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US20130279869 PLANAR OPTICAL WAVEGUIDE AND METHOD FOR MAKING SAME  
A planar optical waveguide includes a trunk, and a first branch and a second branch each extending from the trunk in a manner that the first branch and the second branch cooperatively form a...
US20130216942 POLYCARBONATE BINDER FOR ELECTROPHOTOGRAPHIC PHOTORECEPTOR COATINGS  
A polycarbonate composition for an electrophotographic photoreceptor coating, wherein the polycarbonate includes 1 to 100 mole percent of first units of the formula and 0 to 99 mole percent of one...
US20140242517 LITHOGRAPHIC PRINTING PLATE PRECURSORS AND USE  
Negative-working lithographic printing plate precursor a negative-working imageable layer and an outermost water-soluble overcoat layer that is disposed directly on the negative-working imageable...
US20140212793 Multiresolution Mask Writing  
Mask writing techniques that employ multiple masking writing passes. A first writing pass is made to write a first shot pattern having a first resolution. A second writing pass is then made to...
US20120141924 Multiresolution Mask Writing  
Mask writing techniques that employ multiple masking writing passes. A first writing pass is made to write a first shot pattern having a first resolution. A second writing pass is then made to...
US20110054511 ADDING MICROSCOPIC POROSITY TO THE SURFACE OF A MICROCOIL TO BE USED FOR MEDICAL IMPLANTATION  
A vasoocclusive microcoil for therapeutic treatment of a patient's vasculature includes a surface with a plurality of voids or pores therein that operates to accelerate a healing process in the...
US20090181314 Reverse Dummy Insertion Algorithm  
A method of inserting dummy patterns includes providing a window area comprising a main pattern. The main pattern includes first patterns of a first type of features, and second patterns of a...
US20100321784 Optical Elements with Gradient Structure  
The invention relates to optical elements with gradient structure, in particular for holographic applications, wherein the gradient structure is formed by a refractive index gradient and a method...
US20150168824 EUV PELLICLE FRAME WITH HOLES AND METHOD OF FORMING  
A method of forming an improved EUV mask and pellicle with airflow between the area enclosed by the mask and pellicle and the area outside the mask and pellicle and the resulting device are...
US20110236804 Composition for Producing Optical Elements Having Gradient Structure  
A composition for producing optical elements has a gradient structure, particularly for holographic applications, wherein the gradient structure is formed by a refractivity gradient. The...
US20080070162 Information storage elements and methods of manufacture thereof  
An information storage element has a carbon storage material including hexagonally bonded carbon and tetrahedrally bonded carbon. The information is formed by a changeable ratio of hexagonally...
US20110075249 CHARGED PARTICLE MIGRATION TYPE DISPLAY PANEL AND METHOD OF MANUFACTURING CHARGED PARTICLE MIGRATION TYPE DISPLAY PANEL  
There is provided a charged particle migration-type display panel (1) which has a plurality of cells (40) partitioned by partitions (31) between a transparent substrate (10) and a back substrate...
US20060275672 Photomask with controllable patterns  
A photomask with controllable patterns is a panel, which can be controlled to change the shading patterns. The panel is composed of a plurality of optical controlled elements and has various...
US20120202144 PELLICLE AND MASK ADHESIVE THEREFOR  
Disclosed is a pellicle having a mask adhesive layer having appropriate softness, having a small adhesive residue after being peeled off from a mask, and having good handling characteristics; and...
US20130202993 METHOD OF FABRICATING THE PELLICLE FRAME  
A pellicle frame, including aluminum, aluminum oxide, and a transition metal.
US20130009846 INSERT FOR RADOMES AND METHODS OF MANUFACTURING INSERT FOR RADOMES  
Apparatuses such as inserts for radomes are described herein. The apparatuses and inserts including a metal layer having a frequency selective surface.
US20110300490 HIGH-RESOLUTION MICROSCOPY AND PHOTOLITHOGRAPHY DEVICES USING FOCUSING MICROMIRRORS  
The invention relates to large-field high-resolution microscopy and photolithography setups operating with polychromatic light. It includes the use of a plurality of focusing micromirrors.
US20120040276 METHOD OF FORMING AND USING PHOTOLITHOGRAPHY MASK HAVING A SCATTERING BAR STRUCTURE  
A method of forming a photolithography mask including forming a first linear non-dense feature on the mask and forming a plurality of parallel linear assist features disposed substantially...
US20120122025 PELLICLE FRAME AND PELLICLE CONTAINING SAME  
Provided is a pellicle that has appropriate membrane strength, high resistance to chemicals, and a low degree of sulfate ion generation and outgassing. A provided pellicle frame supports the outer...
US20110151190 SHADOW EDGE LITHOGRAPHY FOR NANOSCALE PATTERNING AND MANUFACTURING  
An advanced high-resolution and high-throughput shadow edge (116) lithography (SEL) method is disclosed for forming uniform zero- one- and two-dimensional nanostructures on a substrate. The method...
US20110159413 TITANIA-DOPED QUARTZ GLASS AND MAKING METHOD  
A titania-doped quartz glass which experiences a reduction in OH group concentration of less than or equal to 100 ppm upon heat treatment at 900° C. for 100 hours is suitable as the EUV...
US20070196770 Printing sleeve and method of manufacturing the same  
The present invention is directed to the manufacture of “seamless” photosensitive printing elements from substantially planar printing plate blanks wrapped around cylindrical printing sleeves or...
US20100330470 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND REFLECTIVE MASK FOR EUV LITHOGRAPHY  
To provide an EUV mask of which a decrease in the contrast of reflected light at the mask pattern boundary, particularly a decrease in the contrast of reflected light at the boundary on the mask...
US20130089753 Forming a Bridging Feature Using Chromeless Phase-Shift Lithography  
First and second anchor features are formed on a photolithography mask, each having a respective center point. An elongated, chromeless, bridging feature is formed between the anchor features. The...
US20130065164 PELLICLE FOR LITHOGRAPHY AND A METHOD OF MAKING THEREOF  
A pellicle is proposed wherein the mask-bonding agglutinant layer coated on one annular face of the pellicle frame is designed to have a cross-section which is trapezoidal (including the case of...
US20110076448 Methods for Patterning Substrates Using Heterogeneous Stamps and Stencils and Methods of Making the Stamps and Stencils  
The present invention is directed to heterogeneous stamp and stencil compositions, methods for patterning substrates using contact printing processes employing the heterogeneous stamps and...
US20150185616 RESISTS FOR LITHOGRAPHY  
New routes involving multi-step reversible photo-chemical reactions using two-step techniques to provide non-linear resist for lithography are described in this disclosure. They may provide...
US20130136897 RESISTS FOR LITHOGRAPHY  
New routes involving multi-step reversible photo-chemical reactions using two-step techniques to provide non-linear resist for lithography are described in this disclosure. They may provide...
US20150079500 Method For Lithography Patterning  
A method for lithography patterning is disclosed. An exemplary method includes receiving an IC design layout, the IC design layout having an IC pattern and receiving a mask, the mask having a...
US20060063091 Toner classification device, and toner manufacturing method  
A toner classification device including a casing including at least one classification space. Each of classification includes a classification rotor and a toner discharging outlet. At least a...
US20130008869 Oblique Parts or Surfaces  
Various structures, such as microstructures and wall-like structures, can include parts or surfaces that are oblique. In some implementations, a cantilevered element includes a spring-like portion...
US20110159410 COST-EFFECTIVE METHOD FOR EXTREME ULTRAVIOLET (EUV) MASK PRODUCTION  
The present disclosure provides for many different embodiments. An exemplary method can include providing a blank mask and a design layout to be patterned on the blank mask, the design layout...
US20140342293 HEAT SENSITIVE COATING COMPOSITION  
Disclosed is an improved method for reducing the static sensitivity of a heat sensitive coating composition while not deteriorating the dynamic sensitivity, wherein...
US20130040232 Method of Patterning NAND Strings Using Perpendicular SRAF  
A lithography mask includes a plurality of patterning features formed on a mask substrate and a first plurality of sub-resolution assist features (SRAFs) formed substantially perpendicular to the...
US20120083124 Method of Patterning NAND Strings Using Perpendicular SRAF  
A lithography mask includes a plurality of patterning features formed on a mask substrate and a first plurality of sub-resolution assist features (SRAFs) formed substantially perpendicular to the...
US20150168858 Preparing Resin Emulsions  
A process for making a latex emulsion suitable for use in a toner composition which applies the model of Brinkman to predict phase inversion point (PIP) during phase invention emulsification...
US20120107733 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY  
Provision of a reflective mask blank for EUV lithography having an absorber layer having optical constants suitable for reducing the film thickness. A reflective mask blank for EUV lithography...
US20150212414 IONIC THERMAL ACID GENERATORS FOR LOW TEMPERATURE APPLICATIONS  
New ionic thermal acid generator compounds are provided. Also provided are photoresist compositions, antireflective coating compositions, and chemical trim overcoat compositions, and methods of...
US20140330392 SCAFFOLDS FOR TISSUES AND USES THEREOF  
The present invention provides tissue scaffolds, methods of generating such scaffolds, and methods of use of such scaffolds to generate aligned and functional tissues for use in methods including...
US20130280909 METAL CUT PROCESS FLOW  
A method for optimizing masks used for forming conductive features and a method for creating the mask features on an IC device are disclosed. An exemplary embodiment includes receiving a design...
US20120052415 STAMPS WITH MICROMETER-AND NANOMETER-SCALE FEATURES AND METHODS OF FABRICATION THEREOF  
Stamps and methods of making stamps for applications in anti-counterfeiting and authentication. The stamps are relatively small in size and feature nanoscale and microscale identification regions...
US20110123937 COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY  
The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for...
US20070105034 Printing of images with selective gloss and toners therefore  
A matte liquid toner suitable for use in a liquid toner printer, comprising a carrier liquid, toner particles comprising a resin and substantially uncolored additive particles of average diameter...
US20110063714 ELECTROPHORETIC PARTICLES, ELECTROPHORETIC PARTICLE DISPERSION, DISPLAY MEDIUM AND DISPLAY DEVICE  
An electrophoretic particle dispersion including: electrophoretic particles including first particles having a surface thereof covered with a curvature-adjustment portion formed from a...
US20140030655 Enhanced Multi-Photon Imaging Resolution Method  
A method and a multi-photon photocurable composition are provided that allow for the formation of a three-dimensional microstructure having enhanced imaging resolution. The method involves...
US20120164565 FLUORINATED COATING AND PHOTOTOOLS MADE THEREWITH  
A coating including an oligomer is disclosed, the oligomer being the reaction product of an epoxy silane, a multi-functional (meth)acrylate; and a polymerizable fluorochemical. The polymerizable...
US20140234780 LITHOGRAPHY WITH REDUCED FEATURE PITCH USING ROTATING MASK TECHNIQUES  
Embodiments of the present invention are directed to techniques for obtaining patterns of features. One set of techniques uses multiple-pass rolling mask lithography to obtain the desired feature...
US20110189594 PELLICLE FOR LITHOGRAPHY AND METHOD FOR MANUFACTURING THE SAME  
A method for manufacturing a pellicle for lithography includes steps of providing a pellicle frame having one pair of long sides and one pair of short sides, each of the long sides 11 having a...
US20110027699 REDUCING ION MIGRATION OF ABSORBER MATERIALS OF LITHOGRAPHY MASKS BY CHROMIUM PASSIVATION  
The deterioration of photomasks caused by chromium migration in COG masks may be reduced or suppressed by avoiding substantially pure chromium materials or encapsulating these materials, since the...
US20150153672 LOW ENERGY CONSUMPTION MONOCHROME PARTICLE FOR SINGLE COMPONENT DEVELOPMENT SYSTEM  
A low energy consumption monochrome particle includes a core latex having a core a glass transition temperature and a weight average molecular weight. A shell encapsulates the core and includes a...