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US20110085939 NODE POLYPEPTIDES FOR NANOSTRUCTURE ASSEMBLY  
Engineered proteins are used in the assembly of two-dimensional and three-dimensional nanostructure assemblies, based on systematic design and production of protein node structures that can be...
US20120040276 METHOD OF FORMING AND USING PHOTOLITHOGRAPHY MASK HAVING A SCATTERING BAR STRUCTURE  
A method of forming a photolithography mask including forming a first linear non-dense feature on the mask and forming a plurality of parallel linear assist features disposed substantially...
US20100330470 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND REFLECTIVE MASK FOR EUV LITHOGRAPHY  
To provide an EUV mask of which a decrease in the contrast of reflected light at the mask pattern boundary, particularly a decrease in the contrast of reflected light at the boundary on the mask...
US20120107733 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY  
Provision of a reflective mask blank for EUV lithography having an absorber layer having optical constants suitable for reducing the film thickness. A reflective mask blank for EUV lithography...
US20140011120 EXTREME ULTRAVIOLET LITHOGRAPHY PROCESS AND MASK  
A process of an extreme ultraviolet lithography (EUVL) is disclosed. The process includes receiving an extreme ultraviolet (EUV) mask with multiple states. Different states of the EUV mask are...
US20140104672 ELECTROWETTING DISPLAY DEVICE  
An electrowetting display device comprising a first support plate, a second support plate and a picture element having a space defined by the first support plate, the second support plate and...
US20110140181 Removal of Masking Material  
Methods for removing a masking material, for example, a photoresist, and electronic devices formed by removing a masking material are presented. For example, a method for removing a masking...
US20120231517 MINIATURIZED ELECTROPORATION-READY MICROWELL ARAY FOR HIGH-THROUGHPUT GENOMIC SCREENING  
Methods of introducing exogenous molecules into cells including cell lines and primary cells are provided. Additionally, miniaturized electroporation-ready microwell arrays are provided. These...
US20130260288 EXTREME ULTRAVIOLET LITHOGRAPHY PROCESS AND MASK  
A process of an extreme ultraviolet lithography (EUVL) is disclosed. The process includes receiving an extreme ultraviolet (EUV) mask with multiple states. Different states of the EUV mask are...
US20090029268 PELLICLE STRESS RELIEF  
The present disclosure provides a mask-pellicle system for lithography patterning. The mask-pellicle system includes a mask substrate; a predefined pattern formed on the transparent pattern; a...
US20120028191 Azide Functionalized Poly(3-Hexylthiophene) and Method of Forming Same  
The invention relates azide functionalized poly(3-hexylthiophene)s. Various azide functionalized poly(3-hexylthiophene)s and intermediates are disclosed and described, as well as method for making...
US20130323649 High Heat Load Optics with Vibration Isolated Hoses in an Extreme Ultraviolet Lithography System  
Methods and apparatus for reducing vibrations in an extreme ultraviolet (EUV) lithography system associated with the cooling of minors are described. According to one aspect of the present...
US20150255272 SYSTEM, METHOD AND RETICLE FOR IMPROVED PATTERN QUALITY IN EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY AND METHOD FOR FORMING THE RETICLE  
A reticle for use in an extreme ultraviolet (euv) lithography tool includes a trench formed in the opaque border formed around the image field of the reticle. The trench is coated with an absorber...
US20120264053 COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY  
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
US20110183269 Methods Of Forming Patterns, And Methods For Trimming Photoresist Features  
Some embodiments include methods of forming patterns. Photoresist features may be formed over a base, with the individual photoresist features having heights and widths. The photoresist features...
US20140034359 PRINTED CIRCUIT BOARD AND METHOD OF MANUFACTURING PRINTED CIRCUIT BOARD  
Disclosed herein is a printed circuit board including a base substrate, a photosensitive insulating layer formed on an upper portion of the base substrate, and a circuit pattern formed to be...
US20120196230 LAYOUT DECOMPOSITION METHOD AND APPARATUS FOR MULTIPLE PATTERNING LITHOGRAPHY  
An initial layout of at least a portion of a given layer of an integrated circuit design is decomposed into multiple sub-layouts by splitting each of a plurality of shapes of the initial layout...
US20150017571 PHOTOLITHOGRPAHY SCATTERING BAR STRUCTURE AND METHOD  
Provided is an integrated circuit (IC) photo mask. The IC photo mask includes a main feature of the IC, the main feature having a plurality of sides, and a plurality of assist features, the assist...
US20130065160 REMOVABLE TRANSPARENT MEMBRANE FOR A PELLICLE  
According to one embodiment, a pellicle includes first and second frame members that are selectively removable from one another. The second frame member has an annular shape similar to and is...
US20120171624 PRINTED CIRCUIT BOARD FOR OPTICAL WAVEGUIDE AND METHOD OF MANUFACTURING THE SAME  
Disclosed herein is a printed circuit board for an optical waveguide, including a base board, and an optical waveguide formed on the base board. The optical waveguide includes a lower clad layer...
US20090226823 RETICLES INCLUDING ASSISTANT STRUCTURES, METHODS OF FORMING SUCH RETICLES, AND METHODS OF UTILIZING SUCH RETICLES  
Reticles comprising assistant structures in contact with at least sidewalls of a phase shift and transmission control material are disclosed. The assistant structures are formed from an absorptive...
US20090263729 TEMPLATES FOR IMPRINT LITHOGRAPHY AND METHODS OF FABRICATING AND USING SUCH TEMPLATES  
A template for use in imprint lithography is disclosed. The template includes at least two ultraviolet transparent materials bonded together by an ultraviolet transparent epoxy. The ultraviolet...
US20130177847 PHOTORESIST FOR IMPROVED LITHOGRAPHIC CONTROL  
Methods and corresponding photoresists are described for fine linewidth lithography using x-rays, e-beams, visible spectrum optical lithography, ultra-violet optical lithography or extreme...
US20120024816 METHOD FOR FABRICATING TOUCH SENSOR PANELS  
A method for fabricating a touch sensor panel is disclosed. The method includes providing a substrate for the touch sensor panel, depositing a conductive material layer on a top surface of the...
US20150079523 POLYMER SHEET PATTERNING AND ITS ASSEMBLY USING SLIT CHANNEL LITHOGRAPHY  
Synthesizing polymeric sheets in a slit fluidic channel by projection of a pulse of illumination to the channel. A slit channel can include a polymeric device with a plane's width larger than 1...
US20070269747 Lithography Technique Using Silicone Molds  
A method includes the steps of: A) filling a silicone mold having a patterned surface with a curable (meth)acrylate formulation, B) curing the curable (meth)acrylate formulation to form a...
US20120199957 PHOTORESISTS AND METHODS FOR USE THEREOF  
New photoresists are provided that comprise a multi-keto component and that are particularly useful for ion implant lithography applications. Preferred photoresists of the invention can exhibit...
US20120100464 GLASS SUBSTRATE-HOLDING TOOL  
To provide a glass substrate-holding tool which is capable of avoiding scratching to the deposition surface of a glass substrate and dusting thereby caused as well as scratching and deposition of...
US20110244683 Fabricating Voids Using Slurry Protect Coat Before Chemical-Mechanical Polishing  
A semiconductor structure is fabricated with a void such as a line, contact, via or zia. To prevent slurry particles from falling into and remaining in a void during a chemical-mechanical...
US20090269680 IMAGE MASK AND IMAGE MASK ASSEMBLY  
An image mask and image mask assembly. The image mask includes a glass substrate having a thickness of less than 2 mm and a patterned mask disposed on a surface of the glass substrate. The image...
US20090075213 Method of forming an auto-calibration label using a laser  
An auto-calibration circuit or label (20) is formed to be used with an instrument (10). A structure is provided that includes an electrically conductive layer. A pattern is created with the...
US20110207054 SELF-ALIGNED, SUB-WAVELENGTH OPTICAL LITHOGRAPHY  
Embodiments of the invention provide a method and an apparatus for performing self-aligned, sub-wavelength optical lithography. One embodiment provides a region of photoresist above a conductive...
US20120148960 METHOD OF MANUFACTURING PRINTED CIRCUIT BOARD  
A method of manufacturing a printed circuit board, including: applying a conductive paste including carbon nanotubes and a photosensitive binder on a bump-forming area of a circuit substrate...
US20130196269 PHOTONIC HEATING OF SILVER GRIDS  
A method of improving conductivity of a metal pattern (18) includes providing a developed silver pattern (14) formed from a photographic silver salt provided in a binder coated on a substrate...
US20120148942 DIAGONAL INTERCONNECT FOR IMPROVED PROCESS MARGIN WITH OFF-AXIS ILLUMINATION  
Mask or reticle methods and structures having pattern feature segments formed at oblique angles to each other. When illuminated using off-axis illumination techniques, a mask or reticle according...
US20120322000 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND PROCESS FOR PRODUCING THE SAME  
To provide an EUV mask blank provided with a low reflective layer, which has excellent properties as an EUV mask blank. A reflective mask blank for EUV lithography comprising a substrate, and a...
US20110262868 METHOD OF DETECTING ALIGNMENT MARK AND METHOD OF MANUFACTURING PRINTED CIRCUIT BOARD  
When an alignment mark does not exist within an area of an image obtained by a camera, the coordinate of the alignment mark is calculated based on an identification mark existing in the area of...
US20080199784 Small Feature Integrated Circuit Fabrication  
A method for controlling etching during photolithography in the fabrication of an integrated circuit in connection with first and second features that are formed on the integrated circuit having a...
US20110171566 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY  
A reflective mask blank for EUV lithography having an absorbing layer which has a low reflectivity with respect to wavelength regions of EUV light and pattern inspection light, and which is easily...
US20110262847 MASK BLANK PROVIDING SYSTEM, MASK BLANK PROVIDING METHOD, MASK BLANK TRANSPARENT SUBSTRATE MANUFACTURING METHOD, MASK BLANK MANUFACTURING METHOD, AND MASK MANUFACTURING METHOD  
A mask blank manufacturing department manufactures a mask blank by forming a thin film to be a mask pattern on a mask blank transparent substrate. When providing the mask blank to a mask...
US20080311434 Metallic Supporting Grid for Thin Electrolyte Membrane in Solid Oxide Fuel Cells  
A solid oxide fuel cell structure obtainable by selective electro-chemical processing, comprising an electrolyte membrane (4) formed by a thin film more than 50 nm but less than 10 μm thick,...
US20120176680 PATTERNED BACKSIDE OPTICAL COATING ON TRANSPARENT SUBSTRATE  
A photonic device is described that contains patterns on the backside of a transparent substrate that perform several functions, including anti-reflection coating in certain areas but not in other...
US20110200920 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY  
A reflective mask blank for EUV lithography having a low-reflective layer which has a low reflectivity with respect to wavelengths of EUV light and a mask pattern inspection light and which...
US20100028787 SUBSTRATE FOR EUV MASK BLANKS  
A substrate that is suitable for an EUV mask or an EUV mask blank and excellent in flatness, is provided. A substrate for an EUV mask blank, which is made of a silica glass containing from 1 to 12...
US20110217659 METHOD FOR PRODUCING A PROTON-CONDUCTING, STRUCTURED ELECTROLYTE MEMBRANE  
In a method for producing a proton-conductive, structured electrolyte membrane, particularly for a fuel cell, a coating, which comprises at least one ion-conductive cross-linking component having...
US20110104595 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND MASK FOR EUV LITHOGRAPHY  
Provision of an EUV mask whereby an influence of reflected light from a region outside a mask pattern region is suppressed, and an EUV mask blank to be employed for production of such an EUV mask....
US20070065667 Photocuring composition and plasma display panel produced by using the same  
A photocuring composition includes black particles (A), black particles (B), an organic binder (C), a photopolymerizable monomer (D), and a photopolymerization initiator (E). The black particles...
US20110030998 PHOTOSENSITIVE RESIN COMPOSITION, FLEXIBLE CIRCUIT BOARD EMPLOYING THE SAME, AND CIRCUIT BOARD PRODUCTION METHOD  
A halogen-free and flame-resistant photosensitive resin composition is provided, which has properties necessary for a solder resist (insulative property, solder heat resistance, alkali...
US20140212817 METHOD AND APPARATUS FOR FABRICATING WAFER BY CALCULATING PROCESS CORRECTION PARAMETERS  
A method of calculating an overlay correction model in a unit for the fabrication of a wafer is disclosed. The method comprises measuring overlay deviations of a subset of first overlay marks and...
US20090053619 Pattern producing method, semiconductor device manufacturing method and program  
A pattern producing method includes specifying a first pattern and a second pattern obtained by modifying the first pattern, specifying a correction area based on the second pattern, in a part of...