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US20130070226 |
MARKER STRUCTURE AND METHOD OF FORMING THE SAME
The invention relates to a marker structure for optical alignment of a substrate and provided thereon. The marker structure has a first reflecting surface at a first level and a second reflecting...
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US20130009846 |
INSERT FOR RADOMES AND METHODS OF MANUFACTURING INSERT FOR RADOMES
Apparatuses such as inserts for radomes are described herein. The apparatuses and inserts including a metal layer having a frequency selective surface.
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US20110300490 |
HIGH-RESOLUTION MICROSCOPY AND PHOTOLITHOGRAPHY DEVICES USING FOCUSING MICROMIRRORS
The invention relates to large-field high-resolution microscopy and photolithography setups operating with polychromatic light. It includes the use of a plurality of focusing micromirrors.
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US20130008869 |
Oblique Parts or Surfaces
Various structures, such as microstructures and wall-like structures, can include parts or surfaces that are oblique. In some implementations, a cantilevered element includes a spring-like portion...
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US20110033801 |
COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition...
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US20100028813 |
BACKSIDE CLEANING OF SUBSTRATE
A pellicle cover, system, and method for cleaning a photomask are disclosed. A pellicle cover is disposed over a photomask and pellicle without damaging the markings surrounding the mask pattern...
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US20120244477 |
PELLICLE FOR LITHOGRAPHY
The invention provides a pellicle for lithography used in the photolithography, affording a wider range of transmissivity to inclinedly incident beams that can be used in a photolithographic...
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US20120107743 |
LITHOGRAPHY USING PHOTORESIST WITH PHOTOINITIATOR AND PHOTOINHIBITOR
Technologies are generally described for a photoresist and methods and systems effective to form a pattern in a photoresist on a substrate. In some examples, the photoresist includes a resin, a...
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US20060147845 |
Electrically reconfigurable photolithography mask for semiconductor and micromechanical substrates
A mask useful for photolithography that can be electronically reconfigured is described. In one embodiment, a photolithography system has an illumination system, a reticle scanning stage, a wafer...
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US20090253079 |
FORMING REVERSE ILLUMINATION PATTERNS
In photolithographic exposure, the illumination pattern (120R) formed on a photosensitive surface (106) is a reverse of the pattern (130) on the optical mask (124). The reverse pattern (120R) is...
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US20110171585 |
Photolithography Method
A photolithography method is provided which includes: arranging a layout topography in a first mask and a second mask in such a way that at least a layout pattern of the layout topography is...
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US20130078574 |
SELF-ASSEMBLABLE POLYMER AND METHOD FOR USE IN LITHOGRAPHY
A self-assemblable polymer is disclosed, having first and second molecular configurations with the first molecular configuration has a higher Flory Huggins parameter for the self-assemblable...
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US20120171600 |
Time Differential Reticle Inspection
Disclosed are systems and methods for time differential reticle inspection. Contamination is detected by, for example, determining a difference between a first signature of at least a portion of a...
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US20070054197 |
Mask and pattern forming method by using the same
The present invention provides a mask comprising a substrate, a plurality of strip patterns and at least an assist pattern. The strip patterns are disposed on the substrate and arranged in parallel...
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US20050130077 |
Method for positioning and transferring at least two different patterns from a supply strip
A method wherein a supply strip (bm) is entrained at a constant speed, which speed is the same as that of the substrate in strip form (c), during transfer between strips of each pattern and...
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US20130089752 |
Forming a Bridging Feature Using Chromeless Phase-Shift Lithography
An elongated, chromeless, bridging feature is formed on a photolithography mask with an etching depth that causes a nominal phase difference of more than 180 degrees to energy passing through the...
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US20090047606 |
Lithography meandering order
An imprint lithography method is disclosed, which includes imprinting a plurality of patterns in an imprintable medium provided on a substrate, wherein the order in which the patterns are imprinted...
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US20130017487 |
COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
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US20120264053 |
COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
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US20120225384 |
COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
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US20070099095 |
Applying colour elements and busbars to a display substrate
A method of applying to a display substrate colour elements and addressing busbars in a defined alignment relative to each other includes: forming said colour elements and said busbars on a surface...
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US20110229821 |
Method of Photochemical Hydrolysis-Polycondensation of Cross-Linkable Chromophores with Steric Hindrance, Catalysed by a Photogenerated Acid, and the Applications Thereof
The invention relates to a process for the hydrolysis-polycondensation of a sterically hindered crosslinkable chromophore, characterized in that the hydrolysis-polycondensation is catalyzed with an...
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US20110183269 |
Methods Of Forming Patterns, And Methods For Trimming Photoresist Features
Some embodiments include methods of forming patterns. Photoresist features may be formed over a base, with the individual photoresist features having heights and widths. The photoresist features...
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US20130065178 |
COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises two or more distinct materials that can be...
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US20080187870 |
METHOD FOR FORMING PHOTORESIST PATTERN, METHOD FOR MANUFACTURING DISPLAY PANEL, AND METHOD FOR MANUFACTURING DISPLAY DEVICE
A method for forming a photoresist pattern includes forming a photoresist, and forming a photoresist pattern having a step portion by performing a light exposure process a different number of times...
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US20090297956 |
PHOTOLITHOGRAPHY WITH OPTICAL MASKS HAVING MORE TRANSPARENT FEATURES SURROUNDED BY LESS TRANSPARENT FEATURES
In photolithographic exposure, a feature (144) of an optical mask is projected onto a dark area (160). The light intensity inside the dark area is reduced by providing a non-printable clear cutout...
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US20050175907 |
Photo mask including scattering bars and method of manufacturing the same
A photo mask includes a transparent substrate, a main pattern, and scattering bars. The image of the main pattern is that which is transferred to photosensitive material by rays of exposure light...
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US20080044775 |
Method for Aligning or Assembling Nano-Structure on Solid Surface
The present invention relates to a method for selectively assembling and aligning nano-structures on a solid surface; and, more particularly, to a method for directly adsorbing the nano-structures...
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US20120034558 |
PHOTOLITHOGRAPHY MATERIAL FOR IMMERSION LITHOGRAPHY PROCESSES
A photolithography material is provided. The photolithography material is a surface modifying material. The photolithography material includes a polymer (e.g., fluorine polymer) that includes less...
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US20080151207 |
Magneto-optical photoresist
A method for a magneto-optical photoresist. The method includes applying a magneto-optical photoresist to a surface, and patterning the magneto-optical photoresist by using a magnetic alignment....
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US20070178391 |
Mask having balance pattern and method of patterning photoresist using the same
A method and mask having balance patterns for reducing and/or preventing chemical flare from occurring in a photoresist between a first mask region and a second mask region. Balance patterns formed...
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US20090263729 |
TEMPLATES FOR IMPRINT LITHOGRAPHY AND METHODS OF FABRICATING AND USING SUCH TEMPLATES
A template for use in imprint lithography is disclosed. The template includes at least two ultraviolet transparent materials bonded together by an ultraviolet transparent epoxy. The ultraviolet...
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US20090284721 |
RETICLE SYSTEM FOR MANUFACTURING INTEGRATED CIRCUIT SYSTEMS
A reticle system that includes: providing a reticle system; and assigning two or more of an image pattern onto the reticle system to form one or more layers of an integrated circuit system by...
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US20080206685 |
Exposure method, method for manufacturing flat panel display substrate, and exposure apparatus
An exposure method and exposure apparatus optimal for the formation of a fine pattern of an electronic device, such as a flat panel display. The exposure method and apparatus provides a high...
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US20110123925 |
POLYMER FOR PROTECTIVE LAYER OF RESIST, AND POLYMER COMPOSITION INCLUDING THE SAME
A polymer includes a first repeating unit represented by the following Chemical Formula 1, and a second repeating unit including at least one repeating unit represented by the following Chemical...
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US20050250052 |
Maskless lithography using UV absorbing nano particle
Systems and methods are disclosed for a maskless lithography process by over coating a photo resist layer with water soluble thermoplastics; and imaging ultraviolet (UV) absorbing nano particles...
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US20120070786 |
METHOD FOR MONITORING PHOTOLITHOGRAPHY PROCESS AND MONITOR MARK
A method for monitoring a photolithography process includes providing a monitor mark having high sensitivity of the focus of the photolithography process, transferring the monitor mark together...
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US20120077130 |
METHOD FOR GENERATING A PLURALITY OF OPTIMIZED WAVEFRONTS FOR A MULTIPLE EXPOSURE LITHOGRAPHIC PROCESS
A simplified version of a multiexpose mask optimization problem is solved in order to find a compressed space in which to search for the solution to the full problem formulation. The simplification...
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US20130115558 |
SELECTIVE PHOTO-INDUCED PROTEIN IMMOBILIZATION USING BOVINE SERUM ALBUMIN
Provided is a biomaterial immobilizing method including immobilizing a bovine serum albumin on a substrate, providing a biomaterial on the substrate immobilized with the bovine serum albumin, and...
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US20050014075 |
Phase edge darkening binary masks
A binary mask and method for improving the aerial image and mask error enhancement factor (MEEF) of binary masks. A phase edge darkening binary mask is provided which has quartz etched, preferably...
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US20050158634 |
Photolithography mask comprising absorber/phase-shifter elements
This invention relates to an insolation mask including a transparent substrate (100) and at least one absorber/phase shifter element (112) embedded in the substrate, so as to form a monolithic...
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US20130004899 |
Sub-wavelength Lithography via Rabi Oscillations
A sub-wavelength photolithographic method includes exposing a photoresist material to a stimulating electromagnetic source prior to further exposing the photoresist material to a dissociating...
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US20130078558 |
LITHOGRAPHIC CD CORRECTION BY SECOND EXPOSURE
Correction of CD variation is accomplished with a second exposure, e.g. using a second reticle. Embodiments include exposing a first wafer with a first dose using a first reflective reticle having...
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US20080311529 |
IMMERSION MULTIPLE-EXPOSURE METHOD AND IMMERSION EXPOSURE SYSTEM FOR SEPARATELY PERFORMING MULTIPLE EXPOSURE OF MICROPATTERNS AND NON-MICROPATTERNS
This invention discloses an immersion multiple-exposure method including a first exposure step of performing, using a first mask, immersion exposure of a photoresist film formed on a substrate, a...
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US20060246361 |
Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask
A method of manufacturing a mask blank glass substrate includes a marking step of irradiating laser light onto a mirror-like surface in an area, having no influence on transfer, on a surface of the...
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US20060154152 |
Flare reduction in photolithography
Lithography masks that include sub-resolution features to reduce flare are disclosed and described herein.
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US20050244757 |
DYNAMIC MASK MODULE
A dynamic mask module is disclosed, which comprises a microcomputer system, a mask pattern generator and a light source. The mask pattern generator is disposed over a substrate and electrically...
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US20070238032 |
Half-tone type phase-shifting mask and method for manufacturing the same
A half-tone type phase-shifting mask is disclosed. The mask includes a half-tone film disposed on a part on which a light-shielding pattern and a part on which a semi-light shielding pattern, and a...
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US20090269680 |
IMAGE MASK AND IMAGE MASK ASSEMBLY
An image mask and image mask assembly. The image mask includes a glass substrate having a thickness of less than 2 mm and a patterned mask disposed on a surface of the glass substrate. The image...
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US20070048669 |
METHOD OF FORMING THE PHOTO RESIST FEATURE
The method of forming the photo resist feature comprises forming a photo resist layer on the substrate, providing a photo mask comprises the main feature and the assistant feature, providing the...
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