A MASK  
A mask (105) for EUV lithography includes a substrate (107), a multi-layer coating (108) applied to the substrate (107) and a mask structure (109) which is applied to the multi-layer coating (108)...
US20120135260 FABRICATION OF NANO-TWINNED NANOPILLARS  
Nanopillars with nanoscale diameters are provided where the nanopillar has uniformly aligned nano-twins either perpendicular or inclined by 1-90° to the pillar-axis with no grain-boundaries or any...
US20100028813 BACKSIDE CLEANING OF SUBSTRATE  
A pellicle cover, system, and method for cleaning a photomask are disclosed. A pellicle cover is disposed over a photomask and pellicle without damaging the markings surrounding the mask pattern...
US20120237856 SELECTION METHOD FOR ADDITIVES IN PHOTOPOLYMERS  
The invention relates to a method for selecting compounds which can be used as additives in photopolymer formulations for producing light holographic media, and to photopolymer formulations which...
US20120040277 DAMASCENE RETICLE AND METHOD OF MANUFACTURE THEREOF  
A reticle carrier for a polishing tool capable of accommodating a reticle includes a base plate with an obverse and reverse surfaces, a retaining ring secured to the obverse surface of the base...
US20070026346 Cleaning solution for lithography  
Provided is a cleaning solution for lithography comprising (A) from 5 to 100% by mass of a lower alkyl ketone and (B) from 95 to 0% by mass of γ-butyrolactone which is a cleaning solution capable...
US20150085268 Extreme Ultraviolet Lithography Process And Mask  
A system of an extreme ultraviolet lithography (EUVL) is disclosed. an extreme ultraviolet lithography (EUVL) system includes an extreme ultraviolet (EUV) reflection-type mask having a patterned...
US20150125784 PHOTOPOLYMER FORMULATIONS HAVING THE ADJUSTABLE MECHANICAL MODULUS GUV  
The subject matter of the invention is a method for producing illuminated, holographic media comprising a photopolymer formulation having the adjustable mechanical modulus GUV. A further subject...
US20120219884 PHOTOPOLYMER FORMULATIONS HAVING THE ADJUSTABLE MECHANICAL MODULUS GUV  
The subject matter of the invention is a method for producing illuminated, holographic media comprising a photopolymer formulation having the adjustable mechanical modulus GUV. A further subject...
US20090286170 PELLICLE  
A pellicle used in semiconductor lithography is provided and comprises a pellicle frame made of aluminum or an aluminum alloy. The surface of the frame is free of pigment.
US20110081603 PELLICLE  
A pellicle for lithography is provided that includes a pellicle frame, a pellicle film stretched over one end face of the pellicle frame, and a pressure-sensitive adhesion layer provided on the...
US20110129766 LITHOGRAPHIC PELLICLE  
A lithographic pellicle comprises a pellicle film (1), a pellicle frame (3), and a PSA layer (4). The pellicle film (1) is stretched across and mounted to the pellicle frame (3) at its top end....
US20140268092 Extreme Ultraviolet Lithography Process and Mask  
A process of an extreme ultraviolet lithography (EUVL) is disclosed. The process includes receiving an extreme ultraviolet (EUV) mask with multiple states. These different states of the EUV mask...
US20060103295 Non-pixellated display  
A non-pixellated segmented display is disclosed. The display comprises a first electrode having a first pattern, an insulator layer having a second pattern, an electroluminescent layer, and a...
US20120308667 EFFECT PIGMENTS  
The present invention relates to effect pigments based on uncoated or coated flake-form substrates having an outer coating comprising a) TiO2 and b) Al2O3, MgO and/or CaO and c) SiO2 and d) ZnO...
US20150064611 Extreme Ultraviolet (Euv) Mask And Method Of Fabricating The Euv Mask  
A Cu-containing material is provided as an absorber layer of an EUV mask. With the absorber layer of the Cu-containing material, the same lithography performance of a conventional absorber in 70...
US20110177437 Compensating Masks, Multi-Optical Systems Using the Masks, and Methods of Compensating for 3-D Mask Effect Using the Same  
Provided are a compensating mask, a multi-optical system using the compensating mask, and a method of compensating for a 3-dimensional (3-D) mask effect using the compensating mask. Methods of...
US20140087295 TECHNIQUES FOR COATING PRINT MEDIA  
Techniques for coating print media are described herein. In an example, a photo imaging assembly is to receive a liquid electrophoretic coating composition assembly on a chargeable surface so as...
US20080192330 Preservation method of microcapsules for electrophoretic display devices and its applications  
The preservation method of microcapsules for electrophoretic display devices according to the present invention includes preserving microcapsules for electrophoretic display devices in a...
US20110235016 PELLICLE, MOUNTING METHOD THEREFOR, PELLICLE-EQUIPPED MASK, AND MASK  
A pellicle is provided that includes a pellicle film, a pellicle frame having the pellicle film stretched over one end face thereof and having the other end face open, and a pressure-sensitive...
US20120040288 Epoxy formulations with controllable photospeed  
The present invention is directed to an epoxy film composition, comprising: novolac resin; solvent; a photoacid generator having the structure A+B− and having a pKa of −5 or less; and a...
US20120044549 Hybrid Reflection Hologram  
Hybrid white-light viewable holograms and methods for making them. The holograms are hybrid reflection holograms made using the diffractive structures or gratings of a holographic object such as a...
US20090274974 SPIN-ON GRADED K SILICON ANTIREFLECTIVE COATING  
Graded absorption silicon based antireflective coating compositions are described.
US20080057433 ADHESIVE PRIMER  
Described herein is an adhesive primer used with xerographic printing and imaging systems, wherein the adhesive primer comprises at least one latex emulsion, water, at least one amino alcohol or...
US20130078552 Dedicated Mask and Production Method thereof, LCD Panel Production Method  
The present invention discloses a dedicated mask, a production method thereof, and a production method of a liquid crystal display (LCD) panel. The production method of an LCD panel comprises the...
US20120244477 PELLICLE FOR LITHOGRAPHY  
The invention provides a pellicle for lithography used in the photolithography, affording a wider range of transmissivity to inclinedly incident beams that can be used in a photolithographic...
US20140065541 Method of Stabilizing Fluorine-Containing Acid Amplifier  
A method of stabilizing a fluorine-containing acid amplifier. The method is provided to include the step of dissolving a fluorine-containing acid amplifier in an organic solvent thereby producing...
US20130130162 Reticle Carrier  
A reticle carrier for a polishing tool capable of accommodating a reticle includes a base plate with an obverse and reverse surfaces, a retaining ring secured to the obverse surface of the base...
US20120141923 Protective Cap for Extreme Ultraviolet Lithography Masks  
An extreme ultraviolet (EUV) lithography mask is provided. The EUV lithography mask includes a reflective layer and an absorptive layer deposited over the reflective layer. The absorptive layer is...
US20060246234 Photomask assembly incorporating a metal/scavenger pellicle frame  
A photomask assembly is disclosed having a photomask substrate and a composite pellicle frame that includes both a metallic frame component and a scavenger component. The metallic frame component...
US20060246368 Master batch and toner using the same  
This invention provides masterbatch (MB) comprising at least a colorant and polyester resin, wherein the glass transition temperature (Tg) and the softening point (Sp) of such polyester resin...
US20140038103 LITHOGRAPHY USING PHOTORESIST WITH PHOTOINITIATOR AND PHOTOINHIBITOR  
Technologies are generally described for a photoresist and methods and systems effective to form a pattern in a photoresist on a substrate. In some examples, the photoresist includes a resin, a...
US20120107743 LITHOGRAPHY USING PHOTORESIST WITH PHOTOINITIATOR AND PHOTOINHIBITOR  
Technologies are generally described for a photoresist and methods and systems effective to form a pattern in a photoresist on a substrate. In some examples, the photoresist includes a resin, a...
US20120082923 PHOTOMASK THROUGHPUT BY REDUCING EXPOSURE SHOT COUNT FOR NON-CRITICAL ELEMENTS  
A solution for improving photomask fabrication time and yield, through the reduction in the number of exposure shots used for a given photomask pattern to be written on the photomask. In one...
US20140308616 COMPOSITION OF AN AQUEOUS ETCHANT CONTAINING A PRECURSOR OF OXIDANT AND PATTERNING METHOD FOR CONDUCTIVE CIRCUIT  
The present invention is primarily related to the composition of an aqueous etchant containing a precursor of oxidant and patterning methods for conductive circuits, in which the chemical...
US20110140181 Removal of Masking Material  
Methods for removing a masking material, for example, a photoresist, and electronic devices formed by removing a masking material are presented. For example, a method for removing a masking...
US20150017577 IMAGING MEMBERS HAVING A CROSS-LINKED ANTICURL BACK COATING  
The disclosure provides a flexible electrophotographic imaging member having an optically clear, cross-linked anticurl back coating of melamine formaldehyde to effect complete and absolute imaging...
US20150104733 Method for Repairing a Mask  
A method for repairing a mask is disclosed. A mask, having at least one defect need to be repaired, is received. The mask includes a transmissive mask or a reflective mask. A location and size of...
US20130171560 ADDITIVE FOR RESIST AND RESIST COMPOSITION COMPRISING SAME  
Provided are an additive for resist represented by the following formula (1), and a resist composition containing the additive. The additive according to the present invention can suppress...