Match Document Document Title
US20140147773 PELLICLE FOR LITHOGRAPHY, PELLICLE-MOUNTED PHOTOMASK, AND EXPOSURE TREATMENT METHOD  
To provide a pellicle for lithography having a pellicle membrane excellent in light resistance against light with a wavelength of at most 250 nm, particularly at most 200 nm, a pellicle-mounted...
US20110076448 Methods for Patterning Substrates Using Heterogeneous Stamps and Stencils and Methods of Making the Stamps and Stencils  
The present invention is directed to heterogeneous stamp and stencil compositions, methods for patterning substrates using contact printing processes employing the heterogeneous stamps and...
US20130136897 RESISTS FOR LITHOGRAPHY  
New routes involving multi-step reversible photo-chemical reactions using two-step techniques to provide non-linear resist for lithography are described in this disclosure. They may provide...
US20120083124 Method of Patterning NAND Strings Using Perpendicular SRAF  
A lithography mask includes a plurality of patterning features formed on a mask substrate and a first plurality of sub-resolution assist features (SRAFs) formed substantially perpendicular to the...
US20110123937 COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY  
The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for...
US20140234780 LITHOGRAPHY WITH REDUCED FEATURE PITCH USING ROTATING MASK TECHNIQUES  
Embodiments of the present invention are directed to techniques for obtaining patterns of features. One set of techniques uses multiple-pass rolling mask lithography to obtain the desired feature...
US20140038103 LITHOGRAPHY USING PHOTORESIST WITH PHOTOINITIATOR AND PHOTOINHIBITOR  
Technologies are generally described for a photoresist and methods and systems effective to form a pattern in a photoresist on a substrate. In some examples, the photoresist includes a resin, a...
US20120107743 LITHOGRAPHY USING PHOTORESIST WITH PHOTOINITIATOR AND PHOTOINHIBITOR  
Technologies are generally described for a photoresist and methods and systems effective to form a pattern in a photoresist on a substrate. In some examples, the photoresist includes a resin, a...
US20130171560 ADDITIVE FOR RESIST AND RESIST COMPOSITION COMPRISING SAME  
Provided are an additive for resist represented by the following formula (1), and a resist composition containing the additive. The additive according to the present invention can suppress...
US20120107742 METHOD AND PHOTORESIST WITH ZIPPER MECHANISM  
The present disclosure provides a resist utilized in a photolithography patterning process. The resist includes a polymeric material having a plurality of zipper molecules, each including a first...
US20120129108 BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME  
This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that...
US20090092934 GRAY-TONE LITHOGRAPHY USING OPTICAL DIFFUSERS  
A method of: directing an exposing light through an optical diffuser; directing the diffused light though a photomask having transparent areas corresponding to a gray-tone pattern; directing the...
US20120064462 BY-PRODUCT MITIGATION IN THROUGH-SILICON-VIA PLATING  
Methods, systems, and apparatus for plating a metal onto a work piece with a plating solution having a low oxygen concentration are described. In one aspect, a method includes reducing an oxygen...
US20110236805 MEMS lithography mask with improved tungsten deposition topography and method for the same  
The present invention discloses a MEMS lithography mask with improved tungsten deposition topography and a method for making the same. The MEMS lithography mask includes: a pattern including at...
US20110183273 Water Mark Defect Prevention for Immersion Lithography  
A photoresist material having a polymer that turns soluble to a base solution in response to reaction with acid. The material includes a photo-acid generator (PAG) that decomposes to form acid in...
US20140199518 Facile Large Area Periodic Sub-Micron Photolithography  
Disclosed herein are articles and methods useful for the lithographic applications. The articles comprise a wrinkling structure and a photosensitive material. The articles and methods provide low...
US20150205194 Lithography Mask  
The present disclosure provides a lithography mask comprising a substrate, a reflective multiplayer (ML) on the substrate, a barrier layer on the reflective ML, and an absorber layer over the...
US20140017615 APPARATUS AND METHOD FOR RESIST COATING AND DEVELOPING  
An apparatus includes a chuck, a first drain cup and second drain cup with two separately drain lines connected to each drain cup. The second drain cup is integrated with the first drain cup and...
US20140154631 METHOD OF REMOVING NEGATIVE ACTING PHOTORESISTS  
Polymerized negative acting photoresists are removed from substrates at relatively low temperatures and fast stripping times using aqueous based alkaline solutions.
US20120145668 FORMING SLOPED RESIST, VIA, AND METAL CONDUCTOR STRUCTURES USING BANDED RETICLE STRUCTURES  
A technique generating sloping resist profiles based on an exposure process uses a reticle having structures surrounded with first and second contrasting interleaved bands below the resolution...
US20110003123 SENSITIZER/INITIATOR COMBINATION FOR NEGATIVE-WORKING THERMAL-SENSITIVE COMPOSITIONS USABLE FOR LITHOGRAPHIC PLATES  
The radiation-sensitive composition and the negative working imageable element include a cationic IR absorber with tetraarylborate counteranion and an onium initiator with tetraarylborate...
US20090004608 Detergent For Lithography And Method Of Forming Resist Pattern With The Same  
Conventional detergents for lithography which contain a surfactant as an active ingredient should have a reduced surfactant concentration because heightened surfactant concentrations result in...
US20110229821 Method of Photochemical Hydrolysis-Polycondensation of Cross-Linkable Chromophores with Steric Hindrance, Catalysed by a Photogenerated Acid, and the Applications Thereof  
The invention relates to a process for the hydrolysis-polycondensation of a sterically hindered crosslinkable chromophore, characterized in that the hydrolysis-polycondensation is catalyzed with...
US20110229829 LITHOGRAPHY MATERIAL AND LITHOGRAPHY PROCESS  
An immersion lithography resist material comprising a matrix polymer having a first polarity and an additive having a second polarity that is substantially greater than the first polarity. The...
US20110287361 PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME  
New photoacid generator compounds are provided that comprise a nitrogen-base functional component of the structure —C(═O)N<. Photoresist compositions also are provided that comprise one or more...
US20110081617 INTEGRATED LITHOGRAPHY EQUIPMENT AND LITHOGRAPHY PROCESS THEREOF  
An integrated lithography equipment is disclosed. The equipment includes an input/output area for loading at least one wafer, a coating a developing area for performing coating and developing...
US20150030985 Multiphoton Curing Methods Using Negative Contrast Compositions  
The present disclosure relates to multiphoton absorption methods for curing a photocurable composition under conditions wherein negative contrast occurs. The photocurable composition includes a...
US20130171561 ADDITIVE FOR RESIST AND RESIST COMPOSITION COMPRISING SAME  
A resist additive represented by Formula 1 below and a resist composition including the additive are disclosed. The resist additive improves hydrophobicity of the surface of the resist film to...
US20110059407 DOUBLE PATTERNING STRATEGY FOR FORMING FINE PATTERNS IN PHOTOLITHOGRAPHY  
A method of lithography patterning includes forming a first resist pattern over a substrate, baking the first resist features, hardening the first resist features, forming a second resist layer...
US20090130610 Integrated color mask  
The invention relates to a process for forming a structure comprising providing a support, coating one side of said support with a colored mask, coating a layer photopatternable by visible light,...
US20130260313 PHOTOACID GENERATING POLYMERS CONTAINING A URETHANE LINKAGE FOR LITHOGRAPHY  
A photoacid generating polymer (PAG polymer) comprises i) a first repeat unit of capable of reacting with a photogenerated acid to form a carboxylic acid containing repeat unit, ii) a second...
US20110195363 LAYERED RADIATION-SENSITIVE MATERIALS WITH VARYING SENSITIVITY  
A method for fabricating a radiation-cured structure is provided. The method includes the steps of providing a first radiation-sensitive material and a second radiation-sensitive material adjacent...
US20110250544 BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS  
Antireflective coating compositions are discussed.
US20130004893 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST  
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more parabanic acid moieties. Preferred...
US20120034562 COATING COMPOSITION FOR USE WITH AN OVERCOATED PHOTORESIST  
In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating...
US20100297556 Coating compositions suitable for use with an overcoated photoresist  
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the...
US20130004901 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST  
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more uracil moieties. Preferred...
US20150099229 NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR  
Negative-working lithographic printing plate precursors have improved bakeability and good shelf life and can be imaged using either UV or infrared radiation. These precursors have a...
US20120128942 DOUBLE PATTERNING WITH INLINE CRITICAL DIMENSION SLIMMING  
A method for double patterning a substrate is described. The double patterning method may include a litho/freeze/litho/etch (LFLE) technique that includes a first (critical dimension) CD slimming...
US20110177332 Nanofiber-nanowire composite and fabrication method thereof  
Example embodiments are directed to a nanofiber-nanowire composite includes a polymer nanofiber; and a plurality of nanowires of a metal oxide extending from inside to outside of the polymer...
US20150248053 PHOTOSENSITIVE CONDUCTIVE PASTE, MULTILAYER SUBSTRATE, METHOD OF PRODUCING CONDUCTIVE PATTERN, AND ELECTROSTATIC CAPACITANCE TYPE TOUCH PANEL  
A photosensitive conductive paste contains conductive particles (A), a photosensitive organic compound (B), an epoxy resin (C) and an ion adsorbent (D) that is selected from the group consisting...
US20130224657 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS  
The present invention provides an acid generator generates a sulfonic acid represented by the following general formula (1) in response to high-energy beam or heat: To provide a novel acid...
US20090136878 TOPCOAT COMPOSITION, ALKALI DEVELOPER-SOLUBLE TOPCOAT FILM USING THE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME  
A topcoat composition to be applied on a resist film is provided, the topcoat composition including: (A) an alkali-soluble resin; (B) a compound containing at least one of an Si atom and an F...
US20150125788 MULTI-LINE WIDTH PATTERN CREATED USING PHOTOLITHOGRAPHY  
Systems and methods are provided for forming features through photolithography. A polymer layer is formed over a substrate. The polymer layer is patterned to form a first feature and a second...
US20130034812 POLYMERIZABLE COMPOSITION FOR SOLDER RESIST, AND SOLDER RESIST PATTERN FORMATION METHOD  
The present invention provides a polymerizable composition for a solder resist, including an infrared ray shielding material, a polymerization initiator, and a polymerizable compound, and a solder...
US20130078558 LITHOGRAPHIC CD CORRECTION BY SECOND EXPOSURE  
Correction of CD variation is accomplished with a second exposure, e.g. using a second reticle. Embodiments include exposing a first wafer with a first dose using a first reflective reticle having...
US20130059254 PHOTOLITHOGRAPHY METHOD USING A CHEMICALLY-AMPLIFIED RESIST  
A photolithography method, including the steps of: S1) depositing, on the upper surface of a wafer, a chemically-amplified resist; S2) exposing the resist to a sensitizing radiation through a...
US20150098984 NANOLITHOGRAPHY USING LIGHT SCATTERING FROM PARTICLES AND ITS APPLICATIONS IN CONTROLLED MATERIAL RELEASE  
The present disclosure provides hollow nanostructures, methods of forming thereof, and methods of delivery of further nanomaterials utilizing the hollow nanostructures. The hollow nanostructures...
US20150056560 PHOTOSENSITIVE CONDUCTIVE PASTE AND METHOD OF PRODUCING CONDUCTIVE PATTERN  
A photosensitive conductive paste includes an epoxy acrylate (A) including a urethane bond, a photopolymerization initiator (B), and a conductive filler (C), wherein an added amount of the...
US20140252674 ARCHITECTED MATERIALS FOR ENHANCED ENERGY ABSORPTION  
A three-dimensional lattice architecture with a thickness hierarchy includes a first surface and a second surface separated from each other with a distance therebetween defining a thickness of the...