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US20140335218 MOLD FOR MOLDING DECORATIVE OUTER PANEL OF REFRIGERATOR AND MANUFACTURING METHOD THEREOF  
Provided is a mold for molding a decorative outer panel of a refrigerator. A molding part is processed on a surface of the mold formed of a metal or engineering plastic material, but not formed of...
US20080063970 Functional particle and manufacturing method thereof  
A functional particle is manufactured by a method including an aggregating step, a depressurizing step, and a cooling step. In the aggregating step, the functional particle is obtained by flowing...
US20110044597 PHOTOSENSITIVE RESIN COMPOSITION FOR OPTICAL WAVEGUIDE FORMATION, OPTICAL WAVEGUIDE AND METHOD FOR PRODUCING OPTICAL WAVEGUIDE  
The present invention has an object to provide a photosensitive resin composition for optical waveguide formation, which has low transmission loss and can form a waveguide pattern with high shape...
US20070048669 METHOD OF FORMING THE PHOTO RESIST FEATURE  
The method of forming the photo resist feature comprises forming a photo resist layer on the substrate, providing a photo mask comprises the main feature and the assistant feature, providing the...
US20130160665 PLATE FOR PRODUCING STEREOTYPE AND METHOD FOR PRODUCING SAID PLATE FOR PRODUCING STEREOTYPE  
A plate for producing printer stereotype is provided with a first layer including a first photopolymerisable polymer and with a second layer including a second photopolymerisable polymer. The...
US20090130606 PHOTORESIST DEVELOPER AND METHOD FOR FABRICATING SUBSTRATE BY USING THE DEVELOPER THEREOF  
A photoresist developer including a basic aqueous solution containing 0.5˜10 mass % of a particular nonionic surfactant and 0.01-10 mass % of particular ammonium compound, the photoresist...
US20150147692 LIQUID DEVELOPER, PARTICLES FOR LIQUID DEVELOPER, AND LIQUID DEVELOPER ACCOMMODATION CONTAINER  
A liquid developer includes a carrier liquid having silicone oil, and toner particles including a polyester resin and having a value of ammonium ions contained therein measured by underwater...
US20110207054 SELF-ALIGNED, SUB-WAVELENGTH OPTICAL LITHOGRAPHY  
Embodiments of the invention provide a method and an apparatus for performing self-aligned, sub-wavelength optical lithography. One embodiment provides a region of photoresist above a conductive...
US20110027700 PELLICLE  
A pellicle for lithography is provided that include a pellicle frame, a pellicle film stretched over one end face of the pellicle frame, and a pressure-sensitive adhesive layer provided on the...
US20050170259 Optically variable security device and method  
A security device comprising at least first and second superposed optically variable effect generating structures (3-5, 31-51), each having a surface relief microstructure, the second optically...
US20080180646 IMPRINT REFERENCE TEMPLATE FOR MULTILAYER OR MULTIPATTERN REGISTRATION AND METHOD THEREFOR  
A method (and resultant structure) of forming a plurality of masks, includes creating a reference template, using imprint lithography to print at least one reference template alignment mark on all...
US20060160006 Positively chargeable developer  
A positively chargeable developer is provided which is capable of providing stable image quality without causing any image defect even in long-term use. The developer includes at least positively...
US20100092894 Bottom Antireflective Coating Compositions  
Antireflective coating compositions are discussed.
US20120148960 METHOD OF MANUFACTURING PRINTED CIRCUIT BOARD  
A method of manufacturing a printed circuit board, including: applying a conductive paste including carbon nanotubes and a photosensitive binder on a bump-forming area of a circuit substrate...
US20130012801 Probe Element and Method of Forming a Probe Element  
A probe element and a method of forming a probe element are provided. The probe element includes a carrier comprising biodegradable and/or bioactive material; and at least one electrode coupled to...
US20150140477 EUV MASK FOR USE DURING EUV PHOTOLITHOGRAPHY PROCESSES  
The present disclosure is directed to various masks for use during EUV photolithography processes. In one example, an EUV mask is disclosed that includes, among other things, a substrate, a...
US20080248406 PELLICLE AND METHOD FOR PREPARING THE SAME  
The present invention aims at reducing the thickness of a pellicle membrane while providing a strong pellicle membrane. The method for manufacturing a pellicle of the present invention comprises...
US20070099097 Multi-purpose measurement marks for semiconductor devices, and methods, systems and computer program products for using same  
A mark for use in measuring characteristics of a layer of the semiconductor device includes multiple staggered L-shaped patterns including adjacent vertices, and legs that include line segments...
US20070278278 Light Beam Bonding  
A method for performing soldering using a light beam, and a mask for blocking the light beam are provided. A connecting method is provided, being a method for connecting conducting lines and...
US20130164694 RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYING THE SAME  
The present invention provides a rinse solution for lithography and a pattern formation method using the solution. They can improve prevention of both the pattern collapse and the melting at the...
US20130280660 METHOD OF PATTERING NONMETAL CONDUCTIVE LAYER  
A method of patterning a nonmetal conductive layer on a circuit board is provided. A nonmetal conductive layer and a negative photoresist layer are sequentially formed on a substrate of a circuit...
US20100021840 DECOLORIZABLE EMULSION COLORING MATERIAL AND METHOD OF PRODUCING THE SAME  
There is provided an emulsion coloring material which can be used on ordinary paper, has good color developability, and can be used for conventional erasable pens or printing inks of black or blue...
US20140154632 PERFLUOROALKYL SULFONAMIDES SURFACTANTS FOR PHOTORESIST RINSE SOLUTIONS  
A method of modifying a surface of a photoresist material including exposing the photoresist material to an aqueous ionic surfactant solution and varying the pH of the aqueous ionic surfactant...
US20060068317 Poly(arylene ether) composition  
A composition comprising poly(arylene ether), poly(alkenyl aromatic) resin, bis(hydroxy benzene) diphosphate, a hindered amine light stabilizer, and an ultra-violet light absorbing compound,...
US20140038085 Automatic Misalignment Balancing Scheme for Multi-Patterning Technology  
Some aspects of the present disclosure provide for a method of automatically balancing mask misalignment for multiple patterning layers to minimize the consequences of mask misalignment. In some...
US20070264585 PHOTOMASK HAVING HALF-TONE PHASE SHIFT PORTION  
A photomask has a half-tone phase shift portion in a reticle alignment mark portion instead of a light transmissive portion so as to reduce an exposure light transmittance and reduce an influence...
US20080050681 Immersion fluid for immersion lithography  
Aimed at improving balance between refractive index and absorbance of an immersion fluid used for light exposure based on the immersion method, the immersion fluid is configured as containing a...
US20130280648 PHOSPHORESCENT TONER AND METHODS OF FORMING AND USING THE SAME  
A toner composition including at least one phosphorescent pigment that absorbs energy released by natural or artificial light, and is able to be seen in a dark environment through luminescence of...
US20110053077 COLORED RESIN PARTICLE AND METHOD FOR PRODUCING THE SAME  
The present invention provides a method for producing a colored resin particle, the method including: preparing an oil phase in which at least a resin and a colorant are dissolved or dispersed in...
US20060019179 Method of reducing the impact of stray light during optical lithography, devices obtained thereof and masks used therewith  
A method of reducing the influence of the spread of the transmitted light on the feature size during optical lithography is disclosed. The method comprises at least two irradiation steps. During a...
US20060269869 Aluminum support for light sensitive planographic printing plate material and light sensitive planographic printing plate material  
Disclosed is an aluminum support for a light sensitive planographic printing plate material, the aluminum support having an average surface roughness (Ra) of 0.40 to 0.65 μm, and Mr1 of 3.0 to...
US20110139616 Photoformed Silicone Sensor Membrane  
A sensing device includes a sensing surface, and a matrix overlaying the sensing surface. The sensing device includes a photoformed membrane overlaying at least a portion of the matrix. The...
US20140016180 ELECTROPHORETIC MATERIAL, ELECTROPHORESIS DISPLAY DEVICE, AND ELECTRONIC APPARATUS  
In an electrophoretic material, first particles which are charged with a first polarity and second particles which are charged with a second polarity are dispersed in a solvent. A volume, which is...
US20120244469 TUNABLE GLOSS USING AEROGEL CERAMIC FILLERS ADDED TO VITON COATINGS FOR FUSING APPLICATIONS  
Exemplary embodiments provide materials, methods, and systems for a fuser member used in electrophotographic devices and processes, wherein the fuser member can include a coating material...
US20060073394 REDUCED MASK COUNT GATE CONDUCTOR DEFINITION  
A combined wide-image and loop-cutter pattern is provided for both cutting and forming a wide-image section to a hard mask on a substrate formed by sidewall imaging techniques in a reduced number...
US20060257753 Photomask and method thereof  
A photomask and method thereof. In an example method, a photomask may be manufactured by forming an oxide layer on a surface, patterning the oxide layer to form an oxide pattern, the oxide pattern...
US20090202922 Dimensional stabilization of precision etched masks  
Dimensional stabilization of a precision etched mask used in the production of organic light emitting diode display panels. This may entail securing a sheet of mask material, and then heating the...
US20090291274 DEVELOPER FOR SELECTIVE PRINTING OF RAISED INFORMATION BY ELECTROGRAPHY  
The use of electrographic printing to prepare prints which have a desired tactile feel or raised information in a controlled manner by utilizing a developer having toner particle size larger than...
US20080113276 Method of joining a plurality of reticles for use in producing a semicondcutor layout pattern, a computerized system for implementing such a method and a semiconductor mask arrangement produced by implementing such a method  
A method for joining a plurality of reticles is used for producing a semiconductor layout pattern, so that the reticles will collectively map a circuit arrangement on a semiconductor substrate. A...
US20090286168 METHOD FOR STRIPPING PELLICLE AND STRIPPING APPARATUS USED THEREIN  
A method for stripping a pellicle from an exposure master plate is provided, the pellicle being a lithographic pellicle that includes a pellicle frame, a pellicle film stretched over one end face...
US20070289943 Block copolymer mask for defining nanometer-scale structures  
A nanometer-scale mask includes a periodic array of nanometer-scale structural elements comprising an inorganic oxide.
US20090130604 Solution for immersion exposure and immersion exposure method  
The object is to resolve a finer pattern with a narrower line/space width by immersion lithography technology in the manufacture of a semiconductor or the like. A liquid for use in immersion...
US20110287358 FIXING DEVICE  
A fixing device includes a fixing belt including a metal layer, a pressing member to form a nip between the pressing member and the fixing belt, an induction current generating coil that faces an...
US20130196269 PHOTONIC HEATING OF SILVER GRIDS  
A method of improving conductivity of a metal pattern (18) includes providing a developed silver pattern (14) formed from a photographic silver salt provided in a binder coated on a substrate...
US20090029269 LITHOGRAPHIC PELLICLE  
The present invention is directed to provide a pellicle that can control the deformation of the photomask to a minimum without particular consideration of the flatness of a pellicle frame even in...
US20110151214 METAL COMPOSITIONS, THERMAL IMAGING DONORS AND PATTERNED MULTILAYER COMPOSITIONS DERIVED THEREFROM  
Thermal imaging donors are useful for thermal transfer patterning of a metal layer and optionally, a corresponding proximate portion of an additional transfer layer onto a thermal imaging...
US20130029130 METHOD FOR FABRICATING A POROUS CARBON STRUCTURE USING OPTICAL INTERFERENCE LITHOGRAPHY, AND POROUS CARBON STRUCTURE FABRICATED BY SAME  
Provided are a method for fabricating a porous carbon structure using optical interference lithography, and a porous carbon structure fabricated by same, wherein the method for fabricating a...
US20080248432 NEAR-FIELD EXPOSURE METHOD  
A near-field exposure method wherein an exposure mask having a light blocking film with an opening smaller than a wavelength of light from an exposure light source is used and wherein an object to...
US20120148942 DIAGONAL INTERCONNECT FOR IMPROVED PROCESS MARGIN WITH OFF-AXIS ILLUMINATION  
Mask or reticle methods and structures having pattern feature segments formed at oblique angles to each other. When illuminated using off-axis illumination techniques, a mask or reticle according...
US20060017910 Composite printing  
Systems and techniques for printing substrates. In one implementation, a method includes patterning a substrate with a substantially arbitrary arrangement of features by introducing irregularity...