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US20090325081 EXPOSURE MASK AND MANUFACTURING METHOD OF A SEMICONDUCTOR USING THE SAME  
An exposure mask for EUV comprises an absorber formed over a mask substrate and a reflecting pattern formed over the absorber. The exposure mask for EUV prevents re-absorption of light reflected...
US20080124641 Electrophotographic photoreceptor  
An electrophotographic photoreceptor, comprising: an undercoat layer and a photosensitive layer formed in this order on a conductive support,wherein the undercoat layer contains a titanium oxide...
US20150241801 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS  
A conductive layer of an electrophotographic photosensitive member includes a binder material, a first metal oxide particle, and a second metal oxide particle. The first metal oxide particle is a...
US20080182179 GRAY TONE MASK AND METHOD FOR MANUFACTURING THE SAME  
A gray tone mask includes a transparent substrate and a light blocking layer. The light blocking layer is disposed on the transparent substrate and has a transparent region with a minimum...
US20050109278 Method to locally protect extreme ultraviolet multilayer blanks used for lithography  
A method of forming thin films of materials on an extreme ultraviolet multilayer surface is described. Specifically, an electron beam and a precursor gas are used to locally deposit a capping...
US20080107972 HALFTONE MASK AND METHOD FOR MAKING PATTERN SUBSTRATE USING THE HALFTONE MASK  
A halftone mask includes translucent film patterns for forming a middle gradation area and light blocking film patterns disposed to an entire periphery of the translucent film patterns.
US20140116980 METHOD FOR PROVIDING A TEMPLATE FOR A SELF-ASSEMBLABLE POLYMER FOR USE IN DEVICE LITHOGRAPHY  
Methods are disclosed for depositing a template for directed self-assembly of a self-assemblable block polymer on a surface of a substrate. The method involves providing a chemical epitaxy pattern...
US20110104616 LINE WIDTH ROUGHNESS IMPROVEMENT WITH NOBLE GAS PLASMA  
A method for forming a photoresist mask may comprise providing a ultra-violet (UV) producing gas to a vacuum chamber having a substrate, ionizing the UV producing gas to produce UV rays to...
US20090023079 Photomask and Method of Forming Overlay Vernier of Semiconductor Device Using the Same  
This patent relates to a photomask and a method of forming an overlay vernier of a semiconductor device employing the same. The photomask includes a reticle formed of a first material through...
US20110142893 ORGANOSILICONE FINE PARTICLES, METHOD OF PRODUCING SAME, AND COSMETICS, RESIN COMPOSITIONS AND DEVELOPMENT TONERS CONTAINING SAME  
Organosilicone fine particles of size in the range of 0.1-20 μm, each having 20 or more faces with indefinite shapes and a network of convex parts that surround these faces with indefinite shapes...
US20050233252 Stereoflexography  
Improvement to the photopolymers catalysis in printing plates for the flexographic and of stamp sectors (FIG. 1), by exposing the photopolymer plate (1), only, by the bottom face (2), to two...
US20130122412 ERASABLE ELECTROPHOTOGRAPHIC TONER CONTAINING ORGANIC WHITE PIGMENT AND METHOD OF PRODUCING THE SAME  
An erasable electrophotographic toner includes a binder resin, a near-infrared absorbing material, a decolorizing agent and an organic white pigment.
US20130122539 MICROSIEVE FOR CELLS AND PARTICLES FILTRATION  
It is disclosed a microsieve comprising two layers, wherein the first layer is a membrane layer having a plurality of micropores contained therein and a thickness of about 10 μm to about 100 μm,...
US20050250017 Mask blank manufacturing method, transfer mask manufacturing method, sputtering target for manufacturing mask blank  
To provide a method for manufacturing a mask blank capable of manufacturing a high quality mask blank that suppresses generation of defects in a thin film for forming a mask pattern with high...
US20090101874 Pigment compositions consisting of an organic yellow pigment and a phthalocyanine pigment  
The invention relates to a pigment composition containing a disazo pigment of formula (I) and at least one phthalocyanine pigment.
US20090305147 EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY MASK, WITH RESONANT BARRIER LAYER  
The invention relates to extreme ultraviolet photolithography masks that operate in reflection. These masks comprise a lower mirror covering a substrate, and two types of reflecting zones Z1 and...
US20150053456 PRINTED CIRCUIT BOARD AND MANUFACTURING METHOD THEREOF  
A printed circuit board and a manufacturing method thereof. The manufacturing method of the printed circuit board includes: coating a first solder resist on an upper surface of a substrate having...
US20050227162 Kit of parts for the preparation of a solvent based coating composition  
The present invention pertains to a kit of parts for the preparation of a solvent based coating composition, said kit of parts comprising A) at least one toner base comprising an acrylic polyol, a...
US20110027713 ELECTROPHOTOGRAPHIC TONER  
The disclosure provides an electrophotographic toner including a binder resin; and a light absorber, wherein the light absorber includes a metal nanorod and a surfactant covering a surface of the...
US20080286701 METHOD FOR KINETICALLY CONTROLLED ETCHING OF COPPER  
An etching composition, particularly for kinetically controlled etching of copper and copper alloy surfaces; a process for etching copper and copper alloys, particularly for etching at high rates...
US20090111037 PROTECTIVE OVERCOAT TRANSFER COMPENSATION  
Observable matte-finish indicia on a printer medium having a matte finish includes the steps creating a matte image-viewing area; creating a glossy finish region within the image-viewing area;...
US20080199784 Small Feature Integrated Circuit Fabrication  
A method for controlling etching during photolithography in the fabrication of an integrated circuit in connection with first and second features that are formed on the integrated circuit having a...
US20070292776 OVERLAY VERNIER KEY AND METHOD FOR FORMING CONTACT HOLES OF SEMICONDUCTOR DEVICE USING THE SAME  
A substrate includes an overlay vernier key structure that includes an outer pattern formed over one layer over a semiconductor substrate, as a reference for an overlay measurement, and an inner...
US20120058426 MARKING AGENT CONCENTRATION METHODS, MARKING AGENTS, AND HARD IMAGING METHODS  
A marking agent concentration method includes concentrating the marking agent by removing at least some liquid carrier between particles without substantially removing retained liquid carrier...
US20110171566 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY  
A reflective mask blank for EUV lithography having an absorbing layer which has a low reflectivity with respect to wavelength regions of EUV light and pattern inspection light, and which is easily...
US20090176175 PHOTOACID GENERATORS FOR EXTREME ULTRAVIOLET LITHOGRAPHY  
A photoacid generator P+ A− comprises (a) an antenna group P+ comprising atoms with high EUV photoabsorption cross-sections according to FIG. 1 and A− anions; or (b) an antenna group P+ and A−...
US20050250018 Lithography mask blank  
A lithography mask blank used as a material for producing a lithography mask includes at least one thin film which is formed on a substrate and has a desired function. The blank has a...
US20090154978 MEDIA FOR USE WITH ACTIVATION PRINTER AND ACTIVATION PRINTER THEREFOR  
Media for use with an activation printer, the media comprising at least one surface having an array of pixels deposited thereon, each pixel containing at least one activatable colourant, wherein...
US20110183261 DEVELOPER COMPOSITION  
A developer composition with low metal corrosiveness is provided. The developer composition includes 1 to 10 weight parts of tetraalkylammonium hydroxide; 0.01 to 3 weight parts of a metal...
US20070054198 Photomask for double exposure and double exposure method using the same  
A photomask for double exposure, and a double exposure method using the same are disclosed. The photomask for double exposure comprises a mask substrate divided into first and second regions...
US20090068579 FULL-COLOR TONER FOR ELECTROPHOTOGRAPHY, AND PRODUCTION METHOD FOR THE SAME  
A production method for a full-color toner for electrophotography includes melt-kneading a toner material by use of an open-roll kneader, the toner material containing at least a binder resin, a...
US20110091811 DOUBLE-LAYERED PATTERNABLE ADHESIVE FILM, METHOD OF FORMING THE SAME, AND METHOD OF FORMING PATTERNABLE ADHESIVE LAYER USING THE SAME  
A patternable adhesive film is formed in a double-layered structure of an adhesive layer having patternability and an adhesive layer having both adhesion and developability. Thus, the...
US20110159416 BLANK MASK AND METHOD OF FABRICATING MASK USING THE SAME  
A blank mask includes a substrate, a multilayer reflection layer disposed over the substrate, a capping layer disposed over the multilayer reflection layer, a self-assembled monolayer disposed...
US20100044943 SPLIT AXES STAGE DESIGN FOR SEMICONDUCTOR APPLICATIONS  
A stage assembly (8) includes a first stage (10) having at least one degree of freedom, i.e. at least one long stroke motion capability, and being movably mounted in a first stage base frame (12),...
US20100085518 PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX  
The present invention relates to a photosensitive resin composition for a black matrix, a black matrix produced by the composition and a liquid crystal display including the black matrix. The...
US20100055584 EXPOSURE DEVICE AND EXPOSURE METHOD  
An exposure device according to an embodiment includes an exposure light source for irradiating a reflective mask with an exposure light, an alignment light source for irradiating the reflective...
US20110280531 RESIN COMPOSITION FOR PRODUCTION OF OPTICAL WAVEGUIDE, AND OPTICAL WAVEGUIDE PRODUCED BY USING THE RESIN COMPOSITION  
A resin composition is provided, which satisfies both an uncured layer flexibility requirement and a patterning resolution requirement for production of an optical waveguide by a roll-to-roll...
US20090086353 Bank Structure for a Display Panel and Method of Manufacturing the Same  
A bank structure for a display panel is provided. The display panel comprises a substrate, and the bank structure is formed on the surface of the substrate. The bank structure comprises a...
US20080084549 HIGH REFRACTIVE INDEX MEDIA FOR IMMERSION LITHOGRAPHY AND METHOD OF IMMERSION LITHOGRAPHY USING SAME  
In accordance with the present invention, a colloidal immersion lithography medium is provided. The medium comprises: a) a continuous liquid phase comprising a liquid having an index of refraction...
US20080241708 SUB-RESOLUTION ASSIST FEATURE OF A PHOTOMASK  
The present disclosure provides a mask. The mask includes a transparent substrate, a main feature, and an assistant feature. The main feature includes attenuating material and is disposed on the...
US20100203430 METHODS FOR PERFORMING MODEL-BASED LITHOGRAPHY GUIDED LAYOUT DESIGN  
Methods are disclosed to create efficient model-based Sub-Resolution Assist Features (MB-SRAF). An SRAF guidance map is created, where each design target edge location votes for a given field...
US20140234769 LIQUID DEVELOPER  
A liquid developer includes an insulating liquid and a plurality of toner particles. The plurality of toner particles has a median size not smaller than 1 μm and not greater than 3 μm as a whole....
US20060024603 Toner and toner manufacturing method  
In a toner of the present invention containing binder resin and a coloring agent, the toner is comprised a mixture of first toner and second toner which are different in the binder resin from each...
US20080076058 Luminescent photoresist  
A photoresist composition (phosphoresist) including a resist capable of activation when exposed to electromagnetic energy within a first bandwidth, but relatively insensitive to electromagnetic...
US20120247220 STRAIN GAGE AND MANUFACTURING METHOD THEREOF  
A strain gage includes a strain sensitive element; and a temperature compensation element, wherein the strain sensitive element and temperature compensation element are monolithically formed. A...
US20150047881 MASKING LAYER FORMED BY APPLYING DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITIONS ON PANEL STRUCTURE  
The invention relates to a masking layer. The masking layer produced by coating a white-color photosensitive resin composition on a peripheral region of a transparent substrate, developing the...
US20070059472 REPOSITIONABLE PHOTO MEDIA AND PHOTOGRAPHS  
A repositionable photo media and a repositionable photograph are provided. The repositionable photo media has a substrate having opposing first and second surfaces; an image receptive coating...
US20090311621 SUPPORT FOR PLANOGRAPHIC PRINTING PLATE MATERIAL, MANUFACTURING METHOD THEREOF, AND PLANOGRAPHIC PRINTING PLATE MATERIAL EMPLOYING THE SAME  
An objective is to provide a light sensitive planographic printing plate material exhibiting excellent tone reproduction, printing durability and anti-stain property during printing at high...
US20090286176 ELECTROPHOTOGRAPHIC COLOR TONER  
A set of a yellow toner, a magenta toner, a cyan toner and a black toner is disclosed. Each of the color toners contains a colored particle and cerium oxide particles, the colored particle...
US20070099116 Photoconductive layer forming radiation image taking panel and radiation image taking panel  
A photoconductive layer for a radiation image taking panel is formed by selenium alloy containing 0.1 to 1000 molar ppm of monovalent metal and 0.1 to 1000 molar ppm of a chalcogenide element...