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US20120183946 Fabrication of Microfilters and Nanofilters and Their Applications  
Micro- and nanofilters with precision pore sizes and pore layout have applications in many fields including capturing circulating tumor cells and fetal cells in blood, water treatment, pathogen...
US20130004901 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST  
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more uracil moieties. Preferred...
US20110311909 Toner Compositions  
The present disclosure provides processes for producing images of excellent color fidelity when incorporating a magenta toner with a lower colorant loading in addition to a first magenta toner. In...
US20110177442 TONER COMPOSITIONS  
The present disclosure provides processes for producing images of excellent color fidelity when incorporating a magenta toner with a lower colorant loading in addition to a first magenta toner. In...
US20070238027 METHOD FOR GENERATING ALIGNMENT MARKS AND RELATED MASKS THEREOF  
A method for generating alignment marks on a substrate is disclosed. The method includes: providing a mask, the mask includes at least one alignment mark set, wherein the alignment mark set...
US20140268091 Extreme Ultraviolet Lithography Process and Mask  
A system and process of an extreme ultraviolet lithography (EUVL) is disclosed. The system and process includes receiving a mask with two states, which have 180 degree phase difference to each...
US20080286692 Photosensitve Laminate  
A photoresist laminate structure comprising at least one photosensitive resist layer and a polymeric layer bound to the photosensitive resist layer is disclosed, wherein the polymeric layer is...
US20130344425 COATING FOR EXTENDING LIFETIME OF AN ORGANIC PHOTOCONDUCTOR  
A doped protective coating for extending a lifetime of an organic photoconductor is provided. The coating includes an in-situ cross-linked polymer matrix and a substantially uniformly distributed...
US20110123925 POLYMER FOR PROTECTIVE LAYER OF RESIST, AND POLYMER COMPOSITION INCLUDING THE SAME  
A polymer includes a first repeating unit represented by the following Chemical Formula 1, and a second repeating unit including at least one repeating unit represented by the following Chemical...
US20150099229 NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR  
Negative-working lithographic printing plate precursors have improved bakeability and good shelf life and can be imaged using either UV or infrared radiation. These precursors have a...
US20120128942 DOUBLE PATTERNING WITH INLINE CRITICAL DIMENSION SLIMMING  
A method for double patterning a substrate is described. The double patterning method may include a litho/freeze/litho/etch (LFLE) technique that includes a first (critical dimension) CD slimming...
US20080274869 Quartz Glass Blank and Method for Producing Said Blank  
The present invention relates to a quartz glass blank for an optical component for transmitting radiation of a wavelength of 15 nm and shorter, the blank consisting of highly pure quartz glass,...
US20050250052 Maskless lithography using UV absorbing nano particle  
Systems and methods are disclosed for a maskless lithography process by over coating a photo resist layer with water soluble thermoplastics; and imaging ultraviolet (UV) absorbing nano particles...
US20110143281 COATING COMPOSITIONS FOR PHOTORESISTS  
In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are...
US20130177847 PHOTORESIST FOR IMPROVED LITHOGRAPHIC CONTROL  
Methods and corresponding photoresists are described for fine linewidth lithography using x-rays, e-beams, visible spectrum optical lithography, ultra-violet optical lithography or extreme...
US20070134596 Photosensitive printing element having nanoparticles and method for preparing the printing element  
This invention relates to a photosensitive printing element for use as a flexographic printing form and a process for preparing the form from the element. The photosensitive element has a layer of...
US20110136058 EMULSION AGGREGATION METHODS  
A method of making toner particles, including: mixing, at less than about 17° C. and without homogenizing, a resin emulsion with a coagulant, a colorant, an optional wax, and optional additives,...
US20120052422 MASK-SHIFT-AWARE RC EXTRACTION FOR DOUBLE PATTERNING DESIGN  
A method includes providing a layout of an integrated circuit design, and generating a plurality of double patterning decompositions from the layout, with each of the plurality of double...
US20110177332 Nanofiber-nanowire composite and fabrication method thereof  
Example embodiments are directed to a nanofiber-nanowire composite includes a polymer nanofiber; and a plurality of nanowires of a metal oxide extending from inside to outside of the polymer...
US20090325096 TRIS(ENYLARYL)AMINE CONTAINING PHOTOCONDUCTORS  
A photoconductor that includes, for example, a supporting substrate, a photogenerating layer, and a tris(enylaryl)amine containing charge transport layer.
US20140080043 SILOXANE-BASED COMPOUND, PHOTOSENSITIVE COMPOSITION COMPRISING THE SAME AND PHOTOSENSITIVE MATERIAL  
The present application relates to a siloxane-based compound, a photosensitive composition including the same, and a photosensitive material.
US20140163414 INSERTABLE PROBE FOR DIAGNOSIS OF LESIONAL TISSUE IN REAL TIME AND METHOD OF MANUFACTURING ELECTRODE THEREOF  
Disclosed herein is an insertable probe for diagnosis of lesional tissue in real time. The insertable probe includes a guide needle inserted into the human body and having a hollow shape of a...
US20090263730 EXTREME ULTRA VIOLET LITHOGRAPHY MASK AND METHOD FOR FABRICATING THE SAME  
A method for fabricating an extreme ultra violet lithography mask includes forming a reflective layer that reflects an extreme ultra violet light on a substrate; forming a capping layer that...
US20120070786 METHOD FOR MONITORING PHOTOLITHOGRAPHY PROCESS AND MONITOR MARK  
A method for monitoring a photolithography process includes providing a monitor mark having high sensitivity of the focus of the photolithography process, transferring the monitor mark together...
US20070020556 PHOTOSENSITIVE ARTICLES AND RELATED MANUFACTURING PROCESS  
A decorative photosensitive article having a design formed of a plurality of polyvinyl chloride plasticizers. At least one of the polyvinyl chloride plasticizers includes a photochromic pigment...
US20150248053 PHOTOSENSITIVE CONDUCTIVE PASTE, MULTILAYER SUBSTRATE, METHOD OF PRODUCING CONDUCTIVE PATTERN, AND ELECTROSTATIC CAPACITANCE TYPE TOUCH PANEL  
A photosensitive conductive paste contains conductive particles (A), a photosensitive organic compound (B), an epoxy resin (C) and an ion adsorbent (D) that is selected from the group consisting...
US20080063982 Fluids and methods of forming thereof  
Fluids for use in immersion lithography systems and methods of forming thereof are disclosed. In accordance with a preferred embodiment, a fluid for immersion lithography includes a liquid and a...
US20090232928 Method of Manufacturing Stamper, and Stamper  
According to one embodiment, a method of manufacturing a stamper includes forming a conductive layer on a surface of a master having patterns of protrusions and recesses, forming an electroforming...
US20060014085 Anisotropic light diffusion adhesive layer, anisotropic light diffusion adhesive laminate, and illuminating device having anisotropic light diffusion adhesive laminate  
An anisotropic light diffusion adhesive layer includes an adhesive material, and an acicular filler whose refractive index is different from that of the adhesive material, wherein the acicular...
US20150104732 Method for Repairing a Mask  
A method for repairing a mask is disclosed. A mask, having multiple defective regions need to be repaired, is received. Locations and sizes of the defective regions are determined. A...
US20110177441 TONER COMPOSITIONS  
The present disclosure provides processes for producing images of excellent color fidelity when incorporating a cyan toner with a lower colorant loading in addition to a first cyan toner. In...
US20050025959 Hard pellicle and fabrication thereof  
Disclosed are thin hard pellicle for projection photolithography and process for making the same. The thin hard pellicle comprises a pellicle layer having a thickness in the range of about 5 to...
US20130183622 POSITIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS  
A positive-working lithographic printing plate precursor has an outermost imageable layer that is present at a dry coverage weight of at least 0.7 g/m2 and up to and including 1.6 g/m2 and...
US20130224657 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS  
The present invention provides an acid generator generates a sulfonic acid represented by the following general formula (1) in response to high-energy beam or heat: To provide a novel acid...
US20090220868 MASK AND DESIGN METHOD THEREOF  
A mask and the design method thereof are provided. The mask includes a light-shielding area shielding off a light, wherein the light-shielding area includes a photonic crystal having a lattice...
US20120214099 PHOTORESIST COMPOSITIONS  
A composition. The composition includes a polymer and a photosensitive acid generator capable of generating a first amount of acid upon exposure to a first dose of radiation and a second amount of...
US20050100837 Ultrahigh speed imaging assembly for orthopedic radiography  
A radiographic imaging assembly comprises a symmetric radiographic silver halide film has an overall system speed of at least 400 and includes a phosphor intensifying screen that has a screen...
US20130143164 POLYMERIZABLE COMPOSITION  
Provided is a polymerizable composition containing (A) a polymerization initiator, (B) a polymerizable compound, (C) at least either a tungsten compound or a metal boride, (D) a compound having a...
US20080026327 Method for forming fine pattern with a double exposure technology  
The method for forming a fine pattern of a semiconductor device includes depositing a photoresist film over a semiconductor substrate having an underlying layer, performing a first exposure...
US20130130181 METHOD OF FORMING ALIGNMENT FILM  
A method of forming an alignment film is provided. A photosensitive polymer material is provided, wherein the photosensitive polymer material defines a first pixel area and a second pixel area...
US20060194142 IMMERSION LITHOGRAPHY WITHOUT USING A TOPCOAT  
A novel immersion medium for immersion lithography is provided. The immersion medium is introduced to fill a gap in between a front surface of a projection lens of a stepper and a top surface of a...
US20090197209 LITHOGRAPHICALLY PATTERNED NANOWIRE ELECTRODEPOSITION  
Lithographically patterned nanowire electrodeposition (LPNE) combines attributes of photolithography with the versatility of bottom-up electrochemical synthesis. Photolithography is employed to...
US20060222967 Reticle, method for manufacturing magnetic disk medium using reticle, and magnetic disk medium  
It is made possible to obtain a reticle which has a high strength even it is formed in a doughnut shape, a method for manufacturing a magnetic disk medium using the reticle, and a magnetic disk...
US20120244460 MECHANISMS FOR PATTERNING FINE FEATURES  
The embodiments described provide mechanisms for patterning features for advanced technology nodes with extreme ultraviolet lithography (EUVL) tools. One or more EUV pre-masks are generated by...
US20080248412 SUPERVISORY ETCH CD CONTROL  
Exemplary embodiments provide a controller system and method to control etch critical dimensions (CDs) during semiconductor manufacturing processes when the etch elements cannot be manipulated to...
US20140057204 NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS AND USE  
A negative-working lithographic printing plate precursor comprises a negative-working radiation-sensitive imageable layer and an outermost layer comprising a vinyl alcohol copolymer comprising at...
US20060246367 Magnetic compositions  
Compositions including carbon nanofoam are suitable for printing and magnetic ink.
US20140044654 COMPOSITIONS, APPARATUS, SYSTEMS, AND METHODS FOR RESOLVING ELECTRONIC EXCITED STATES  
The present disclosure relates, according to some embodiments, to molecules, including conjugated fused polycyclic molecules, that may receive excited state energy from other molecules (e.g.,...
US20060110689 Immersion photolithography with megasonic rinse  
A method comprises forming a photoresist on a substrate, rinsing the photoresist using a rinse liquid agitated with at least one megasonic source, exposing the photoresist to radiation while...
US20090136878 TOPCOAT COMPOSITION, ALKALI DEVELOPER-SOLUBLE TOPCOAT FILM USING THE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME  
A topcoat composition to be applied on a resist film is provided, the topcoat composition including: (A) an alkali-soluble resin; (B) a compound containing at least one of an Si atom and an F...