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US20140272718 Lithography Process  
A method for being used in a lithography process is provided. The method includes receiving a first mask, a second mask and a substrate with a set of baseline registration marks. A first set of...
US20050042524 Process for making hard pellicles  
Disclosed is a process for making thin hard pellicle for photomasks used in projection photolithography. The process can be used for making thin hard pellicles comprising a pellicle layer having a...
US20130244184 SUB-WAVELENGTH LITHOGRAPHY VIA RABI OSCILLATIONS  
A sub-wavelength photolithographic method includes exposing a photoresist material to a stimulating electromagnetic source prior to further exposing the photoresist material to a dissociating...
US20130004899 Sub-wavelength Lithography via Rabi Oscillations  
A sub-wavelength photolithographic method includes exposing a photoresist material to a stimulating electromagnetic source prior to further exposing the photoresist material to a dissociating...
US20080193790 Drum For a Machine Producing a Patterned Nonwoven and Obtained Fabric  
The inventive nickel drum comprises a first part whose lateral surface is provided with perforations at the first level thereof and a second part whose lateral surface is provided with...
US20120107738 TAGGENT FLAKES FOR COVERT SECURITY APPLICATIONS HAVING A SELECTED SHAPE  
A plurality of flakes are provided that can be used in ink or paint wherein the flakes are of a size that requires magnification to see their shape. The flakes are in the form of regular polygons,...
US20130078558 LITHOGRAPHIC CD CORRECTION BY SECOND EXPOSURE  
Correction of CD variation is accomplished with a second exposure, e.g. using a second reticle. Embodiments include exposing a first wafer with a first dose using a first reflective reticle having...
US20130059254 PHOTOLITHOGRAPHY METHOD USING A CHEMICALLY-AMPLIFIED RESIST  
A photolithography method, including the steps of: S1) depositing, on the upper surface of a wafer, a chemically-amplified resist; S2) exposing the resist to a sensitizing radiation through a...
US20050158654 Reducing outgassing of reactive material upon exposure of photolithography resists  
Outgassing of reactive material upon exposure of a photolithographic resist may be reduced. Outgassing may foul optical components of the photolithographic system. In one embodiment, a ring...
US20120196210 Determining manufacturability of lithographic mask based on manufacturing shape penalty of aspect ratio of edge that takes into account pair of connected edges of the edge  
The manufacturability of a lithographic mask employed in fabricating instances of a semiconductor device is determined. Target edge pairs are selected from mask layout data of the mask, for...
US20150212405 TEST PATTERN LAYOUT FOR TEST PHOTOMASK AND METHOD FOR EVALUATING CRITICAL DIMENSION CHANGES  
Aspects of the present invention relate to a test photomask and a method for evaluating critical dimension changes in the test photomask. Various embodiments include a test photomask. The test...
US20090269702 METHOD FOR INTRODUCING INCLUSION IMAGE INTO GEMSTONE  
A gemstone having an image formed by a manufactured color inclusion and method for making same. The gemstone is of a type that is heat sensitive and undergoes a color phase transformation upon...
US20110236809 METHOD FOR EXAMINING A WAFER WITH REGARD TO A CONTAMINATION LIMIT AND EUV PROJECTION EXPOSURE SYSTEM  
A method for examining at least one wafer (13) with regard to a contamination limit, in which the contamination potential of the resist (13a) of the wafer (13), which resist (13a) outgasses...
US20080020330 Method for Developing a Photoresist  
A method for developing a photoresist includes applying a first developer to the photoresist to remove non-cross-linked areas of the photoresist, and applying a second developer to the photoresist...
US20090104541 PLASMA SURFACE TREATMENT TO PREVENT PATTERN COLLAPSE IN IMMERSION LITHOGRAPHY  
The present invention comprises a method of reducing photoresist mask collapse when the photoresist mask is dried after immersion development. As feature sizes continue to shrink, the capillary...
US20070269747 Lithography Technique Using Silicone Molds  
A method includes the steps of: A) filling a silicone mold having a patterned surface with a curable (meth)acrylate formulation, B) curing the curable (meth)acrylate formulation to form a...
US20150098984 NANOLITHOGRAPHY USING LIGHT SCATTERING FROM PARTICLES AND ITS APPLICATIONS IN CONTROLLED MATERIAL RELEASE  
The present disclosure provides hollow nanostructures, methods of forming thereof, and methods of delivery of further nanomaterials utilizing the hollow nanostructures. The hollow nanostructures...
US20060177766 Photoresist for enhanced patterning performance  
A photoresist is composed of an alkali soluble resin, a photosensitive agent and a solvent. The alkali soluble resin includes a first type novolak resin synthesized from meta-cresol, and the first...
US20150056560 PHOTOSENSITIVE CONDUCTIVE PASTE AND METHOD OF PRODUCING CONDUCTIVE PATTERN  
A photosensitive conductive paste includes an epoxy acrylate (A) including a urethane bond, a photopolymerization initiator (B), and a conductive filler (C), wherein an added amount of the...
US20140252674 ARCHITECTED MATERIALS FOR ENHANCED ENERGY ABSORPTION  
A three-dimensional lattice architecture with a thickness hierarchy includes a first surface and a second surface separated from each other with a distance therebetween defining a thickness of the...
US20070059612 Black composition, black coating composition, resin black matrix, color filter for liquid crystal display and liquid crystal display  
A black coating composition which gives a highly adhesive resin black matrix that exhibits a high OD value which was able to be attained only by metal thin film black matrices is disclosed. The...
US20120199957 PHOTORESISTS AND METHODS FOR USE THEREOF  
New photoresists are provided that comprise a multi-keto component and that are particularly useful for ion implant lithography applications. Preferred photoresists of the invention can exhibit...
US20080311529 IMMERSION MULTIPLE-EXPOSURE METHOD AND IMMERSION EXPOSURE SYSTEM FOR SEPARATELY PERFORMING MULTIPLE EXPOSURE OF MICROPATTERNS AND NON-MICROPATTERNS  
This invention discloses an immersion multiple-exposure method including a first exposure step of performing, using a first mask, immersion exposure of a photoresist film formed on a substrate, a...
US20110287351 ELECTROPHOTOGRAPHIC PHOTORECEPTOR AND IMAGE FORMING APPARATUS  
An electrophotographic photoreceptor having a photosensitive layer on a conductive support, wherein the photosensitive layer comprises a pigment containing an adduct of titanyl phthalocyanine and...
US20070082285 Resin microparticle as raw material for toner, aqueous dispersed system thereof and toner  
A resin microparticle for a toner raw material that has a small particle diameter and a narrow particle diameter distribution and has a low odor is provided. The resin microparticle for a toner...
US20130164659 STRUCTURES COMPRISING MASKS COMPRISING CARBON  
The critical dimension (CD) of features formed during the fabrication of a semiconductor device may be controlled through the use of a dry develop chemistry comprising O2, SO2 and a hydrogen...
US20120100464 GLASS SUBSTRATE-HOLDING TOOL  
To provide a glass substrate-holding tool which is capable of avoiding scratching to the deposition surface of a glass substrate and dusting thereby caused as well as scratching and deposition of...
US20060246361 Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask  
A method of manufacturing a mask blank glass substrate includes a marking step of irradiating laser light onto a mirror-like surface in an area, having no influence on transfer, on a surface of...
US20100239982 Photoresist composition with high etching resistance  
A resist composition includes a first polymer including a repeating unit having the following Chemical Formula 1 and a repeating unit having the following Chemical Formula 2, a second polymer...
US20120141941 DEVELOPING LITHOGRAPHIC PRINTING PLATE PRECURSORS IN SIMPLE MANNER  
Imaged lithographic printing plates are processed using a developer that is replenished with only water, but replenishment is at a rate to allow developer volume to slowly decrease from a...
US20150191830 ETCHING LIQUID, ETCHING METHOD, AND METHOD OF MANUFACTURING SOLDER BUMP  
An etching Liquid which can selectively remove only a copper layer in an etching process of a multilayer structure including a cobalt layer and the copper layer is disclosed. The etching liquid is...
US20130137045 UV Glass Production Method  
The present invention discloses a UV glass production method, comprising the steps: arranging a blade on an exposure stage; controlling the position of an exposure area on a glass substrate by...
US20100081075 MAGENTA TONER AND DEVELOPER  
A magenta toner, produced by a method including suspending an oily liquid comprising a binder resin and a colorant in an aqueous medium, wherein the colorant comprises a naphthol pigment and a...
US20050123842 Mother glass and method of fabricating liquid crystal display panel using the same  
A mother glass and a method of fabricating a liquid crystal display panel using the mother glass provides improved color characteristics and brightness. The mother glass is provided with a...
US20120308788 OVERLAY MARK SET AND METHOD FOR POSITIONING TWO DIFFERENT LAYOUT PATTERNS  
An overlay mark set includes a substrate, a first overlay mark and a second overlay mark. The first overlay mark is disposed on the substrate for representing a first layout pattern. The second...
US20080020302 DEVICE HAVING ETCHED FEATURE WITH SHRINKAGE CARRYOVER  
In an embodiment of the present invention, a device includes a first etched feature located in a critical dimension scanning electron microscope (CD-SEM) characterization location, the first...
US20090075183 Technique for Determining Mask Patterns and Write Patterns  
During a method for generating a third mask pattern to be used on a photo-mask in a photolithographic process, first features are added to a first mask pattern to produce a second mask pattern. A...
US20080206653 EXPOSURE MASK  
Disclosed herein is an exposure mask for use in manufacturing a semiconductor device through exposure conducted by use of extreme ultraviolet rays, including, an absorbing film configured to...
US20110155855 METHOD FOR MAKING AN ACOUSTIC PANEL FOR THE AIR INTAKE LIP OF A NACELLE  
The invention relates to a method for making an acoustic panel (12) for an air intake lip (2) of a nacelle (1) that includes the steps of obtaining a perforated de-icing assembly (14) including at...
US20080241756 ENHANCING LITHOGRAPHY FOR VIAS AND CONTACTS BY USING DOUBLE EXPOSURE BASED ON LINE-LIKE FEATURES  
By performing a double exposure process on the basis of bar-like or line-like features, critical via and contact openings may be defined as an intersection, thereby obtaining the desired design...
US20060154152 Flare reduction in photolithography  
Lithography masks that include sub-resolution features to reduce flare are disclosed and described herein.
US20050089776 Resist reflow measurement key and method of forming a fine pattern of a semiconductor device using the same  
In a resist reflow measurement key, and method of fabricating a fine pattern of a semiconductor device using the same, the resist reflow measurement key includes a first reflow key including a...
US20150177619 PLASMONIC LITHOGRAPHY USING PHASE MASK  
In the proposed plasmonic nanolithography technique a transparent mask is brought into physical contact with a metal on a substrate that is coated with a photoresist. The mask is not made of metal...
US20140329183 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS  
A polymer comprising 0.5-10 mol % of recurring units having acid generating capability and 50-99.5 mol % of recurring units providing for dissolution in alkaline developer is used to formulate a...
US20120219888 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS  
A polymer comprising 0.5-10 mol % of recurring units having acid generating capability and 50-99.5 mol % of recurring units providing for dissolution in alkaline developer is used to formulate a...
US20080182193 POLYESTER EMULSION CONTAINING CROSSLINKED POLYESTER RESIN, PROCESS, AND TONER  
A polyester resin emulsion includes crosslinked polyester resin in an emulsion medium, the crosslinked polyester resin having a degree of crosslinking of from about 0.1 percent to about 100...
US20080166646 TONER FOR REDUCED PHOTORECEPTOR WEAR RATE  
An electrophotographic image forming apparatus comprising a photoreceptor, a conductive magnetic brush development system, and a housing in association with the conductive magnetic brush...
US20090081589 THICK FILM RESISTS  
Thick film photoresist compositions are disclosed.
US20050244757 DYNAMIC MASK MODULE  
A dynamic mask module is disclosed, which comprises a microcomputer system, a mask pattern generator and a light source. The mask pattern generator is disposed over a substrate and electrically...
US20140045104 LCD Panel Photolithography Process and Mask  
Disclosed is an LCD panel photolithography process, employed in a lithography system for manufacturing a plurality of LCD panel, comprising steps of: performing photolithography to a glass...