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US20080316556 VOLUME HOLOGRAM TRANSFER FOIL, VOLUME HOLOGRAM LAMINATE, AND PRODUCTION METHOD THEREOF  
A major object of the present invention is to provide a volume hologram transfer foil that gives a volume hologram laminate higher in antiforgery function, The present invention achieves the...
US20090233225 Low chlorine epoxy resin formulations  
This invention relates to the need to improve the corrosion resistance of very low total chlorine epoxy resins which contain very low contents of organically bound chlorine. The invention relates...
US20100068664 DEVELOPING ROLLER, ELECTROPHOTOGRAPHIC PROCESS CARTRIDGE AND ELECTROPHOTOGRAPHIC IMAGE-FORMING APPARATUS  
A developing roller has a mandrel, an elastic layer and a cover layer as a surface layer. The cover layer includes a silicon oxide film containing a carbon atom chemically bonded to a silicon...
US20060115745 Electron beam exposure mask, electron beam exposure method, and electron beam exposure system  
An electron beam exposure system includes: an electron beam generation unit for generating an electron beam; an electron beam exposure mask having opening portions for proximity effect correction,...
US20130294972 ZERO-MODE WAVEGUIDE FOR SINGLE BIOMOLECULE FLUORESCENCE IMAGING  
The disclosed subject matter provides a zero-mode waveguide (ZMW) including a substrate and at least one nano-well thereon and having a bottom surface and a side wall comprising gold. A surface of...
US20090087777 Optical Disk Storage Medium  
The surface of a transparent layer provided on the uppermost layer of the label side of an optical disk is subjected to pearskin finish. As a result, a light from a reflection layer is prevented...
US20120024816 METHOD FOR FABRICATING TOUCH SENSOR PANELS  
A method for fabricating a touch sensor panel is disclosed. The method includes providing a substrate for the touch sensor panel, depositing a conductive material layer on a top surface of the...
US20140212795 REFLECTIVE MASK BLANK AND REFLECTIVE MASK, AND METHODS FOR MANUFACTURING REFLECTIVE MASK BLANK AND REFLECTIVE MASK  
A reflective mask blank, a reflective mask, and methods for manufacturing those, which suppress reflectance at a light-shielding frame. The reflective mask includes a substrate, a multilayered...
US20100143467 Pharmaceutical tablets with diffractive microstructure and compression tools for producing such tablets  
A tablet (4) for pharmaceutical use has on at least one part of its surface a diffractive microstructure (11) which generates diffraction effects which can be perceived in the visible spectral...
US20060172229 Alignment system used in nano-imprint lithography and nano imprint lithography method using the alignment system  
An alignment system used in nano-imprint lithography and a nano-imprint lithography method using the alignment system are provided. The alignment system includes: a plurality of electron emission...
US20070279605 Exposure systems including devices for inhibiting heating caused by infrared radiation from vacuum pump or the like  
Exposure systems are disclosed that suppress incidence of infrared radiation from a vacuum pump into a chamber in which exposures are performed under vacuum. An exemplary system includes a...
US20110275021 SILVER HALIDE PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL FOR MOVIE  
A silver halide photographic light-sensitive material for movie, having a specific layer structure by using particles of at least one kind of electroconductive metal oxide and at least one kind of...
US20110305977 OPTICAL PROXIMITY CORRECTION PROCESS  
An optical proximity correction process for designing a mask according to a target exposure intensity of each edge of a pattern is provided. Each edge is at a corresponding current edge position...
US20090096676 DURABLE WIDEBAND ANTENNA FABRICATED ON LOW RESISTIVITY SILICON SUBSTRATE  
An antenna that is easily fabricated on a low resistivity CMOS-grade silicon substrate is herein described. The antenna has a reasonable radiation efficiency. One generalized non-limiting...
US20070059613 REPOSITIONABLE PHOTO CARD  
The invention provides a repositionable photo card having a substrate comprising a base sheet having opposing first and second surfaces and an image receptive coating disposed on the first surface...
US20150079523 POLYMER SHEET PATTERNING AND ITS ASSEMBLY USING SLIT CHANNEL LITHOGRAPHY  
Synthesizing polymeric sheets in a slit fluidic channel by projection of a pulse of illumination to the channel. A slit channel can include a polymeric device with a plane's width larger than 1...
US20110207030 PELLICLE FOR LITHOGRAPHY AND METHOD FOR MANUFACTURING PELLICLE FILM  
Provided are a pellicle for lithography which can prevent a haze from being generated on a photomask even if a short wave length laser such as an ArF excimer laser is used for a long period of...
US20120077130 METHOD FOR GENERATING A PLURALITY OF OPTIMIZED WAVEFRONTS FOR A MULTIPLE EXPOSURE LITHOGRAPHIC PROCESS  
A simplified version of a multiexpose mask optimization problem is solved in order to find a compressed space in which to search for the solution to the full problem formulation. The...
US20050221206 Decolorable image forming material  
The present invention relates to a decolorable image forming material having a color former, a developer, a binder resin and a surfactant. The present invention also relates to a decolorable image...
US20100075248 BOTTOM ANTIREFLECTIVE COATINGS EXHIBITING ENHANCED WET STRIP RATES, BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR FORMING BOTTOM ANTIREFLECTIVE COATINGS, AND METHODS FOR FABRICATING THE SAME  
Bottom antireflective coating (BARC) that exhibit enhanced wet strip rates, BARC compositions for fabricating such BARCs, and methods for manufacturing such BARC compositions are provided....
US20110037175 INTERCONNECTION BETWEEN SUBLITHOGRAPHIC-PITCHED STRUCTURES AND LITHOGRAPHIC-PITCHED STRUCTURES  
An interconnection between a sublithographic-pitched structure and a lithographic pitched structure is formed. A plurality of conductive lines having a sublithographic pitch may be...
US20140272687 EXTREME ULTRAVIOLET (EUV) MULTILAYER DEFECT COMPENSATION AND EUV MASKS  
Methods and structures for extreme ultraviolet (EUV) lithography are disclosed. A method includes determining a phase error correction for a defect in an EUV mask, determining an amplitude error...
US20140038087 EXTREME ULTRAVIOLET (EUV) MULTILAYER DEFECT COMPENSATION AND EUV MASKS  
Methods and structures for extreme ultraviolet (EUV) lithography are disclosed. A method includes determining a phase error correction for a defect in an EUV mask, determining an amplitude error...
US20090011353 Black Toner  
In a black toner having at least a binder resin and an iron-titanium composite oxide as a colorant; the iron-titanium composite oxide is contained in a specific amount; the black toner has a...
US20150125788 MULTI-LINE WIDTH PATTERN CREATED USING PHOTOLITHOGRAPHY  
Systems and methods are provided for forming features through photolithography. A polymer layer is formed over a substrate. The polymer layer is patterned to form a first feature and a second...
US20120003584 MATERIALS FOR LITHOGRAPHIC PLATES COATINGS, LITHOGRAPHIC PLATES AND COATINGS CONTAINING SAME, METHODS OF PREPARATION AND USE  
This invention relates to iodonium salts, acetal copolymers and polymer binders comprising functional groups capable of undergoing cationic or radical polymerization, their method of preparation...
US20110311916 THERMALLY ABLATABLE LITHOGRAPHIC PRINTING PLATE PRECURSORS  
A lithographic printing plate precursor can be used to prepare a printing plate using thermal ablation. The precursor has a non-thermally ablatable first layer on a substrate. Over the first layer...
US20050219669 Method of forming a rainbow security hologram  
The present invention relates to a method of forming and validating a color-assigned rainbow security hologram of an object, where different parts of the recreated image of the object is presented...
US20090170030 Method of making a pillar pattern using triple or quadruple exposure  
Methods of making pillar shaped device array using a triple or quadruple exposure technique are described. A plurality of pillar shaped devices are formed arranged in a hexagonal or rectangular...
US20150010868 MANUFACTURING METHOD OF LIQUID EJECTION HEAD  
A manufacturing method of a liquid ejection head includes a step of performing a first exposure to form a first ejection orifice row and a step of performing a second exposure to form a second...
US20090185836 Developer, developer storage unit, developing device, and image forming apparatus  
Developer includes toner formed of base particles containing at least a binder resin. The base particles have surfaces coated with an additive agent, and the toner has a volume average particle...
US20110262861 PHOTOSENSITIVE COMPOSITION  
Photoresist compositions and methods suitable for depositing a thick photoresist layer in a single coating application are provided. Such photoresist layers are particularly suitable for use in...
US20130115558 SELECTIVE PHOTO-INDUCED PROTEIN IMMOBILIZATION USING BOVINE SERUM ALBUMIN  
Provided is a biomaterial immobilizing method including immobilizing a bovine serum albumin on a substrate, providing a biomaterial on the substrate immobilized with the bovine serum albumin, and...
US20140127622 TAGGENT FLAKES FOR COVERT SECURITY APPLICATIONS HAVING A SELECTED SHAPE  
A plurality of flakes are provided that can be used in ink or paint wherein the flakes are of a size that requires magnification to see their shape, in the form of polygons, such as squares,...
US20090296055 LENS HEATING COMPENSATION SYSTEMS AND METHODS  
Methods for calibrating a photolithographic system are disclosed. A cold lens contour for a reticle design and at least one hot lens contour for the reticle design are generated from which a...
US20080102404 ALUMINUM ALLOY PLATE AND SUPPORT FOR LITHOGRAPHIC PRINTING PLATE  
An aluminum alloy plate for lithographic printing that is capable of obtaining a lithographic printing plate support which is free from appearance defects and has a uniform surface after...
US20060240199 Pellicle frame  
The invention provides a pellicle frame which can readily be peeled off after being adhesively attached to a photomask, and a photolithographic framed pellicle which makes use of this pellicle...
US20110111334 LIGHT SHOCK RESISTANT OVERCOAT LAYER  
Embodiments pertain to a novel imaging member, namely, an imaging member or photoreceptor comprising an overcoat layer which comprises light-absorbing material that improves print quality. The...
US20090068580 EXTERNAL ADDITIVE, METHOD OF MANUFACTURING SAME AND TONER  
An external additive including titanium dioxide having a water-soluble component of at least 0.2% by weight and a fluorosilane compound, wherein the titanium dioxide is surface-reformed by the...
US20050014075 Phase edge darkening binary masks  
A binary mask and method for improving the aerial image and mask error enhancement factor (MEEF) of binary masks. A phase edge darkening binary mask is provided which has quartz etched, preferably...
US20140162184 Color Toner  
The present disclosure describes a color single component toner with desirable fusing performance.
US20090286165 HOLOGRAM LAMINATE, HOLOGRAM COPY METHOD, AND HOLOGRAM PRODUCING METHOD  
A hologram laminate is provided. The hologram laminate includes a hologram record layer, and a surface protection layer. The hologram record layer is made of a photosensitive material. The surface...
US20130034812 POLYMERIZABLE COMPOSITION FOR SOLDER RESIST, AND SOLDER RESIST PATTERN FORMATION METHOD  
The present invention provides a polymerizable composition for a solder resist, including an infrared ray shielding material, a polymerization initiator, and a polymerizable compound, and a solder...
US20080008958 SIGNING FILM  
There is described a signing film wherein provided on a background of the signing film is a decorative printing which forms a security feature and which fluoresces when viewed under UV light. So...
US20050158634 Photolithography mask comprising absorber/phase-shifter elements  
This invention relates to an insolation mask including a transparent substrate (100) and at least one absorber/phase shifter element (112) embedded in the substrate, so as to form a monolithic...
US20150147686 Extreme Ultraviolet Lithography Process And Mask  
A low EUV reflectivity mask includes a low thermal expansion material (LTEM) layer, a low EUV reflectivity (LEUVR) multilayer over the LTEM layer in a first region, a high EUV reflectivity (HEUVR)...
US20100190097 Pellicle for photolithography  
There is provided a pellicle for photolithography having a plurality of air vents formed in a pellicle frame for photolithography and having the air vents covered with a dustproof filter in which...
US20080226990 Apertured Window for Enabling Flexible Illumination Overfill of Patterning Devices  
A dark border region may be integrated with a window covering a patterning device, such that light from an active area of the patterning device passes through the dark border region, while excess...
US20120288797 PHOTORESIST COMPOSITIONS AND METHODS OF USE IN HIGH INDEX IMMERSION LITHOGRAPHY  
The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected...
US20150132700 PHOTORESIST WITH RARE-EARTH SENSITIZERS  
A method of making a photoresist with rare-earth sensitizers is provided. The rare-earth sensitizer could be a salt or a rare-earth complex. According to the invention, photoresist composition is...