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US20060246234 Photomask assembly incorporating a metal/scavenger pellicle frame  
A photomask assembly is disclosed having a photomask substrate and a composite pellicle frame that includes both a metallic frame component and a scavenger component. The metallic frame component...
US20110140181 Removal of Masking Material  
Methods for removing a masking material, for example, a photoresist, and electronic devices formed by removing a masking material are presented. For example, a method for removing a masking...
US20080020326 Pattern Decomposition Method For Double Exposure  
A pattern decomposition method capable of achieving patterns with a complicated layout by double exposure. The pattern decomposition method for decomposing a target pattern which includes first...
US20150072290 COATING COMPOSITIONS  
In one aspect, coating compositions are provided that comprise a component a component that comprises one or more silicon, antimony, aluminum, yttrium, cerium, lanthanum, tin, titanium, zirconium,...
US20140295348 COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY  
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
US20070166648 INTEGRATED LITHOGRAPHY AND ETCH FOR DUAL DAMASCENE STRUCTURES  
A method and structure for an integrated via and line lithography followed by integrated via and line etch. A two-layered, negative resist based lithography is used to generate a dual damascene...
US20050164096 Monitor for variation of critical dimensions (CDs) of reticles  
The present invention provides a reticle 100 for use in a lithographic process. The reticle, in one embodiment, includes a patterned layer 110 located over a reticle substrate. The reticle 100 may...
US20070031760 IMMERSION LITHOGRAPHY WATERMARK REDUCTION  
A method of performing immersion lithography on a semiconductor substrate includes providing a layer of resist onto a surface of the semiconductor substrate and exposing the resist layer using an...
US20050175907 Photo mask including scattering bars and method of manufacturing the same  
A photo mask includes a transparent substrate, a main pattern, and scattering bars. The image of the main pattern is that which is transferred to photosensitive material by rays of exposure light...
US20110159444 METHOD FOR MANUFACTURING PROBE SHEET  
An embodiment of the invention provides a method for manufacturing a probe sheet in which a probe tip can be arranged at a predetermined accurate position without the need for troublesome...
US20100028810 ETCHING METHOD FOR USE IN DEEP-ULTRAVIOLET LITHOGRAPHY  
In a lithography process using an ultraviolet process, the applied ultraviolet resist can be removed by intentionally condensing the ultraviolet resist before removing the ultraviolet resist.
US20070238027 METHOD FOR GENERATING ALIGNMENT MARKS AND RELATED MASKS THEREOF  
A method for generating alignment marks on a substrate is disclosed. The method includes: providing a mask, the mask includes at least one alignment mark set, wherein the alignment mark set...
US20110143281 COATING COMPOSITIONS FOR PHOTORESISTS  
In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are...
US20080063982 Fluids and methods of forming thereof  
Fluids for use in immersion lithography systems and methods of forming thereof are disclosed. In accordance with a preferred embodiment, a fluid for immersion lithography includes a liquid and a...
US20130143164 POLYMERIZABLE COMPOSITION  
Provided is a polymerizable composition containing (A) a polymerization initiator, (B) a polymerizable compound, (C) at least either a tungsten compound or a metal boride, (D) a compound having a...
US20060222967 Reticle, method for manufacturing magnetic disk medium using reticle, and magnetic disk medium  
It is made possible to obtain a reticle which has a high strength even it is formed in a doughnut shape, a method for manufacturing a magnetic disk medium using the reticle, and a magnetic disk...
US20060172229 Alignment system used in nano-imprint lithography and nano imprint lithography method using the alignment system  
An alignment system used in nano-imprint lithography and a nano-imprint lithography method using the alignment system are provided. The alignment system includes: a plurality of electron emission...
US20150079523 POLYMER SHEET PATTERNING AND ITS ASSEMBLY USING SLIT CHANNEL LITHOGRAPHY  
Synthesizing polymeric sheets in a slit fluidic channel by projection of a pulse of illumination to the channel. A slit channel can include a polymeric device with a plane's width larger than 1...
US20110037175 INTERCONNECTION BETWEEN SUBLITHOGRAPHIC-PITCHED STRUCTURES AND LITHOGRAPHIC-PITCHED STRUCTURES  
An interconnection between a sublithographic-pitched structure and a lithographic pitched structure is formed. A plurality of conductive lines having a sublithographic pitch may be...
US20090170030 Method of making a pillar pattern using triple or quadruple exposure  
Methods of making pillar shaped device array using a triple or quadruple exposure technique are described. A plurality of pillar shaped devices are formed arranged in a hexagonal or rectangular...
US20090186284 Reticle, and method of laying out wirings and vias  
Provided is a reticle used for forming a plurality of vias for connecting first wirings provided in a first wiring layer and second wirings provided in a second wiring layer formed above the first...
US20110244683 Fabricating Voids Using Slurry Protect Coat Before Chemical-Mechanical Polishing  
A semiconductor structure is fabricated with a void such as a line, contact, via or zia. To prevent slurry particles from falling into and remaining in a void during a chemical-mechanical...
US20090075213 Method of forming an auto-calibration label using a laser  
An auto-calibration circuit or label (20) is formed to be used with an instrument (10). A structure is provided that includes an electrically conductive layer. A pattern is created with the...
US20070048669 METHOD OF FORMING THE PHOTO RESIST FEATURE  
The method of forming the photo resist feature comprises forming a photo resist layer on the substrate, providing a photo mask comprises the main feature and the assistant feature, providing the...
US20100092889 Mandrel  
Pixel wells and a grid of electrical lines including electrical bridges are formed using an ultraviolet transparent mandrel having a three-dimensional surface and an integrated mask.
US20060223011 Method for manufacturing optical semiconductor element, and optical semiconductor element  
A method for manufacturing an optical semiconductor element having a light emitting element section and a functional section. The method includes conducting dry etching, and then conducting wet...
US20070281219 Masking techniques and contact imprint reticles for dense semiconductor fabrication  
A reticle comprising isolated pillars is configured for use in imprint lithography. In some embodiments, on a first substrate a pattern of pillars pitch-multiplied in two dimensions is formed in...
US20090227075 ETCHANT COMPOSITION, PATTERNING CONDUCTIVE LAYER AND MANUFACTURING FLAT PANEL, DISPLAY DEVICE USING THE SAME  
An etchant composition that allows simplification and optimization of semiconductor manufacturing process is presented, along with a method of patterning a conductive layer using the etchant and a...
US20050089770 Printing irregularly-spaced contact holes using phase shift masks  
An exemplary method for printing irregularly-spaced contact holes of a semiconductor device comprises printing a semiconductor wafer using at least one multi-phase phase shift mask. The mask has a...
US20050277062 Method of making a photopolymer sleeve blank having an integral UV transparent cushion layer for flexographic printing  
A method of making a photopolymer sleeve blank for use in flexographic printing is provided which includes providing a base sleeve, applying a cushion layer over the base sleeve which is...
US20050123840 Mask for use in a microlithographic projection exposure apparatus  
A mask (20) for use in a microlithographic projection exposure apparatus (10) has a support (28) on which a pattern of opaque structures (32) is applied. The intermediate spaces (36, 36′)...
US20080305409 LITHOGRAPHIC MASK AND METHOD FOR PRINTING FEATURES USING THE MASK  
A lithographic mask enables printing wafer features at very small to large pitch values with an increase in the depth of focus. The mask may include square or rectangular patterns for printing...
US20060008709 Mask and method for determining mask pattern line length  
A mask on which the line length of a mask pattern can be determined with great accuracy. Auxiliary patterns used for determining line length are formed near edges of a pattern to be determined....
US20080096113 EXPOSURE MASK, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND CHECKING METHOD OF EXPOSURE MASK  
According to the present invention, provided is a method of manufacturing a electronic device including forming a film over a substrate, performing a photoresist over the film, performing a first...
US20070231746 Treating carbon containing layers in patterning stacks  
Adherence between antireflective coating and a carbon containing hard mask may be improved by treating the carbon containing hard mask with a plasma. In some embodiments, using antireflective...
US20110201207 BACKPLANE STRUCTURES FOR SOLUTION PROCESSED ELECTRONIC DEVICES  
There is provided a backplane for an organic electronic device. The backplane has a TFT substrate; a multiplicity of electrode structures; and a bank structure defining a multiplicity of pixel...
US20060073397 Masking arrangement and method for producing integrated circuit arrangements  
A masking arrangement and method for producing integrated circuit. arrangements are described. The masking arrangement includes a substrate with lithographic patterns. The lithographic patterns...
US20080020324 IMMERSION LITHOGRAPHY DEFECT REDUCTION WITH TOP COATER REMOVAL  
A method for photolithography processing includes providing a substrate coated with a photosensitive layer thereon and a top coater overlying the photosensitive layer; exposing the photosensitive...
US20050164099 Method to overcome minimum photomask dimension rules  
A method for fabricating a semiconductor device comprising at least one component having photolithographic proximity-limited geometries (702). The method comprises the steps of dividing the...
US20080227033 Photosensitive Paste Composition, Plasma Display Panel Manufactured Using the Same and Method of Manufacturing the Plasma Display Panel  
Photosensitive paste compositions, plasma display panels (PDP) manufactured using the same, and methods of manufacturing the PDPs are provided. In one embodiment, a photosensitive paste...
US20070292806 Dynamic Puddle Developing Process  
A dynamic puddle developing process is disclosed. First, a semiconductor substrate having a photoresist disposed thereon is provided, in which the photoresist has been exposed. Next, a developer...
US20070065757 Photo-curable resin composition and a method for forming a pattern using the same  
Provided is a new photo-curable resin composition which can be used in a photo nanoimprinting technology available for a photo nanoimprinting technology by which a substrate is processed with high...
US20050142495 Methods of controlling multilayer foil ignition  
Embodiments of the invention include a method of simulating an ignition of a reactive multilayer foil. Other embodiments include various methods of igniting a reactive multilayer foil by...
US20130344438 PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE  
A photoacid generator has the formula (I): wherein R1, R2, R3, L1, L2, L3 X, Z+, a, b, c, d, p, q, and r, are defined herein. A photoresist comprises the photoacid generator, and a coated article...
US20130280656 PHOTOSENSITIVE, DEVELOPER-SOLUBLE BOTTOM ANTI-REFLECTIVE COATING MATERIAL  
Photosensitive, developer-soluble bottom anti-reflective coatings are described. Compositions and methods of forming the same are also disclosed along with resulting microelectronic structures....
US20050118532 Back to Front Alignment with Latent Imaging  
The invention relates to a method for lateral alignment of a substrate for photolithography, wherein the substrate's back side has a reference mark and the substrate front side is coated with a...
US20110312164 FORMING AN ELECTRODE HAVING REDUCED CORROSION AND WATER DECOMPOSITION ON SURFACE USING A CUSTOM OXIDE LAYER  
The present invention provides a method of forming an electrode having reduced corrosion and water decomposition on a surface thereof. A conductive layer is deposited on a substrate. The...
US20050250021 Utilizing compensation features in photolithography for semiconductor device fabrication  
A photomask set includes at least two masks that combine to form a device pattern in a semiconductor device. Orthogonal corners may be produced in a semiconductor device pattern to include one...
US20080014533 Semiconductor device fabrication and dry develop process suitable for critical dimension tunability and profile control  
The critical dimension (CD) of features formed during the fabrication of a semiconductor device may be controlled through the use of a dry develop chemistry comprising O2, SO2 and a hydrogen...
US20060257765 System and method for photolithography in semiconductor manufacturing  
A method for photolithography in semiconductor manufacturing includes providing one or more masks for a wafer; defining a reference focus plane of a first mask of the one or more masks; defining a...