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US20110111345 SILICON CONTAINING COATING COMPOSITIONS AND METHODS OF USE  
Coating compositions include a polymer including: wherein R1 is a silicon containing moiety, R2 is an acid stable lactone functionality, and R3 is an acid labile lactone functionality; X1, X2, X3...
US20110143278 TONER PROCESSES  
The present disclosure provides toners and processes for making said toners. In embodiments, the toners are invisible when viewed under natural light, but possess a fluorescent agent that renders...
US20120058367 SPIN INJECTION SOURCE AND MANUFACTURING METHOD THEREOF  
The spin injection source comprises a nonmagnetic conductor, an MgO film, and a ferromagnet, and injects spin from the ferromagnet to the nonmagnetic conductor. The MgO film is annealed at...
US20080166651 TONER HAVING CROSSLINKED RESIN FOR CONTROLLING MATTE PERFORMANCE  
A toner composition comprising a crosslinked resin, a substantially non-crosslinked resin, a was, and a colorant. The crosslinked resin has a crosslinked density of from about 0.3 percent to about...
US20110151384 Colour Forming Composition  
A composition comprising i) a colour forming component which is susceptible to changing colour when irradiated; ii) an amine neutralised alkylaromatic sulphonic acid; and iii) a binder. Methods of...
US20060210887 Lithography mask and methods for producing a lithography mask  
Lithography mask for the lithographic patterning of a resist layer on a substrate having first regions, in which the lithography mask has a nontransparent layer, and second and third regions,...
US20050191564 Liner mask for semiconductor applications  
A method for producing a liner mask on a semiconductor structure is disclosed. The method may include providing an amorphous liner layer (55) on the top side (OS;OS′) of the semiconductor...
US20090186187 PHOTOSENSITIVE PASTE COMPOSITION, BARRIER RIBS PREPARED USING THE COMPOSITION AND PLASMA DISPLAY PANEL COMPRISING THE BARRIER RIBS  
A photosensitive paste composition includes: a fluoride sol dispersed in an organic material; and an inorganic material, wherein an average refractive index of the fluoride sol N1 and an average...
US20080153036 Chemically amplified positive resist compostion  
The present invention provides a chemically amplified positive resist composition comprising (A) a resin obtainable by reacting a novolak resin, a poly(hydroxystyrene) and a compound having at...
US20060190850 Method for optimizing the geometry of structural elements of a circuit design pattern and method for producing a photomask  
A method for optimizing the geometry of structural elements of a circuit pattern involves providing an overall circuit pattern of the circuit design and a plurality of basic patterns....
US20050244762 Method for reducing sensitizing dye stain  
The present invention relates to a method for reducing sensitizing dye stain comprising the steps of providing an exposed sensitized imaging element comprising a support having thereon at least...
US20070020560 Limited play optical discs  
An optical disc having machine-readable, information encoding features includes a coating comprising a dye irreversibly bleachable by light. The dye, once bleached, is operative to change the...
US20100092889 Mandrel  
Pixel wells and a grid of electrical lines including electrical bridges are formed using an ultraviolet transparent mandrel having a three-dimensional surface and an integrated mask.
US20150050584 Methods of Reducing Registration Errors of Photomasks and Photomasks Formed Using the Methods  
Methods of reducing registration errors of photomasks and photomasks formed using the methods are provided. The method may include forming a plurality of photomask patterns on a substrate and...
US20060014088 Optically anisotropic body  
The invention relates to an optically anisotropic body, such as a compensation foil or a micro-lens array, having a desired pattern of optical properties. Said body is obtainable by a method...
US20060223011 Method for manufacturing optical semiconductor element, and optical semiconductor element  
A method for manufacturing an optical semiconductor element having a light emitting element section and a functional section. The method includes conducting dry etching, and then conducting wet...
US20150177620 CONDUCTIVE LAYER MANUFACTURING METHOD AND PRINTED CIRCUIT BOARD  
In a conductive layer manufacturing method, there is provided a reducing step of irradiating with light a precursor layer-carrying support having a support and a copper oxide particle-containing...
US20140247434 Lithographic Focus and Dose Measurement Using A 2-D Target  
In order to determine whether an exposure apparatus is outputting the correct dose of radiation and its projection system is focusing the radiation correctly, a test pattern is used on a mask for...
US20110249244 Lithographic Focus and Dose Measurement Using A 2-D Target  
In order to determine whether an exposure apparatus is outputting the correct dose of radiation and its projection system is focusing the radiation correctly, a test pattern is used on a mask for...
US20090246644 Low stress pellicle frames and reticle pellicle assemblies  
Low stress reticle pellicle assemblies. In accordance with certain embodiments of the present invention, a pellicle frame of reduced stiffness is employed to reduce the stress a pellicle frame...
US20120322000 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND PROCESS FOR PRODUCING THE SAME  
To provide an EUV mask blank provided with a low reflective layer, which has excellent properties as an EUV mask blank. A reflective mask blank for EUV lithography comprising a substrate, and a...
US20050227158 Toner for producing wiring board and method of producing wiring board using thereof  
A conductive underlayer is formed in an electrophotographic manner using a toner comprising toner particles containing a binder resin containing a green thermosetting resin and conductive...
US20150111137 CROSS-LINKED OVERCOAT LAYER  
Embodiments pertain to a novel imaging member, namely, an imaging member or photoreceptor comprising an overcoat layer which comprises a soluble filler that improves low surface energy and wear....
US20140273310 MONITORING PATTERN FOR DEVICES  
Reticle and methods for forming a device or reticle are presented. A reticle is provided with a device pattern and a first monitoring pattern. The first monitoring pattern includes a plurality of...
US20090046263 USING PHASE DIFFERENCE OF INTERFERENCE LITHOGRAPHY FOR RESOLUTION ENHANCEMENT  
Interference lithography (IL) system and methods are disclosed according to embodiments of the invention. Two beams of coherent light with a first phase difference expose a first interference...
US20110262868 METHOD OF DETECTING ALIGNMENT MARK AND METHOD OF MANUFACTURING PRINTED CIRCUIT BOARD  
When an alignment mark does not exist within an area of an image obtained by a camera, the coordinate of the alignment mark is calculated based on an identification mark existing in the area of...
US20050250039 Overprint compositions for xerographic prinits  
Radiation curable overprint compositions containing a radiation curable oligomer/monomer, at least one photoinitiator, and at least one surfactant are disclosed. The overprint compositions are...
US20090130573 Multilayer active mask lithography  
An active mask emits a patterned energy flux in response to an energy input.
US20050037279 Near infrared absorptive adhesive composition and optical film  
A near infrared absorptive adhesive composition comprising a near infrared absorptive dye having the maximum absorption wavelength within a range of from 800 to 1100 nm, and a silicone adhesive.
US20140302427 MASK LAYOUT PATTERNS FOR CLOSELY SPACED PRIMITIVES IN PHASE SHIFT PHOTOLITHOGRAPHY MASKS  
Improved mask layout patterns are described for closely spaced primitives in phase shift photolithography masks. In one example, at least a portion of a photolithography mask layout is decomposed...
US20110110104 OPTICAL PLATE AND METHOD OF MANUFACTURING THE SAME  
An optical plate includes a first optical sheet, a reflective layer, and a second optical sheet. The first optical sheet includes first patterns protruding from a front surface. At least a portion...
US20100047717 METHOD FOR MANUFACTURING ORIGINAL MASTER  
An original master manufacturing method of rotating an original master at a constant linear velocity, moving in a plane the original master in a predetermined radial direction at a constant...
US20130164545 COMPOSITIONS FOR ANTIREFLECTIVE COATINGS  
A composition comprising the following: A) a cure catalyst selected from Formula A: [NR1′R2′R3′R4′]+X− (Formula A), R1′, R2′, R3′, R4′ are each independently selected from hydrogen, alkyl,...
US20100196825 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS ESPECIALLY SUITABLE FOR ION IMPLANT APPLICATIONS  
Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable...
US20090068578 Binder resin for toner, toner, and method of manufacturing binder resin for toner  
A binder resin for toner includes a hybrid resin of a crystalline resin (X) and an amorphous resin (Y), having a peak molecular weight of 30,000 or larger, and an amorphous resin (Z) having a peak...
US20090246674 SILICA ENCAPSULATED ORGANIC NANOPIGMENTS AND METHOD OF MAKING SAME  
Core-shell nanoscale pigment particles include a core organic pigment composition including nanoscale particles of organic pigments, and a shell layer of surface-deposited silica, where the...
US20100311613 PATTERNED NANOSUBSTRATES MADE BY DIRECTED SELF ASSEMBLY OF AMPHIPHILIC MOLECULES  
Nanoscale patterns prepared by lithography are used to direct the self-assembly of amphiphilic molecules to form patterned nanosubstrates having a desired distribution of chemical functional...
US20110017834 METHOD FOR PRODUCING AN ANTENNA STRUCTURE FOR AN RFID DEVICE, AND DRY TONER FOR USE IN PRODUCING SUCH ANTENNA STRUCTURE  
A method for producing an antenna structure for an RFID device, a dry toner for use in producing an antenna for an RFID device and a RFID device comprising an antenna structure made of fused toner...
US20110244387 LOW-SURFACE AREA FUMED SILICON DIOXIDE POWDER  
Fumed silicon dioxide powder with a BET surface area of 20 to 35 m2/g, characterized in that a) the number-based median particle diameter is 60 to 150 nm, and b) the proportion of particles with a...
US20100021701 Pigments Modified By A Polymerisable Coating, And Production And Use Of Same  
The invention relates to a pigment preparation containing, as main ingredients: (a) between 5 and 70 wt. % of at least one pigment P which is coated with at least one polymerisable, ethylenically...
US20080220358 COLORING COMPOUND AND YELLOW TONER CONTAINING THE COLORING COMPOUND  
Provided are a coloring compound for color toner which satisfies all of solubility in an organic solvent, a color tone, and lightfastness, and does not inhibit the polymerization of a...
US20090131607 Epoxy Resin, Epoxy Resin Composition, Photosensitive Resin Composition and Cured Object Obtained Therefrom  
[Problems] To provide an epoxy resin giving a cured object having high heat resistance, which is improved in impact resistance and moisture resistance as compared with conventional...
US20120069311 Passivation of Multi-Layer Mirror for Extreme Ultraviolet Lithography  
A reflector structure suitable for extreme ultraviolet lithography (EUVL) is provided. The structure comprises a substrate having a multi-layer reflector. A capping layer is formed over the...
US20100311244 DOUBLE-EXPOSURE METHOD  
The present invention discloses a double-exposure method comprising a first lithography process and a second lithography process. Between the first and the second lithography process, coat...
US20060046183 Photoresist formulation with surfactant additive  
A composition including a photoresist formulation and a surfactant additive is described herein.
US20070088117 Emulsion containing epoxy resin  
The emulsion herein is of an epoxy resin having a glass transition temperature of at least about 40° C., wherein the average diameter of the epoxy resin particles in the emulsion is 500 nm or...
US20080285001 Lithography aperture lenses, illumination systems, and methods  
Lithography aperture lenses, illumination systems, and methods are disclosed. In a preferred embodiment, a lens includes a substantially transparent material and an electro-optical material...
US20090305154 TRI-LEVEL XEROGRAPHY FOR HYPOCHROMATIC COLORANTS  
A xerogrpahic system and method use a tri-level development process in which at least one xerographic imaging unit includes a photoreceptor and a pair of developer units. A first developer unit...
US20050089767 Mask for off axis illumination and method for manufacturing the same  
A mask used to form contact holes of 90 nm, 65 nm, and beyond, and methods of forming the mask. The mask comprises a mask substrate and at least one pattern on the mask substrate. The pattern...
US20140234755 MASK BLANK SUBSTRATE, MASK BLANK, REFLECTIVE MASK BLANK, TRANSFER MASK, REFLECTIVE MASK, AND METHODS OF MANUFACTURING THE SAME  
A mask blank substrate is provided with a substrate mark comprising an oblique section. The inclination angle of the substrate mark with respect to a main surface is greater than 45° and less than...