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US20120083124 Method of Patterning NAND Strings Using Perpendicular SRAF  
A lithography mask includes a plurality of patterning features formed on a mask substrate and a first plurality of sub-resolution assist features (SRAFs) formed substantially perpendicular to the...
US20140234780 LITHOGRAPHY WITH REDUCED FEATURE PITCH USING ROTATING MASK TECHNIQUES  
Embodiments of the present invention are directed to techniques for obtaining patterns of features. One set of techniques uses multiple-pass rolling mask lithography to obtain the desired feature...
US20120107742 METHOD AND PHOTORESIST WITH ZIPPER MECHANISM  
The present disclosure provides a resist utilized in a photolithography patterning process. The resist includes a polymeric material having a plurality of zipper molecules, each including a first...
US20110171585 Photolithography Method  
A photolithography method is provided which includes: arranging a layout topography in a first mask and a second mask in such a way that at least a layout pattern of the layout topography is...
US20110172110 TRACERS AND ASSEMBLY FOR LABELING CHEMICAL OR BIOLOGICAL MOLECULES METHODS AND KITS USING THE SAME  
An improved process to create an arbitrarily large number of distinguishable particles allows more flexibility in experimental design and related efficiencies of scale. Novel enhanced tracers, for...
US20070054197 Mask and pattern forming method by using the same  
The present invention provides a mask comprising a substrate, a plurality of strip patterns and at least an assist pattern. The strip patterns are disposed on the substrate and arranged in...
US20070231712 Alternating phase shift masking  
An alternating phase shift mask may be formed using a dry undercut etch. The dry undercut etch reduces problems associated with wet etching of quartz or glass masks. In addition, the use of the...
US20110183269 Methods Of Forming Patterns, And Methods For Trimming Photoresist Features  
Some embodiments include methods of forming patterns. Photoresist features may be formed over a base, with the individual photoresist features having heights and widths. The photoresist features...
US20080044775 Method for Aligning or Assembling Nano-Structure on Solid Surface  
The present invention relates to a method for selectively assembling and aligning nano-structures on a solid surface; and, more particularly, to a method for directly adsorbing the nano-structures...
US20100028810 ETCHING METHOD FOR USE IN DEEP-ULTRAVIOLET LITHOGRAPHY  
In a lithography process using an ultraviolet process, the applied ultraviolet resist can be removed by intentionally condensing the ultraviolet resist before removing the ultraviolet resist.
US20100143467 Pharmaceutical tablets with diffractive microstructure and compression tools for producing such tablets  
A tablet (4) for pharmaceutical use has on at least one part of its surface a diffractive microstructure (11) which generates diffraction effects which can be perceived in the visible spectral...
US20090096676 DURABLE WIDEBAND ANTENNA FABRICATED ON LOW RESISTIVITY SILICON SUBSTRATE  
An antenna that is easily fabricated on a low resistivity CMOS-grade silicon substrate is herein described. The antenna has a reasonable radiation efficiency. One generalized non-limiting...
US20050014075 Phase edge darkening binary masks  
A binary mask and method for improving the aerial image and mask error enhancement factor (MEEF) of binary masks. A phase edge darkening binary mask is provided which has quartz etched, preferably...
US20050158634 Photolithography mask comprising absorber/phase-shifter elements  
This invention relates to an insolation mask including a transparent substrate (100) and at least one absorber/phase shifter element (112) embedded in the substrate, so as to form a monolithic...
US20070269747 Lithography Technique Using Silicone Molds  
A method includes the steps of: A) filling a silicone mold having a patterned surface with a curable (meth)acrylate formulation, B) curing the curable (meth)acrylate formulation to form a...
US20060246361 Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask  
A method of manufacturing a mask blank glass substrate includes a marking step of irradiating laser light onto a mirror-like surface in an area, having no influence on transfer, on a surface of...
US20060154152 Flare reduction in photolithography  
Lithography masks that include sub-resolution features to reduce flare are disclosed and described herein.
US20130164689 PHOTOMASK AND METHOD FOR FORMING OVERLAY MARK USING THE SAME  
The present invention relates to a photomask and a method for forming an overlay mark in a substrate using the same. The photomask comprises a plurality of patterns. At least one of the patterns...
US20120237857 PHOTOMASK AND METHOD FOR FORMING OVERLAY MARK USING THE SAME  
The present invention relates to a photomask and a method for forming an overlay mark in a substrate using the same. The photomask comprises a plurality of patterns. At least one of the patterns...
US20070238032 Half-tone type phase-shifting mask and method for manufacturing the same  
A half-tone type phase-shifting mask is disclosed. The mask includes a half-tone film disposed on a part on which a light-shielding pattern and a part on which a semi-light shielding pattern, and...
US20090130606 PHOTORESIST DEVELOPER AND METHOD FOR FABRICATING SUBSTRATE BY USING THE DEVELOPER THEREOF  
A photoresist developer including a basic aqueous solution containing 0.5˜10 mass % of a particular nonionic surfactant and 0.01-10 mass % of particular ammonium compound, the photoresist...
US20060073394 REDUCED MASK COUNT GATE CONDUCTOR DEFINITION  
A combined wide-image and loop-cutter pattern is provided for both cutting and forming a wide-image section to a hard mask on a substrate formed by sidewall imaging techniques in a reduced number...
US20060257753 Photomask and method thereof  
A photomask and method thereof. In an example method, a photomask may be manufactured by forming an oxide layer on a surface, patterning the oxide layer to form an oxide pattern, the oxide pattern...
US20080248432 NEAR-FIELD EXPOSURE METHOD  
A near-field exposure method wherein an exposure mask having a light blocking film with an opening smaller than a wavelength of light from an exposure light source is used and wherein an object to...
US20110111345 SILICON CONTAINING COATING COMPOSITIONS AND METHODS OF USE  
Coating compositions include a polymer including: wherein R1 is a silicon containing moiety, R2 is an acid stable lactone functionality, and R3 is an acid labile lactone functionality; X1, X2, X3...
US20060210887 Lithography mask and methods for producing a lithography mask  
Lithography mask for the lithographic patterning of a resist layer on a substrate having first regions, in which the lithography mask has a nontransparent layer, and second and third regions,...
US20100196825 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS ESPECIALLY SUITABLE FOR ION IMPLANT APPLICATIONS  
Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable...
US20080182179 GRAY TONE MASK AND METHOD FOR MANUFACTURING THE SAME  
A gray tone mask includes a transparent substrate and a light blocking layer. The light blocking layer is disposed on the transparent substrate and has a transparent region with a minimum...
US20080107972 HALFTONE MASK AND METHOD FOR MAKING PATTERN SUBSTRATE USING THE HALFTONE MASK  
A halftone mask includes translucent film patterns for forming a middle gradation area and light blocking film patterns disposed to an entire periphery of the translucent film patterns.
US20110104616 LINE WIDTH ROUGHNESS IMPROVEMENT WITH NOBLE GAS PLASMA  
A method for forming a photoresist mask may comprise providing a ultra-violet (UV) producing gas to a vacuum chamber having a substrate, ionizing the UV producing gas to produce UV rays to...
US20090176175 PHOTOACID GENERATORS FOR EXTREME ULTRAVIOLET LITHOGRAPHY  
A photoacid generator P+ A− comprises (a) an antenna group P+ comprising atoms with high EUV photoabsorption cross-sections according to FIG. 1 and A− anions; or (b) an antenna group P+ and A−...
US20140087313 STRIPPING SOLUTION FOR PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD  
A stripping solution for photolithography which can effectively strip away residual materials of a photoresist pattern and etching residual materials, and has excellent anticorrosion properties on...
US20100136490 MULTI-SCALE CANTILEVER STRUCTURES HAVING NANO SIZED HOLES AND METHOD OF PREPARING THE SAME  
Provided are a multi-scale cantilever structure having nano-sized holes prepared by anodic oxidation and a method of preparing the same. The multi-scale cantilever structure is prepared using...
US20060115742 Tri-tone trim mask for an alternating phase-shift exposure system  
A photolithographic trim mask includes a transparent region, an attenuated phase-shift region, and an opaque region. The transparent region substantially transmits received light. The attenuated...
US20150050599 METHODS OF PROVIDING PATTERNED EPITAXY TEMPLATES FOR SELF-ASSEMBLABLE BLOCK COPOLYMERS FOR USE IN DEVICE LITHOGRAPHY  
A method is disclosed to form a patterned epitaxy template, on a substrate, to direct self-assembly of block copolymer for device lithography. A resist layer on a substrate is selectively exposed...
US20110244398 Patterning method  
A patterning method is provided. First, a first mask layer, a second mask layer and a patterned photoresist layer are sequentially formed on a target layer. Thereafter, the second mask layer is...
US20050260503 Reticle film stabilizing method  
A reticle film stabilizing method which is suitable for stabilizing a reticle film on a reticle, is disclosed. The method includes subjecting the multilayer reticle film to VUV (vacuum...
US20140363768 NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS  
A naphthalene derivative having formula (1) is provided wherein Ar1 and Ar2 denote a benzene or naphthalene ring, and n is such a natural number as to provide a weight average molecular weight of...
US20110111340 NOVEL SILOXANE POLYMER COMPOSITIONS  
A siloxane composition and a method of producing the same. The composition comprises a siloxane prepolymer with a backbone exhibiting a group which is capable of being deprotonated in an aqueous...
US20070087273 Alternating phase shift mask  
One inventive aspect relates to a phase shift mask suitable for lithographic processing of a device, to a method of making such a mask and to lithographic processing using such a mask. The phase...
US20140342273 MONOMER FOR A HARDMASK COMPOSITION, HARDMASK COMPOSITION COMPRISING THE MONOMER, AND METHOD FOR FORMING A PATTERN USING THE HARDMASK COMPOSITION  
Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same....
US20060257754 Pellicles having low adhesive residue  
The present invention provides a pellicle, wherein a peel strength is from 0.004 N/mm to 0.10 N/mm when a non-surface-treated polyethylene terephthalate film having a thickness of 125 μm is peeled...
US20090208881 IMMERSION ULTRAVIOLET PHOTOLITHOGRAPHY PROCESS  
The invention relates to ultraviolet photolithography at 193 nanometres or 157 nanometres. To maximize resolution, optics having a very high numerical aperture are used, but without photoresists...
US20140186775 MONOMER FOR HARDMASK COMPOSITION AND HARDMASK COMPOSITION INCLUDING THE MONOMER AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION  
A monomer for a hardmask composition is represented by the following Chemical Formula 1,
US20120038021 OVERLAY MARK ENHANCEMENT FEATURE  
Methods and apparatuses for alignment are disclosed. An exemplary method includes providing a substrate having a device region and an alignment region; forming a first material layer over the...
US20060210886 Method for making grayscale photo masks and optical grayscale elements  
A positive photo resist is provided on a surface of a photo mask blank. Light is then exposed onto the photo resist to form a predetermined pattern of unexposed and exposed portions in the...
US20120178027 MULTIPLE EXPOSURE PHOTOLITHOGRAPHY METHODS  
A method. The method forms a film of photoresist composition on a substrate and exposes a first and second region of the film to radiation through a first and second mask having a first and second...
US20050158637 Template, method of forming the template and method of forming a pattern on a semiconductor device using the template  
A template, a method of forming the template and a method of forming a photoresist pattern using a lithographic template is disclosed. In the method, a photoresist film is formed on a substrate. A...
US20060222961 Leaky absorber for extreme ultraviolet mask  
The present invention discloses a method of forming a mask including: providing a substrate; forming a multilayer mirror for EUV light over the substrate; forming a leaky absorber for the EUV...
US20060216615 Wavefront engineering with off-focus mask features  
An imaging part such as a mask or reticle includes a patterned layer in an on-axis plane of the imaging part. The imaging part further includes another layer including sub-resolution features,...

Matches 1 - 50 out of 433 1 2 3 4 5 6 7 8 9 >