Matches 1 - 50 out of 123 1 2 3 >
Match Document Document Title
US20090305151 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD  
A detection method for detecting a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate or on a...
US20090305153 SUBSTRATE PROCESSING METHOD AND MASK MANUFACTURING METHOD  
A substrate processing method uses a processing fluid to selectively process only a region of a portion of a processing surface of a substrate to be processed, by causing a discharge aperture and a...
US20090305148 PATTERN DATA CREATING METHOD, PHOTOMASK FABRICATING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE  
A pattern data creating method according to an embodiment of the present invention creates data of a mask pattern to be arranged on a photomask. The method includes creating a test mask pattern by...
US20090305152 SEMICONDUCTOR DEVICE MANUFACTURING METHOD  
A semiconductor device manufacturing method has forming a first resist pattern on the semiconductor substrate, and then, forming a first pattern on the semiconductor substrate by the use of the...
US20090305150 Exposure method, exposure apparatus, and device manufacturing method  
An exposure method comprises: forming an immersion region on a substrate; exposing the substrate by irradiating the substrate with an exposure light via a liquid of the immersion region; and...
US20090291374 Exposure aligning method and exposure apparatus  
In an exposure aligning method, a first shift amount indicating a shift amount of a lower layer pattern of an exposure target substrate from an origin point position is determined and a second...
US20090286173 ELECTRONIC COMPONENT FORMING APPARATUS, ELECTRONIC COMPONENT FORMED WITH IT AND FORMING METHOD THEREOF  
An electronic component forming apparatus for forming an electronic component by radiating light to a photosensitive conductive resin provided on a forming work material, comprising radiation...
US20090286172 SURFACE SHAPE MEASUREMENT APPARATUS AND EXPOSURE APPARATUS  
A surface shape measurement apparatus is configured to measure a surface shape of an object to be measured, and includes a beam splitter configured to split white light from a light source into two...
US20090286174 MANUFACTURING METHOD AND MANUFACTURING SYSTEM OF SEMICONDUCTOR DEVICE  
In an exposure process forming a predetermined circuit pattern of a semiconductor device on a wafer, a resist dimension of the resist pattern formed on a wafer and a focus position in the exposure...
US20090280418 EXPOSURE APPARATUS, CORRECTION METHOD, AND DEVICE MANUFACTURING METHOD  
An exposure apparatus comprising a projection optical system configured to project a pattern of an original onto a substrate; and a control unit, wherein the control unit acquires a result of...
US20090280417 METHOD FOR FABRICATING MOLD CORE  
An exemplary method for fabricating a mold core includes the following steps. First, a substrate is provided. Second, a photo resist layer is formed on the substrate, the photo resist layer has a...
US20090278569 Semiconductor Device and its Manufacturing Method, Semiconductor Manufacturing Mask, and Optical Proximity Processing Method  
An object of the present invention is to reduce processing time and manufacturing cost for a semiconductor device including a logic circuit. To accomplish the above object, an area ( 114 ) for...
US20090274963 MEASUREMENT APPARATUS, MEASUREMENT METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
A measurement apparatus which illuminates a pattern positioned on an object plane to form an aerial image 40 on an image plane and measures a light intensity distribution of the aerial image 40 ...
US20090274964 MEASURING APPARATUS AND EXPOSURE APPARATUS HAVING THE SAME  
A measuring apparatus for measuring an optical performance of an optical system under test that has a numerical aperture of more than 0.6 at a light exit side, said measuring apparatus includes a...
US20090269685 Position aligning apparatus, position aligning method, and semiconductor device manufacturing method  
A position aligning apparatus performs position alignment of a pattern in a current process of a pattern exposure process by using a pattern formed before the current process. The position aligning...
US20090269686 SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM AND SUBSTRATE PROCESSING SYSTEM  
A processing temperature of thermal processing is corrected based on measurement of a first dimension of a resist pattern on a substrate from a previously obtained relation between a dimension of a...
US20090263735 EXPOSURE APPARATUS  
An exposure apparatus includes a plurality of module each of which is configured to expose a pattern of an original onto the substrate using light from a light source, each module including a...
US20090263736 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD  
A pattern image generation device generates a pattern image, and at least a part of the pattern image which has been generated or the pattern image which is generated and is formed on an object is...
US20090258305 MEMORY MEDIUM STORING ORIGINAL DATA GENERATION PROGRAM, MEMORY MEDIUM STORING ILLUMINATION CONDITION DETERMINATION PROGRAM, ORIGINAL DATA GENERATION METHOD, ILLUMINATION CONDITION DETERMINATION METHOD, AND DEVICE MANUFACTURING METHOD  
A memory medium stores a program for generating data on an original pattern used in an exposure apparatus forming an image of a target pattern on a substrate, the program comprising a determination...
US20090258304 SUBSTRATE PROCESSING METHOD, PROGRAM, COMPUTER-READABLE STORAGE MEDIUM AND SUBSTRATE PROCESSING SYSTEM  
In the present invention, patterning for the first time is performed on a film to be worked above the front surface of a substrate, and the actual dimension of the pattern formed by the patterning...
US20090252422 EXPOSURE METHOD AND EXPOSURE DEVICE  
An exposure method capable of performing accurate exposure without using a large photomask. The exposure method performs exposure while relatively moving a photomask above a substrate and includes...
US20090246655 ELECTRON BEAM WRITING APPARATUS AND METHOD  
A Z stage is placed on an XY stage in avoidance of an area to which a mark table is fixed. The mask M is placed on a holding mechanism provided on the Z stage. A middle value of the range...
US20090246654 METHOD FOR EVALUATING LITHOGRAPHY APPARATUS AND METHOD FOR CONTROLLING LITHOGRAPHY APPARATUS  
An evaluation method for lithography apparatus including a coating unit, an exposure unit, a heating unit and a development unit, the evaluation method including forming an evaluation resist...
US20090239160 METHOD FOR PREPARING DATA FOR EXPOSURE AND METHOD FOR MANUFACTURING PHOTO MASK  
A method for preparing data for exposure includes forming a first plurality of rectangular patterns from a reticle preparing rule; lining an object pattern for performing reticle exposure with the...
US20090233189 DEVICE AND METHOD FOR OBTAINING EXPOSURE CORRECTION INFORMATION, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE  
A method of obtaining exposure correction information includes adjusting intensity of light incident on a photomask so that intensity of light output from the photomask has a desired distribution,...
US20090233194 PARAMETER DETERMINATION METHOD, EXPOSURE METHOD, DEVICE FABRICATION METHOD, AND STORAGE MEDIUM  
The present invention provides a parameter determination method of determining an optical parameter and a process parameter by using an optical simulator which calculates a resist image to be...
US20090233195 LINEWIDTH MEASURING METHOD, IMAGE-FORMING-STATE DETECTING METHOD, ADJUSTMENT METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD  
A pattern area that includes a plurality of line patterns with a predetermined spacing therebetween formed on a wafer is imaged, and based on the imaging results, a contrast value of an image of...
US20090233193 PATTERN PREDICTION METHOD, PATTERN CORRECTION METHOD, METHOD OF FABRICATING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM  
A pattern prediction method according to an embodiment includes: predicting a second pattern shape from a first pattern shape by using a conversion function and a conversion difference residual...
US20090225285 SUBSTRATE PROCESSING METHOD, COMPUTER STORAGE MEDIUM AND SUBSTRATE PROCESSING SYSTEM  
In the present invention, when dense and sparse resist patterns are formed above a substrate, respective resist pattern dimensions are measured, and a correction value for a first processing unit...
US20090225331 Method of Providing Alignment Marks, Device Manufacturing Method and Lithographic Apparatus  
A method of providing a set of alignment marks on a substrate including the following steps. Exposing a first pattern on at least one exposure area of a layer of a substrate, the first pattern...
US20090226827 Method for Correcting Critical Dimension of Mask Pattern  
A method for correcting a critical dimension (CD) of a mask pattern includes forming an light shielding layer over a substrate including a main cell region and a frame region at a periphery of the...
US20090220870 MEASURING THE EFFECT OF FLARE ON LINE WIDTH  
In photo-lithography, one may assess the effect of flare due to various exposure tools. In an example embodiment, in a photo-lithography process on a photo resist coated substrate, there is a...
US20090220873 BELT SKEW CORRECTION CONTROLLING METHOD, BELT TRANSPORTATION DEVICE, AND RECORDING APPARATUS  
A belt skew correction controlling method includes detecting a skew speed of a wound endless belt, calculating a difference between the skew speed that is acquired in the detecting of the skew...
US20090220874 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD  
An exposure apparatus includes an optical path in which a plurality of optical units are arranged and which includes a portion of projecting a pattern of an original onto a substrate to expose the...
US20090220872 DETECTING APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
A detecting apparatus includes a image pickup device configured to supply an output signal, an imaging optical system configured to form an image of an alignment mark formed on a substrate onto the...
US20090220871 Device Manufacturing Method, Lithographic System, Lithographic Apparatus and Design for Manufacturing System  
In an embodiment, a device manufacturing method for transferring a pattern from a patterning device onto a substrate includes receiving a design layout information associated with a device,...
US20090214962 EXPOSURE APPARATUS  
An exposure apparatus includes a plurality modules and a controller, each module exposes a pattern of an original onto a substrate by using light from a light source, wherein each module includes a...
US20090214964 Semiconductor device manufacturing method, semiconductor device manufacturing equipment, and computer readable medium  
A semiconductor device manufacturing method, a semiconductor device manufacturing equipment and a computer readable medium storing a computer program provide for easily identifying a cause of a...
US20090214963 SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND SUBSTRATE PROCESSING SYSTEM  
The present invention has: a first step of measuring, as an initial condition of a substrate, any of a film thickness of a processing film on the substrate, a refractive index of the processing...
US20090208855 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD  
An exposure apparatus is configured to project a pattern of an original onto a substrate using a projection optical system, thereby exposing the substrate, and comprises a substrate stage...
US20090200546 Test Structures and Methods  
Test structures and methods for semiconductor devices, lithography systems, and lithography processes are disclosed. In one embodiment, a method of manufacturing a semiconductor device includes...
US20090199137 SYSTEM AND METHOD FOR MULTI-EXPOSURE PATTERN DECOMPOSITION  
Some embodiments provide a method and system for identifying error markers for patterns within a design layout that do not meet the manufacturing constraints. Some embodiments extend a region from...
US20090197189 FOCUS MEASUREMENT METHOD AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE  
In a focus measurement method and a method of manufacturing a semiconductor device relating to the present invention, a focus value is obtained by using a fluctuation where shrinkage of a resist...
US20090197188 Method for a multiple exposure beams lithography tool  
An aspect of the present invention includes a method for patterning a workpiece covered at least partly with a layer sensitive to electromagnetic radiation by simultaneously using a plurality of...
US20090199152 Methods and apparatuses for reducing mura effects in generated patterns  
A method for generating a pattern on a workpiece is provided. In one method for generating a pattern on a workpiece, at least two sweeps or exposure fields are calibrated based on at least two...
US20090191473 PHOTOMASK MANUFACTURING METHOD, PHOTOMASK MANUFACTURING SYSTEM, AND DEVICE MANUFACTURING METHOD  
A drawing apparatus is first adjusted so that a pattern is drawn on the photomask at a pattern position at which a position variation amount of the pattern position on a surface of the photomask...
US20090186286 Method To Control Semiconductor Device Overlay Using Post Etch Image Metrology  
A method of determining positioning error between lithographically produced integrated circuit patterns on at least two different lithographic levels of a semiconductor wafer comprising. The method...
US20090181316 SUBSTRATE PROCESSING METHOD, PROGRAM, COMPUTER-READABLE STORAGE MEDIUM, AND SUBSTRATE PROCESSING SYSTEM  
In a pattern measuring unit installed in a coating and developing treatment system, the height of a pattern formed on a substrate is measured using the Scatterometry method. Based on the measured...
US20090175634 METHOD FOR CONTROLLING IMAGE FORMING APPARATUS  
A method for controlling an image forming apparatus is disclosed. An image pattern is developed both by a DC developing process using a developing bias voltage of only a DC voltage and by an AC+DC...
US20090176168 EXPOSURE DATA PREPARATION METHOD AND EXPOSURE METHOD  
In the exposure data preparation method for charged particle beam exposure in which an exposure object is exposed while dose is adjusted for each pattern, the method including the steps of:...
Matches 1 - 50 out of 123 1 2 3 >