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US20140242517 LITHOGRAPHIC PRINTING PLATE PRECURSORS AND USE  
Negative-working lithographic printing plate precursor a negative-working imageable layer and an outermost water-soluble overcoat layer that is disposed directly on the negative-working imageable...
US20130017487 COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY  
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
US20120264053 COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY  
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
US20120225384 COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY  
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
US20140038104 WATER-DISPERSIBLE ELECTRICALLY CONDUCTIVE FLUORINE-CONTAINING POLYANILINE COMPOSITIONS FOR LITHOGRAPHY  
A water dispersible composition comprises a polyaniline copolymer having a weight average molecular weight of at least 30,000 and a polymeric acid comprising sulfonic acid groups. The polyaniline...
US20110086202 NEGATIVE-WORKING IMAGEABLE ELEMENTS  
Negative-working imageable elements can be imaged and processed to provide lithographic printing plates. These imageable elements are sensitive to infrared radiation but are insensitive to “white”...
US20130323643 NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS  
Negative-working lithographic printing plate precursor a negative-working imagable layer and an outermost water-soluble overcoat layer that is disposed directly on the negative-working imagable...
US20110143281 COATING COMPOSITIONS FOR PHOTORESISTS  
In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are...
US20140057204 NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS AND USE  
A negative-working lithographic printing plate precursor comprises a negative-working radiation-sensitive imageable layer and an outermost layer comprising a vinyl alcohol copolymer comprising at...
US20110311916 THERMALLY ABLATABLE LITHOGRAPHIC PRINTING PLATE PRECURSORS  
A lithographic printing plate precursor can be used to prepare a printing plate using thermal ablation. The precursor has a non-thermally ablatable first layer on a substrate. Over the first layer...
US20100021844 NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHOD OF USE  
Negative-working imageable elements can be imaged and processed with water to provide lithographic printing plates. These imageable elements have imageable layers that contain a particulate...
US20100233445 NEGATIVE-WORKING IMAGEABLE ELEMENTS WITH OVERCOAT  
Negative-working imageable element can be used to provide lithographic printing plates. The imageable element has a suitable radiation-sensitive imageable layer and a water-soluble overcoat...
US20090136871 TOPCOAT COMPOSITION  
A topcoat composition. The topcoat composition includes a fluorine-containing polymer and a casting solvent that includes an alcohol.
US20090197200 Resist top coat composition and patterning process  
The present invention relates to a resist top coat composition and a patterning process adopting such a material, which resist top coat composition is provided for forming a top coat on a...
US20080166667 Tunable contact angle process for immersionlithography topcoats and photoresists  
A process for tuning the water contact angle of an immersion photoresist layer or immersion topcoat layer by modification of the top surface. The surface modification is a layer of fluorinated...
US20070087286 Compositions and processes for photolithography  
Overcoating layer compositions that are applied above a photoresist composition including for immersion lithography processing as well as non-immersion imaging.
US20090142714 METHOD FOR USING A TOPCOAT COMPOSITION  
A method of forming an image on a photoresist. The method includes: forming a photoresist over a substrate; applying a topcoat composition, the topcoat composition comprising at least one...
US20100151385 STACK OF NEGATIVE-WORKING IMAGEABLE ELEMENTS  
A plurality of negative-working lithographic printing plate precursors is provided in a stack. Each precursor comprises an aluminum-containing substrate having thereon a single imageable layer and...
US20090035694 POLYMERIC DYES, OVERCOAT COMPOSITIONS AND THERMAL LITHOGRAPHIC PRINTING PLATES  
A thermal lithographic printing plate overcoat composition comprising (a) a water-soluble polymeric dye having an absorption band between about 300 and about 600 nm; and (b) micro-particles or...
US20080318153 PHOTOSENSITIVE LAYER STACK  
A photosensitive layer stack and methods for multiple exposure lithography are disclosed having a bleachable layer with a first absorption switching from absorptive to transmissive upon...
US20070064215 Removable pellicle for immersion lithography  
A method of irradiating to pattern a photosensitive layer such as a resist (L2) immersed in a fluid (L3), involves applying a removable transparent layer (L4, L5), projecting the radiation onto...
US20090035695 POSITIVE WORKING LITHOGRAPHIC PRINTING PLATES  
A positive-working lithographic printing plate precursor is disclosed comprising on a grained and anodized aluminum support having a hydrophilic surface or which is provided with hydrophilic...
US20080311509 Photopolymer Printing Plate Precursor  
A photopolymer printing plate precursor includes a photosensitive coating on a support, wherein the photosensitive coating includes a composition that is photopolymerizable upon absorption of...
US20070254236 HIGH CONTACT ANGLE TOPCOAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESS  
A topcoat material for application on top of a photoresist material is disclosed. The topcoat material comprises an acid-inert compound. The topcoat material also comprises a polymer or an...
US20070160930 Coating compositions for photoresists  
In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are...
US20120189959 LITHOGRAPHIC PRINTING ORIGINAL PLATE  
A presensitized plate having a long press life and excellent resistance to scum and corrosive micro-stains and capable of on-press development is provided. The presensitized plate includes a...
US20120258400 NOVEL TARC MATERIAL FOR IMMERSION WATERMARK REDUCTION  
A coating material for use during a lithography process. In an example, a coating material disposed on a material layer includes a polymer and a quencher catcher chemically bonded to the polymer....
US20090269554 BAKEABLE LITHOGRAPHIC PRINTING PLATES WITH A HIGH RESISTANCE TO CHEMICALS  
A singe- or multilayer lithographic printing plate precursor comprises on a substrate a radiation-sensitive coating that comprises a copolymer soluble or dispersible in aqueous alkaline solution...
US20060008748 Protective film-forming composition for immersion exposure and pattern-forming method using the same  
A protective film-forming composition for immersion exposure having a dissolution rate in an alkali developer of from 20 to 300 mm/sec in the time when the protective film-forming composition is...
US20080171285 Immersion Lithography Technique And Product Using A Protection Layer Covering The Resist  
In an immersion lithography method, the photoresist layer is provided with a shield layer to protect it from degradation caused by contact with the immersion liquid. The shield layer is...
US20090087778 METHOD FOR MANUFACTURING ORIGINAL PLATE OF PLANOGRAPHIC PRINTING PLATE AND ORIGINAL PLATE OF PLANOGRAPHIC PRINTING PLATE  
An aspect of the present invention provides a method for manufacturing an original plate of a planographic printing plate, comprising: a process of forming a photosensitive layer on a substrate; a...
US20060177774 Process of imaging a photoresist with multiple antireflective coatings  
A process for imaging a photoresist comprising the steps of, a) forming a stack of multiple layers of organic antireflective coatings on a substrate; b) forming a coating of a photoresist over the...
US20130323644 NORBORNENE-TYPE POLYMERS, COMPOSITIONS THEREOF AND LITHOGRAPHIC PROCESS USING SUCH COMPOSITIONS  
Embodiments in accordance with the present invention provide for non-self imagable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers,...
US20070275326 Resist protective film composition and patterning process  
There is disclosed a resist protective film composition for forming a protective film on a photoresist film, comprising: at least a polymer including a repeating unit having one or more groups...
US20140178814 DRY FILM PHOTORESIST HAVING OXYGEN PERMEABLE BARRIER LAYER AND MANUFACTURING METHOD THEREOF  
There is provided a dry film photoresist including: a base film having an oxygen permeable barrier layer formed thereon; a photosensitive resin layer formed on the oxygen permeable barrier layer;...
US20070105044 Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern  
There is provided a means for forming a protective film of a fluorine-containing polymer composition excellent in smoothness and adhesiveness on a photoresist. Moreover, there is provided a means...
US20100009130 ON-PRESS DEVELOPABLE IMAGEABLE ELEMENTS  
A negative-working imageable element has an imageable layer and a topcoat layer that contains a composition that will change color upon exposure to imaging infrared radiation. The imageable...
US20130071786 COATING COMPOSITION AND IMAGE-FORMING MATERIAL, LITHOGRAPHIC PRINTING PLATE PRECURSOR AND OXYGEN-BLOCKING FILM INCLUDING THE COATING COMPOSITION  
The invention is directed to a coating composition containing a polymer having a structural unit represented by the following formula (1), an image-forming material including, in the following...
US20060046197 Device and method of fabricating donor substrate for laser induced thermal imaging and method of fabricating OELD device using the same  
A device of fabricating a donor substrate for a LITI includes a vacuum chamber; a donor substrate which moves in line and passes through an inside of the vacuum chamber; and a depositing device...
US20070269734 Uper Layer Film Forming Composition for Liquid Immersion and Method of Forming Photoresist Pattern  
An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist...
US20090272295 Coating Materials Consisting of Low- or Medium-Molecular Organic Compounds  
A coating material including a low-molecular or medium-molecular organic compound represented by general formula (1). (In the formula, R1 is a single bond, methylene, ethylene or oxygen; and R2 is...
US20070087125 Process for producing top coat film used in lithography  
The present invention relates to a process for producing a top coat film used in a lithography. This process includes the steps of (a) providing a polymer that dissolves in an alkali developing...
US20130115553 TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS  
Topcoat compositions are provided that can be used in immersion lithography to form photoresist patterns. The topcoat compositions include a polymer system that includes a matrix polymer and a...
US20100003615 UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD  
An upper layer-forming composition formed on a photoresist while causing almost no intermixing with the photoresist film and a photoresist patterning method are provided. The upper layer-forming...
US20060024613 Composition for photoresist protective film, photoresist protective film and photoresist pattern formation process  
A composition for a photoresist protective film comprising a fluoropolymer having at least one functional group selected from the group consisting of —COOH, —SO3H, —OP(═O)(OH)2, —NR2 and —N+R3Cl−...
US20100040973 COMPOSITION FOR FORMATION OF RESIST PROTECTION FILM, AND METHOD FOR FORMATION OF RESIST PATTERN USING THE SAME  
Disclosed are: a composition for forming a resist protection film, which shows less damage to a resist film, can form a good, rectangular resist pattern, and can be used regardless of the...
US20120202152 LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE MAKING METHOD THEREOF  
A lithographic printing plate precursor comprising a support, tin image-recording layer which contains (A) an infrared absorbing agent, (B) a radical polymerization initiator and (C) a radical...
US20110134411 LITHOGRAPHIC PRINTING PLATE PRECURSOR, LITHOGRAPHIC PRINTING METHOD AND PACKAGED BODY OF LITHOGRAPHIC PRINTING PLATE PRECURSORS  
(1) A packaged body of lithographic printing plate precursors, wherein an image-recording layer or a protective layer of the outermost surface layer contains an inorganic layered compound. (2) A...
US20100040974 UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN  
An upper layer film forming composition for forming an upper layer film on the surface of a photoresist film includes (A) a resin dissolvable in a developer for the photoresist film and (B) a...
US20080299503 Material for Forming Resist Protection Films and Method for Resist Pattern Formation with the Same  
The formation of high-resolution resist patterns by liquid immersion lithography with various fluids is enabled by protecting a resist film from deterioration (such as bridging) during the...

Matches 1 - 50 out of 76 1 2 >