Matches 1 - 5 out of 5


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US20060110689 Immersion photolithography with megasonic rinse  
A method comprises forming a photoresist on a substrate, rinsing the photoresist using a rinse liquid agitated with at least one megasonic source, exposing the photoresist to radiation while...
US20060046211 Effectively water-free immersion lithography  
A method and system is disclosed for conducting immersion photolithography. The system includes at least one lens for transmitting a predetermined radiation on a predetermined substrate with a...
US20060240365 Side seal for wet lens elements  
A method for protecting a wet lens element from liquid degradation is provided. The method includes applying a thin coating of an organoxy-metallic compound to the side portions of a wet lens...
US20060019204 Exposure system, exposure method and method for fabricating semiconductor device  
An exposure system includes an exposure part for irradiating a resist film formed on a substrate with exposing light through a mask with a liquid provided on the resist film; and a liquid supply...
US20060141400 Immersion exposure process-use resist protection film forming material, composite film, and resist pattern forming method  
Provided are a material for forming a resist protecting film which is for use in a liquid immersion lithography process and which is formed on a resist film, wherein the material has the following...
Matches 1 - 5 out of 5