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US20130244144 GATE CD CONTROL USING LOCAL DESIGN ON BOTH SIDES OF NEIGHBORING DUMMY GATE LEVEL FEATURES  
A method of forming an IC including MOS transistors includes using a gate mask to form a first active gate feature having a line width W1 over an active area and a neighboring dummy feature having...
US20120107729 GATE CD CONTROL USING LOCAL DESIGN ON BOTH SIDES OF NEIGHBORING DUMMY GATE LEVEL FEATURES  
A method of forming an IC including MOS transistors includes using a gate mask to form a first active gate feature having a line width W1 over an active area and a neighboring dummy feature having...
US20140106265 PELLICLE  
A pellicle is proposed in which the frame is composed of a detachable double structure of an inner frame and an outer frame, and the pellicle membrane is adhered only to the inner frame and the...
US20110236807 Pellicle for lithography  
There is provided a pellicle for lithography which is capable of preventing or at least restricting the outgas from its mask-bonding agglutinant layer from entering the hollow of the pellicle by...
US20100330467 PELLICLE FRAME AND LITHOGRAPHIC PELLICLE  
A pellicle frame is provided that includes a pellicle frame bar having a cross-section with a shape that has a curved line-containing recess in at least one side edge of a quadrilateral having an...
US20110275012 Pellicle  
There is provided a pellicle in which the agglutinant, that is, the mask-bonding adhesive, is designed to have a light transmission of no greater than 70 percents; preferably the agglutinant is...
US20120122024 Pellicle for lithography  
There is provided a pellicle in which the mask-bonding agglutinant layer has the adhesion strength of 1 N/m through 100 N/m, preferably 4 N/m through 80 N/m, and more preferably the agglutinant...
US20110195351 Pellicle for lithography  
There is provided a pellicle in which the mask-bonding adhesive is formed to have a corner-rounded cross section in a shape akin to a trapezoid whose upper parallel side represents the face of the...
US20110195350 Pellicle for lithography  
There is provided a pellicle in which the adhesive layer bearing the pellicle membrane is molded so flatly that the flatness of the pellicle as measured across the membrane is 10 micrometers or...
US20110294048 MOUNTING A PELLICLE TO A FRAME  
A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may...
US20130164660 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY  
To provide a reflective mask blank for EUV lithography having an absorber layer having optical constants suitable for reducing the thickness. A mask blank for EUV lithography comprising a...
US20100304283 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY  
A reflective mask blank for EUV lithography is provided which has an absorber layer wherein stress and crystal structure can be easily controlled. A reflective mask blank for EUV lithography,...
US20140178805 PELLICLE FOR LITHOGRPAHY  
There is provided a pellicle wherein the frame is cut with one or more slight-chamfers, and in particular the one cut along the inner edge of the upper annular face of the frame, to which the...
US20100330466 PELLICLE FRAME AND LITHOGRAPHIC PELLICLE  
A pellicle frame is provided that comprises a pellicle frame bar having a quadrilateral cross-section, wherein an upper edge and a lower edge of a basic quadrilateral forming said cross-section...
US20110081604 Pellicle for lithography and a method for making the same  
There is provided a method for manufacturing a pellicle in which the pellicle frame is prepared by being heated at a predetermined temperature while constricting the frame to some extent of...
US20120276473 PELLICLE FOR LITHOGRAPHY  
A pellicle for lithography, in which an agglutinant layer is so controlled that the deformation of the pellicle frame is prevented from transferring to an exposure original plate to which the...
US20140255827 PELLICLES WITH REDUCED PARTICULATES  
Pellicles for photomasks used in photolithographic manufacturing are described. A frame of a pellicle may include a recess formed in a side member and a locking member dimensioned to secure a...
US20120308922 PELLICLE MOUNTING APPARATUS AND ASSEMBLY WITH PELLICLE MOUNTED ON MASK  
An apparatus is provided for mounting a pellicle to a photomask. A chamber has at least one port for filling the chamber with extreme clean dry air (XCDA) or an inert gas. A pellicle mounter is...
US20120129082 METHOD OF ADHERING LITHOGRAPHIC PELLICLE AND ADHERING APPARATUS THEREFOR  
A method of adhering a lithographic pellicle includes steps of pressing the pellicle frame 6 toward the exposure stencil 5 by a pressure plate 2 via a bag 3 containing a low viscosity liquid being...
US20130177840 ALIGNMENT MARKS FOR MULTI-EXPOSURE LITHOGRAPHY  
A plurality of reticles for printing structures in the same lithography level includes an alignment structure pattern within a same relative location in each reticle. Each set of process...
US20130001193 ALIGNMENT MARKS FOR MULTI-EXPOSURE LITHOGRAPHY  
A plurality of reticles for printing structures in the same lithography level includes an alignment structure pattern within a same relative location in each reticle. Each set of process...
US20130337372 Method and System for Design of a Reticle to be Manufactured Using Variable Shaped Beam Lithography  
A surface manufactured using variable shaped beam (VSB) shots is disclosed, where either: 1) the left edge of a first VSB shot intersects the top edge of a second VSB shot, and the bottom edge of...
US20130089814 PELLICLE HAVING BUFFER ZONE AND PHOTOMASK STRUCTURE HAVING PELLICLE  
A pellicle including a frame having a square shape; and a buffer zone in the frame, the buffer zone dividing a lower surface of the frame into a plurality of portions.
US20140315122 PELLICLE AND AN ASSEMBLY OF PHOTOMASK PLUS PELLICLE  
A pellicle was well as an assembly of photomask plus pellicle is proposed in which the conventional agglutinant layer which bonds the pellicle to photomask is replaced by male and female screws...
US20140147773 PELLICLE FOR LITHOGRAPHY, PELLICLE-MOUNTED PHOTOMASK, AND EXPOSURE TREATMENT METHOD  
To provide a pellicle for lithography having a pellicle membrane excellent in light resistance against light with a wavelength of at most 250 nm, particularly at most 200 nm, a pellicle-mounted...
US20110129767 PELLICLE FOR LITHOGRAPHY  
A pellicle 10 for lithography includes a pellicle frame 3, a pellicle membrane 1 adhered onto the upper end surface of the pellicle frame 3 and an agglutinant layer 4 formed on the lower surface...
US20110117482 PELLICLE FOR LITHOGRAPHY  
A pellicle for lithography is provided that includes a pellicle frame provided with one or more atmospheric pressure adjustment holes having an inner peripheral face with a shape that opens out in...
US20110117481 PELLICLE FOR LITHOGRAPHY  
A pellicle for lithography is provided that includes a pellicle frame provided with an atmospheric pressure adjustment hole that extends through from an outer peripheral face to an inner...
US20140212793 Multiresolution Mask Writing  
Mask writing techniques that employ multiple masking writing passes. A first writing pass is made to write a first shot pattern having a first resolution. A second writing pass is then made to...
US20120141924 Multiresolution Mask Writing  
Mask writing techniques that employ multiple masking writing passes. A first writing pass is made to write a first shot pattern having a first resolution. A second writing pass is then made to...
US20090181314 Reverse Dummy Insertion Algorithm  
A method of inserting dummy patterns includes providing a window area comprising a main pattern. The main pattern includes first patterns of a first type of features, and second patterns of a...
US20150168824 EUV PELLICLE FRAME WITH HOLES AND METHOD OF FORMING  
A method of forming an improved EUV mask and pellicle with airflow between the area enclosed by the mask and pellicle and the area outside the mask and pellicle and the resulting device are...
US20060275672 Photomask with controllable patterns  
A photomask with controllable patterns is a panel, which can be controlled to change the shading patterns. The panel is composed of a plurality of optical controlled elements and has various...
US20120202144 PELLICLE AND MASK ADHESIVE THEREFOR  
Disclosed is a pellicle having a mask adhesive layer having appropriate softness, having a small adhesive residue after being peeled off from a mask, and having good handling characteristics; and...
US20130202993 METHOD OF FABRICATING THE PELLICLE FRAME  
A pellicle frame, including aluminum, aluminum oxide, and a transition metal.
US20120040276 METHOD OF FORMING AND USING PHOTOLITHOGRAPHY MASK HAVING A SCATTERING BAR STRUCTURE  
A method of forming a photolithography mask including forming a first linear non-dense feature on the mask and forming a plurality of parallel linear assist features disposed substantially...
US20120122025 PELLICLE FRAME AND PELLICLE CONTAINING SAME  
Provided is a pellicle that has appropriate membrane strength, high resistance to chemicals, and a low degree of sulfate ion generation and outgassing. A provided pellicle frame supports the outer...
US20110159413 TITANIA-DOPED QUARTZ GLASS AND MAKING METHOD  
A titania-doped quartz glass which experiences a reduction in OH group concentration of less than or equal to 100 ppm upon heat treatment at 900° C. for 100 hours is suitable as the EUV...
US20100330470 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND REFLECTIVE MASK FOR EUV LITHOGRAPHY  
To provide an EUV mask of which a decrease in the contrast of reflected light at the mask pattern boundary, particularly a decrease in the contrast of reflected light at the boundary on the mask...
US20130089753 Forming a Bridging Feature Using Chromeless Phase-Shift Lithography  
First and second anchor features are formed on a photolithography mask, each having a respective center point. An elongated, chromeless, bridging feature is formed between the anchor features. The...
US20130065164 PELLICLE FOR LITHOGRAPHY AND A METHOD OF MAKING THEREOF  
A pellicle is proposed wherein the mask-bonding agglutinant layer coated on one annular face of the pellicle frame is designed to have a cross-section which is trapezoidal (including the case of...
US20150079500 Method For Lithography Patterning  
A method for lithography patterning is disclosed. An exemplary method includes receiving an IC design layout, the IC design layout having an IC pattern and receiving a mask, the mask having a...
US20110159410 COST-EFFECTIVE METHOD FOR EXTREME ULTRAVIOLET (EUV) MASK PRODUCTION  
The present disclosure provides for many different embodiments. An exemplary method can include providing a blank mask and a design layout to be patterned on the blank mask, the design layout...
US20130040232 Method of Patterning NAND Strings Using Perpendicular SRAF  
A lithography mask includes a plurality of patterning features formed on a mask substrate and a first plurality of sub-resolution assist features (SRAFs) formed substantially perpendicular to the...
US20120083124 Method of Patterning NAND Strings Using Perpendicular SRAF  
A lithography mask includes a plurality of patterning features formed on a mask substrate and a first plurality of sub-resolution assist features (SRAFs) formed substantially perpendicular to the...
US20120107733 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY  
Provision of a reflective mask blank for EUV lithography having an absorber layer having optical constants suitable for reducing the film thickness. A reflective mask blank for EUV lithography...
US20130280909 METAL CUT PROCESS FLOW  
A method for optimizing masks used for forming conductive features and a method for creating the mask features on an IC device are disclosed. An exemplary embodiment includes receiving a design...
US20120164565 FLUORINATED COATING AND PHOTOTOOLS MADE THEREWITH  
A coating including an oligomer is disclosed, the oligomer being the reaction product of an epoxy silane, a multi-functional (meth)acrylate; and a polymerizable fluorochemical. The polymerizable...
US20110189594 PELLICLE FOR LITHOGRAPHY AND METHOD FOR MANUFACTURING THE SAME  
A method for manufacturing a pellicle for lithography includes steps of providing a pellicle frame having one pair of long sides and one pair of short sides, each of the long sides 11 having a...
US20110027699 REDUCING ION MIGRATION OF ABSORBER MATERIALS OF LITHOGRAPHY MASKS BY CHROMIUM PASSIVATION  
The deterioration of photomasks caused by chromium migration in COG masks may be reduced or suppressed by avoiding substantially pure chromium materials or encapsulating these materials, since the...